Abstract: A reflective mask blank includes: a substrate; a Mo/Si multilayer reflection layer formed by alternately laminating a molybdenum (Mo) layer and a silicon (Si) layer on or above the substrate; an intermediate layer on or above the Mo/Si multilayer reflection layer; a barrier layer on or above the intermediate layer; a protective layer on or above the barrier layer; and an absorption layer on or above the protective layer.

Abstract: The current disclosure relates to methods of selectively etching material from a first surface of a substrate relative to a second surface of the substrate. The method includes providing the substrate having a first surface comprising an etchable material, and a second surface comprising a non-etchable material in a reaction chamber, providing hydrogen-containing plasma into the reaction chamber to reduce the etchable material to a predetermined depth; and providing remotely-generated reactive halogen species and hydrogen into the reaction chamber to selectively etch the reduced etchable material. The disclosure further relates to methods of selectively etching at least two different etchable materials simultaneously from a surface of a substrate relative to a non-etchable material on the same substrate, to methods of simultaneous differential etching of three or more etchable materials on a substrate, as well as to assemblies for processing semiconductor substrates.

Abstract: Methods and related systems for topographically depositing a material on a substrate are disclosed. The substrate comprises a proximal surface and a gap feature. The gap feature comprises a sidewall and a distal surface. Exemplary methods comprise, in the given order: a step of positioning the substrate on a substrate support in a reaction chamber; a step of subjecting the substrate to a plasma pre-treatment; and, a step of selectively depositing a material on at least one of the proximal surface and the distal surface with respect to the sidewall. The step of subjecting the substrate to a plasma pre-treatment comprises exposing the substrate to at least one of fluorine-containing molecules, ions, and radicals.

Abstract: The current disclosure relates to processes for selectively etching material from one surface of a semiconductor substrate over another surface of the semiconductor substrate. The disclosure further relates to assemblies for etching material from a surface of a semiconductor substrate. In the processes, a substrate comprising a first surface and a second surface is provided into a reaction chamber, an etch-priming reactant is provided into the reaction chamber in vapor phase; reactive species generated from plasma are provided into the reaction chamber for selectively etching material from the first surface. The etch-priming reactant is deposited on the first surface and the etch-priming reactant comprises a halogenated hydrocarbon. The halogenated hydrocarbon may comprise a head group and a tail group, and one or both of them may be halogenated.

Abstract: Methods and related systems for filling a gap feature comprised in a substrate are disclosed. The methods comprise a step of providing a substrate comprising one or more gap features into a reaction chamber. The one or more gap features comprise an upper part comprising an upper surface and a lower part comprising a lower surface. The methods further comprise a step of subjecting the substrate to a plasma treatment. Thus, the upper surface is inhibited while leaving the lower surface substantially unaffected. Then, the methods comprise a step of selectively depositing a silicon-containing material on the lower surface.

Abstract: An etching process is provided that includes a pre-clean process to remove a surface oxide of a dielectric material. The removal of the oxide can be executed through a thermal reaction and/or plasma process before the etch process. In some embodiments, the removal of the oxide increases etch process control and reproducibility and can improve the selectivity versus oxides.

Abstract: In some embodiments, a selective cyclic (optionally dry) etching of a first surface of a substrate relative to a second surface of the substrate in a reaction chamber by chemical atomic layer etching comprises forming a modification layer using a first plasma and etching the modification layer. The first surface comprises carbon and/or nitride and the second surface does not comprise carbon and/or nitride.

Abstract: An etching process is provided that includes a pre-clean process to remove a surface oxide of a dielectric material. The removal of the oxide can be executed through a thermal reaction and/or plasma process before the etch process. In some embodiments, the removal of the oxide increases etch process control and reproducibility and can improve the selectivity versus oxides.

Abstract: In some embodiments, a selective cyclic (optionally dry) etching of a first surface of a substrate relative to a second surface of the substrate in a reaction chamber by chemical atomic layer etching comprises forming a modification layer using a first plasma and etching the modification layer. The first surface comprises carbon and/or nitride and the second surface does not comprise carbon and/or nitride.

Abstract: A method for etching a target layer on a substrate by a dry etching process includes at least one etching cycle, wherein an etching cycle includes: depositing a carbon halide film using reactive species on the target layer on the substrate; and etching the carbon halide film using a plasma of a non-halogen hydrogen-containing etching gas, which plasma alone does not substantially etch the target layer, thereby generating a hydrogen halide as etchant species at a boundary region of the carbon halide film and the target layer, thereby etching a portion of the target layer in the boundary region.

