Patents by Inventor Takehiro Seshimo

Takehiro Seshimo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240368393
    Abstract: A resin composition for forming an etching mask pattern containing a block copolymer having a first block and a second block, and a homopolymer having a number-average molecular weight of less than 3,000. The first block is a polymer of a constitutional unit represented by Formula (b1) and the second block is a random copolymer of a constitutional unit represented by Formula (b2m) and a constitutional unit represented by Formula (b2g). The proportion of the volume of the first block is 20% to 80% by volume. The homopolymer includes a polymer of the constitutional unit represented by Formula (b1).
    Type: Application
    Filed: April 25, 2024
    Publication date: November 7, 2024
    Inventors: Takehiro Seshimo, Ken Miyagi, Takahiro Dazai, Teruaki Hayakawa, Shinsuke Maekawa, Ryota Uehara
  • Publication number: 20240361686
    Abstract: A manufacturing method including applying a resin composition for forming an etching mask pattern onto a support to form a layer containing a block copolymer and having a film thickness of 25 nm or more, and phase-separating the layer. The resin composition contains a block copolymer having a first block and a second block, the first block is includes a constitutional unit having General Formula (b1), and the second block is a random copolymer of a constitutional unit of General Formula (b2m) and a constitutional unit of General Formula (b2g). In the formulas illustrated below, R1 is an alkyl group which may have an oxygen atom or a silicon atom; R2 is an alkyl group; R3 is an alkylene group; and x represents a molar ratio and is more than 0 and 0.
    Type: Application
    Filed: April 24, 2024
    Publication date: October 31, 2024
    Inventors: Takehiro Seshimo, Takahiro Dazai, Teruaki Hayakawa, Shinsuke Maekawa, Ryota Uehara
  • Publication number: 20240360267
    Abstract: A resin composition for forming an etching mask pattern, with which a phase-separated structure having a period (L0) of less than 20 nm and having excellent vertical orientation even when subjected to high-temperature annealing can be obtained; and a method for manufacturing an etching mask pattern. The method includes applying the resin composition onto a support to form a block copolymer layer having a film thickness of 25 nm or more and phase-separating the block copolymer layer. The resin composition contains a block copolymer having a first block and a second block, the first block includes a structure of General Formula (b1), and the second block consists of a block 2M of a structure of General Formula (b2m) and a block 2G of a structure of General Formula (b2g), and y/(y+z) is 0.01 or more and 0.
    Type: Application
    Filed: April 15, 2024
    Publication date: October 31, 2024
    Inventors: Takehiro SESHIMO, Takahiro DAZAI, Teruaki HAYAKAWA, Shinsuke MAEKAWA, Ryota UEHARA
  • Patent number: 12024579
    Abstract: A curable liquid composition containing a particulate filler and an epoxy compound having a non-aromatic cyclic group having 5 or more annular atoms, having a favorable dispersion stability of particulate filler and providing a cured material having high hardness, a filler that is suitably incorporated in the curable liquid composition, and a compound that can be suitably used as a ligand bonded to the filler. In a curable liquid composition comprising an epoxy compound having a non-aromatic cyclic group having 5 or more annular atoms as a curable component, a filler on a surface of which a ligand having an alicyclic epoxy group that may be condensed with an aromatic ring and a thiol group, is bonded, is used.
    Type: Grant
    Filed: December 7, 2021
    Date of Patent: July 2, 2024
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Kunihiro Noda, Tetsuo Fujinami, Takehiro Seshimo
  • Publication number: 20240158547
    Abstract: A composition for selectively modifying a base material having a surface having two or more regions made of materials that are different from each other and contains a polymer and a solvent, in which the polymer has at least one structure represented by Formula (1-1) at a terminal of a main chain thereof. In the formula, X represents NR1, O, S, or Te; R1 represents a hydrogen atom or a hydrocarbon group having 1 to 20 carbon atoms; A1 represents a monovalent substituent having substrate adsorbability at a terminal; and * represents a bonding site that is bonded to the main chain of the polymer *—X-A1??(1-1).
