Abstract: A method is provided for designing a wiring structure of a wiring layer of a semiconductor integrated circuit device. The method includes a wire width detecting step of detecting a wire width of each wire in a wiring pattern of layout data, a wire identifying step of identifying a wire having a predetermined wire width or more based on a result of detection by the wire width detecting step, a wiring pitch detecting step of detecting a wiring pitch between the wire identified by the wire identifying step and another wire, and an air gap-forbidden region forming and removing step of forming or removing an air gap-forbidden region, depending on a result of detection by the wiring pitch detecting step.

Abstract: There is provided a photofunctional laminated article being excellent in various photofunctionalities, particularly an intensity of light emission, light emitting efficiency and further fluorescence life and light amplifying property. The photofunctional laminated article comprises the transparent substrate (L0), the photofunctional layer (L1) comprising the fluorine-containing polymer (A) and the rare earth metal compound (B) and being formed on the substrate (L0) and the low refractive index layer (L2) formed on the photofunctional layer (L1), and when refractive indices of each layer are assumed to be n(L0), n(L1) and n(L2), the following equation: n(L0)?n(L1)>n(L2) is satisfied.

Abstract: A fluorine-containing allyl ether polymer having a number average molecular weight of 1,000 to 1,000,000 and consisting of chains of at least one repeating unit of the formula: wherein A is an organic group having 1 to 100 carbon atoms.

Abstract: In each wiring layer in which wirings connected to a gate is formed, wirings are routed so as not to cover the active region of an antenna protection element. A wiring formed in an upper wiring layer is routed so as to cover at least a part of the active region of the antenna protection element.

Abstract: There is provided a method of forming a ferroelectric thin film of vinylidene fluoride homopolymer having crystal form I which is applicable to various substrates in relatively easy way (coating conditions, application method, etc.). The method of forming a ferroelectric thin film comprising vinylidene fluoride homopolymer comprises the step (i) for preparing a green powder of vinylidene fluoride homopolymer comprising crystal form I alone or as main component by subjecting vinylidene fluoride to radical polymerization in the presence of a radical polymerization initiator, the step (ii) for forming a thin film on a substrate surface by using vinylidene fluoride homopolymer which comprises crystal form I alone or as main component and is obtained from the green powder product of vinylidene fluoride homopolymer comprising I-form crystal structure alone or as main component, and the step (iii) for subjecting the thin film of vinylidene fluoride homopolymer formed in the step of above (ii) to polarization.

Abstract: There is provided a photofunctional laminated article being excellent in various photofunctionalities, particularly an intensity of light emission, light emitting efficiency and further fluorescence life and light amplifying property. The photofunctional laminated article comprises the transparent substrate (L0), the photofunctional layer (L1) comprising the fluorine-containing polymer (A) and the rare earth metal compound (B) and being formed on the substrate (L0) and the low refractive index layer (L2) formed on the photofunctional layer (L1), and when refractive indices of each layer are assumed to be n(L0), n(L1) and n(L2), the following equation: n(L0)?n(L1)>n(L2) is satisfied.

Abstract: There is provided a fluorine-containing resin composition which is used for nonlinear optical material and comprises (I) a fluorine-containing prepolymer and (II) an organic compound exhibiting a second- or higher-order nonlinear optical effect, in which the fluorine-containing prepolymer (I): (1) is a non-crystalline polymer having a fluorine content of not less than 25% and (2) has a carbon-carbon double bond in a polymer side chain or at an end of a polymer trunk chain and also there is provided a nonlinear optical waveguide device produced from the fluorine-containing resin composition. A suitable nonlinear optical material having a stable structure with a nonlinear substance is produced, and an excellent nonlinear optical waveguide device is produced by relatively simple steps while maintaining transparency in a near infrared region.

Abstract: There is formed a laminated resist which exhibits sufficient reflection reducing effect in a photolithography process using light of vacuum ultraviolet region and also has sufficient developing characteristics in a developing process. The method of forming the laminated photoresist comprises (I) a step for forming the photoresist layer (L1) on a substrate and (II) a step for forming the antireflection layer (L2) on the photoresist layer (L1) by applying the coating composition containing the fluorine-containing polymer (A) having hydrophilic group Y. The fluorine-containing polymer (A) contains a structural unit derived from a fluorine-containing ethylenic monomer having hydrophilic group Y and is characterized in that (i) the hydrophilic group Y contains an acidic OH group having a pKa value of not more than 11, (ii) a fluorine content is not less than 50% by mass, and (iii) the number of moles of the hydrophilic group Y in 100 g of the fluorine-containing polymer (A) is not less than 0.14.

Abstract: There is provided the photofunctional optical material which is excellent in an intensity of light emission, light emitting efficiency and/or light amplifying property and also is excellent in processability, for example, easy processing into an optical waveguide device. The photofunctional optical material contains a fluorine-containing acrylate, a polyfunctional acrylate and a rare earth metal compound. There is also provided the composition containing a fluorine-containing acrylate, a polyfunctional acrylate and a rare earth metal compound and is suitable for an optical material.

Abstract: There is provided the method of forming a thin film of vinylidene fluoride homopolymer of I-form crystal structure having functional group at its end which can be applied to various substrates, by relatively easy method (applying conditions, manner, etc.). The method is a method of forming a thin film of vinylidene fluoride homopolymer by applying, on a substrate, a vinylidene fluoride homopolymer which contains, at one end or both ends thereof, a moiety represented by the formula (1): —(R1)n—Y??(1) wherein R1 is a divalent organic group but does not contain a structural unit of the vinylidene fluoride homopolymer; n is 0 or 1; Y is a functional group, and has from 3 to 100 repeat units of vinylidene fluoride, to form a thin film of vinylidene fluoride homopolymer comprising I-form crystal structure alone or as main component.

