Patents by Inventor Takehiro Komatsu

Takehiro Komatsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20080096712
    Abstract: To provide a transmission capable of using pump/motors or generator/motors of smaller maximum torque and of small size. The transmission includes input shaft (4), output shaft (16), a mechanical transmission part interposed between input shaft (4) and output shaft (16) including planetary gear mechanisms (5), (6), and a hydrostatic transmission part interposed between input shaft (4) and output shaft (16) including three pump/motors (21), (25), (31). A rotating shaft of first pump/motor (21) and a rotating shaft of second pump/motor (25) are coupled to the mechanical transmission part. Clutches (34), (35), (36) are provided for coupling a rotating shaft of third pump/motor (31) to at least one of the rotating shaft of first pump/motor (21) and the rotating shaft of second pump/motor (25).
    Type: Application
    Filed: August 31, 2005
    Publication date: April 24, 2008
    Inventors: Hikosaburo Hiraki, Takehiro Komatsu
  • Publication number: 20070068448
    Abstract: A single crystal semiconductor manufacturing apparatus in which the concentration of oxygen in a single crystal semiconductor is controlled while pulling up a single crystal semiconductor such as single crystal silicon by the CZ method, a single crystal semiconductor manufacturing method, and a single crystal ingot manufactured by the method are disclosed. The natural convection (20) in the melt (5) in a quartz crucible (3) is controlled by regulating the temperatures at a plurality of parts of the melt (5). A single crystal semiconductor (6) can have a desired diameter by regulating the amount of heat produced by heating means (9a) on the upper side. Further the ratio between the amount of heat produced by the upper-side heating means (9a) and that by the lower-side heating means (9b) is adjusted to vary the process condition. In the adjustment, the amount of heat produced by the lower-side heating means (9b) is controlled to a relatively large proportion.
    Type: Application
    Filed: November 29, 2006
    Publication date: March 29, 2007
    Applicant: Komatsu Denshi Kinzoku Kabushiki Kaisha
    Inventors: Yutaka Shiraishi, Jyunsuke Tomioka, Takuji Okumura, Tadayuki Hanamoto, Takehiro Komatsu, Shigeo Morimoto
  • Patent number: 7160386
    Abstract: A single crystal semiconductor manufacturing apparatus in which the concentration of oxygen in a single crystal semiconductor is controlled while pulling up a single crystal semiconductor such as single crystal silicon by the CZ method, a single crystal semiconductor manufacturing method, and a single crystal ingot manufactured by the method are disclosed. The natural convection (20) in the melt (5) in a quartz crucible (3) is controlled by regulating the temperatures at a plurality of parts of the melt (5). A single crystal semiconductor (6) can have a desired diameter by regulating the amount of heat produced by heating means (9a) on the upper side. Further the ratio between the amount of heat produced by the upper-side heating means (9a) and that by the lower-side heating means (9b) is adjusted to vary the process condition. In the adjustment, the amount of heat produced by the lower-side heating means (9b) is controlled to a relatively large proportion.
    Type: Grant
    Filed: September 27, 2002
    Date of Patent: January 9, 2007
    Assignee: Komatsu Denshi Kinzoku Kabushiki Kaisha
    Inventors: Yutaka Shiraishi, Jyunsuke Tomioka, Takuji Okumura, Tadayuki Hanamoto, Takehiro Komatsu, Shigeo Morimoto
  • Publication number: 20040211359
    Abstract: A single crystal semiconductor manufacturing apparatus in which the concentration of oxygen in a single crystal semiconductor is controlled while pulling up a single crystal semiconductor such as single crystal silicon by the CZ method, a single crystal semiconductor manufacturing method, and a single crystal ingot manufactured by the method are disclosed. The natural convection (20) in the melt (5) in a quartz crucible (3) is controlled by regulating the temperatures at a plurality of parts of the melt (5). A single crystal semiconductor (6) can have a desired diameter by regulating the amount of heat produced by heating means (9a) on the upper side. Further the ratio between the amount of heat produced by the upper-side heating means (9a) and that by the lower-side heating means (9b) is adjusted to vary the process condition. In the adjustment, the amount of heat produced by the lower-side heating means (9b) is controlled to a relatively large proportion.
    Type: Application
    Filed: February 20, 2004
    Publication date: October 28, 2004
    Inventors: Yutaka Shiraishi, Jyunsuke Tomioka, Takuji Okumura, Tadayuki Hanamoto, Takehiro Komatsu, Shigeo Morimoto