Patents by Inventor Takayoshi Numata

Takayoshi Numata has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6355716
    Abstract: The present invention relates to a silicon wafer carrier consisting of a composition composed of (a) 100 parts by weight of a polyester, (b) 5 to 100 parts by weight of a polyether ester amide, (c) 10 to 2,500 ppm (based on the polyether ester amide) of an alkaline metal and (d) 0 to 40 parts by weight of a modified polyolefin, generating not more than 10 ppm of volatile gas by the heat-treatment at 150° C. for 60 minutes and eluting not more than 10 ppm of the alkaline metal by the immersion treatment in pure water at 80° C. for 120 minutes. The silicon wafer carrier has the generation of volatile gas and the elution of metal suppressed to an extent not to essentially cause the surface contamination of a silicon wafer and is provided with excellent permanent antistaticity and high mechanical properties and heat-resistance.
    Type: Grant
    Filed: November 28, 2000
    Date of Patent: March 12, 2002
    Assignee: Teijin Limited
    Inventors: En Lai Zhang, Satoshi Yamamoto, Takayoshi Numata, Kiyoshi Sugie
  • Patent number: 6344513
    Abstract: A resin composition exhibiting excellent antistaticity and static charge dissipating performance and having extremely small variations of antistatic properties (saturated static voltage and half-life period of static voltage) on the surface of a molded article and a transportation jig for electronic field made of the above resin composition are provided by using a resin composition produced by compounding (A) 100 parts by weight of a thermoplastic resin with (B) 1 to 30 parts by weight of a carbon fiber having a diameter of 1 nm to 1 &mgr;m, a length of 1 &mgr;m to 3 mm and a volume resistivity of smaller than 1 &OHgr;cm and (C) 5 to 200 parts by weight of an antistatic polymer having a surface resistivity of 108 to 1011&OHgr; (measured under impressed voltage of 500V), a melting point of 100° C. or above, an apparent melt viscosity of 10 to 1,000 Pa·s at apparent shear rate of 1,000 sec−1 at 260° C.
    Type: Grant
    Filed: October 26, 2000
    Date of Patent: February 5, 2002
    Assignee: Teijin Limited
    Inventor: Takayoshi Numata
  • Patent number: 6268030
    Abstract: The present invention relates to a silicon wafer carrier consisting of a composition composed of (a) 100 parts by weight of a polyester, (b) 5 to 100 parts by weight of a polyether ester amide, (c) 10 to 2,500 ppm (based on the polyether ester amide) of an alkaline metal and (d) 0 to 40 parts by weight of a modified polyolefin, generating not more than 10 ppm of volatile gas by the heat-treatment at 150° C. for 60 minutes and eluting not more than 10 ppm of the alkaline metal by the immersion treatment in pure water at 80° C. for 120 minutes. The silicon wafer carrier has the generation of volatile gas and the elution of metal suppressed to an extent not to essentially cause the surface contamination of a silicon wafer and is provided with excellent permanent antistaticity and high mechanical properties and heat-resistance.
    Type: Grant
    Filed: November 17, 1998
    Date of Patent: July 31, 2001
    Assignee: Teijin Limited
    Inventors: En Lai Zhang, Satoshi Yamamoto, Takayoshi Numata, Kiyoshi Sugie
  • Patent number: 6150446
    Abstract: A destaticizing thermoplastic resin composition compristing(A) a thermoplastic resin;(B) a polymer having a surface resistivity measured at 500 V of 10.sup.8 to 10.sup.11 .OMEGA., a melting point of 100.degree. C. or higher, an apparent malt viscosity at an apparent shear rate at 260.degree. C. of 1,000 sec.sup.-1 of 10 to 1,000 Pa.multidot.s, and a ratio of the above apparent melt viscosity to the apparent melt viscosity of the thermoplastic resin at an apparent shear rate at 260.degree. C. of 1,000 sec.sup.-1 of 0.01 to 1.3; or a carbon fiber having a diameter of 1 nm to 1 .mu.m, a length of 1 .mu.m to 10 mm and a volume resistivity of less than 1 .OMEGA.cm; or a combination of the polymer and the carbon fiber; and(C) a fibrous conductive filler having a volume resistivity of 100 .OMEGA..multidot.cm or less.The destaticizing composition is useful for preparation of a carrier jig for use in an electronic field.
    Type: Grant
    Filed: August 27, 1998
    Date of Patent: November 21, 2000
    Assignee: Teijin Limited
    Inventor: Takayoshi Numata
  • Patent number: 5690610
    Abstract: A sticking material for hemostasis has a flexible strip-shaped base member having a high recovery property, a main surface, and side edges extending in a first longitudinal direction. An adhesive layer is disposed on the main surface of the base member. A pad is disposed on the adhesive layer and extends in a second longitudinal direction substantially transverse to the first longitudinal direction such that a space is defined between the pad and each of the side edges of the base member. The pad is of a size sufficient to exert pressure at a puncture area including punctures of both a blood vessel and a skin surface. The pad has a slight elasticity and a hardness capable of securely exerting pressure on the punctures by a shrinking action of the base member when the base member is adhered to the skin surface while being stretched to secure the pad over the punctures.
    Type: Grant
    Filed: March 10, 1994
    Date of Patent: November 25, 1997
    Assignee: Nichiban Co., Ltd.
    Inventors: Toshio Ito, Takayuki Akutsu, Tsugio Saito, Takayoshi Numata, Fumio Tokumura, Katsumi Kusumi, Kunihiro Ohyama