    Type: Application
    Filed: October 24, 2023
    Publication date: May 16, 2024
    Inventors: Takuya Uehara, Takehiro Seshimo
  • Patent number: 11912889
    Abstract: The present invention aims to provide: a novel silicon-containing polymer that is alkali soluble or is soluble in an alkaline aqueous solution by using heat, etc.; a film-forming composition including the silicon-containing polymer; a method for forming a silicon-containing polymer coating using the film-forming composition; a method for forming a silica coating using the film-forming composition; and a production method for the silicon-containing polymer. The silicon-containing polymer including at least either a polysiloxane chain or oligosiloxane chain or a polysilane chain or oligosilane chain in the molecular chain thereof has a group that has e.g., a carboxy or carboxylic acid ester group and a sulfide group, introduced to the molecular chain as a result of an ene-thiol reaction.
    Type: Grant
    Filed: May 13, 2020
    Date of Patent: February 27, 2024
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Kunihiro Noda, Takehiro Seshimo, Dai Shiota
  • Patent number: 11542397
    Abstract: The present invention provides: a liquid composition which can be suitably used for production of an optical film having a favorable fluorescence efficiency and includes quantum dots (A), a quantum dot-containing film obtained by drying and/or curing the liquid composition, an optical film for a light-emitting display element made of the quantum dot-containing film, a light-emitting display element panel including the optical film, and a light-emitting display equipped with the light-emitting display element panel. An ionic liquid (B), and a solvent (S) are incorporated into a liquid composition including quantum dots (A), in which the solvent (S) includes a solvent (S1), the solvent (S1) being a compound having a cyclic skeleton and including a heteroatom other than a hydrogen atom and a carbon atom.
    Type: Grant
    Filed: June 24, 2019
    Date of Patent: January 3, 2023
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Takehiro Seshimo, Kunihiro Noda, Dai Shiota
  • Publication number: 20220389308
    Abstract: The objective of the invention is to provide a wavelength conversion film demonstrating a high optical density, a wavelength conversion film forming composition used suitably for forming the wavelength conversion film, and a production method for a cluster-containing quantum dot that may be applied suitably to the wavelength conversion film and the wavelength conversion film forming composition. In this invention, for a wavelength conversion film containing a quantum dot converting blue light into red light or green light, the light beam transmittance of the wavelength conversion film at 450 nm wavelength is set to 40% or lower, the light beam transmittance of the wavelength conversion film at 650 nm wavelength is set to 90% or higher if the hue of the light beam after the wavelength conversion is red, and the light beam transmittance of the wavelength conversion film at 550 nm wavelength is set to 90% or higher if the hue of the light beam after the wavelength conversion is green.
    Type: Application
    Filed: July 10, 2020
    Publication date: December 8, 2022
    Inventors: YuehChun LIAO, Takehiro SESHIMO, Kunihiro NODA
  • Publication number: 20220220338
    Abstract: The present invention aims to provide: a novel silicon-containing polymer that is alkali soluble or is soluble in an alkaline aqueous solution by using heat, etc.; a film-forming composition including the silicon-containing polymer; a method for forming a silicon-containing polymer coating using the film-forming composition; a method for forming a silica coating using the film-forming composition; and a production method for the silicon-containing polymer. The silicon-containing polymer including at least either a polysiloxane chain or oligosiloxane chain or a polysilane chain or oligosilane chain in the molecular chain thereof has a group that has e.g., a carboxy or carboxylic acid ester group and a sulfide group, introduced to the molecular chain as a result of an ene-thiol reaction.
    Type: Application
    Filed: May 13, 2020
    Publication date: July 14, 2022
    Inventors: Kunihiro NODA, Takehiro SESHIMO, Dai SHIOTA
  • Publication number: 20220213348
    Abstract: Provided are: a novel silicon-containing polymer capable of supporting a metal compound including a metal element; a film-forming composition including the silicon-containing polymer; a method for forming a coating film on the surface of an object to be treated using the film forming composition, and supporting a metal compound on the surface of the object to be treated by bringing the metal compound into contact with the coating film; an article including a coating film which contains said silicon-containing polymer and supports a metal compound; and a method for producing said silicon-containing polymer. This silicon-containing polymer contains, in a molecular chain, at least one among a polysiloxane chain or an oligosiloxane chain, and a polysilane chain or an oligosilane chain, wherein a cyano group-containing hydrocarbon group having 1-10 carbon atoms is introduced onto a silicon atom.
