Patents by Inventor Takehiro Seshimo

Takehiro Seshimo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200407545
    Abstract: A curable resin composition capable of achieving a low refractive material having high solvent resistance. The curable resin composition includes a resin having two types of specific structural units, hollow particles including a shell portion made of a resin, and an organic solvent. The average particle diameter of the hollow particles may be 20 nm or more and 300 nm or less. The content rate of the resin in total solid content in the curable resin composition may be 30% by mass or more and 90% by mass or less.
    Type: Application
    Filed: June 9, 2020
    Publication date: December 31, 2020
    Inventors: Takehiro SESHIMO, Hiroaki TAKEUCHI, Tomoyuki INOUE
  • Publication number: 20200362115
    Abstract: A silicon-containing polymer which results in a composition that forms a coated film having good adhesive properties to a substrate and does not easily peel off the substrate, a film-forming composition including the polymer, a method for forming a silicon-containing polymer coating using the composition, a method for forming a silica-based coating using the composition, and a production method for the polymer. In a silicon-containing polymer including at least one of poly- or oligo-siloxane chain and poly- or oligo-silane chain in a molecular chain, a group having a silyl group and a sulfide group, which can be subjected to a condensation reaction, is introduced into the molecular chain, for example, by an ene-thiol reaction.
    Type: Application
    Filed: May 11, 2020
    Publication date: November 19, 2020
    Inventors: Kunihiro NODA, Takehiro SESHIMO, Keisuke KUBO, Yohei KINOSHITA
  • Publication number: 20190270852
    Abstract: A block copolymer including a first block consisting of a polymer having a repeating structure of a structural unit (u1) containing no silicon atom, and a second block consisting of a polymer having a repeating structure of a structural unit (u2) containing a silicon atom, the second block containing a block (b21) consisting of a polymer having a repeating structure represented by general formula (u2-1), and a block (b22) consisting of a polymer having a repeating structure of a structural unit (u22) containing a silicon atom, and the block (b22) is positioned between the first block and the block (b21) (wherein RP211 represents an alkyl group, a halogenated alkyl group, a hydrogen atom, or an organic group having a polar group; and RP212 represents an organic group having a polar group).
    Type: Application
    Filed: February 26, 2019
    Publication date: September 5, 2019
    Inventors: Akiyoshi YAMAZAKI, Daisuke KAWANA, Takehiro SESHIMO, Teruaki HAYAKAWA, Lei DONG, Rin ODASHIMA
  • Patent number: 10366888
    Abstract: A pattern forming method includes forming a first organic film by coating an etching target film with a composition including a polymer including a cross-linkable component, infiltrating an inorganic substance into the first organic film, cross-linking the polymer, forming a second organic film on the first organic film, forming a second organic film pattern by patterning the second organic film, forming a first organic film pattern having a pitch reduced to one-half of a pitch of the second organic film pattern by patterning the first organic film by a self-aligned patterning method that uses the second organic film pattern as a core pattern, forming an etching target film pattern having a pitch reduced to one-half of a pitch of the first organic film pattern by patterning the etching target film by a self-aligned patterning method that uses the first organic film pattern as a core pattern.
    Type: Grant
    Filed: June 14, 2018
    Date of Patent: July 30, 2019
    Assignees: Tokyo Electron Limited, TOKYO OHKA KOGYO CO., LTD.
    Inventors: Kazuki Yamada, Masatoshi Yamato, Hidetami Yaegashi, Yoshitaka Komuro, Takehiro Seshimo, Katsumi Ohmori
  • Publication number: 20190198314
    Abstract: To provide a method for removing an organic cured film on a substrate, which can satisfactorily remove the organic cured film formed on the substrate while suppressing damage on a wiring material such as copper, and an acidic cleaning liquid which can be preferably used in the method. When removing an organic cured film on a substrate, the organic cured film is contacted with an acidic cleaning liquid, and an acidic cleaning liquid, which includes sulfuric acid and a water-soluble organic solvent and does not include a compound capable of generating nitronium ions, the content of water being 5% by mass or less, is used as the acidic cleaning liquid.
