Abstract: The present invention provides a mold including a pattern to be transferred to a resin coated on a substrate, by performing an imprint process, the mold comprising a first portion including a first surface which include a pattern portion provided with the pattern and a peripheral portion surrounding the pattern portion, and a second surface which is opposite to the first surface, and a second portion which surrounds the first portion and is thicker than the first portion, wherein a concave portion is formed by the second surface of the first portion and an inner surface of the second portion, and the concave portion is provided with a light-shielding portion in a region on an opposite side to the peripheral portion.

Abstract: A scanning exposure apparatus includes a projection optical system which projects a pattern formed on a mask onto an object, a stage which holds an object and moves in a direction perpendicular to an optical axis of the projection optical system, a measurement system which measures a position of a surface of the object in a direction of the optical axis in response to a reset signal, and a generation system which generates the reset signal when the stage arrives at each predetermined position in the direction perpendicular to the optical axis.

Abstract: A scanning exposure apparatus includes a stage unit which supports and moves a substrate, and a control unit which starts exposing the substrate after a start of a second section in an acceleration section of the stage unit sequentially including a first section in which a jerk is positive, the second section in which a jerk is 0, and a third section in which a jerk is negative.

Abstract: A scanning exposure apparatus includes a stage unit which supports and moves a substrate, and a control unit which starts exposing the substrate after a start of a second section in an acceleration section of the stage unit sequentially including a first section in which a jerk is positive, the second section in which a jerk is 0, and a third section in which a jerk is negative.

Abstract: A scanning exposure apparatus includes a stage unit which supports and moves a substrate, and a control unit which starts exposing the substrate after a start of a second section in an acceleration section of the stage unit sequentially including a first section in which a jerk is positive, the second section in which a jerk is 0, and a third section in which a jerk is negative.

Abstract: A power monitoring apparatus monitors the voltage fluctuation range of an AC power supply and the duration of voltage fluctuations within the voltage fluctuation range. The power monitoring apparatus looks up a power failure rank table for determining the power failure rank of the power supply on the basis of the voltage fluctuation range and the duration obtained as the monitoring result to determine the power failure rank of the power supply. The power monitoring apparatus sends a power failure signal indicating the power failure rank to a power supply destination of an AC power supply.

Abstract: A scanning exposure apparatus includes a projection optical system which projects a pattern formed on a mask onto an object, a stage which holds an object and moves in a direction perpendicular to an optical axis of the projection optical system, a measurement system which measures a position of a surface of the object in a direction of the optical axis in response to a reset signal, and a generation system which generates the reset signal when the stage arrives at each predetermined position in the direction perpendicular to the optical axis.

Abstract: An exposure apparatus includes a stage which moves with an object thereon. A surface position detector is arranged to detect a surface position of the object at a timing that is asynchronous to a reference signal, and is provided for controlling the stage.

Abstract: An illumination device for scanning exposure apparatus for carrying out exposure even when a movable stage is being accelerated and decelerated. The apparatus includes an illumination-distribution varying device for temporarily varying the illumination distribution of an illumination unit that is performing the exposure, wherein the illumination-distribution varying device has a function for varying the temporary change of the illumination distribution in conformity with a pattern for driving the movable stage.

Abstract: A scanning exposure apparatus includes a stage unit which supports and moves a substrate, and a control unit which starts exposing the substrate after a start of a second section in an acceleration section of the stage unit sequentially including a first section in which a jerk is positive, the second section in which a jerk is 0, and a third section in which a jerk is negative.

Abstract: A power monitoring apparatus monitors the voltage fluctuation range of an AC power supply and the duration of voltage fluctuations within the voltage fluctuation range. The power monitoring apparatus looks up a power failure rank table for determining the power failure rank of the power supply on the basis of the voltage fluctuation range and the duration obtained as the monitoring result to determine the power failure rank of the power supply. The power monitoring apparatus sends a power failure signal indicating the power failure rank to a power supply destination of an AC power supply.

Abstract: After scanning is started in an exposure apparatus, a wafer stage (5) is moved to a position (Ma) at which focus measurement is possible. When an initial focus measurement point (M0) has arrived at the spots (A) to (C) or (a) to (c), a storage cycle of a CCD sensor is initialized at a timing that is asynchronous with respect to a reference signal that is for controlling the wafer stage. As a result, the focus measurement point (M0) and an offset measurement point can be made to agree in a highly precise manner.

Abstract: In a scanning exposure apparatus for performing exposure even when movable stages (31, 35) are being accelerated/decelerated, use is made of an illumination-distribution varying unit including a rotatable wedge prism (21) serving as an optical member for temporally varying the illumination distribution, and a prism driver (101) for driving the prism (21). The illumination-distribution varying unit has a function for varying the temporal change of the illumination distribution in conformity with a pattern for driving the movable stages (31, 35). An illumination distribution that conforms to an acceleration/deceleration pattern of the stages (31, 35) is measured and a pattern for driving the wedge prism (21) is decided based upon the result of measurement.

Abstract: A device manufacturing apparatus includes a plurality of component units, and a cable element and/or a pipe element, for connecting one of the units with another, wherein the cable element or the pipe element connects the units through a member which is isolated from the units with respect to vibration, such that transmission of vibration between the units can be prevented.

Abstract: A surface position detecting method for detecting a surface position of a surface to be examined, having surface height irregularity, while relatively scanning the surface, is disclosed. The method includes detecting characteristic data related to a surface state at plural measurement positions on the surface, while relatively scanning the surface, and processing the detected characteristic data related to the measurement positions to determine a measurement position for measurement of the surface position in a subsequent surface position detecting process.

Abstract: A surface state inspecting device includes an illumination system for illuminating a surface to be inspected, with a beam having non-uniform sectional intensity distribution, a uniforming system for substantially uniforming the sectional intensity distribution of the beam, and an inspecting portion for detecting scattered light from the surface to determine the state of the surface.

Abstract: A method of aligning a substrate includes the steps of detecting misalignment of the substrate using an image signal from a charge coupled device (CCD) camera which receives light reflected by an alignment mark on the substrate illuminated by pulse light, and moving the substrate in accordance with the detected misalignment. If the amount of light received by the camera during a predetermined time period does not reach a predetermined value, the predetermined time period is increased. If the amount of light exceeds the predetermined value, the amount of light emitted by the source of the pulse light for each pulse is reduced.