Patents by Inventor Takehiro Suga

Takehiro Suga has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11866564
    Abstract: The present invention is a polymer substrate with a hard coat layer, which is obtained by directly laminating a polymer substrate, a base cured layer and a silicon oxide layer, wherein the base cured layer has a thickness of 1-20 ?m and contains 10-90 parts by weight of a polyfunctional acrylate and 90-10 parts by weight of inorganic oxide fine particles and/or a hydrolytic condensation product of a silicon compound or contains a hydrolytic condensation product of an organic silicon compound as a primary component, and the silicon oxide layer satisfies requirement (a1) below at a position 0.04 ?m in the thickness direction from the interface between the base cured layer and the silicon oxide layer and satisfies requirement (a3) below at the surface of the silicon oxide layer on the opposite side from the interface, Requirement (a1): when the chemical composition is represented by SiOxCyHz, x falls within the range 1.93-1.98, y falls within the range 0.04-0.15 and z falls within the range 0.10-0.50.
    Type: Grant
    Filed: March 28, 2018
    Date of Patent: January 9, 2024
    Assignees: TEIJIN LIMITED, TSUKISHIMA KIKAI CO., LTD.
    Inventors: Tatsuya Ekinaka, Tatsuichirou Kon, Hiroshi Kishimoto, Yume Takeda, Takehiro Suga, Satoshi Ogata, Masato Nakagomi
  • Patent number: 11028284
    Abstract: The present invention provides a polymer substrate with a hardcoat layer exhibiting excellent environmental resistance and wear resistance. A polymer substrate (60) is 1-20 mm thick and a hardcoat layer (70, 80) on the surface thereof comprises: an underlayer cured layer (70) with a thickness of 1-20 ?m, and including 10-90 parts by weight of a multifunctional acrylate, and 90-10 parts by weight of inorganic oxide fine particles and/or a silicon compound hydrolytic condensate; and a silicon oxide layer (80) which is in direct contract with the underlayer cured layer, is formed by PE-CVD with an organosilicon compound as the starter material, and satisfies all of the following conditions (a)-(c): (a) the film thickness of the silicon oxide layer is 3.5-9.0 ?m; (b) the maximum indentation depth of the surface of the silicon oxide layer by nanoindentation measurement at a maximum load of 1 mN is 150 nm or less; and (c) the limit compression ratio K of the silicon oxide layer is at most 0.
    Type: Grant
    Filed: September 23, 2016
    Date of Patent: June 8, 2021
    Assignees: TEIJIN LIMITED, TSUKISHIMA KIKAI CO., LTD.
    Inventors: Tatsuya Ekinaka, Tatsuichirou Kon, Takehiro Suga, Hiroshi Kishimoto, Yume Morita, Satoshi Ogata, Masato Nakagomi
  • Publication number: 20200377682
    Abstract: The present invention is a polymer substrate with a hard coat layer, which is obtained by directly laminating a polymer substrate, a base cured layer and a silicon oxide layer, wherein the base cured layer has a thickness of 1-20 ?m and contains 10-90 parts by weight of a polyfunctional acrylate and 90-10 parts by weight of inorganic oxide fine particles and/or a hydrolytic condensation product of a silicon compound or contains a hydrolytic condensation product of an organic silicon compound as a primary component, and the silicon oxide layer satisfies requirement (a1) below at a position 0.04 ?m in the thickness direction from the interface between the base cured layer and the silicon oxide layer and satisfies requirement (a3) below at the surface of the silicon oxide layer on the opposite side from the interface, Requirement (a1): when the chemical composition is represented by SiOxCyHz, x falls within the range 1.93-1.98, y falls within the range 0.04-0.15 and z falls within the range 0.10-0.50.
    Type: Application
    Filed: March 28, 2018
    Publication date: December 3, 2020
    Applicants: TEIJIN LIMITED, TSUKISHIMA KIKAI CO., LTD.
    Inventors: Tatsuya EKINAKA, Tatsuichirou KON, Hiroshi KISHIMOTO, Yume TAKEDA, Takehiro SUGA, Satoshi OGATA, Masato NAKAGOMI
  • Patent number: 10280272
    Abstract: A laminate having excellent abrasion resistance to physical stimuli such as dust. The laminate comprises a base layer, a hard coat layer and a top coat layer comprising flaky metal oxide fine particles all of which are formed in this order. The flaky metal oxide fine particles are hardened by at least one method selected from the group consisting of ionizing material exposure, ionizing radiation exposure, infrared exposure, microwave exposure and high-temperature vapor exposure.
