Patents by Inventor Takayuki Deguchi

Takayuki Deguchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240154167
    Abstract: A non-aqueous secondary battery including a positive electrode including a lithium-transition metal composite oxide containing at least nickel as a transition metal, a negative electrode including a silicon-containing material, a separator interposed between the positive electrode and the negative electrode, and a liquid electrolyte. The liquid electrolyte contains a sultone compound and a nitrile compound, and 1?A/B?10 is satisfied, where a concentration of the sultone compound in the liquid electrolyte is A mass %, and a concentration of the nitrile compound in the liquid electrolyte is B mass %.
    Type: Application
    Filed: February 10, 2022
    Publication date: May 9, 2024
    Applicant: Panasonic Intellectual Property Management Co., Ltd.
    Inventors: Takayuki Nakatsutsumi, Masaki Deguchi
  • Patent number: 11962274
    Abstract: An amplifier device includes an amplifier including cascade-connected power amplifiers in a plurality of stages and a bias circuit configured to supply bias currents to the amplifier. A bias current supplied to a power amplifier in the first stage of the power amplifiers in the plurality of stages exhibits a positive temperature characteristic. A bias current supplied to a power amplifier in the final stage exhibits a negative temperature characteristic.
    Type: Grant
    Filed: August 13, 2021
    Date of Patent: April 16, 2024
    Assignee: MURATA MANUFACTURING CO., LTD.
    Inventors: Tsutomu Oonaro, Masamichi Tokuda, Makoto Tabei, Kazuaki Deguchi, Takayuki Kawano
  • Patent number: 7128348
    Abstract: A female connector including: a cylindrical core member having a luer taper on a distal inner surface thereof and a tube bonding portion formed on a proximal end inner surface and being formed with a flange at a distal extremity thereof; a cylindrical housing having a male screw formed on an outer surface thereof and mounted to an outer periphery of the core member without being fixed, and a stopper fixed at a position apart from the flange of the core member, wherein the distance (L1) between the flange and the stopper is larger than the length (L2) of the housing in the axial direction when a male connector is connected to the female connector.
    Type: Grant
    Filed: January 6, 2005
    Date of Patent: October 31, 2006
    Assignee: Nipro Corporation
    Inventors: Shin-ichi Kawamura, Takahito Wakabayashi, Masato Hidaka, Takayuki Deguchi
  • Publication number: 20050146136
    Abstract: A female connector including: a cylindrical core member having a luer taper on a distal inner surface thereof and a tube bonding portion formed on a proximal end inner surface and being formed with a flange at a distal extremity thereof; a cylindrical housing having a male screw formed on an outer surface thereof and mounted to an outer periphery of the core member without being fixed, and a stopper fixed at a position apart from the flange of the core member, wherein the distance (L1) between the flange and the stopper is larger than the length (L2) of the housing in the axial direction when a male connector is connected to the female connector.
    Type: Application
    Filed: January 6, 2005
    Publication date: July 7, 2005
    Inventors: Shin-ichi Kawamura, Takahito Wakabayashi, Masato Hidaka, Takayuki Deguchi
  • Patent number: 4725375
    Abstract: An etchant composition comprising(a) a cerium (IV) salt,(b) a nonionic or anionic fluorine-containing surfactant,(c) water, and(d) optionally, at least one compound selected from the group consisting of perchloric acid, acetic acid, sulfuric acid, nitric acid and hydrochloric acid and salts thereof, which can homogeneously etch a resist pattern having thin gaps as well as wide gaps on a chrome layer.
    Type: Grant
    Filed: September 16, 1986
    Date of Patent: February 16, 1988
    Assignee: Daikin Industries Ltd.
