Patents by Inventor Takayoshi Matsuyama

Takayoshi Matsuyama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11029674
    Abstract: An information processing device determines, based on a preset threshold, whether the production index belongs to either a first section or a second section contained in one maintenance cycle of the member, wherein a change in the production index is larger in the second section than in the first section. The information processing device executes at least one of first processing in which the production index determined to belong to the first section is used and second processing in which the production index determined to belong to the second section is used.
    Type: Grant
    Filed: June 12, 2018
    Date of Patent: June 8, 2021
    Assignee: OMRON Corporation
    Inventors: Takayoshi Matsuyama, Reiko Hattori, Toru Fujii, Hideki Yachiku, Hiroshi Kuribayashi
  • Publication number: 20210121623
    Abstract: Provided in the present disclosure are a controller, a method for controlling controller, learning device, and a storage medium. Correct/incorrect determination of a transfusion tube is efficiently performed during a changeover. Motor shaft information of a driving motor, which drives an actuating portion sequentially compressing and relaxing a transfusion tube of a transfusion device, is obtained, and the correctness/incorrectness determination of the transfusion tube is performed on the basis of the motor shaft information.
    Type: Application
    Filed: May 23, 2019
    Publication date: April 29, 2021
    Applicant: OMRON Corporation
    Inventors: Yasuhiro UJITA, GAKU SHIRAMIZU, Takayoshi MATSUYAMA
  • Patent number: 10639759
    Abstract: There are provided a load state diagnosis device and a load state diagnosis method for a servomotor. A PLC diagnoses the load state of the servomotor which rotationally drives a rotary tool in a predetermined rotational drive direction at a constant speed. The PLC includes a detection part that detects the rotational direction of a torque acting on the servomotor, a determination part that determines whether the rotational direction of the torque detected by the detection part is consistent with the predetermined rotational drive direction, and a load index output part that outputs a load index indicating the load state of the servomotor based on a determination result of the determination part.
    Type: Grant
    Filed: October 17, 2018
    Date of Patent: May 5, 2020
    Assignee: OMRON Corporation
    Inventors: Reiko Hattori, Takayoshi Matsuyama, Toru Fujii
  • Publication number: 20190184511
    Abstract: There are provided a load state diagnosis device and a load state diagnosis method for a servomotor. A PLC diagnoses the load state of the servomotor which rotationally drives a rotary tool in a predetermined rotational drive direction at a constant speed. The PLC includes a detection part that detects the rotational direction of a torque acting on the servomotor, a determination part that determines whether the rotational direction of the torque detected by the detection part is consistent with the predetermined rotational drive direction, and a load index output part that outputs a load index indicating the load state of the servomotor based on a determination result of the determination part.
    Type: Application
    Filed: October 17, 2018
    Publication date: June 20, 2019
    Applicant: OMRON Corporation
    Inventors: Reiko HATTORI, Takayoshi MATSUYAMA, Toru FUJII
  • Publication number: 20190072945
    Abstract: An information processing device determines, based on a preset threshold, whether the production index belongs to either a first section or a second section contained in one maintenance cycle of the member, wherein a change in the production index is larger in the second section than in the first section. The information processing device executes at least one of first processing in which the production index determined to belong to the first section is used and second processing in which the production index determined to belong to the second section is used.
    Type: Application
    Filed: June 12, 2018
    Publication date: March 7, 2019
    Applicant: OMRON Corporation
    Inventors: Takayoshi MATSUYAMA, Reiko HATTORI, Toru FUJII, Hideki YACHIKU, Hiroshi KURIBAYASHI
  • Patent number: 6603875
    Abstract: A pattern inspection method and apparatus for carrying out pattern inspection with a simple mechanical apparatus following a simple procedure are provided. A recording medium which records a pattern inspection program for carrying out the pattern inspection is also provided. The pattern inspection apparatus of the present invention includes: a first image data generator which generates first image data from a pattern image captured from a sample; a second image data generator which generates second image data by reducing the four sides of each pattern contained in the first image data; a pattern number detector which detects a first pattern number that is the number of patterns contained in the first image data, and also detects a second pattern number that is the number of patterns contained in the second image data; and a defect detector which detects a defect contained in the patterns of the sample in accordance with a result of the comparison between the first pattern number and the second pattern number.