    Type: Grant
    Filed: February 20, 2013
    Date of Patent: May 7, 2019
    Assignee: TEIJIN LIMITED
    Inventors: Tatsuya Ekinaka, Takehiro Suga, Toshio Kita, Ryo Niimi, Yuta Toyoshima, Tetsuya Shichi, Daisuke Yoshioka, Makoto Yamashita, Sohei Okazaki, Yuji Kaneko
  • Publication number: 20180265731
    Abstract: The present invention provides a polymer substrate with a hardcoat layer exhibiting excellent environmental resistance and wear resistance. A polymer substrate (60) is 1-20 mm thick and a hardcoat layer (70, 80) on the surface thereof comprises: an underlayer cured layer (70) with a thickness of 1-20 ?m, and including 10-90 parts by weight of a multifunctional acrylate, and 90-10 parts by weight of inorganic oxide fine particles and/or a silicon compound hydrolytic condensate; and a silicon oxide layer (80) which is in direct contract with the underlayer cured layer, is formed by PE-CVD with an organosilicon compound as the starter material, and satisfies all of the following conditions (a)-(c): (a) the film thickness of the silicon oxide layer is 3.5-9.0 ?m; (b) the maximum indentation depth of the surface of the silicon oxide layer by nanoindentation measurement at a maximum load of 1 mN is 150 nm or less; and (c) the limit compression ratio K of the silicon oxide layer is at most 0.
    Type: Application
    Filed: September 23, 2016
    Publication date: September 20, 2018
    Applicants: TEIJIN LIMITED, TSUKISHIMA KIKAI CO., LTD.
    Inventors: Tatsuya EKINAKA, Tatsuichirou KON, Takehiro SUGA, Hiroshi KISHIMOTO, Yume MORITA, Satoshi OGATA, Masato NAKAGOMI
  • Patent number: 9758630
    Abstract: The present invention realizes a polymer substrate with hard coating layer comprising a high level of environmental resistance and a high level of abrasion resistance. A polymer substrate with hard coating layer is provided that comprises a polymer substrate (60) having a thickness of 1 mm to 20 mm and a hard coating layer (70,80) on the surface thereof. Here, in this polymer substrate with hard coating layer, the hard coating layer (70,80) is laminated on the surface of the polymer substrate, contains as a main component thereof a hydrolysis-condensation product of an organic silicon compound, has a thickness of 0.1 ?m to 20 ?m, makes direct contact with a cured underlayer on the opposite side of the polymer substrate, is formed from an organic silicon compound by PE-CVD, and satisfies all of the following requirements (a) to (c): (a) film thickness of the silicon oxide layer is within the range of 3.5 ?m to 9.
    Type: Grant
    Filed: March 27, 2015
    Date of Patent: September 12, 2017
    Assignees: TEIJIN LIMITED, TSUKISHIMA KIKAI CO., LTD.
    Inventors: Tatsuichirou Kon, Tatsuya Ekinaka, Hiroshi Kishimoto, Yume Morita, Takehiro Suga, Satoshi Ogata, Masato Nakagomi
  • Publication number: 20170107345
    Abstract: The present invention realizes a polymer substrate with hard coating layer comprising a high level of environmental resistance and a high level of abrasion resistance. A polymer substrate with hard coating layer is provided that comprises a polymer substrate (60) having a thickness of 1 mm to 20 mm and a hard coating layer (70,80) on the surface thereof. Here, in this polymer substrate with hard coating layer, the hard coating layer (70,80) is laminated on the surface of the polymer substrate, contains as a main component thereof a hydrolysis-condensation product of an organic silicon compound, has a thickness of 0.1 ?m to 20 ?m, makes direct contact with a cured underlayer on the opposite side of the polymer substrate, is formed from an organic silicon compound by PE-CVD, and satisfies all of the following requirements (a) to (c): (a) film thickness of the silicon oxide layer is within the range of 3.5 ?m to 9.
    Type: Application
    Filed: March 27, 2015
    Publication date: April 20, 2017
    Applicants: TEIJIN LIMITED, TSUKISHIMA KIKAI CO., LTD.
    Inventors: Tatsuichirou KON, Tatsuya EKINAKA, Hiroshi KISHIMOTO, Yume MORITA, Takehiro SUGA, Satoshi OGATA, Masato NAKAGOMI
  • Patent number: 9296143
    Abstract: It is an object of the present invention to provide a process capable of manufacturing various types of curved members having a high-grade design surface which are used as glazing members for means of transport such as automobiles at a low cost. The present invention is the process of manufacturing a curved member having a high-grade design surface, comprises the steps of: (1) preparing a sheet having a high-grade design surface by injection compression molding a resin material containing a thermoplastic resin; (2) preheating the sheet at a temperature of (Tg+5)° C. to (Tg+70)° C. (Tg(° C.) is the glass transition temperature of the resin material) to soften it; and (3) applying pressure to the softened sheet to curve the high-grade design surface.
