Abstract: A method for fabricating a semiconductor device, includes dividing a pattern region of a desired pattern that is to be formed on a semiconductor substrate into a plurality of sub-regions; calculating combination condition including a shape of illumination light for transferring and a mask pattern obtained by correcting a partial pattern in the sub-region of the desired pattern formed on a mask used during transferring for each of the plurality of sub-regions, to make a dimension error of the partial pattern of each of the plurality of sub-regions smaller when transferred to the semiconductor substrate; and forming the desired pattern by making multiple exposures on the semiconductor substrate in such a way that the partial patterns of the sub-regions divided are sequentially transferred by transferring a pattern to the semiconductor substrate using the combination conditions calculated for each of the sub-regions.

Abstract: A switch includes a movable contact piece having one end as a supporting point of turn and the other end arranged with a movable contact, a turning member having the other end as a supporting point of turn, a coil spring having one end locked to one end of the turning member and the other end locked to an intermediate portion of the movable contact piece, and a push button supported and slidable in an up and down direction. The movable contact piece is inverted by pushing down the one end of the turning member with the push button so as to make the movable contact approach and separate from a fixed contact. The turning member includes a position regulating portion that is brought into contact with the coil spring and brings the movable contact into contact with the fixed contact while maintaining a contact state with the coil spring.

Abstract: An image with a desired contrast is obtained while suppressing body motion artifacts caused by both random motion and periodic motion of an object. In order to do so, an imaging sequence using a non-Cartesian sampling method is executed so as to synchronize with a biological signal only at the start time and a repetition time (TR), which is an execution interval between shots within the imaging sequence, is maintained. In addition, a time difference between a delay time and a start time of each shot is calculated, and a shot with a predetermined time difference or more is executed again after the TR time.

Abstract: A magnetic resonance imaging device includes a predetermined pulse sequence, the predetermined pulse sequence including an unnecessary material suppressing sequence unit for canceling a signal from an unnecessary material which is not a measurement target and a main imaging sequence unit for measuring a nuclear magnetic resonance signal used to create an image of an examinee. The unnecessary material suppressing sequence unit generates at least two or more high frequency magnetic field pulses so that the longitudinal magnetization of the unnecessary material is made spatially uniform in the imaging space under application of a first high frequency magnetic field pulse in the main imaging sequence unit.

Abstract: A method for resizing a pattern to be written by using lithography technique includes calculating a first dimension correction amount of a pattern for correcting a dimension error caused by a loading effect, for each small region made by virtually dividing a writing region of a target workpiece into meshes of a predetermined size, based on an area density of the each small region, calculating a second dimension correction amount in accordance with a line width dimension of the pattern to be written in the each small region, correcting the first dimension correction amount by using the second dimension correction amount, and resizing the line width dimension of the pattern by using a corrected first dimension correction amount, and outputting a result of the resizing.

Abstract: A beam dose computing method includes dividing a surface area of a target object into include first, second and third regions of different sizes, the third regions being less in size than the first and second regions, determining first corrected doses of a charged particle beam for correcting fogging effects in the first regions, determining corrected size values for correcting pattern line width deviations occurring due to loading effects in the second regions to create a map of base doses of the beam in respective of said second regions and to prepare a map of proximity effect correction coefficients in respective of said second regions, using the maps to determine second corrected doses of the beam for proximity effect correction in the third regions, and using the first and second corrected doses to determine an actual beam dose at each position on the surface of said object.

