Abstract: A fault analysis apparatus is an apparatus for measuring a reaction of a semiconductor device having a wiring extending in two directions orthogonal to each other. The fault analysis apparatus comprises a laser light source that outputs laser light, a control unit that sets a scan direction which is a direction of scanning an irradiation position of the laser light in the semiconductor device, a laser scanner that scans the laser light according to the scan direction, an electric signal detector that measures the reaction of the semiconductor device to the laser light and outputs a measured value, and an image processing unit that creates a two-dimensional map according to the irradiation position and the measured value. The control unit sets the scan direction such that the scan direction intersects the wiring extending directions at an angle greater than 0° but smaller than 90°.

Abstract: A fault analysis apparatus is an apparatus for measuring a reaction of a semiconductor device having a wiring extending in two directions orthogonal to each other. The fault analysis apparatus comprises a laser light source that outputs laser light, a control unit that sets a scan direction which is a direction of scanning an irradiation position of the laser light in the semiconductor device, a laser scanner that scans the laser light according to the scan direction, an electric signal detector that measures the reaction of the semiconductor device to the laser light and outputs a measured value, and an image processing unit that creates a two-dimensional map according to the irradiation position and the measured value. The control unit sets the scan direction such that the scan direction intersects the wiring extending directions at an angle greater than 0° but smaller than 90°.