    Type: Grant
    Filed: March 14, 2000
    Date of Patent: August 5, 2003
    Assignee: Fujitsu Limited
    Inventors: Takayoshi Matsuyama, Ituo Kobayashi
  • Patent number: 6327379
    Abstract: An actual pattern image including an auxiliary pattern in a periphery of a pattern of an object to be inspected is recognized. The image of the auxiliary pattern is deleted from the recognized image and an auxiliary-pattern-image-deleted recognized image is produced. An inspection image to be used for inspection is produced from design data from which the auxiliary pattern is removed. The auxiliary-pattern-image-deleted recognized image is compared with the inspection image.
    Type: Grant
    Filed: August 8, 1997
    Date of Patent: December 4, 2001
    Assignee: Fujitsu Limited
    Inventors: Takayoshi Matsuyama, Ken-ichi Kobayashi
  • Publication number: 20010012391
    Abstract: An actual pattern image including an auxiliary pattern in a periphery of a pattern of an object to be inspected is recognized. The image of the auxiliary pattern is deleted from the recognized image and an auxiliary-pattern-image-deleted recognized image is produced. An inspection image to be used for inspection is produced from design data from which the auxiliary pattern is removed. The auxiliary-pattern-image-deleted recognized image is compared with the inspection image.
    Type: Application
    Filed: August 8, 1997
    Publication date: August 9, 2001
    Inventors: TAKAYOSHI MATSUYAMA, KEN-ICHI KOBAYASHI
  • Patent number: 6064484
    Abstract: A pattern inspection method includes the steps of: obtaining first image data by optically picking up an actually formed pattern such as a reticle; aligning a position of the first image data with second image data of a pattern at a different layer from that of the first image data; and performing a first pattern inspection using the first and second image data. Defect inspection can be executed in a short time with a practically sufficient precision.
    Type: Grant
    Filed: March 11, 1997
    Date of Patent: May 16, 2000
    Assignee: Fujitsu Limited
    Inventors: Ken-ichi Kobayashi, Takayoshi Matsuyama, Showgo Matsui
  • Patent number: 5900941
    Abstract: A pattern inspection method includes the steps of: copying design data representative of a design pattern in a storage unit; generating index data and storing the index data in the storage unit, the index data indicating data at what position of the design pattern is stored at which location of the storage unit; picking up an image of a real pattern on a stage and generating real pattern data; reading the design data by using the index data in accordance with a position on the real pattern; generating design pattern data in accordance with the read design data; and comparing the real pattern data with the design pattern data to detect any defect in the real pattern data. A pattern inspection method and system is provided which can perform die-to-database inspection at high speed.
    Type: Grant
    Filed: May 29, 1997
    Date of Patent: May 4, 1999
    Assignee: Fujitsu Limited
    Inventors: Takayoshi Matsuyama, Ken-ichi Kobayashi, Katsuyoshi Nakashima, Yasunori Hada
  • Patent number: 4701859
    Abstract: A method and the apparatus for inspecting the unit pattern arrangements on a photomask to determine relative shear between the unit patterns where each unit pattern has the same shape and size and is printed repeatedly at equal intervals on the photomask. Shear-detecting-patterns are provided on each unit pattern. Adjacent shear-detecting-patterns on adjacent unit patterns are designated as combined patterns. The combined patterns arranged in the same directions make a group. To detect an irregular shear, a standard pattern is designated from the combined patterns in a group and comparison is made between each combined pattern in the group and the standard pattern. An optical image of each combined pattern in a group is and converted into electric signals. The electrical signals for the standard pattern and for the other combined patters are stored a memory. The two sets of signals are read out and compared to provide a shear difference between the patterns.
    Type: Grant
    Filed: October 10, 1984
    Date of Patent: October 20, 1987
    Assignee: Fujitsu Limited
    Inventors: Takayoshi Matsuyama, Kenichi Kobayashi
  • Patent number: 4669123
    Abstract: A method and an apparatus for inspecting a photomask pattern utilizing a vector comparing method. A pair of optical images intended to be compared are taken from the photomask pattern and converted to digital data by optical systems and an amplitude distributor. The digital data have values of black (B), gray (G), or white (W) corresponding to high, middle, and low signal amplitudes. Separated data corresponding to a portion of each of the optical images are sequentially separated from the digital data by data separators. The separated data are shifted by several matrix elements of the separated data by data shifters to provide shifted data. The shifted data of each optical image and separated data are respectively synthesized by data synthesizers to provide two groups of synthesized data. Vectors are generated from the matrices of the groups of synthesized data by vector generators.
    Type: Grant
    Filed: September 17, 1984
    Date of Patent: May 26, 1987
    Assignee: Fujitsu Limited
    Inventors: Kenichi Kobayashi, Takayoshi Matsuyama