    Type: Application
    Filed: December 26, 2018
    Publication date: June 27, 2019
    Inventors: Isao HIRANO, Takehiro SESHIMO, Yu TSEWEI, Chuang YACHIEN
  • Patent number: 10317797
    Abstract: A pattern forming method includes forming a first film patterned in a line and space shape on an underlayer film, the line and space shape including lines and a space arranged therebetween, forming a second film to cover the first film, removing the second film to form the second film on a side surface of the first film in a line shape, forming a third film to cover the first film and the second film, removing the third film formed on the first film and the second film to form the third film on a side surface of the second film, and converting the third film after removing the third film formed on the first film and the second film, wherein the third film is comprised of an organic metal compound, the organic metal compound having characteristic to increase etching tolerance when the organic metal compound undergoes a predetermined process.
    Type: Grant
    Filed: November 20, 2017
    Date of Patent: June 11, 2019
    Assignees: Tokyo Electron Limited, TOKYO OHKA KOGYO CO., LTD.
    Inventors: Hidetami Yaegashi, Kenichi Oyama, Katsumi Ohmori, Yoshitaka Komuro, Takehiro Seshimo
  • Patent number: 10179866
    Abstract: A resin composition for forming a phase-separated structure, including: a block copolymer, and an ion liquid containing a compound (IL) having a cation moiety and an anion moiety, the cation moiety of the compound (IL) having a dipole moment of 3 debye or more.
    Type: Grant
    Filed: February 18, 2016
    Date of Patent: January 15, 2019
    Assignees: TOKYO OHKA KOGYO CO., LTD., THE UNIVERSITY OF CHICAGO
    Inventors: Akiya Kawaue, Takehiro Seshimo, Takaya Maehashi, Tasuku Matsumiya, Ken Miyagi, Hitoshi Yamano, Xuanxuan Chen, Paul Franklin Nealey
  • Patent number: 10167410
    Abstract: Vacuum deposited thin films of material are used to create an interface that non-preferentially interacts with different domains of an underlying block copolymer film. The non-preferential interface prevents formation of a wetting layer and influences the orientation of domains in the block copolymer. The purpose of the deposited polymer is to produce nano structured features in a block copolymer film that can serve as lithographic patterns.
    Type: Grant
    Filed: April 28, 2015
    Date of Patent: January 1, 2019
    Assignee: Board of Regents, The University of Texas System
    Inventors: C. Grant Wilson, William J. Durand, Christopher John Ellison, Christopher M. Bates, Takehiro Seshimo, Julia Cushen, Logan J. Santos, Leon Dean, Erica L. Rausch
  • Publication number: 20180374695
    Abstract: A pattern forming method includes forming a first organic film by coating an etching target film with a composition including a polymer including a cross-linkable component, infiltrating an inorganic substance into the first organic film, cross-linking the polymer, forming a second organic film on the first organic film, forming a second organic film pattern by patterning the second organic film, forming a first organic film pattern having a pitch reduced to one-half of a pitch of the second organic film pattern by patterning the first organic film by a self-aligned patterning method that uses the second organic film pattern as a core pattern, forming an etching target film pattern having a pitch reduced to one-half of a pitch of the first organic film pattern by patterning the etching target film by a self-aligned patterning method that uses the first organic film pattern as a core pattern.
    Type: Application
    Filed: June 14, 2018
    Publication date: December 27, 2018
    Inventors: Kazuki YAMADA, Masatoshi YAMATO, Hidetami YAEGASHI, Yoshitaka KOMURO, Takehiro SESHIMO, Katsumi OHMORI
  • Publication number: 20180244856
    Abstract: A block copolymer including a first block and a second block, the first block consisting of a polymer (P1) having a repeating structure of a structural unit (u1) containing in a side chain thereof a hyperbranched structure containing a silicon atom.
