Patents by Inventor Takayuki Miyagawa
Takayuki Miyagawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240112571Abstract: A congestion prediction device, a congestion prediction method, and a storage medium are provided. A mapping outputs an output variable when input variables are input to the mapping. The output variable indicates a degree of congestion in a predetermined specific area. The mapping is learned in advance by machine learning. The input variables include congestion variables. Each of the congestion variables indicates a degree of congestion in the specific area at regular time intervals within a specific period. The output variable indicates a degree of congestion after a lapse of the regular time interval from an end time of the specific period.Type: ApplicationFiled: September 26, 2023Publication date: April 4, 2024Applicant: TOYOTA JIDOSHA KABUSHIKI KAISHAInventors: Ayumu SHIOMI, Atsushi MIYAGAWA, Hiroki TAKEUCHI, Toshiyuki KAWAI, Ryosuke FUKAYA, Hiroyuki TOKITA, Yusuke IKENOUE, Tsukasa KATO, Katsuhisa YOSHIKAWA, Yuta ICHIJYO, Takayuki AKAISHI, Shintaro KAWAI
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Patent number: 10795258Abstract: A resist composition which contains a resin (A1) which has a structural unit having a sulfonyl group, a structural unit represented by formula (II) and a structural unit having an acid-labile group, and an acid generator: wherein R1 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group that may have a halogen atom, L1 represents a single bond or *-L2-CO—O-(L3-CO—O)g— where * represents a binding position to an oxygen atom, L2 and L3 independently represent a C1 to C12 divalent hydrocarbon group, “g” represents 0 or 1, and R3 represents a C1 to C12 liner or branched alkyl group except for a tertiary alkyl group.Type: GrantFiled: June 24, 2016Date of Patent: October 6, 2020Assignee: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Takayuki Miyagawa, Shingo Fujita, Koji Ichikawa
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Patent number: 10126650Abstract: A resist composition which contains a resin (A1) which has a structural unit having a cyclic carbonate, a structural unit represented by formula (II) and a structural unit having an acid-labile group, and an acid generator: wherein R1 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group that may have a halogen atom, L1 represents a single bond or *-L2-CO—O-(L3-CO—O)g— where * represents a binding position to an oxygen atom, L2 and L3 independently represent a C1 to C12 divalent hydrocarbon group, g represents 0 or 1, and R3 represents a C1 to C12 liner or branched alkyl group except for a tertiary alkyl group.Type: GrantFiled: June 24, 2016Date of Patent: November 13, 2018Assignee: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Takayuki Miyagawa, Kaoru Araki, Koji Ichikawa
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Patent number: 9771346Abstract: A salt represented by formula (I): wherein R1 and R2 independently represent a hydrogen atom, a hydroxy group or a C1 to C12 hydrocarbon group in which a methylene group may be replaced by a —O— or —CO—; m and n independently represent 1 or 2; Ar represents an optionally substituted phenyl group; Q1 and Q2 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group, A1 represents a single bond, a C1 to C24 alkanediyl group or the like, and Y represents an optionally substituted C1 to C18 alkyl group or monovalent C3 to C18 alicyclic hydrocarbon group, and a methylene group therein may be replaced by a —O—, O— or —SO2—, provided that the alkyl group or the alicyclic hydrocarbon group has at least one substituent, or at least one methylene group contained therein is replaced by a —O—, —CO— or —SO2—.Type: GrantFiled: December 14, 2015Date of Patent: September 26, 2017Assignee: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Takayuki Miyagawa, Yukako Anryu, Koji Ichikawa
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Publication number: 20160377979Abstract: A resist composition which contains a resin (A1) which has a structural unit having a sulfonyl group, a structural unit represented by formula (II) and a structural unit having an acid-labile group, and an acid generator: wherein R1 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group that may have a halogen atom, L1 represents a single bond or *-L2-CO—O-(L3-CO—O)g— where * represents a binding position to an oxygen atom, L2 and L3 independently represent a C1 to C12 divalent hydrocarbon group, “g” represents 0 or 1, and R3 represents a C1 to C12 liner or branched alkyl group except for a tertiary alkyl group.Type: ApplicationFiled: June 24, 2016Publication date: December 29, 2016Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Takayuki MIYAGAWA, Shingo FUJITA, Koji ICHIKAWA
