Abstract: A negative type resist composition is provided, which provides excellent resolution, satisfactory profile and outstanding process stability: is suitable for exposure using deep ultra violet ray; and comprises alkali soluble resin, acid generator, crosslinking agent, and a basic compound represented by the following formula (I) wherein, A represents bivalent aliphatic hydrocarbon residue which may be optionally interrupted by imino group, sulfide group, or disulfide group, X represents nitrogen atom or C(NH2), and R1 and R2 independently represent hydrogen or alkyl.

Abstract: The present invention provides a positive photoresist composition comprising an alkali-soluble resin containing a copolymer of p-vinylphenol or a derivative thereof and styrene, a dissolution inhibitor and a photo-induced acid precursor. This positive photoresist composition exhibits excellent sensitivity and resolution while maintaining excellence in other properties such as heat resistance, film thickness retention, adhesion and profile, in far ultraviolet ray lithography.

Abstract: A positive-working photoresist composition which exhibits a high sensitivity and a high resolution in addition to excellent characteristics such as heat resistance, film retention ratio, coatability and profile;which comprises an alkali-soluble resin comprising a polyvinylphenol resin which is polyvinylphenol and/or its partially hydrogenated product in which the phenolic hydroxyl groups are partially alkyletherified and partially protected;and a sulfonate of a N-hydroxyimide compound as an acid generator.

Abstract: This invention provides a positive photoresist composition comprising an alkali-soluble resin, a dissolution inhibitor and a photo-induced acid precursor, wherein said alkali-soluble resin is obtainable through a condensation reaction of a compound represented by the general formula (I): ##STR1## wherein R.sub.1 to R.sub.9 each represent hydrogen atom, halogen atom, alkyl group, alkenyl group, --OH group or the like, provided that at least one of R.sub.1 to R.sub.9 is --OH group and at least two hydrogen atoms are attached to the o- or p-position of the --OH group, and an aldehyde. This positive photoresist composition is excellent in performances such as resolution, profile, sensitivity, etc.

Abstract: A negative or positive photoresist composition which comprises an alkali soluble resin containing at least one resin selected from the group consisting of a partially alkyletherified polyvinylphenol and a partially alkyletherified hydrogenated polyvinylphenol, a photo-induced acid precursor containing at least a kind of sulfonic acid ester of N-hydroxyimide compounds and crosslinking agent or dissolution inhibitor, and this photoresist composition is excellent in various properties such as heat resistance, film thickness retention, coating property, profile and the like, and further exhibits high sensitivity and high resolution when far ultraviolet rays including excimer laser is used as the light source. It also hardly cause a scam during the developing process.

Abstract: This invention provides a process for producing a cyclic carbonate compound represented by the following formula (5): ##STR1## or the like which is useful as a dissolution inhibitor for use in a chemically amplified positive photoresist, as well as a positive photoresist composition comprising said cyclic carbonate compound, an alkali-soluble resin and a photo-induced acid precursor. This composition gives a positive photoresist excellent in performances such as resolution, profile, sensitivity, etc.

Abstract: This invention provides a process for producing a cyclic carbonate compound represented by the following formula (5): ##STR1## or the like which is useful as a dissolution inhibitor for use in a chemically amplified positive photoresist, as well as a positive photoresist composition comprising said cyclic carbonate compound, an alkali-soluble resin and a photo-induced acid precursor. This composition gives a positive photoresist excellent in performances such as resolution, profile, sensitivity, etc.

Abstract: A novolak resin made from a carbonyl compound and a specific phenol compound, which resin has good properties, in particular, as a base resin of a photoresist.

Abstract: A negative photoresist composition containing an alkali-soluble resin which is obtainable through a condensation reaction of an aldehyde with a phenol compound containing a compound of the general formula: ##STR1## wherein R.sup.1 to R.sup.9 are independently a hydrogen atom, an alkyl group, an alkenyl group, an alkylcarbonyl group, a halogen atom or a hydroxyl group, provided that at least one of R.sup.1 to R.sup.9 is a hydroxyl group and, at the ortho- or para-position to the hydroxyl group, at least two hydrogen atoms are present; a cross linking agent; and a photo-acid generator, and a negative photoresist composition comprising an alkali-soluble resin, a cross linking agent and a photo-acid generator having a trifluoromethanesulfonic acid ester group, which can increase resolution and contrast of a photoresist pattern.

Abstract: A cyan dye-donor element which gives good printed images to a thermal-transfer sheet and a thermal-transfer sheet comprising a substrate sheet and a layer containing said cyan dye-donor and being laid on one side of the substrate sheet are provided. The cyan dye-donor element comprises cyan dyes dispersed or dissolved in a polymeric binder wherein said cyan dyes comprise: ##STR1## wherein R.sub.1 and R.sub.2 each represents a hydrogen atom or a C.sub.1 -C.sub.6 alkyl group; at least one dye represented by the following formula (II): ##STR2## wherein R.sub.3 and R.sub.4 each represents a hydrogen atom or a C.sub.1 -C.sub.6 alkyl group which may be substituted, and R.sub.5 represents a hydrogen atom or a C.sub.1 -C.sub.6 alkyl group; and at least one dye selected from the group consisting of dyes represented by the following formula (III): ##STR3## wherein R.sub.6 and R.sub.7 each represents a hydrogen atom or a C.sub.1 -C.sub.6 alkyl group which may be substituted, R.sub.8 represents a hydrogen atom, a C.sub.

Abstract: A compound of the following formula in the free acid form, ##STR1## wherein and R and R.sub.1 are each hydrogen or alkyl, A is a divalent group of the formula, ##STR2## wherein R.sub.3, R.sub.4 and R.sub.5 are each hydrogen, methyl, ethyl, methoxy or ethoxy, m is 0 or 1, n, u and v are each 0, 1 or 2, p is 0, 1, 2 or 3, q and s are each an integer of 2 to 6, and r is 1 or 2, B.sub.1 is phenylene or naphthylene, Z.sub.1 is vinyl, .beta.-sulfatoethyl or the like, l is 0, 1 or 2, and X is a group of the formula, ##STR3## wherein R.sub.2 is hydrogen or alkyl, B.sub.2 is phenylene or naphtylene, Z.sub.2 is vinyl, .beta.-sulfatoethyl or the like, R.sub.6 and R.sub.7 are each hydrogen, alkyl, phenyl, naphthyl or benzyl, and R, A and l are as defined above, which is useful for dyeing or printing fiber materials to give a dyed or printed product of a brilliant blue color superior in fastness properties such as light fastness and perspiration-light fastness, with superior build-up property.

Abstract: A negative type resist composition is provided, which provides excellent resolution, satisfactory profile and outstanding process stability; is suitable for exposure using deep ultra violet ray; and comprises alkali soluble resin, acid generator, crosslinking agent, and a basic compound represented by the following formula (I) wherein, A represents sulfide group, disulfide group or bivalent aliphatic hydrocarbon residue which may be optionally interrupted by imino group, sulfide group, or disulfide group, X represents nitrogen atom or C(NH2), and R1 and R2 independently represent hydrogen or alkyl.