    Type: Application
    Filed: April 30, 2020
    Publication date: July 7, 2022
    Inventors: Kunihiro NODA, Atsushi YAMANOUCHI, Takehiro SESHIMO, Dai SHIOTA
  • Patent number: 11377522
    Abstract: A silicon-containing polymer which results in a composition that forms a coated film having good adhesive properties to a substrate and does not easily peel off the substrate, a film-forming composition including the polymer, a method for forming a silicon-containing polymer coating using the composition, a method for forming a silica-based coating using the composition, and a production method for the polymer. In a silicon-containing polymer including at least one of poly- or oligo-siloxane chain and poly- or oligo-silane chain in a molecular chain, a group having a silyl group and a sulfide group, which can be subjected to a condensation reaction, is introduced into the molecular chain, for example, by an ene-thiol reaction.
    Type: Grant
    Filed: May 11, 2020
    Date of Patent: July 5, 2022
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Kunihiro Noda, Takehiro Seshimo, Keisuke Kubo, Yohei Kinoshita
  • Publication number: 20220195097
    Abstract: A curable liquid composition containing a particulate filler and an epoxy compound having a non-aromatic cyclic group having 5 or more annular atoms, having a favorable dispersion stability of particulate filler and providing a cured material having high hardness, a filler that is suitably incorporated in the curable liquid composition, and a compound that can be suitably used as a ligand bonded to the filler. In a curable liquid composition comprising an epoxy compound having a non-aromatic cyclic group having 5 or more annular atoms as a curable component, a filler on a surface of which a ligand having an alicyclic epoxy group that may be condensed with an aromatic ring and a thiol group, is bonded, is used.
    Type: Application
    Filed: December 7, 2021
    Publication date: June 23, 2022
    Inventors: Kunihiro NODA, Tetsuo FUJINAMI, Takehiro SESHIMO
  • Publication number: 20220073815
    Abstract: Provided are: a method for producing a quantum dot dispersion enabling formation of a substrate having quantum dots or a film comprising quantum dots which exhibits desired quantum dots, when the quantum dot dispersion is used for dispersing quantum dots on a surface of the substrate or preparing a composition for producing the film containing quantum dots, and a quantum dot dispersion that can be suitably produced by the above method. The quantum dot dispersion is produced by using quantum dots containing chalcogenide as a material of surface and dispersing the quantum dots (A) in the dispersion medium (B) comprising an organic solvent (B1) comprising a chalcogen element.
    Type: Application
    Filed: December 24, 2019
    Publication date: March 10, 2022
    Inventors: Yueh Chun LIAO, Takehiro SESHIMO, Kunihiro NODA
  • Publication number: 20220073817
    Abstract: Provided are: a method for producing a quantum dot-containing film enabling formation of a quantum dot-containing film exhibiting desired quantum yield; and a composition for producing a quantum dot-containing film suitably used for the method. In a method for producing a quantum dot-containing film using a composition including quantum dots (A) containing a chalcogenide as a surface material, a base component (C), and a solvent (S), a heating step to heat a quantum dot-containing film in an atmosphere with a lower oxygen concentration than air is conducted.
    Type: Application
    Filed: December 24, 2019
    Publication date: March 10, 2022
    Inventors: Yueh Chun LIAO, Takehiro SESHIMO, Kunihiro NODA
  • Patent number: 11261299
    Abstract: A block copolymer including a first block consisting of a polymer having a repeating structure of a structural unit (u1) containing no silicon atom, and a second block consisting of a polymer having a repeating structure of a structural unit (u2) containing a silicon atom, the second block containing a block (b21) consisting of a polymer having a repeating structure represented by general formula (u2-1), and a block (b22) consisting of a polymer having a repeating structure of a structural unit (u22) containing a silicon atom, and the block (b22) is positioned between the first block and the block (b21) (wherein RP211 represents an alkyl group, a halogenated alkyl group, a hydrogen atom, or an organic group having a polar group; and RP212 represents an organic group having a polar group).