Abstract: There is provided an ionic liquid type functional material which is useful for a lubricant, acid-removing agent, various ionic liquid materials, electrolyte for solar cell and actuator material.

Abstract: There are provided a fluorine-containing ethylenic monomer having hydroxyl group or fluoroalkyl carbonyl group and represented by the formula (1): and the formula (14): respectively, wherein X1 and X2 are the same or different and each is H or F; X3 is H, F, Cl or CF3; Rf1 and Rf2 are the same or different and each is a perfluoroalkyl group having 1 to 20 carbon atoms; Rf3 is a fluorine-containing alkylene group having 1 to 40 carbon atoms or a fluorine-containing alkylene group having ether bond which has 1 to 100 carbon atoms and the sum of carbon atom and oxygen atom of two or more; a is 0 or 1, a fluorine-containing polymer having a structural unit of the above-mentioned monomer and a composition for a photoresist. The monomer has good polymerizability, particularly radical polymerizability, and the polymer obtained by polymerizing the monomer has excellent optical characteristics and is useful as a base polymer for an antireflection film and for a composition for a resist.

Abstract: There is provided a laminated resist which is transparent in the case of exposure light of not less than 193 nm and can form a fine pattern having an intended form without defects with good reproducibility. The laminated resist has a photoresist layer (L1) and a transparent protective layer (L2) on a substrate and the protective layer (L2) is formed on an outermost surface of the laminated resist. The protective layer (L2) has an absorption coefficient of not more than 1.0 ?m?1 in the case of ultraviolet light of a wavelength of not less than 193 nm, a dissolution rate in a developing solution of not less than 50 nm/sec and a dissolution rate in pure water of not more than 10 nm/min.

Abstract: The present invention provides a method of reutilization and method of shaping of waste plastic which reduces the amount of volatile ingredients and oil cake* to extents preferable as materials for coke ovens, enables the formation of plastic granular materials able to maintain suitable shapes even after charging into a coke oven, and does not require expensive facilities for treating any produced hydrogen chloride gas, that is, a method of reutilization of waste plastic characterized by melting waste plastic at over 160° C. to 250° C. in temperature in part or whole, compression shaping it to thereby obtain a plastic granular material having an apparent density of 0.7 to 1.2 kg/liter, and mixing this plastic granular material with coal for dry distillation in a coke oven.

Abstract: There are provided a novel norbornene derivative which is a material for a chemically amplifying type photoresist for F2 laser, possesses excellent transparency and improved dry etching resistivity and has a fluorine-containing ketone unit or fluorine-containing tertiary alcohol unit directly bonded to the norbornene backbone; a fluorine-containing polymer obtained by using the norbornene derivative as a copolymerizable monomer; and a chemically amplifying type photoresist composition comprising the fluorine-containing polymer, a photoacid generator and a solvent.

Abstract: There is provided an optical material obtained from an organic composition which is suitable for an optical material in optical communication and comprises a fluorine-containing polymer having functional group and a rare earth metal ion, in which the fluorine-containing polymer having functional group has at least one ketone structure in its side chain and a maximum absorption coefficient of not more than 1 cm?1 in each wavelength range of from 1,290 to 1,320 nm, from 1,530 to 1,570 nm and from 600 to 900 nm and the rare earth metal ion is at least one selected from the group consisting of erbium (Er) ion, thulium (Tm) ion, praseodymium (Pr) ion, holmium (Ho) ion, neodymium (Nd) ion, europium (Eu) ion, dysprosium (Dy) ion, samarium (Sm) ion and cerium (Ce) ion.

Abstract: There are provided a fluorine-containing ethylenic monomer having hydroxyl group or fluoroalkyl carbonyl group and represented by the formula (1): and the formula (14): respectively, wherein X1 and X2 are the same or different and each is H or F; X3 is H, F, Cl or CF3; Rf1 and Rf2 are the same or different and each is a perfluoroalkyl group having 1 to 20 carbon atoms; Rf3 is a fluorine-containing alkylene group having 1 to 40 carbon atoms or a fluorine-containing alkylene group having ether bond which has 1 to 100 carbon atoms and the sum of carbon atom and oxygen atom of two or more; a is 0 or 1, a fluorine-containing polymer having a structural unit of the above-mentioned monomer and a composition for a photoresist. The monomer has good polymerizability, particularly radical polymerizability, and the polymer obtained by polymerizing the monomer has excellent optical characteristics and is useful as a base polymer for an antireflection film and for a composition for a resist.

Abstract: There can be obtained a suitable optical material which has a stable structure with a rare earth metal ion while maintaining transparency in a region of from visible light to near infrared light. The optical material is obtained by curing a fluorine-containing resin composition comprising (I) a fluorine-containing prepolymer and (II) a compound containing a rare earth metal ion and/or a rare earth metal element, wherein the fluorine-containing prepolymer (I) is a curable fluorine-containing polymer which: (1) is a non-crystalline polymer having a fluorine content of not less than 25% by weight and (2) has a cure site in a side chain of the polymer and/or at an end of a trunk chain of the polymer.

Abstract: There are provided a novel norbornene derivative which is a material for a chemically amplifying type photoresist for F2 laser, possesses excellent transparency and improved dry etching resistivity and has a fluorine-containing ketone unit or fluorine-containing tertiary alcohol unit directly bonded to the norbornene backbone; a fluorine-containing polymer obtained by using the norbornene derivative as a copolymerizable monomer; and a chemically amplifying type photoresist composition comprising the fluorine-containing polymer, a photoacid generator and a solvent.

Abstract: There is provided a method of forming a fine pattern by using a practicable fluorine-containing polymer which has a high transparency to exposure light having a short wavelength such as F2 laser and can undergo resolution of a fine pattern.