Abstract: A method for etching a target layer on a substrate by a dry etching process includes at least one etching cycle, wherein an etching cycle includes: depositing a carbon halide film using reactive species on the target layer on the substrate; and etching the carbon halide film using a plasma of a non-halogen hydrogen-containing etching gas, which plasma alone does not substantially etch the target layer, thereby generating a hydrogen halide as etchant species at a boundary region of the carbon halide film and the target layer, thereby etching a portion of the target layer in the boundary region.

Abstract: A method for etching a target layer on a substrate by a dry etching process includes at least one etching cycle, wherein an etching cycle includes: depositing a halogen-containing film using reactive species on the target layer on the substrate; and etching the halogen-containing film using a plasma of a non-halogen etching gas, which plasma alone does not substantially etch the target layer, to generate etchant species at a boundary region of the halogen-containing film and the target layer, thereby etching a portion of the target layer in the boundary region.

Abstract: A portable terminal carried and owned by each user is provided with a display screen, a communication unit, a memory storing personal information about each user, and an input/output device such as an inhaler. A database that communicates with each portable terminal is provided with a personal information storage unit storing the personal information about each user carrying the portable terminal, a medical information storage unit storing information about a medical facility, a drugstore, a medicine, and the input/output device, and a communication unit for communicating with each portable terminal. In the database, the user of the portable terminal is identified by collating the part of the information transmitted from the communication unit with information stored in the personal information storage unit.

Abstract: A portable terminal carried and owned by each user is provided with a display screen, a communication unit, a memory storing personal information about each user, and an input/output device such as an inhaler. A database that communicates with each portable terminal is provided with a personal information storage unit storing the personal information about each user carrying the portable terminal, a medical information storage unit storing information about a medical facility, a drugstore, a medicine, and the input/output device, and a communication unit for communicating with each portable terminal. In the database, the user of the portable terminal is identified by collating the part of the information transmitted from the communication unit with information stored in the personal information storage unit.

Abstract: A portable terminal carried and owned by each user is provided with a display screen, a communication unit, a memory storing personal information about each user, and an input/output device such as an inhaler. A database that communicates with each portable terminal is provided with a personal information storage unit storing the personal information about each user carrying the portable terminal, a medical information storage unit storing information about a medical facility, a drugstore, a medicine, and the input/output device, and a communication unit for communicating with each portable terminal. In the database, the user of the portable terminal is identified by collating the part of the information transmitted from the communication unit with information stored in the personal information storage unit.

Abstract: To reduce a quantity of uselessly consumed ink when an ink jet head is recoverably activated, the capacity of an ink path communicated with a group of ejecting ports having a small flow rate coefficient is determined to be smaller than that of an ink path communicated with a group of ejecting ports having a large flow rate coefficient. While all of plural groups of, ejecting ports are fully covered with a common recovering cap with the aid of sucking means, ink is, sucked from the plural groups of ejecting ports. When the ink remaining in the region extending from the plural groups of ejecting ports to predetermined positions in a plurality of ink paths communicated with the plural groups of ejecting ports is discharged, ink discharging positions are dislocated to predetermined positions in a plurality of ink paths to positionally coincide with the predetermined positions in the substantially same timing relationship after ejection recovering treatment starts to be conducted.

Abstract: A portable terminal carried and owned by each user is provided with a display screen, a communication unit, a memory storing personal information about each user, and an input/output device such as an inhaler. A database that communicates with each portable terminal is provided with a personal information storage unit storing the personal information about each user carrying the portable terminal, a medical information storage unit storing information about a medical facility, a drugstore, a medicine, and the input/output device, and a communication unit for communicating with each portable terminal. In the database, the user of the portable terminal is identified by collating the part of the information transmitted from the communication unit with information stored in the personal information storage unit.

Abstract: A liquid storing container employable for an ink jet recording apparatus includes a housing, a storing area containing a porous ink absorbing member, a valve mechanism, a filter in contact with the porous member, and a stopper. The liquid storing container is detachably connected to an ink jet recording head, where the valve mechanism allows an outflow of ink to the ink jet head through the joint portion when connected to an ink feed pipe, and closes the joint portion when disconnected from the ink feed pipe.

Abstract: An ink refilling method for an ink container having a porous material capable of producing negative pressure therein and having an ink absorbing portion in a connecting zone with an ink jet recording head, after at least a part of initially contained ink is consumed through the ink absorbing portion includes breaking ink meniscus at the ink absorbing portion of the ink container; supplying the ink into the ink container by a negative pressure produced in the porous material by consumption of the ink, while maintaining fluid communication between the ink absorbing portion and the ink to be supplied.

Abstract: A liquid storing container, having a liquid feed portion for supplying liquid to a liquid injection recording apparatus, includes a rectangular receiving case for a porous member, and a filter that compresses the porous member. The liquid storing container provides for controlled feeding of liquid through a contact portion where the filter compresses the porous member, and a proper balance of air and liquid is achieved by symmetrical surfaces located within the receiving case.