Abstract: An exposure system exposing system capable of exposing wafer transported from coating apparatus capable of coating photosensitive material onto wafer, including: holding apparatus including first holding part holding first surface of wafer transported from coating apparatus; measurement apparatus including first measurement part having at least first measurement region and capable of measuring position in first direction of second surface on side opposite to first surface of wafer held by first holding part and second measurement part having at least one second measurement region different from first measurement region and capable of measuring position in first direction of first or second surface of wafer; exposure apparatus exposing the wafer with energy beam; transport apparatus transporting wafer from measurement apparatus to exposure apparatus; and control apparatus, wherein control apparatus determines whether or not wafer is transported toward exposure apparatus by transport apparatus based on measurem

Abstract: A coil unit formed of a coil-wound inner core partially circumferentially encased by an outer core. The coil unit is mounted on a plate with the outer core externally exposed and covering the lead-in wires to the coil which are adhered to contacts on the plate.

Abstract: A coil element formed from a drum-shaped ferrite core on which a coil is wound, magnetic members each made of a magnetic and electrically conductive metal and formed so as to fit to the outer surface of the drum-shaped ferrite core and spaced from each other so as to be electrically insulated from each other, and connection terminals forming a part of the magnetic members connected to the ends of the coil.