Patents by Inventor Takeharu Motobe

Takeharu Motobe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Developer for photosensitive polyimide precursor, and method of using it for patterning
    Patent number: 6146815
    Abstract: The invention provides a developer for photosensitive polyimides, with which polyimide patterning for interlayer insulating films for multi-layered circuit boards and for .alpha.-ray shield layers, buffer coat layers and others for semiconductor memory devices is attained within a shorter period of time than with conventional developers. It provides a developer for photosensitive polyimide precursors, which comprises two or more solvents including at least an aprotic polar solvent, and in which the mixed solution of the solvents has a polar component solubility parameter, .delta.P, of not smaller than 7, and provides a patterning method of using the developer.
    Type: Grant
    Filed: March 4, 1999
    Date of Patent: November 14, 2000
    Assignees: Hitachi Chemical DuPont Microsystems L.L.C., Hitachi Chemical DuPont Microsystems Ltd.
    Inventors: Hiroshi Komatsu, Takeharu Motobe