    Type: Grant
    Filed: October 15, 2010
    Date of Patent: March 29, 2016
    Assignee: TEIJIN CHEMICALS, LTD.
    Inventors: Keiichi Kashima, Takehiro Suga, Junichi Miura, Ryo Niimi, Toshiaki Hotaka
  • Publication number: 20150037566
    Abstract: A laminate having excellent abrasion resistance to physical stimuli such as dust. The laminate comprises a base layer, a hard coat layer and a top coat layer containing flaky metal oxide fine particles all of which are formed in the mentioned order. The flaky metal oxide fine particles are hardened by at least one method selected from the group consisting of ionizing material exposure, ionizing radiation exposure, infrared exposure, microwave exposure and high-temperature vapor exposure.
    Type: Application
    Filed: February 20, 2013
    Publication date: February 5, 2015
    Applicant: CENTRAL JAPAN RAILWAY COMPANY
    Inventors: Tatsuya Ekinaka, Takehiro Suga, Toshio Kita, Ryo Nimi, Yuta Toyoshima, Tetsuya Shichi, Daisuke Yoshioka, Makoto Yamashita, Sohei Okazaki, Yuji Kaneko
  • Patent number: 8859099
    Abstract: A laminate having excellent weatherability and abrasion resistance as well as adhesion. The laminate comprises a base, a first layer formed by thermally curing an acrylic resin composition and a second layer formed by thermally curing an organosiloxane resin composition, all of which are formed in the mentioned order, wherein the acrylic resin composition comprises: (A) an acrylic copolymer which contains at least 70 mol % of a recurring unit represented by the following formula (A): wherein X is a hydrogen atom or methyl group, and Y is a methyl group, ethyl group, cycloalkyl group, hydroxyalkyl group having 2 to 5 carbon atoms or triazine-based ultraviolet absorber residue; (B) a blocked polyisocyanate compound; (C) a curing catalyst; and (D) a triazine-based ultraviolet absorber, and the organosiloxane resin composition comprises: (E) colloidal silica and (F) a hydrolysis condensate of an alkoxysilane.
    Type: Grant
    Filed: February 8, 2013
    Date of Patent: October 14, 2014
    Assignee: Teijin Chemicals, Ltd.
    Inventors: Toshio Kita, Shunsuke Kajiwara, Ryou Niimi, Takehiro Suga, Tatsuya Ekinaka, Nobuaki Takaoka
  • Patent number: 8765891
    Abstract: It is an object of the present invention to provide a laminate having excellent weatherability and abrasion resistance as well as adhesion. The present invention relates to a laminate comprising a base, a first layer formed by thermally curing an acrylic resin composition and a second layer formed by thermally curing an organosiloxane resin composition, all of which are formed in the mentioned order, wherein the acrylic resin composition comprises: (A) an acrylic copolymer which contains at least 70 mol % of a recurring unit represented by the following formula (A): wherein X is a hydrogen atom or methyl group, and Y is a methyl group, ethyl group, cycloalkyl group, hydroxyalkyl group having 2 to 5 carbon atoms or triazine-based ultraviolet absorber residue; (B) a blocked polyisocyanate compound; (C) a curing catalyst; and (D) a triazine-based ultraviolet absorber, and the organosiloxane resin composition comprises: (E) colloidal silica and (F) a hydrolysis condensate of an alkoxysilane.
    Type: Grant
    Filed: February 8, 2013
    Date of Patent: July 1, 2014
    Assignee: Teijin Chemicals, Ltd.
    Inventors: Toshio Kita, Shunsuke Kajiwara, Ryou Niimi, Takehiro Suga, Tatsuya Ekinaka, Nobuaki Takaoka
  • Patent number: 8404349
    Abstract: It is an object of the present invention to provide a laminate having excellent weatherability and abrasion resistance as well as adhesion. The present invention relates to a laminate comprising a base, a first layer formed by thermally curing an acrylic resin composition and a second layer formed by thermally curing an organosiloxane resin composition, all of which are formed in the mentioned order, wherein the acrylic resin composition comprises: (A) an acrylic copolymer which contains at least 70 mol % of a recurring unit represented by the following formula (A): wherein X is a hydrogen atom or methyl group, and Y is a methyl group, ethyl group, cycloalkyl group, hydroxyalkyl group having 2 to 5 carbon atoms or triazine-based ultraviolet absorber residue; (B) a blocked polyisocyanate compound; (C) a curing catalyst; and (D) a triazine-based ultraviolet absorber, and the organosiloxane resin composition comprises: (E) colloidal silica and (F) a hydrolysis condensate of an alkoxysilane.