    Inventors: Tsuneo Fujii, Takayuki Deguchi, Sinji Tamaru
  • Patent number: 4686168
    Abstract: A resist material of positive type having a high sensitivity, a high resolving power and an excellent adhesion property to substrates, which comprises a copolymer of a fluoroalkyl acrylate having the general formula: ##STR1## wherein R.sub.1 is methyl group, ethyl group, a halogen-substituted methyl or ethyl group, a halogen atom or hydrogen atom, R.sub.2 is a bivalent hydrocarbon group having 1 to 6 carbon atoms, and R.sub.f is a fluoroalkyl group having 1 to 15 carbon atoms, with an acrylic comonomer selected from the group consisting of a glycidyl acrylate, an acrylic acid, an acrylamide and an .alpha.-cyanoacrylate.
    Type: Grant
    Filed: March 11, 1985
    Date of Patent: August 11, 1987
    Assignees: Daikin Kogyo Co., Ltd., Nippon Telegraph & Telephone Public Corporation
    Inventors: Tsuneo Fujii, Hiroshi Inukai, Takayuki Deguchi, Toshihiko Amano, Masami Kakuchi, Hiroshi Asakawa, Osamu Kogure
  • Patent number: 4656108
    Abstract: A resist film made of thiocarbonyl fluoride polymers which has excellent sensitivity, resolving power and adhesion property to a substrate and can provide a fine resist pattern. The resist pattern is produced by forming the resist film on a substrate, irradiating an ionizing radiation and developing with an organic solvent.
    Type: Grant
    Filed: June 20, 1985
    Date of Patent: April 7, 1987
    Assignee: Daikin Kogyo Co., Ltd.
    Inventors: Takaomi Satokawa, Tsuneo Fujii, Takayuki Deguchi
  • Patent number: 4539250
    Abstract: A resist material of positive type having a high sensitivity, a high resolving power and an excellent adhesion property to substrates, which comprises a copolymer of a fluoroalkyl acrylate having the general formula: ##STR1## wherein R.sub.1 is methyl group, ethyl group, a halogen-substituted methyl or ethyl group, a halogen atom or hydrogen atom, R.sub.2 is a bivalent hydrocarbon group having 1 to 6 carbon atoms, and R.sub.f is a fluoroalkyl group having 1 to 15 carbon atoms, with an acrylic comonomer selected from the group consisting of a glycidyl acrylate, an acrylic acid, an acrylamide and an .alpha.-cyanoacrylate.
    Type: Grant
    Filed: December 17, 1982
    Date of Patent: September 3, 1985
    Assignees: Daikin Kogyo Co. Ltd., Nippon Telegraph & Telephone Public Corporation
    Inventors: Tsuneo Fujii, Hiroshi Inukai, Takayuki Deguchi, Toshihiko Amano, Masami Kakuchi, Hiroshi Asakawa, Osamu Kogure
  • Patent number: 4124517
    Abstract: A dry cleaning composition comprising as effective components a fluorine-containing hydrocarbon solvent and at least one surfactant selected from the group consisting of organic acid salts of monoamines represented by the formula ##STR1## wherein R.sub.1 is alkyl having 6 to 20 carbon atoms, R.sub.2 is hydrogen atom or CH.sub.3, m and n are each zero or an integer of 1 to 20, and are further defined by 3.ltoreq.m + n.ltoreq.20, R.sub.3 is hydrogen atom or alkyl having 6 to 20 carbon atoms when n is zero and R.sub.3 is hydrogen atom when m is 1 to 20, and organic acid salts of diamines represented by the formula ##STR2## wherein R.sub.2 is as defined above, R.sub.4 is alkyl having 6 to 20 carbon atoms, R.sub.5 is alkylene having 2 to 6 carbon atoms, l is zero or an integer of 1 to 20, m and n are as defined above, and 3.ltoreq.l + m + n.ltoreq.20.
    Type: Grant
    Filed: September 15, 1976
    Date of Patent: November 7, 1978
    Assignee: Daikin Kogyo Kabushiki Kaisha
    Inventors: Iwao Hisamoto, Chiaki Maeda, Takayuki Deguchi, Yukio Omure, Takasi Onishi