Patents by Inventor Takayuki Iwamatsu

Takayuki Iwamatsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Exposure mask and method and apparatus for manufacturing the same
    Patent number: 5907393
    Abstract: This invention provides an exposure mask including a translucent film formed on a light-transmitting substrate and having a mask pattern, and a stabilized region formed in the boundary between the light-transmitting substrate and the translucent film or on at least the surface of the translucent film to prevent variations in physical properties of the translucent film.
    Type: Grant
    Filed: October 11, 1996
    Date of Patent: May 25, 1999
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Kenji Kawano, Shinichi Ito, Iwao Higashikawa, Masamitsu Itoh, Takashi Kamo, Hiroaki Hazama, Takayuki Iwamatsu
  • Exposure mask and method and apparatus for manufacturing the same
    Patent number: 5728494
    Abstract: This invention provides an exposure mask including a translucent film formed on a light-transmitting substrate and having a mask pattern, and a stabilized region formed in the boundary between the light-transmitting substrate and the translucent film or on at least the surface of the translucent film to prevent variations in physical properties of the translucent film.
    Type: Grant
    Filed: October 11, 1996
    Date of Patent: March 17, 1998
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Kenji Kawano, Shinichi Ito, Iwao Higashikawa, Masamitsu Itoh, Takashi Kamo, Hiroaki Hazama, Takayuki Iwamatsu
  • Mask for light exposure and process for production of the same
    Patent number: 5700605
    Abstract: There is disclosed a mask for light exposure which comprises being provided with a light transparent substrate and a mask pattern formed on the light transparent substrate, the mask pattern comprising a light screening pattern composed of a material which screens the exposure light and transmits the light having the longer wavelength than that of the exposure light and a phase shift pattern formed by engraving a part of the light transparent substrate.
    Type: Grant
    Filed: March 15, 1996
    Date of Patent: December 23, 1997
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Shin-ichi Ito, Takayuki Iwamatsu
  • Phase shifting mask and method of forming a pattern using the same
    Patent number: 5686209
    Abstract: A reflection phase shifting mask used to expose a pattern by forming reflected light having a phase difference upon reflection of light, includes a substrate for reflecting exposure light, a phase shifting layer formed on a portion on the substrate, and a light transmitting medium formed on the substrate and the phase shifting layer, wherein the thickness of the phase shifting layer is set such that the phase difference between light reflected by the substrate and light reflected by the phase shifting layer becomes 180.degree..
    Type: Grant
    Filed: November 22, 1996
    Date of Patent: November 11, 1997
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Takayuki Iwamatsu, Kenji Kawano, Hideya Miyazaki, Shinichi Ito, Soichi Inoue, Hiroyuki Sato, Satoshi Tanaka, Koji Hashimoto
  • Exposure mask and method and apparatus for manufacturing the same
    Patent number: 5629115
    Abstract: This invention provides an exposure mask including a translucent film formed on a light-transmitting substrate and having a mask pattern, and a stabilized region formed in the boundary between the light-transmitting substrate and the translucent film or on at least the surface of the translucent film to prevent variations in physical properties of the translucent film.
    Type: Grant
    Filed: January 11, 1996
    Date of Patent: May 13, 1997
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Kenji Kawano, Shinichi Ito, Iwao Higashikawa, Masamitsu Itoh, Takashi Kamo, Hiroaki Hazama, Takayuki Iwamatsu
  • Reflection phase shifting mask and method of forming a pattern using the same
    Patent number: 5609977
    Abstract: A reflection phase shifting mask used to expose a pattern by forming reflected light having a phase difference upon reflection of light, includes a substrate for reflecting exposure light, a phase shifting layer formed on a portion on the substrate, and a light transmitting medium formed on the substrate and the phase shifting layer, wherein the thickness of the phase shifting layer is set such that the phase difference between light reflected by the substrate and light reflected by the phase shifting layer becomes 180.degree..
    Type: Grant
    Filed: January 22, 1996
    Date of Patent: March 11, 1997
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Takayuki Iwamatsu, Kenji Kawano, Hideya Miyazaki, Shinichi Ito, Soichi Inoue, Hiroyuki Sato, Satoshi Tanaka, Koji Hashimoto
  • Phase shifting mask comprising a multilayer structure and method of forming a pattern using the same
    Patent number: 5514499
    Abstract: A reflection phase shifting mask used to expose a pattern by forming reflected light having a phase difference upon reflection of light, includes a substrate for reflecting exposure light, a phase shifting layer formed on a portion on the substrate, and a light transmitting medium formed on the substrate and the phase shifting layer, wherein the thickness of the phase shifting layer is set such that the phase difference between light reflected by the substrate and light reflected by the phase shifting layer becomes 180.degree..
    Type: Grant
    Filed: May 25, 1994
    Date of Patent: May 7, 1996
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Takayuki Iwamatsu, Kenji Kawano, Hideya Miyazaki, Shinichi Ito, Soichi Inoue, Hiroyuki Sato, Satoshi Tanaka, Koji Hashimoto