Patents by Inventor Takehiro Yoshida

Takehiro Yoshida has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240368804
    Abstract: A method of making a semiconductor including a step of preparing a base substrate; a first step of epitaxially growing a single crystal of a group III nitride semiconductor having a top surface with (0001) plane exposed, directly on the main surface of the base substrate, forming a plurality of concaves composed of inclined interfaces other than the (0001) plane on the top surface, gradually expanding the inclined interfaces toward an upper side of the main surface of the base substrate, making the (0001) plane disappear from the top surface, and growing a first layer whose surface is composed only of the inclined interfaces; and a second step of epitaxially growing a single crystal of a group III nitride semiconductor on the first layer, making the inclined interfaces disappear, and growing a second layer having a mirror surface, and a semiconductor made thereby.
    Type: Application
    Filed: July 15, 2024
    Publication date: November 7, 2024
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventor: Takehiro YOSHIDA
  • Publication number: 20240319502
    Abstract: A wearable device that is usable in a plurality of usage forms which has a notification unit that notifies a user of information indicating a recommended usage form out of the plurality of usage forms. the information being determined based on information relating to an external environment.
    Type: Application
    Filed: June 3, 2024
    Publication date: September 26, 2024
    Inventors: Takehiro Yoshida, Sanae Yamaguchi
  • Patent number: 12091774
    Abstract: A nitride semiconductor substrate that is constituted by a single crystal of a group III nitride semiconductor and includes a main surface for which the closest low index crystal plane is a (0001) plane includes an inclined interface growth region that has grown with inclined interfaces other than the (0001) plane serving as growth surfaces. A ratio of an area occupied by the inclined interface growth region in the main surface is 80% or more. When a dislocation density is determined based on a dark spot density by observing the main surface in a field of view that is 250 ?m square using a multiphoton excitation microscope, the main surface does not include a region that has a dislocation density higher than 3×106 cm?2, and the main surface includes dislocation-free regions that are 50 ?m square and do not overlap each other, at a density of 100 regions/cm2 or more.
    Type: Grant
    Filed: January 23, 2020
    Date of Patent: September 17, 2024
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventor: Takehiro Yoshida
  • Publication number: 20240302302
    Abstract: A nitride semiconductor substrate that has a diameter of 2 inches or more and includes a main surface for which the closest low index crystal plane is a (0001) plane. The ratio of FWHM1{10-12} to FWHM2{10-12} is 80% or more.
    Type: Application
    Filed: October 9, 2020
    Publication date: September 12, 2024
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventor: Takehiro YOSHIDA
  • Patent number: 12083880
    Abstract: An accelerator device includes at least one drive source, a pedal lever, and a power transmission mechanism. The pedal lever is configured to move according to a pedal depressing operation. The power transmission mechanism is configured to transmit force both in the pedal lever's closing direction and opening direction to the pedal lever by driving of the drive source.
    Type: Grant
    Filed: September 9, 2022
    Date of Patent: September 10, 2024
    Assignee: DENSO CORPORATION
    Inventors: Takuto Kita, Tetsuo Hariu, Kiyoshi Kimura, Takehiro Saitoh, Hideyuki Mori, Souichi Kinouchi, Yuusuke Yoshida
  • Patent number: 12071707
    Abstract: A method of making a semiconductor including a step of preparing a base substrate; a first step of epitaxially growing a single crystal of a group III nitride semiconductor having a top surface with (0001) plane exposed, directly on the main surface of the base substrate, forming a plurality of concaves composed of inclined interfaces other than the (0001) plane on the top surface, gradually expanding the inclined interfaces toward an upper side of the main surface of the base substrate, making the (0001) plane disappear from the top surface, and growing a first layer whose surface is composed only of the inclined interfaces; and a second step of epitaxially growing a single crystal of a group III nitride semiconductor on the first layer, making the inclined interfaces disappear, and growing a second layer having a mirror surface, and a semiconductor made thereby.
    Type: Grant
    Filed: August 22, 2019
    Date of Patent: August 27, 2024
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventor: Takehiro Yoshida
  • Publication number: 20240259540
    Abstract: The present invention provides an image display system in which images can be displayed at at least a predetermined framerate even with limited processor performance. The image display system having a head-mounted display capable of displaying a three-dimensional image, the image display system includes a selection unit for selecting a viewing object desired by a viewer from the three-dimensional image, a detection unit for detecting a part to view corresponding to the viewing object selected by the selection unit, and a resolution increasing unit for increasing a resolution of the part to view that has been detected, wherein the head-mounted display displays the three-dimensional image in which the resolution of the part to view has been increased at at least a predetermined framerate.