Abstract: A pattern forming apparatus using lithography technique includes a stage configured to allow a target object to be placed thereon; a plurality of columns configured to form patterns on the target object by using a charged particle beam while moving relatively to the stage; a pattern forming rule setting unit configured to set a pattern forming rule depending on a position of broken one of the plurality of columns; a region setting unit configured to set regions so that unbroken ones of the plurality of columns respectively form a pattern in one of the regions; a plurality of control circuits each configured to control any one of the plurality of columns different from others of the plurality of columns controlled by others of the plurality of control circuits; and a pattern forming data processing unit configured to perform a converting process on pattern forming data for the regions set to output a corresponding data generated by the converting process to the control circuit of a corresponding one of the unb

Abstract: A charged particle beam writing apparatus which the apparatus includes a first area density calculation unit and a first dimension error calculation unit. The apparatus includes a first dimension calculation unit which calculates a second dimension of a pattern obtained by correcting the first dimension error of the first dimension, a second area density calculation unit which calculates a second area density occupied by the pattern of the second dimension in the predetermined region, a second dimension error calculation unit which calculates a second dimension error caused by the loading effect, a second dimension calculation unit which calculates a third dimension by adding the second dimension error to the second dimension, a judgment unit which judges whether a difference between the first dimension and the third dimension is within a predetermined range, and a writing unit which writes the pattern of the second dimension onto a target workpiece.

Abstract: A method for resizing a pattern to be written by using lithography technique includes calculating a first dimension correction amount of a pattern for correcting a dimension error caused by a loading effect, for each small region made by virtually dividing a writing region of a target workpiece into meshes of a predetermined size, based on an area density of the each small region, calculating a second dimension correction amount in accordance with a line width dimension of the pattern to be written in the each small region, correcting the first dimension correction amount by using the second dimension correction amount, and resizing the line width dimension of the pattern by using a corrected first dimension correction amount, and outputting a result of the resizing.

Abstract: A beam dose computing method includes specifying a matrix of rows and columns of regions as divided from a surface area of a target object to include first, second and third regions of different sizes, the third regions being less in size than the first and second regions, determining first corrected doses of a charged particle beam for correcting fogging effects in the first regions, determining corrected size values for correcting pattern line width deviations occurring due to loading effects in the second regions, using said corrected size values in said second regions to create a map of base doses of the beam in respective ones of said second regions, using said corrected size values to prepare a map of proximity effect correction coefficients in respective ones of said second regions, using the maps to determine second corrected doses of said beam for correction of proximity effects in said third regions, and using the first and second corrected doses to determine an actual beam dose at each position on

Abstract: A charged particle beam writing apparatus includes a unit emitting a charged particle beam, a stage on which a target workpiece to be written is placed, a unit correcting a reference position of a small region in a writing region, based on a pattern distortion obtained from positions of figures spread over substantially all writing region of a dummy target workpiece and written without correcting, a first deflector deflecting the beam, based on a corrected reference position obtained by correcting the reference position, a correction unit correcting a relative distance from the corrected reference position to an arbitrary position in the small region, based on a pattern distortion of the dummy, by using the reference position and a coefficient of a correction equation for correcting the reference position, and a second deflector further deflecting the beam from a position deflected by the first deflector, based on the relative distance corrected.

Abstract: A pattern inspection apparatus includes a stage configured to mount a target workpiece to be inspected thereon, a sensor configured to include a plurality of light receiving elements arrayed in a second direction orthogonal to a first direction which moves relatively to the stage, and to capture optical images of the target workpiece by using the plurality of light receiving elements, an accumulation unit configured to accumulate each pixel data of the optical images overlappingly captured by the sensor at positions shifted each other in the second direction by a pixel unit, for each pixel, and a comparison unit configured to compare the each pixel data accumulated for each pixel with predetermined reference data.

Abstract: A method for resizing a pattern to be written by using lithography technique includes calculating a first dimension correction amount of a pattern for correcting a dimension error caused by a loading effect, for each small region made by virtually dividing a writing region of a target workpiece into meshes of a predetermined size, based on an area density of the each small region, calculating a second dimension correction amount in accordance with a line width dimension of the pattern to be written in the each small region, correcting the first dimension correction amount by using the second dimension correction amount, and resizing the line width dimension of the pattern by using a corrected first dimension correction amount, and outputting a result of the resizing.

