Abstract: An information processing device includes a controller configured to execute a posture estimation processing by extracting a pair group of line segments based on an optical flow of a feature point on a road surface from a processing target region set in a camera image captured by an in-vehicle camera and by estimating a posture of the in-vehicle camera based on an angle estimation value at which the in-vehicle camera is attached, the angle estimation value being estimated from each pair data included in the pair group. The controller is configured to determine that an attachment state of the in-vehicle camera is abnormal in response to at least one of a data accumulation number of the pair data, a standard deviation of the angle estimation value, or a deviation amount from a given calibration value relating to the posture in the posture estimation processing being out of a preset range.

Abstract: [The present invention is] a dart game apparatus that provides a dart game in which one player successively throws n number of (n=3 or 4) darts D at a dart board 12, having: light sources LS that are disposed around the dart board 12 and emit lights L along the board face of the dart board 12; a plurality of photo-sensors S that are disposed around the dart board 12 at approximately the same height from the dart board 12 in the board thickness direction, and detect the brightness of the lights L emitted from the light sources LS; and a processor that calculates a hit position of a dart D in the dart board 12 based on the brightness of each light. A number of photo-sensors S is n×2.

Abstract: [The present invention is] a dart game apparatus that provides a dart game in which one player successively throws n number of (n=3 or 4) darts D at a dart board 12, having: light sources LS that are disposed around the dart board 12 and emit lights L along the board face of the dart board 12; a plurality of photo-sensors S that are disposed around the dart board 12 at approximately the same height from the dart board 12 in the board thickness direction, and detect the brightness of the lights L emitted from the light sources LS; and a processor that calculates a hit position of a dart D in the dart board 12 based on the brightness of each light. A number of photo-sensors S is n×2.

Abstract: In one embodiment, a charged particle beam drawing apparatus performs drawing by deflecting a charged particle beam with a deflector. A method for evaluating the apparatus includes making a shot of a first pattern, controlling a deflection amount by the deflector to move an applied position of the beam from the first pattern along a first direction to make a shot of a second pattern, controlling the deflection amount to move the applied position from the second pattern along the first direction to make a shot of a third pattern, controlling the deflection amount to move the applied position from the third pattern along a second direction opposite to the first direction to make a shot of a fourth pattern between the second pattern and the third pattern, calculating an interval between the second pattern and the fourth pattern, and comparing the calculated interval to a reference interval.

Abstract: In a method for forming a resist film, a first resist film is formed on a light shielding film formed on a substrate, by using a spin coating method. A protective film is formed on the first resist film. The protective film and the first resist film are simultaneously removed at the same region to expose a portion of the light shielding film. A first region in which the second resist film is formed on the light shielding film and a second region in which the second resist film is formed on the first resist film through the protective film, are provided. The protective film and the second resist film are simultaneously removed in the second region to expose the first resist film. A region in which the first resist film, and a region in which the second resist film, is formed, are separately provided on the substrate.

Abstract: In one embodiment, a charged particle beam drawing apparatus performs drawing by deflecting a charged particle beam with a deflector. A method for evaluating the apparatus includes making a shot of a first pattern, controlling a deflection amount by the deflector to move an applied position of the beam from the first pattern along a first direction to make a shot of a second pattern, controlling the deflection amount to move the applied position from the second pattern along the first direction to make a shot of a third pattern, controlling the deflection amount to move the applied position from the third pattern along a second direction opposite to the first direction to make a shot of a fourth pattern between the second pattern and the third pattern, calculating an interval between the second pattern and the fourth pattern, and comparing the calculated interval to a reference interval.

Abstract: In one embodiment, a charged particle beam drawing apparatus performs drawing by deflecting a charged particle beam with a deflector. A method for evaluating the apparatus includes making a shot of a first pattern, controlling a deflection amount by the deflector to move an applied position of the beam from the first pattern along a first direction to make a shot of a second pattern, controlling the deflection amount to move the applied position from the second pattern along the first direction to make a shot of a third pattern, controlling the deflection amount to move the applied position from the third pattern along a second direction opposite to the first direction to make a shot of a fourth pattern between the second pattern and the third pattern, calculating an interval between the second pattern and the fourth pattern, and comparing the calculated interval to a reference interval.

Abstract: In one embodiment, a charged particle beam drawing apparatus performs drawing by deflecting a charged particle beam with a deflector. A method for evaluating the apparatus includes making a shot of a first pattern, controlling a deflection amount by the deflector to move an applied position of the beam from the first pattern along a first direction to make a shot of a second pattern, controlling the deflection amount to move the applied position from the second pattern along the first direction to make a shot of a third pattern, controlling the deflection amount to move the applied position from the third pattern along a second direction opposite to the first direction to make a shot of a fourth pattern between the second pattern and the third pattern, calculating an interval between the second pattern and the fourth pattern, and comparing the calculated interval to a reference interval.