    Type: Grant
    Filed: March 7, 2007
    Date of Patent: March 26, 2013
    Assignee: Teijin Chemicals, Ltd.
    Inventors: Toshio Kita, Shunsuke Kajiwara, Ryou Niimi, Takehiro Suga, Tatsuya Ekinaka, Nobuaki Takaoka
  • Publication number: 20120225241
    Abstract: It is an object of the present invention to provide a process capable of manufacturing various types of curved members having a high-grade design surface which are used as glazing members for means of transport such as automobiles at a low cost. The present invention is the process of manufacturing a curved member having a high-grade design surface, comprises the steps of: (1) preparing a sheet having a high-grade design surface by injection compression molding a resin material containing a thermoplastic resin; (2) preheating the sheet at a temperature of (Tg+5)° C. to (Tg+70)° C. (Tg(° C.) is the glass transition temperature of the resin material) to soften it; and (3) applying pressure to the softened sheet to curve the high-grade design surface.
    Type: Application
    Filed: October 15, 2010
    Publication date: September 6, 2012
    Inventors: Keiichi Kashima, Takehiro Suga, Junichi Miura, Ryo Niimi, Toshiaki Hotaka
  • Publication number: 20090104447
    Abstract: It is an object of the present invention to provide a laminate having excellent weatherability and abrasion resistance as well as adhesion. The present invention relates to a laminate comprising a base, a first layer formed by thermally curing an acrylic resin composition and a second layer formed by thermally curing an organosiloxane resin composition, all of which are formed in the mentioned order, wherein the acrylic resin composition comprises: (A) an acrylic copolymer which contains at least 70 mol % of a recurring unit represented by the following formula (A): wherein X is a hydrogen atom or methyl group, and Y is a methyl group, ethyl group, cycloalkyl group, hydroxyalkyl group having 2 to 5 carbon atoms or triazine-based ultraviolet absorber residue; (B) a blocked polyisocyanate compound; (C) a curing catalyst; and (D) a triazine-based ultraviolet absorber, and the organosiloxane resin composition comprises: (E) colloidal silica and (F) a hydrolysis condensate of an alkoxysilane.
    Type: Application
    Filed: March 7, 2007
    Publication date: April 23, 2009
    Inventors: Toshio Kita, Shunsuke Kajiwara, Ryou Niimi, Takehiro Suga, Tatsuya Ekinaka, Nobuaki Takaoka
  • Patent number: 7070859
    Abstract: A laminate which is excellent in appearance, adhesion, scratch resistance, abrasion resistance and hot water resistance and has a high level of weatherability and excellent durability, and an acrylic resin composition and an organosiloxane resin composition both of which can be used for the manufacture of the above laminate and have excellent storage stability. The laminate comprises a polycarbonate substrate, a first layer formed on the surface of the polycarbonate substrate, and a second layer formed on the surface of the first layer, wherein the first layer is composed of a crosslinked acrylic copolymer and an ultraviolet light absorber, and the second layer is composed of a crosslinked organosiloxane polymer; and the crosslinked acrylic copolymer comprises specific recurring units and an urethane bond in a specific ratio, and the organosiloxane polymer has a specific structure composed of colloidal silica and alkoxysilanes.
    Type: Grant
    Filed: June 20, 2003
    Date of Patent: July 4, 2006
    Assignee: Teijin Chemicals, Ltd.
    Inventors: Yoshihiko Imanaka, Shunsuke Kajiwara, Tatsuya Ekinaka, Toshio Kita, Takehiro Suga, Ryou Niimi, Isao Sogou
  • Publication number: 20040247878
    Abstract: A laminate which is excellent in appearance, adhesion, scratch resistance, abrasion resistance and hot water resistance and has a high level of weatherability and excellent durability, and an acrylic resin composition and an organosiloxane resin composition both of which can be used for the manufacture of the above laminate and have excellent storage stability.
    Type: Application
    Filed: February 19, 2004
    Publication date: December 9, 2004
    Inventors: Yoshihiko Imanaka, Shunsuke Kajiwara, Tatsuya Ekinaka, Toshio Kita, Takehiro Suga, Ryou Niimi, Isao Sogou