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Publication number: 20160377980Abstract: A resist composition which contains a resin (A1) which has a structural unit having a cyclic carbonate, a structural unit represented by formula (II) and a structural unit having an acid-labile group, and an acid generator: wherein R1 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group that may have a halogen atom, L1 represents a single bond or *-L2-CO—O-(L3-CO—O)g— where * represents a binding position to an oxygen atom, L2 and L3 independently represent a C1 to C12 divalent hydrocarbon group, g represents 0 or 1, and R3 represents a C1 to C12 liner or branched alkyl group except for a tertiary alkyl group.Type: ApplicationFiled: June 24, 2016Publication date: December 29, 2016Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Takayuki MIYAGAWA, Kaoru ARAKI, Koji ICHIKAWA
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Publication number: 20160168115Abstract: A salt represented by formula (I): wherein R1 and R2 independently represent a hydrogen atom, a hydroxy group or a C1 to C12 hydrocarbon group in which a methylene group may be replaced by a —O— or —CO—; m and n independently represent 1 or 2; Ar represents an optionally substituted phenyl group; Q1 and Q2 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group, A1 represents a single bond, a C1 to C24 alkanediyl group or the like, and Y represents an optionally substituted C1 to C18 alkyl group or monovalent C3 to C18 alicyclic hydrocarbon group, and a methylene group therein may be replaced by a —O—, O— or —SO2—, provided that the alkyl group or the alicyclic hydrocarbon group has at least one substituent, or at least one methylene group contained therein is replaced by a —O—, —CO— or —SO2—.Type: ApplicationFiled: December 14, 2015Publication date: June 16, 2016Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Takayuki MIYAGAWA, Yukako ANRYU, Koji ICHIKAWA
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Publication number: 20140199009Abstract: The present invention relates to: a grease composition that includes a base oil which has a pressure-viscosity coefficient as measured at 40° C. of 33 GPa?1 or less and a thickener which is contained in a projected-area proportion of 10% by area or higher; and a rolling device packed with the grease composition.Type: ApplicationFiled: August 24, 2012Publication date: July 17, 2014Applicant: NSK LTD.Inventors: Noriyuki Inami, Atsushi Yokouchi, Michita Hokao, Shinya Nakatani, Haruka Kanda, Kazuhiro Soga, Takayuki Miyagawa
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Publication number: 20140193110Abstract: There is provided a grease composition decreasing the load sensitivity to a running torque, maintaining necessary performances for a wheel supporting rolling bearing unit, and maintaining a good lubricated condition for a long time, and, a wheel supporting rolling bearing unit having the grease composition packed therein. The grease composition contains base oil, thickeners, rust inhibitors, and anti-wear agents, the base oil contains mineral oil, synthetic oil or blend oil of the mineral oil and the synthetic oil, a mix ratio (mass ratio) of the mineral oil and the synthetic oil is 0:100 to 20:80, a kinematic viscosity of the base oil at a temperature of 40° C. is 70 to 150 mm2/s, and a pour point of the base oil is equal to or lower than ?40° C. The wheel supporting rolling bearing unit is packed with this grease composition.Type: ApplicationFiled: September 18, 2012Publication date: July 10, 2014Inventors: Kazuhiro Soga, Takayuki Miyagawa, Noriyuki Inami
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Patent number: 8546059Abstract: The present invention provides a photoresist composition comprising a resin, an acid generator and a compound represented by the formula (C1): wherein Rc1 represents an aromatic group which can have one or more substituents, Rc2 and Rc3 independently each represent a hydrogen atom, an aliphatic hydrocarbon group which can have one or more substituents or an aromatic group which can have one or more substituents, Rc4 and Rc6 independently each represent a hydrogen atom or an aliphatic hydrocarbon group which can have one or more substituents, or Rc4 and Rc6 are bonded each other to form an alkanediyl group, Rc5 represents an aliphatic hydrocarbon group which can have one or more substituents or an amino group which can have one or two substituents, Rc7 represents a hydrogen atom or an aliphatic hydrocarbon group which can have one or more substituents, or Rc5 and Rc7 are bonded each other to form an alkanediyl group.Type: GrantFiled: November 24, 2010Date of Patent: October 1, 2013Assignee: Sumitomo Chemical Company, LimitedInventors: Koji Ichikawa, Takayuki Miyagawa, Mitsuhiro Hata
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Patent number: 8298746Abstract: The present invention provides a chemically amplified resist composition comprising: a resin (A) which itself is insoluble or poorly soluble in an aqueous alkali solution but becomes soluble in an aqueous alkali solution by the action of an acid and which comprises a structural unit having an acid-labile group in a side chain and a structural unit represented by the formula (I): wherein R1 represents a hydrogen atom or a methyl group, ring X1 represents an unsubstituted or substituted C3-C30 cyclic hydrocarbon group having —COO— and k represents an integer of 1 to 4, a resin (B) which comprises a structural unit represented by the formula (II): wherein R2 represents a hydrogen atom, a methyl group or a trifluoromethyl group, and an acid generator.Type: GrantFiled: June 24, 2009Date of Patent: October 30, 2012Assignee: Sumitomo Chemical Company, LimitedInventors: Junji Shigematsu, Kunishige Edamatsu, Takayuki Miyagawa, Akira Kamabuchi
