Abstract: According to one embodiment, a data collection system includes a receiving module configured to receive semi-structured data including first data of a first level and a plurality of second data of a second level, the first data including a plurality of the second data, wherein a plurality of second identification information are respectively set for a plurality of the second data, a database, an information storage module configured to store storage position information indicating storage positions of a plurality of the second identification information in the database, and a registration module configured to write a plurality of the second data to the database based on the storage position information.

Abstract: An eyeglass frame shape measurement apparatus includes a measuring unit measuring shapes of right and left rims of an eyeglass frame. Measuring modes include a first measuring mode in which whole peripheries of both rims are measured; a second measuring mode in which the whole periphery of one of the right and left rims; and a third measuring mode in which nose side portions of the left rim and the nose side portion of the right rim are partially measured. A controller drives the measuring unit to measure the whole peripheries of both rims in the first measuring mode, for driving the measuring unit to measure the whole periphery of one of the left and right rims in the second mode, and drive the measuring unit to measure partially the nose side portions of both rims in the third mode.

Abstract: An eyeglass frame shape measuring apparatus includes: a frame holding unit holding an eyeglass frame; a tracing stylus inserted into a bevel groove of the rim; a moving unit moving the tracing stylus; and a controller controls the moving unit and obtains measurement data of a shape of the rim. The controller controls the moving unit based on a first measurement operation to perform a first measurement. The controller decides whether the first measurement is performed in a first state in which the tracing stylus is inserted into the bevel groove at the time of starting the first measurement or a second state in which the tracing stylus is not inserted into the bevel groove at the time of starting the first measurement. If the controller decides that it is the second state, the controller performs a second measurement based on a second measurement operation.

Abstract: An eyeglass frame shape measurement device includes: an eyeglass frame holding unit including a first slider and a second slider for holding an eyeglass frame; a rim measuring unit including a tracing stylus for a rim of the eyeglass frame, and detecting the movement position of the tracing stylus to measure a shape of the rim; a template holder configured to attach a template and a measurement object of a demo lens; a template measuring unit including a tracing stylus shaft configured to contact an edge of the measurement object attached to the template holder, for measuring radius vector information of the measurement object; and a housing portion provided to house the template holder and provided in one of the first slider and the second slider when measurement using the template measuring unit is not being performed.

Abstract: An eyeglass frame shape measuring apparatus includes: a frame holding unit holding an eyeglass frame; a tracing stylus inserted into a bevel groove of the rim; a moving unit moving the tracing stylus; and a controller controls the moving unit and obtains measurement data of a shape of the rim. The controller controls the moving unit based on a first measurement operation to perform a first measurement. The controller decides whether the first measurement is performed in a first state in which the tracing stylus is inserted into the bevel groove at the time of starting the first measurement or a second state in which the tracing stylus is not inserted into the bevel groove at the time of starting the first measurement. If the controller decides that it is the second state, the controller performs a second measurement based on a second measurement operation.

Abstract: An eyeglass frame shape measurement apparatus includes a measuring unit measuring shapes of right and left rims of an eyeglass frame. Measuring modes include a first measuring mode in which whole peripheries of both rims are measured; a second measuring mode in which the whole periphery of one of the right and left rims; and a third measuring mode in which nose side portions of the left rim and the nose side portion of the right rim are partially measured. A controller drives the measuring unit to measure the whole peripheries of both rims in the first measuring mode, for driving the measuring unit to measure the whole periphery of one of the left and right rims in the second mode, and drive the measuring unit to measure partially the nose side portions of both rims in the third mode.

Abstract: An eyeglass frame shape measurement device includes: an eyeglass frame holding unit including a first slider and a second slider for holding an eyeglass frame; a rim measuring unit including a tracing stylus for a rim of the eyeglass frame, and detecting the movement position of the tracing stylus to measure a shape of the rim; a template holder configured to attach a template and a measurement object of a demo lens; a template measuring unit including a tracing stylus shaft configured to contact an edge of the measurement object attached to the template holder, for measuring radius vector information of the measurement object; and a housing portion provided to house the template holder and provided in one of the first slider and the second slider when measurement using the template measuring unit is not being performed.