Abstract: In a method for forming a resist film, a first resist film is formed on a light shielding film formed on a substrate, by using a spin coating method. A protective film is formed on the first resist film. The protective film and the first resist film are simultaneously removed at the same region to expose a portion of the light shielding film. A first region in which the second resist film is formed on the light shielding film and a second region in which the second resist film is formed on the first resist film through the protective film, are provided. The protective film and the second resist film are simultaneously removed in the second region to expose the first resist film. A region in which the first resist film, and a region in which the second resist film, is formed, are separately provided on the substrate.

Abstract: A charged particle beam writing apparatus includes an emission unit to emit a charged particle beam, a stage to mount thereon a target object to be written, an objective lens to focus the charged particle beam on a surface of the target object, a chamber to house the stage, a measurement unit to measure a partial pressure of a predetermined gas in the chamber in a state where a pressure inside the chamber is controlled to be lower than an atmospheric pressure, and an adjustment unit to adjust a focus position for focusing the charged particle beam on the target object, based on the partial pressure of the predetermined gas.

Abstract: A charged particle beam writing apparatus includes an emission unit to emit a charged particle beam, a stage to mount thereon a target object to be written, an objective lens to focus the charged particle beam on a surface of the target object, a chamber to house the stage, a measurement unit to measure a partial pressure of a predetermined gas in the chamber in a state where a pressure inside the chamber is controlled to be lower than an atmospheric pressure, and an adjustment unit to adjust a focus position for focusing the charged particle beam on the target object, based on the partial pressure of the predetermined gas.

Abstract: A charged particle beam writing method comprising, an irradiation step of irradiating a sample with a charged particle beam emitted from a charged particle source, a first blanking step of performing the blanking while the charged particle beam is moved in a first direction from a position of the charged particle beam in the irradiation step; and a second blanking step of performing the blanking the charged particle beam is moved in a second direction opposite to the first direction from the position of the charged particle beam in the irradiation step.

Abstract: A mask drawing method includes: disposing a grounding body provided with a grounding pin at a plurality of different places on a mask substrate to measure resistance values; disposing the grounding body at a position where the resistance value is lowest, among the plural positions where the resistance values are measured; and irradiating an electron beam to the mask substrate to draw a desired pattern.

Abstract: A mask drawing method includes: disposing a grounding body provided with a grounding pin at a plurality of different places on a mask substrate to measure resistance values; disposing the grounding body at a position where the resistance value is lowest, among the plural positions where the resistance values are measured; and irradiating an electron beam to the mask substrate to draw a desired pattern.

Abstract: An ultrasound diagnosis apparatus having a transmission circuit which generates a transmission signal is provided. The transmission signal corresponds to a combined waveform of a trapezoidal waveform and an impulse-shaped waveform (impulse portion). In an example transmission signal, a front slope portion, a flat portion, and a rear slope portion exist in a positive polarity side. The impulse portion has a shape which protrudes from an offset level over a base line into an opposite polarity side. Because the center frequency of the trapezoidal wave form is near the DC component, the trapezoidal wave form can substantially be ignored. The impulse portion has a large amplitude, but because the impulse portion exists over both polarities, there is no need to apply a special high voltage countermeasure for each polarity in designing the transmission circuit. A trapezoidal wave form of an opposite polarity may be added in front of the trapezoidal waveform.

Abstract: A mask blank is formed on a transparent substrate with a light-shielding film of a material mainly containing chromium and is used for obtaining a photomask by forming the light-shielding film into a transfer pattern by lithography using an electron beam writing resist. The mask blank includes a mask layer formed on the light-shielding film for serving as an etching mask in etching that forms the light-shielding film into the transfer pattern. The mask layer is made of a material containing silicon. The mask blank further includes a chromium nitride-based film formed on the mask layer and containing at least chromium and nitrogen.

Abstract: Provided is a digitizer function-equipped liquid crystal display device capable of preventing the wire shadows of a loop antenna from being projected on a liquid crystal panel and capable of being applied to a large size liquid crystal panel. It is also possible to provide an information processing electronic device and a game device provided with the digitizer function-equipped liquid crystal display device.

Abstract: A pattern forming method includes performing a first resist development during a first time period to a substrate obtained by coating a resist film having a predetermined thickness onto a predetermined film to be etched, measuring the film thickness of the resist film after the first resist development, writing a predetermined pattern corrected in dimension on the basis of an amount of reduction in thickness of the resist film on the resist film by using a charged particle beam, performing a second resist development during a second time period which is longer than the first time period to the substrate after writing the pattern, and etching the predetermined film to be etched by using the resist film after the second resist development as a mask.

Abstract: Provided is a digitizer function-equipped liquid crystal display device capable of preventing the wire shadows of a loop antenna from being projected on a liquid crystal panel and capable of being applied to a large size liquid crystal panel. It is also possible to provide an information processing electronic device and a game device provided with the digitizer function-equipped liquid crystal display device.

Abstract: An information apparatus switches a display at a predetermined area which includes at least a part of a portion where an electromagnetic-wave emitting unit used for data communications with a data storage device is disposed, according to data communication processing with the data storage device, and emits sound generated according to the processing at corresponding timing.