Abstract: An electron beam irradiation device includes an electron gun, a housing, and an electron beam emission window. A rod portion of the housing includes a first tubular member, a second tubular member, a cooling gas flow space, and a wall member. The window is provided at an end portion on a distal end side of the first tubular member. The second tubular member surrounds the first tubular member. The cooling gas flow space includes at least a cooling gas flow path provided between an outer wall surface of the first tubular member and an inner wall surface of the second tubular member. The wall member is provided so as to perform partition between an electron beam emission space and the cooling gas flow space. The wall member is provided with a cooling gas ejection hole. The hole has a flow path sectional area smaller than a flow path sectional area of the cooling gas flow path.

Abstract: An electron beam irradiation device includes an electron gun, a housing, and an electron beam emission window. A rod portion of the housing includes a first tubular member, a second tubular member, a cooling gas flow space, and a wall member. The window is provided at an end portion on a distal end side of the first tubular member. The second tubular member surrounds the first tubular member. The cooling gas flow space includes at least a cooling gas flow path provided between an outer wall surface of the first tubular member and an inner wall surface of the second tubular member. The wall member is provided so as to perform partition between an electron beam emission space and the cooling gas flow space. The wall member is provided with a cooling gas ejection hole. The hole has a flow path sectional area smaller than a flow path sectional area of the cooling gas flow path.

Abstract: An ultraviolet light generating target 20 includes a substrate 21 made of sapphire, quartz, or rock crystal; and a light-emitting layer 22 that is provided on the substrate 21 and that generates ultraviolet light upon receiving an electron beam. The light-emitting layer 22 includes powdered or granular Pr:LuAG crystals. By using such a light-emitting layer 22 as the target, the ultraviolet light generating efficiency can be increased more remarkably than when a Pr:LuAG single crystal film is used.

Abstract: An ultraviolet light generating target 20 includes a substrate 21 made of sapphire, quartz or rock crystal; and a Pr:LuAG polycrystalline film 22, provided on the substrate 21, that generates ultraviolet light upon receiving an electron beam. By using a Pr:LuAG polycrystal as the target, the ultraviolet light generating efficiency can be increased more remarkably than when a Pr:LuAG single crystal film is used.

Abstract: An ultraviolet light generating target 20 includes a substrate 21 made of sapphire, quartz, or rock crystal; and a light-emitting layer 22 that is provided on the substrate 21 and that generates ultraviolet light upon receiving an electron beam. The light-emitting layer 22 includes powdered or granular Pr:LuAG crystals. By using such a light-emitting layer 22 as the target, the ultraviolet light generating efficiency can be increased more remarkably than when a Pr:LuAG single crystal film is used.

Abstract: An ultraviolet light generating target 20 includes a substrate 21 made of sapphire, quartz or rock crystal; and a Pr:LuAG polycrystalline film 22, provided on the substrate 21, that generates ultraviolet light upon receiving an electron beam. By using a Pr:LuAG polycrystal as the target, the ultraviolet light generating efficiency can be increased more remarkably than when a Pr:LuAG single crystal film is used.