    Type: Application
    Filed: February 13, 2018
    Publication date: August 30, 2018
    Inventors: Teruaki HAYAKAWA, Seina YAMAZAKI, Rin ODASHIMA, Takehiro SESHIMO, Daisuke KAWANA, Akiyoshi YAMAZAKI
  • Publication number: 20180143536
    Abstract: A pattern forming method includes forming a first film patterned in a line and space shape on an underlayer film, the line and space shape including lines and a space arranged therebetween, forming a second film to cover the first film, removing the second film to form the second film on a side surface of the first film in a line shape, forming a third film to cover the first film and the second film, removing the third film formed on the first film and the second film to form the third film on a side surface of the second film, and converting the third film after removing the third film formed on the first film and the second film, wherein the third film is comprised of an organic metal compound, the organic metal compound having characteristic to increase etching tolerance when the organic metal compound undergoes a predetermined process.
    Type: Application
    Filed: November 20, 2017
    Publication date: May 24, 2018
    Inventors: Hidetami YAEGASHI, Kenichi OYAMA, Katsumi OHMORI, Yoshitaka KOMURO, Takehiro SESHIMO
  • Publication number: 20180072564
    Abstract: A resin composition for forming a phase-separated structure includes a block copolymer having a block (b1) having a repeating structure of styrene units; a block (b2) having a repeating structure of methyl methacrylate units partially substituted with a constituent unit represented by general formula (h1); and a number average molecular weight of less than 28,000. In general formula (h1), Rh0 is a hydrophilic functional group.
    Type: Application
    Filed: July 18, 2017
    Publication date: March 15, 2018
    Inventors: Ken MIYAGI, Takehiro SESHIMO, Takaya MAEHASHI, Takahiro DAZAI, Hitoshi YAMANO, Toshifumi SATOH, Takuya ISONO
  • Patent number: 9914847
    Abstract: A resin composition for forming a phase-separated structure, including: a block copolymer, and an ion liquid containing a compound (IL) having a cation moiety and an anion moiety, the energy of the LUMO of the cation moiety being ?4.5 eV or more, and the energy difference between the LUMO and the HOMO of the cation moiety being 10.0 ev or more, or the Log P value of the anion moiety being 1 to 3.
    Type: Grant
    Filed: June 17, 2016
    Date of Patent: March 13, 2018
    Assignees: TOKYO OHKA KOGYO CO., LTD., THE UNIVERSITY OF CHICAGO
    Inventors: Akiya Kawaue, Takehiro Seshimo, Takaya Maehashi, Tasuku Matsumiya, Ken Miyagi, Hitoshi Yamano, Xuanxuan Chen, Paul Franklin Nealey
  • Patent number: 9850350
    Abstract: A block copolymer containing a first block having a structure represented by general formula (1) shown below (Rs01 and Rs02 each independently represents an organic group, provided that at least one of Rs01 and Rs02 has a polar group; and * represents a valence bond).
    Type: Grant
    Filed: February 26, 2016
    Date of Patent: December 26, 2017
    Assignees: TOKYO OHKA KOGYO CO., LTD., TOKYO INSTITUTE OF TECHNOLOGY
    Inventors: Takehiro Seshimo, Teruaki Hayakawa
  • Publication number: 20170362460
    Abstract: A resin composition for forming a phase-separated structure, including: a block copolymer, and an ion liquid containing a compound (IL) having a cation moiety and an anion moiety, the energy of the LUMO of the cation moiety being ?4.5 eV or more, and the energy difference between the LUMO and the HOMO of the cation moiety being 10.0 ev or more, or the Log P value of the anion moiety being 1 to 3.
    Type: Application
    Filed: June 17, 2016
    Publication date: December 21, 2017
    Inventors: Akiya KAWAUE, Takehiro SESHIMO, Takaya MAEHASHI, Tasuku MATSUMIYA, Ken MIYAGI, Hitoshi YAMANO, Xuanxuan CHEN, Paul Franklin NEALEY
  • Patent number: 9828519
    Abstract: A resin composition for forming a phase-separated structure, including a block copolymer, and an ion liquid containing a compound having a cation moiety and an anion moiety, the anion moiety being represented by general formula (a1), (a2) or (a3), in which X? represents an alkylene group of 2 to 6 carbon atoms in which at least one hydrogen atom is substituted with a fluorine atom; Y? and Z? each independently represents an alkyl group of 1 to 10 carbon atoms in which at least one hydrogen atom is substituted with a fluorine atom; R? represents an alkyl group of 1 to 5 carbon atoms in which at least one hydrogen atom is optionally substituted with a fluorine atom, m represents an integer of 1 to 6, and n represents an integer of 0 to 5, provided that m+n=6.
