Abstract: A braking control device for a vehicle includes a malfunction detector configured to detect a malfunction of a first stroke sensor or a second stroke sensor, a memory configured to store a first stroke and a second stroke, a stroke calculator for first calculation configured to calculate, from the first stroke and the second stroke, an average value for calculating a target deceleration before a malfunction is detected by the malfunction detector, a stroke calculator for second calculation configured to calculate, from the average value and the second stroke (first stroke), an additional value for calculating the target deceleration after the malfunction is detected, and a target deceleration setting circuit configured to set the target deceleration from the average value or the additional value.

Abstract: Provided is a Ti—Nb alloy sputtering target containing 0.1 to 30 at % of Nb, the remainder of Ti and unavoidable impurities; and the Ti—Nb alloy sputtering target is characterized by having an oxygen content of 400 wtppm or less. Since the target in the present disclosure has a favorable surface texture with a low oxygen content and is readily processable due to the low hardness of the target, the Ti—Nb alloy sputtering target yields a superior effect of being able to suppress the generation of particles during sputtering.

Abstract: A Co sputtering target having a purity of 99.99% to 99.999% and a Si content of 1 wtppm or less. Provided is a Co sputtering target capable of improving barrier properties and adhesiveness by suppressing conversion into highly reactive silicide by a reduction in the Si content in cobalt.

Abstract: A tungsten silicide target capable of suppressing the occurrence of particles during sputtering is provided by a method different from conventional methods. The tungsten silicide target includes not more than 5 low-density semi-sintered portions having a size of 50 ?m or more per 80000 mm2 on the sputtering surface.

Abstract: Provided is a tungsten silicide target that efficiently suppresses generation of particles during sputtering deposition. A tungsten silicide target having a two-phase structure of a WSi2 phase and a Si phase, wherein the tungsten silicide target is represented by a composition formula in an atomic ratio: WSix with X>2.0; wherein, when observing a sputtering surface, a ratio of a total area I1 of Si grains having an area per a Si grain of 63.6 ?m2 or more to a total area S1 of the Si grains forming the Si phase (I1/S1) is 5% or less; and wherein a Weibull modulus of flexural strength is 2.1 or more.

Abstract: Provided is a novel anode for electroplating, which replaces the Cu anode and which is capable of suppressing plating defects. The Co anode has a number of particles with a grain size of 0.5 ?m or more of 6000 particles/g or less, as measured by an in-liquid particle counter according to JIS B 9925 after dissolving the Co anode in dilute nitric acid having a nitric acid concentration of 20% by mass.

Abstract: Provided is a master alloy for a sputtering target, wherein, when elements constituting the master alloy are following X1, X2, Y1, Y2, Y2, and Y3; specifically, where X1 is one or two types of Ta or W; X2 is at least one type of Ru, Mo, Nb or Hf; Y1 is one or two types of Cr or Mn; Y2 is one or two types of Co or Ni; and Y3 is one or two types of Ti or V, the master alloy comprises any one combination of X1-Y1, X1-Y2, X1-Y3, X2-Y1, and X2-Y2 of the foregoing constituent elements. This consequently yields superior effects of being able to obtain a sintered sputtering target with few defects and having a high-density and uniform alloy composition, and, by using this target, to realize the deposition of an alloy barrier film with uniform quality and few particles at a high speed.

Abstract: Provided is a master alloy for a sputtering target, wherein, when elements constituting the master alloy are following X1, X2, Y1, Y2, Y2, and Y3; specifically, where X1 is one or two types of Ta or W; X2 is at least one type of Ru, Mo, Nb or Hf; Y1 is one or two types of Cr or Mn; Y2 is one or two types of Co or Ni; and Y3 is one or two types of Ti or V, the master alloy comprises any one combination of X1-Y1, X1-Y2, X1-Y3, X2-Y1, and X2-Y2 of the foregoing constituent elements. The present invention consequently yields superior effects of being able to obtain a sintered sputtering target with few defects and having a high-density and uniform alloy composition, and, by using this target, to realize the deposition of an alloy barrier film with uniform quality and few particles at a high speed.

Abstract: A tungsten silicide target capable of suppressing the occurrence of particles during sputtering is provided by a method different from conventional methods. The tungsten silicide target includes not more than 5 low-density semi-sintered portions having a size of 50 ?m or more per 80000 mm2 on the sputtering surface.

Abstract: Provided is a Ti—Nb alloy sputtering target containing 0.1 to 30 at % of Nb, the remainder of Ti and unavoidable impurities; and the Ti—Nb alloy sputtering target is characterized by having an oxygen content of 400 wtppm or less. Since the target in the present disclosure has a favorable surface texture with a low oxygen content and is readily processable due to the low hardness of the target, the Ti—Nb alloy sputtering target yields a superior effect of being able to suppress the generation of particles during sputtering.

Abstract: A Co sputtering target having a purity of 99.99% to 99.999% and a Si content of 1 wtppm or less. Provided is a Co sputtering target capable of improving barrier properties and adhesiveness by suppressing conversion into highly reactive silicide by a reduction in the Si content in cobalt.