    Type: Application
    Filed: April 10, 2024
    Publication date: August 1, 2024
    Inventors: Takehiro Yoshida, HIROHITO KAI, NOBUYOSHI SUZUKI, Hiroshi Atobe
  • Patent number: 12032163
    Abstract: A wearable device that is usable in a plurality of usage forms which has a notification unit that notifies a user of information indicating a recommended usage form out of the plurality of usage forms, the information being determined based on information relating to an external environment.
    Type: Grant
    Filed: November 29, 2022
    Date of Patent: July 9, 2024
    Assignee: Canon Kabushiki Kaisha
    Inventors: Takehiro Yoshida, Sanae Yamaguchi
  • Patent number: 11970784
    Abstract: There is provided a nitride semiconductor substrate having a diameter of 2 inches or more and having a main surface whose closest low index crystal plane is a (0001) plane, wherein X-ray locking curve measurement for (0002) plane diffraction, which is performed to the main surface by irradiating with (Cu) K?1 X-rays through a two-crystal monochromator of Ge (220) plane and a slit, reveals that full width at half maximum FWHMb is 32 arcsec or less, and FWHMa?FWHMb obtained by subtracting FWHMb from FWHMa is 30% or less of FWHMa, wherein FWHMa is full width at half maximum of the (0002) plane diffraction when a slit width in ? direction is 1 mm, and FWHMb is full width at half maximum of the (0002) plane diffraction when a slit width in ? direction is 0.1 mm.
    Type: Grant
    Filed: August 22, 2019
    Date of Patent: April 30, 2024
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventor: Takehiro Yoshida
  • Patent number: 11967617
    Abstract: A nitride semiconductor substrate including a group III nitride semiconductor crystal and having a main surface, wherein a low index crystal plane is (0001) plane curved in a concave spherical shape to the main surface, and the off-angle (?m, ?a) at a position (x, y) in the main surface approximated by x representing a coordinate in a direction along <1-100> axis, y is a coordinate in a direction along <11-20> axis, (0, 0) represents a coordinate (x, y) of the center, ?m represents a direction component along <1-100> axis in an off-angle of <0001> axis with respect to a normal, ?a represents a direction component along <11-20> axis in the off-angle, (M1, A1) represents a rate of change in the off-angle (?m, ?a) with respect to the position (x, y) in the main surface, and (M2, A2) represents the off-angle (?m, ?a) at the center.
    Type: Grant
    Filed: August 8, 2018
    Date of Patent: April 23, 2024
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Fumimasa Horikiri, Takehiro Yoshida
  • Patent number: 11908688
    Abstract: A method for manufacturing a nitride semiconductor substrate, including: a step of preparing a base substrate; a step of forming a mask layer having a plurality of openings on the main surface of the base substrate; a first step of growing a first layer whose surface is composed only of inclined interfaces; and a second step of epitaxially growing a single crystal of a group III nitride semiconductor on the first layer, making the inclined interfaces disappear, and growing a second layer having a mirror surface, wherein in the first step, at least one valley and a plurality of tops are formed at an upper side of each of the plurality of openings of the mask layer by forming a plurality of concaves on a top surface of the single crystal and making the (0001) plane disappear.
    Type: Grant
    Filed: August 22, 2019
    Date of Patent: February 20, 2024
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventor: Takehiro Yoshida
  • Patent number: 11873578
    Abstract: A method for manufacturing a nitride semiconductor substrate by using a vapor phase growth method includes: a step of preparing a base substrate that is constituted by a material different from a single crystal of a group III nitride semiconductor; a step of growing a base layer on the upper side of the base substrate; a first step of growing a first layer by epitaxially growing a single crystal of a group III nitride semiconductor directly on the base surface of the base layer, the single crystal of the group III nitride semiconductor having a top surface at which a (0001) plane is exposed, and a plurality of recessed portions formed by inclined interfaces other than the (0001) plane being generated in the top surface; and a second step of growing a second layer that has a mirror-finished surface.
    Type: Grant
    Filed: November 29, 2019
    Date of Patent: January 16, 2024
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventor: Takehiro Yoshida
  • Patent number: 11718927
    Abstract: There is provided a method of manufacturing a crystal substrate, including: preparing a first crystal body which is a substrate comprising a single crystal of group III nitride produced by a vapor phase method and having a first main surface, and in which c-plane of the single crystal is curved in a concave spherical shape with a predetermined curvature; and growing a second crystal body comprising a single crystal of group III nitride on the first main surface, in a mixed melt containing an alkali metal and a group III element.