    Type: Grant
    Filed: February 18, 2016
    Date of Patent: November 28, 2017
    Assignees: TOKYO OHKA KOGYO CO., LTD., THE UNIVERSITY OF CHICAGO
    Inventors: Akiya Kawaue, Takehiro Seshimo, Takaya Maehashi, Tasuku Matsumiya, Ken Miyagi, Hitoshi Yamano, Xuanxuan Chen, Paul Franklin Nealey
  • Publication number: 20170240766
    Abstract: A resin composition for forming a phase-separated structure, including: a block copolymer, and an ion liquid containing a compound (IL) having a cation moiety and an anion moiety, the cation moiety of the compound (IL) having a dipole moment of 3 debye or more.
    Type: Application
    Filed: February 18, 2016
    Publication date: August 24, 2017
    Inventors: Akiya KAWAUE, Takehiro SESHIMO, Takaya MAEHASHI, Tasuku MATSUMIYA, Ken MIYAGI, Hitoshi YAMANO, Xuanxuan CHEN, Paul Franklin NEALEY
  • Publication number: 20170240767
    Abstract: A resin composition for forming a phase-separated structure, including a block copolymer, and an ion liquid containing a compound having a cation moiety and an anion moiety, the anion moiety being represented by general formula (a1), (a2) or (a3), in which X? represents an alkylene group of 2 to 6 carbon atoms in which at least one hydrogen atom is substituted with a fluorine atom; Y? and Z? each independently represents an alkyl group of 1 to 10 carbon atoms in which at least one hydrogen atom is substituted with a fluorine atom; R? represents an alkyl group of 1 to 5 carbon atoms in which at least one hydrogen atom is optionally substituted with a fluorine atom, m represents an integer of 1 to 6, and n represents an integer of 0 to 5, provided that m+n=6.
    Type: Application
    Filed: February 18, 2016
    Publication date: August 24, 2017
    Inventors: Akiya KAWAUE, Takehiro SESHIMO, Takaya MAEHASHI, Tasuku MATSUMIYA, Ken MIYAGI, Hitoshi YAMANO, Xuanxuan CHEN, Paul Franklin NEALEY
  • Patent number: 9644110
    Abstract: A method of producing a structure containing a phase-separated structure, including forming a layer containing a block copolymer on a substrate; applying a top coat material to the layer containing the block copolymer to form a top coat film; and subjecting the layer including the block copolymer having the top coat film formed thereon to annealing treatment so as to conduct a phase separation of the layer, the top coat material including an organic solvent component and a polymeric compound containing a structural unit having either a dicarboxylic acid or a salt of a dicarboxylic acid, and the organic solvent component containing water and an alcohol having 3 or more carbon atoms.
    Type: Grant
    Filed: March 31, 2015
    Date of Patent: May 9, 2017
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Takehiro Seshimo, Takaya Maehashi, Takahiro Dazai, Yoshiyuki Utsumi
  • Patent number: 9567477
    Abstract: An undercoat agent used for phase separating a layer containing a block copolymer having a block of a structural unit derived from an (?-substituted) acrylate ester on a substrate, and which contains a resin component including a structural unit represented by formula (ba0-1), and/or a structural unit represented by formula (ba0-2), and a structural unit (ba0-3) having a substrate interacting group, wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, R1 and R2 represent a halogen atom or an organic group of 1 to 20 carbon atoms which may contain an oxygen atom, a halogen atom, or a silicon atom, and n is 1 to 5.
    Type: Grant
    Filed: July 7, 2014
    Date of Patent: February 14, 2017
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Takehiro Seshimo, Tasuku Matsumiya, Takaya Maehashi, Takahiro Dazai, Yoshiyuki Utsumi