Abstract: A laminate structure includes a laminate which has a three-dimensional shape and is provided with a transparent conductive member having a plurality of conductive layers constituted of fine metal wires on a flexible transparent substrate, a wiring formed on the transparent substrate and electrically connected to each conductive layer, a protective member having an optically transparent region and protecting the transparent conductive member, and an optically transparent adhesive layer positioned between the transparent conductive member and the protective member. The laminate has at least a planar portion and a bent portion formed continuously to the planar portion. The wiring is routed to the bent portion and is connected to a flexible wiring member at the tip of the bent portion.

Abstract: An organically modified layered silicate including a laminate composed of 3 to 60 layers of silicate that have been treated with a surface treatment agent in a dispersed state, wherein the laminate has a thickness of 10 nm to 120 nm, and an interlayer distance of the layers of the surface-treated silicate constituting the laminate is 1.5 nm to 4.0 nm. A preferred aspect of the present invention is an organically modified layered silicate obtained by dispersing layered silicate in a solvent to prepare a dispersion liquid, adding a surface treatment agent into the dispersion liquid until the pH of the dispersion liquid reaches 5 to 7 to obtain an organically modified layered silicate dispersion liquid, filtering the layered silicate dispersion liquid to obtain an organically modified layered silicate, and washing the organically modified layered silicate.

Abstract: In order to achieve the above object, the invention provides a retainer ring for polishing head includes: a base unit made of a highly rigid material, formed to have a ring-like shape, and supported on the polishing head side; and a resin unit in which a plurality of resin blocks are fixed to the lower surface of the base unit at almost the same intervals and which serves as a contact side to the polishing pad. Flow paths for the slurry are constituted by spaces between adjacent resin blocks and the lower surface of the base unit.

Abstract: A method for manufacturing a resin composition which comprising a thermoplastic resin and inorganic particles having major axes less than 1 ?m and aspect ratios in a range of from 3 to 1000 and dispersant both of which are frozen and dried at a temperature lower than 30° C. below the freezing point by freeze vacuum drying. This resin composition is hard to cause agglutination of anisotropic particles having large aspect ratios.