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Patent number: 8062830Abstract: The present invention provides a chemically amplified resist composition comprising: a resin (A) which contains no fluorine atom and a structural unit (a1) having an acid-labile group in a side chain, a resin (B) which contains a structural unit (b2) having a fluorine-containing group in a side chain and at least one structural unit selected from the group consisting of a structural unit (b1) having an acid-labile group, a structural unit (b3) having a hydroxyl group and a structural unit (b4) having a lactone structure in a side chain, and an acid generator, wherein the content of the structural unit (b1) based on the total units of the resin (B) is less than 10 mol %.Type: GrantFiled: April 17, 2009Date of Patent: November 22, 2011Assignee: Sumitomo Chemical Company, LimitedInventors: Yusuke Fuji, Junji Shigematsu, Takayuki Miyagawa, Nobuo Ando, Ichiki Takemoto
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Patent number: 8062829Abstract: A chemically amplified resist composition, comprising: a resin which includes a structural unit having an acid-labile group in a side chain, a structural unit represented by the formula (I) and a structural unit having a polycyclic lactone structure, and which is soluble in an organic solvent and insoluble or poorly soluble in an alkali aqueous solution but rendered soluble in an alkali aqueous solution by the action of an acid; and an acid generator represented by the formula (II). wherein X1 represents a hydrogen atom, a C1 to C4 alkyl group, etc., Y in each occurrence independently represent a hydrogen atom or an alkyl group, and n is an integer of 1 to 14, R1 to R4 independently represent a hydrogen atom, an alkyl group, etc., and A+ represents an organic counterion, E? represents CF3SO3—, C2F5SO3—, C4F9SO3—, etc., Y1 and Y2 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group.Type: GrantFiled: March 2, 2009Date of Patent: November 22, 2011Assignee: Sumitomo Chemical Company, LimitedInventors: Mitsuhiro Hata, Yusuke Fuji, Takayuki Miyagawa
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Patent number: 8057983Abstract: The present invention provides a chemically amplified resist composition comprising: a resin (A) which contains no fluorine atom and a structural unit (a1) having an acid-labile group in a side chain, a resin (B) which contains a structural unit (b2) having a fluorine-containing group in a side chain and at least one structural unit selected from the group consisting of a structural unit (b1) having an acid-labile group, a structural unit (b3) having a hydroxyl group and a structural unit (b4) having a lactone structure in a side chain, and an acid generator, wherein the amount of the resin (B) is 2 parts by weight or less per 100 parts by weight of the resin (A).Type: GrantFiled: April 17, 2009Date of Patent: November 15, 2011Assignee: Sumitomo Chemical Company, LimitedInventors: Yusuke Fuji, Junji Shigematsu, Takayuki Miyagawa, Nobuo Ando, Ichiki Takemoto
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Patent number: 8003296Abstract: The present invention provides a chemically amplified positive composition comprising: (A) a resin comprising a structural unit having an acid-labile group and being itself insoluble or poorly soluble in an alkali aqueous solution but becoming soluble in an alkali aqueous solution by the action of an acid, (B) a resin comprising a structural unit represented by the formula (I): wherein R1 represents a hydrogen atom, a halogen atom, a C1-C4 alkyl group or a C1-C4 perfluoroalkyl group, Z represents a single bond or —(CH2)k—CO—X4—, k represents an integer of 1 to 4, X1, X2, X3 and X4 each independently represents an oxygen atom or a sulfur atom, m represents an integer of 1 to 3 and n represents an integer of 0 to 3, and a structural unit having a fluorine atom in a side chain, and an acid generator.Type: GrantFiled: August 5, 2009Date of Patent: August 23, 2011Assignee: Sumitomo Chemical Company, LimitedInventors: Masahiko Shimada, Kazuhiko Hashimoto, Junji Shigematsu, Takayuki Miyagawa, Satoshi Yamamoto
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Publication number: 20110171586Abstract: A resist processing method having the steps of: (1) forming a first resist film by applying a first resist composition comprising: a resin (A) having an acid-labile group, being insoluble or poorly soluble in alkali aqueous solution, and being rendered soluble in alkali aqueous solution through the action of an acid, a photo acid generator (B) and a cross-linking agent (C) onto a substrate and drying; (2) prebaking the first resist film; (3) exposing to a whole surface of the first resist film, and then exposing the first resist film through a mask; (4) post-exposure baking of the first resist film; (5) developing with a first alkali developer to obtain a first resist pattern; (6) hard-baking the first resist pattern, (7) obtaining a second resist film by applying a second resist composition onto the first resist pattern, and then drying; (8) pre baking the second resist film; (9) exposing the second resist film through a mask; (10) post-exposure baking the second resist film; and (11) developing with a seconType: ApplicationFiled: July 7, 2009Publication date: July 14, 2011Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Mitsuhiro Hata, Satoshi Yamamoto, Takayuki Miyagawa