Abstract: Provided is a master alloy for a sputtering target, wherein, when elements constituting the master alloy are following X1, X2, Y1, Y2, Y2, and Y3; specifically, where X1 is one or two types of Ta or W; X2 is at least one type of Ru, Mo, Nb or Hf; Y1 is one or two types of Cr or Mn; Y2 is one or two types of Co or Ni; and Y3 is one or two types of Ti or V, the master alloy comprises any one combination of X1-Y1, X1-Y2, X1-Y3, X2-Y1, and X2-Y2 of the foregoing constituent elements. The present invention consequently yields superior effects of being able to obtain a sintered sputtering target with few defects and having a high-density and uniform alloy composition, and, by using this target, to realize the deposition of an alloy barrier film with uniform quality and few particles at a high speed.

Abstract: Provided is a method of producing a printing plate, especially a gravure plate with cushion properties, which enables direct gravure printing on a hard printing target without using a blanket roll owing to being provided with cushion properties, effects a satisfactory gravure printing on a rough surface such as corrugated cardboard, and is suitable for color-printing a matrix image for forming a color filter on glass for liquid crystal panels or an image on a compact disk or the like. The gravure plate includes a hollow roll provided on the surface thereof with a cushion layer formed of rubber or resin with cushion properties, a copper-plated layer formed on the surface of the cushion layer and formed on the surface thereof with multiple gravure cells, a metal layer formed on the surface of the copper-plated layer, a metal carbide layer formed on the surface of the metal layer, and a diamond-like carbon film for covering the surface of the metal carbide layer.

Abstract: The present invention provides: a novel gravure printing roll capable of improving plate fogging, being provided with a surface-reinforcing coating layer completely free from toxicity and the possibility of pollution, and of being excellent in printing durability; and a method of producing the roll. The gravure printing roll includes a metal hollow roll, a copper-plated layer provided on the surface of the hollow roll and formed with multiple gravure cells on the surface thereof, a metal layer provided on the surface of the copper-plated layer, a metal carbide gradient layer of the metal provided on the surface of the metal layer, and a diamond-like carbon film covering the surface of the metal carbide gradient layer, in which a pit being smaller than the minimum gravure cell in the highlighted portion of the copper-plated layer and having a size not permitting ink transfer is arranged so that at least one pit exists in the one-pitch area of a screen line in a non-image area.

Abstract: A novel gravure engraving roll that has a surface-reinforcing coating layer being nontoxic and having no danger of pollution generation at all and that excels in printing life; and a process for producing the same. There is provided a gravure engraving roll comprising: a metal hollow roll; a copper plating layer superimposed on the surface of the hollow roll and on its surface furnished with a multiplicity of gravure cells; a metal layer superimposed on the surface of the copper plating layer; a layer of carbide of said metal superimposed on the surface of the metal layer; and a diamond-like carbon coating covering the surface of the metal carbide layer.

Abstract: The present invention provides a flame retardant resin composition having a good fluidity and excellent recycling property, can yield a molded article having excellent rigidity and flame retardancy, and is particularly applicable for a molded article having a small thickness. Specifically, the flame retardant resin composition contains: 100 parts by weight of a thermoplastic resin (A); 0.5 to 100 parts by weight of a liquid crystal polymer (B); and 0.1 to 30 parts by weight of a silicone compound (C) as a flame retardant.

Abstract: The present invention provides a flame retardant resin composition having excellent impact resistance, heat resistance, dimensional stability, and flame retardance. That is, it provides a flame retardant resin composition made up of: 100 parts by weight of a thermoplastic resin (A) containing: 80 to 10% by weight of (A-1) at least one of an aromatic polyester resin and a polyamide resin, 17 to 85% by weight of at least one of a rubber-containing copolymer of a vinyl cyanide and an aromatic vinyl (A-2) and a copolymer of a vinyl cyanide and an aromatic vinyl (A-3) and 3 to 40% by weight of (A-4) at least one of a polyphenylene ether resin and a polyphenylene sulfide resin, 1 to 60 parts by weight of a non-halogen, organic or inorganic flame retardant (B) and 100 parts by weight or less of a filler (C).

Abstract: The present invention provides a flame retardant resin composition having a good fluidity and excellent recycling property, can give a molded article having excellent rigidity and flame retardancy, and is particularly applicable for a molded article having a small thickness.

Abstract: The present invention provides a flame retardant resin composition excellent in impact resistance, heat resistance, dimensional stability, and flame retardance.

Abstract: In an information recording/reproducing apparatus, a light beam emitted from a semiconductor laser is guided to a beam splitter. The light beam passing through an incident surface of the splitter is splitted into first and second light beam by a beam splitting layer. The first beam passing through the splitting layer is emerged from a first emerging surface and guided to an optical disk. The first light beam after being reflected from the optical disk is returned to the first emerging surface and passes through the first emerging surface. The returned first light beam passed through a second emerging surface and defected by a detector so that a retrieving signal is generated from a detector. The second light beam reflected from the beam splitting layer is directed to a concave mirror of the splitter and is converged on a mirror detector through a third emerging surface so that a mirror signal for controlling the semiconductor laser is detected.