Abstract: In a method of processing a periphery of an eyeglass lens, at an optician shop, rimless frame identifying data for identifying a rimless frame is inputted; modification data for an original target lens shape of the eyeglass lens to be mounted on the rimless frame is inputted; and the input rimless frame identifying data and modification data is transmitted through a network communication to a lens processing factory; and at the lens processing factory, the data transmitted is received through the network communication; the original target lens shape data of the eyeglass lens to be mounted on the rimless frame is called from a database, based on the received rimless frame identifying data; a modified target lens shape is calculated based on the original target lens shape and the modification data; and the periphery of the eyeglass lens is processed based on data the calculated modified target lens shape.

Abstract: An eyeglass lens processing apparatus includes: a piercing unit that includes a piercing tool for piercing a hole in an eyeglass lens; a first input unit that inputs position data and depth data of a non-through hole to be formed in a refractive surface of the lens; a detecting unit that detects a position of a front end of the piercing tool; and a control unit that controls a process of forming the non-through hole based on the detected front-end position data, and the input position data and the input depth data.

Abstract: In a method of processing a periphery of an eyeglass lens, at an optician shop, rimless frame identifying data for identifying a rimless frame is inputted; modification data for an original target lens shape of the eyeglass lens to be mounted on the rimless frame is inputted; and the input rimless frame identifying data and modification data is transmitted through a network communication to a lens processing factory; and at the lens processing factory, the data transmitted is received through the network communication; the original target lens shape data of the eyeglass lens to be mounted on the rimless frame is called from a database, based on the received rimless frame identifying data; a modified target lens shape is calculated based on the original target lens shape and the modification data; and the periphery of the eyeglass lens is processed based on data the calculated modified target lens shape.

Abstract: A defect inspection apparatus for inspecting an object to be inspected for a defect by processing an image taken from the object, includes: neural networks provided respectively for individual defect types to be classified; a learning unit which makes the neural networks learn based on the corresponding defect types to be classified; and a defect detection unit which classifies and detects defect types using the neural networks that have learned.

Abstract: An eyeglass lens processing apparatus includes: a piercing unit that includes a piercing tool for piercing a hole in an eyeglass lens; a first input unit that inputs position data and depth data of a non-through hole to be formed in a refractive surface of the lens; a detecting unit that detects a position of a front end of the piercing tool; and a control unit that controls a process of forming the non-through hole based on the detected front-end position data, and the input position data and the input depth data.

Abstract: A inspecting device for a semiconductor wafer comprises: a holding unit which holds a wafer; an aligner unit which detects a cutout position and a center position of the wafer held by the holding unit and obtains position determining data of the wafer; an observing unit for magnifying and observing fine patterns on the wafer, the observing unit being disposed at a position where the wafer held by the holding unit can be observed; a moving unit which relatively moves the holding unit with respect to the observing unit; and a control unit which controls the moving unit to move the holding unit based on the obtained position data so that the fine patterns at a desired position can be observed.

Abstract: A defect inspection apparatus for inspecting an object to be inspected for a defect by processing an image taken from the object, includes: neural networks provided respectively for individual defect types to be classified; a learning unit which makes the neural networks learn based on the corresponding defect types to be classified; and a defect detection unit which classifies and detects defect types using the neural networks that have learned.

Abstract: A inspecting device for a semiconductor wafer comprises: a holding unit which holds a wafer; an aligner unit which detects a cutout position and a center position of the wafer held by the holding unit and obtains position determining data of the wafer; an observing unit for magnifying and observing fine patterns on the wafer, the observing unit being disposed at a position where the wafer held by the holding unit can be observed; a moving unit which relatively moves the holding unit with respect to the observing unit; and a control unit which controls the moving unit to move the holding unit based on the obtained position data so that the fine patterns at a desired position can be observed.