Abstract: A magnetic resonance imaging device includes magnetic field generating means and control means for controlling receiving means according to a predetermined pulse sequence, the predetermined pulse sequence including an unnecessary material suppressing sequence unit for canceling a signal from an unnecessary material which is not a measurement target and a main imaging sequence unit for measuring a nuclear magnetic resonance signal used to create an image of an examinee. The unnecessary material suppressing sequence unit generates at least two or more high frequency magnetic field pulses so that the longitudinal magnetization of the unnecessary material is made spatially uniform in the imaging space under application of a first high frequency magnetic field pulse in the main imaging sequence unit.

Abstract: The present invention has an object to provide an insoluble carrier for an antiphospholipid antibody detection reagent having a high reactivity. The present invention also has an object to provide an antiphospholipid antibody detection reagent, and a method of detecting an antiphospholipid antibody. The present invention directs to an insoluble carrier for an antiphospholipid antibody detection reagent, having a zeta potential of lower than ?45 mV in the case that the insoluble carrier is suspended in a 20 mmol/L aqueous sodium phosphate solution with a pH of 7.4 so that the resulting suspension has a solids concentration of 0.1%.

Abstract: A magnetic resonance imaging device includes control means for controlling receiving means according to a predetermined pulse sequence that includes an unnecessary material suppressing sequence unit for suppressing a signal from an unnecessary material which is not a measurement target, and a main imaging sequence unit for measuring a nuclear magnetic resonance signal used to create an image of an examinee. The unnecessary material suppressing sequence unit generates at least two or more high frequency magnetic field pulses so that the longitudinal magnetization of the unnecessary material is made spatially uniform in the imaging space under application of a first high frequency magnetic field pulse in the main imaging sequence unit.

Abstract: When executing an imaging pulse sequence using a high frequency magnetic field pulse with a partial waveform of a predetermined waveform, an application start time of a slice gradient magnetic field applied simultaneously with the high frequency magnetic field pulse is corrected. Specifically, a magnetic resonance signal for correcting the imaging pulse sequence is acquired by executing a prescan sequence using a high frequency magnetic field pulse with a predetermined waveform, an application start time of a slice selection gradient magnetic field in the imaging pulse sequence is corrected using the magnetic resonance signal for correction, and the imaging pulse sequence is executed by applying the slice selection gradient magnetic field with the corrected application start time.

Abstract: A pattern inspection apparatus includes a stage configured to mount thereon a target workpiece to be inspected where patterns are formed, at least one sensor configured to move relatively to the stage and capture optical images of the target workpiece to be inspected, a first comparing unit configured to compare first pixel data of an optical image captured by one of the at least one sensor with first reference data at a position corresponding to a position of the first pixel data, and a second comparing unit configured to compare second pixel data of an optical image captured by one of the at least one sensor at a position shifted by a sub-pixel unit from the position where the optical image of the first pixel data is captured, with second reference data at a position corresponding to the position of the second pixel data.

Abstract: According to one embodiment, a memory system includes: a nonvolatile semiconductor memory including a plurality of normal blocks and at least one dummy block, each of the normal blocks being a unit of data erasing; a writing control unit that rewrites the dummy block the number of times equal to or larger than a maximum number of times among the numbers of times of rewriting of the normal blocks; a monitor unit that monitors a data erasing time or a data writing time of the dummy block; and a wear-leveling control unit that averages the numbers of times of rewriting of the normal blocks. The memory system determines, based on a monitor result of the monitor unit, possibility of continuation of the rewriting of the normal blocks.

Abstract: The present invention provides a vehicle-use propeller shaft that includes a yoke having arm portions disposed at equal intervals in the circumferential direction, each arm portion extending outward in the radial direction, and that is capable of suppressing bending vibration. A vehicle-use propeller shaft (10) includes a yoke (16) having four arm portions (17) to (20) disposed at equal intervals in the circumferential direction, each arm portion extending outward in the radial direction. One pair of arm portions (17) and (19) that extend in opposite directions and the other pair of arm portions (18) and (20) that extend in opposite directions have mutually different shapes.