    Type: Grant
    Filed: February 26, 2019
    Date of Patent: March 1, 2022
    Assignees: Tokyo Ohka Kogyo Co., Ltd., Tokyo Institute of Technology
    Inventors: Akiyoshi Yamazaki, Daisuke Kawana, Takehiro Seshimo, Teruaki Hayakawa, Lei Dong, Rin Odashima
  • Patent number: 11222781
    Abstract: A method includes contacting an organic cured film with an acidic cleaning liquid including sulfuric acid and a water-soluble organic solvent and does not include a compound capable of generating nitronium ions. An amount of the sulfuric acid in the acidic cleaning liquid is 40% by mass or more, and an amount of water in the acidic cleaning liquid is 5% by mass or less.
    Type: Grant
    Filed: December 26, 2018
    Date of Patent: January 11, 2022
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Isao Hirano, Takehiro Seshimo, TseWei Yu, YaChien Chuang
  • Publication number: 20210309866
    Abstract: The present invention provides: a liquid composition which can be suitably used for production of an optical film having a favorable fluorescence efficiency and includes quantum dots (A), a quantum dot-containing film obtained by drying and/or curing the liquid composition, an optical film for a light-emitting display element made of the quantum dot-containing film, a light-emitting display element panel including the optical film, and a light-emitting display equipped with the light-emitting display element panel. An ionic liquid (B), and a solvent (S) are incorporated into a liquid composition including quantum dots (A), in which the solvent (S) includes a solvent (S1), the solvent (S1) being a compound having a cyclic skeleton and including a heteroatom other than a hydrogen atom and a carbon atom.
    Type: Application
    Filed: June 24, 2019
    Publication date: October 7, 2021
    Inventors: Takehiro SESHIMO, Kunihiro NODA, Dai SHIOTA
  • Patent number: 10941253
    Abstract: A block copolymer including a first block and a second block, the first block consisting of a polymer (P1) having a repeating structure of a structural unit (u1) containing in a side chain thereof a hyperbranched structure containing a silicon atom.
    Type: Grant
    Filed: February 13, 2018
    Date of Patent: March 9, 2021
    Assignees: Tokyo Ohka Kogyo Co., Ltd., Tokyo Institute of Technology
    Inventors: Teruaki Hayakawa, Seina Yamazaki, Rin Odashima, Takehiro Seshimo, Daisuke Kawana, Akiyoshi Yamazaki
  • Publication number: 20210055457
    Abstract: A color filter manufacturing method that forms low refractive index partition walls using a material easily removable by asking without the need to use fluororesin as a partition wall material; a color filter as a product by such a color filter manufacturing method; and a resin composition suitable for use in such a color filter manufacturing method. The method includes forming partition walls using a bubble-containing resin or resin composition containing bubbles, or the like, and having an inorganic content of 5% by mass or less.
    Type: Application
    Filed: August 3, 2020
    Publication date: February 25, 2021
    Inventors: Takehiro Seshimo, Hiroaki Takeuchi, Tomoyuki Inoue
  • Publication number: 20200407545
    Abstract: A curable resin composition capable of achieving a low refractive material having high solvent resistance. The curable resin composition includes a resin having two types of specific structural units, hollow particles including a shell portion made of a resin, and an organic solvent. The average particle diameter of the hollow particles may be 20 nm or more and 300 nm or less. The content rate of the resin in total solid content in the curable resin composition may be 30% by mass or more and 90% by mass or less.
    Type: Application
    Filed: June 9, 2020
    Publication date: December 31, 2020
    Inventors: Takehiro SESHIMO, Hiroaki TAKEUCHI, Tomoyuki INOUE