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Publication number: 20110123926Abstract: The present invention provides a photoresist composition comprising a resin, an acid generator and a compound represented by the formula (C1): wherein Rc1 represents an aromatic group which can have one or more substituents, Rc2 and Rc3 independently each represent a hydrogen atom, an aliphatic hydrocarbon group which can have one or more substituents or an aromatic group which can have one or more substituents, Rc4 and RC6 independently each represent a hydrogen atom or an aliphatic hydrocarbon group which can have one or more substituents, or Rc4 and Rc6 are bonded each other to form an alkanediyl group, Rc5 represents an aliphatic hydrocarbon group which can have one or more substituents or an amino group which can have one or two substituents, Rc7 represents a hydrogen atom or an aliphatic hydrocarbon group which can have one or more substituents, or Rc5 and Rc7 are bonded each other to form an alkanediyl group.Type: ApplicationFiled: November 24, 2010Publication date: May 26, 2011Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Koji ICHIKAWA, Takayuki MIYAGAWA, Mitsuhiro HATA
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Publication number: 20100279226Abstract: The present invention has the object of providing a method of manufacturing a resist pattern in which an extremely fine and highly accurate resist pattern can be formed which is obtained using the resist composition for forming a first resist pattern in a multi-patterning method such as a double patterning method. The resist processing method comprising; forming a first resist film by applying a first resist composition onto a substrate and drying, the first resist composition comprising a resin (A), a photo acid generator (B) and a cross-linking agent (C), the resin (A) having an acid-labile group, being insoluble or poorly soluble in alkali aqueous solution but of being rendered soluble in alkali aqueous solution through the action of an acid; prebaking; exposure processing; post-exposure baking; developing; hard-baking the first resist pattern; and obtaining a second resist film; pre-baking; exposure processing; post-exposure baking; developing to obtain a second resist pattern.Type: ApplicationFiled: December 22, 2008Publication date: November 4, 2010Inventors: Mitsuhiro Hata, Yoshiyuki Takata, Satoshi Yamaguchi, Ichiki Takemoto, Takayuki Miyagawa, Yusuke Fuji
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Publication number: 20100167199Abstract: A chemically amplified positive resist composition comprising: a resin comprising a structural unit having an acid-labile group in a side chain and an acid generator wherein the resin contains 40 to 90% by mole of the structural unit having an acid-labile group in a side chain based on all the structural units and the structural unit having an acid-labile group in a side chain contains a structural unit represented by the formula (I): wherein R1 represents a hydrogen atom or a methyl group, Z represents a single bond or —(CH2)k—CO—O—, k represents an integer of 1 to 4, R2 is independently in each occurrence a C1-C6 alkyl group, and m represents an integer of 0 to 14.Type: ApplicationFiled: December 18, 2009Publication date: July 1, 2010Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Takayuki MIYAGAWA, Satoshi Yamamoto, Yusuke Fuji
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Publication number: 20100062365Abstract: The present invention provides a chemically amplified positive composition comprising: (A) a resin comprising a structural unit having an acid-labile group and being itself insoluble or poorly soluble in an alkali aqueous solution but becoming soluble in an alkali aqueous solution by the action of an acid, (B) a resin comprising a structural unit represented by the formula (I): wherein R1 represents a hydrogen atom, a halogen atom, a C1-C4 alkyl group or a C1-C4 perfluoroalkyl group, Z represents a single bond or —(CH2)k—CO—X4—, k represents an integer of 1 to 4, X1, X2, X3 and X4 each independently represents an oxygen atom or a sulfur atom, m represents an integer of 1 to 3 and n represents an integer of 0 to 3, and a structural unit having a fluorine atom in a side chain, and an acid generator.Type: ApplicationFiled: August 5, 2009Publication date: March 11, 2010Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Masahiko SHIMADA, Kazuhiko HASHIMOTO, Junji SHIGEMATSU, Takayuki MIYAGAWA, Satoshi YAMAMOTO