    Type: Grant
    Filed: March 14, 2019
    Date of Patent: August 8, 2023
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Takehiro Yoshida, Masatomo Shibata, Seiji Sarayama, Takashi Sato, Naoya Miyoshi, Akishige Murakami
  • Patent number: 11706396
    Abstract: An image processing apparatus that performs processing concerning the display of a stereoscopic image so as to improve the convenience of a user in viewing a stereoscopic image. A head mount display displays a stereoscopic image using image data including a plurality of images having different viewpoints. The image data is processed based on metadata attached to the image data. In a case where information indicating that the image data is associated with a file format which cannot cause the head mount display to perform display is included in the metadata, the image data is converted into a file format which can cause the head mount display to perform display.
    Type: Grant
    Filed: September 6, 2021
    Date of Patent: July 18, 2023
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Takehiro Yoshida, Takumi Uehara, Hiroki Ito, Kunihiro Shirai, Takuma Mikawa, Hiroshi Atobe
  • Publication number: 20230168505
    Abstract: A wearable device that is usable in a plurality of usage forms which has a notification unit that notifies a user of information indicating a recommended usage form out of the plurality of usage forms, the information being determined based on information relating to an external environment.
    Type: Application
    Filed: November 29, 2022
    Publication date: June 1, 2023
    Inventors: Takehiro Yoshida, Sanae Yamaguchi
  • Patent number: 11640906
    Abstract: Provided is a crystal laminate including: a crystal substrate formed from a monocrystal of group III nitride expressed by a compositional formula InxAlyGa1-x-yN (where 0?x?1, 0?y?1, 0?x+y?1), the crystal substrate containing at least any one of n-type impurity selected from the group consisting of Si, Ge, and O; and a crystal layer formed by a group III nitride crystal epitaxially grown on a main surface of the crystal substrate, at least any one of p-type impurity selected from the group consisting of C, Mg, Fe, Be, Zn, V, and Sb being ion-implanted in the crystal layer. The crystal laminate is configured in a manner such that an absorption coefficient of the crystal substrate for light with a wavelength of 2000 nm when the crystal substrate is irradiated with the light falls within a range of 1.8 cm?1 or more and 4.6 cm?1 or less under a temperature condition of normal temperature.
    Type: Grant
    Filed: April 19, 2018
    Date of Patent: May 2, 2023
    Assignees: SUMITOMO CHEMICAL COMPANY, LIMITED, HOSEI UNIVERSITY
    Inventors: Fumimasa Horikiri, Takehiro Yoshida, Tomoyoshi Mishima
  • Patent number: 11339500
    Abstract: There is provided a nitride crystal substrate comprising group-III nitride crystal and containing n-type impurities, wherein an absorption coefficient ? is approximately expressed by equation (1) in a wavelength range of at least 1 ?m or more and 3.3 ?m or less: ?=n K?a (1) (wherein, ?(?m) is a wavelength, ?(cm?1) is absorption coefficient of the nitride crystal substrate at 27° C., n (cm?3) is a free electron concentration in the nitride crystal substrate, and K and a are constants, satisfying 1.5×10?19?K?6.0×10?19, a=3).
    Type: Grant
    Filed: April 19, 2018
    Date of Patent: May 24, 2022
    Assignees: SCIOCS COMPANY LIMITED, SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Fumimasa Horikiri, Takehiro Yoshida
  • Patent number: 11339053
    Abstract: An object of the present invention is to improve quality of a nitride crystal, and also improve performance and manufacturing yield of a semiconductor device manufactured using the crystal. Provided is a nitride crystal in which a composition formula is represented by InxAlyGa1-x-yN (satisfying 0?x?1, 0?y?1, 0?x+y?1), and the concentration of B in the crystal is less than 1×1015 at/cm3, and each of the concentrations of O and C in the crystal is less than 1×1015 at/cm3 in a region of 60% or more of a main surface.
    Type: Grant
    Filed: July 29, 2019
    Date of Patent: May 24, 2022
    Assignees: SCIOCS COMPANY LIMITED, SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Hajime Fujikura, Taichiro Konno, Takehiro Yoshida
  • Publication number: 20220106706
    Abstract: A nitride semiconductor substrate that is constituted by a single crystal of a group III nitride semiconductor and includes a main surface for which the closest low index crystal plane is a (0001) plane includes an inclined interface growth region that has grown with inclined interfaces other than the (0001) plane serving as growth surfaces. A ratio of an area occupied by the inclined interface growth region in the main surface is 80% or more. When a dislocation density is determined based on a dark spot density by observing the main surface in a field of view that is 250 ?m square using a multiphoton excitation microscope, the main surface does not include a region that has a dislocation density higher than 3×106 cm?2, and the main surface includes dislocation-free regions that are 50 ?m square and do not overlap each other, at a density of 100 regions/cm2 or more.
    Type: Application
    Filed: January 23, 2020
    Publication date: April 7, 2022
    Applicants: SCIOCS COMPANY LIMITED, SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventor: Takehiro YOSHIDA
  • Publication number: 20220078394
    Abstract: An image processing apparatus that performs processing concerning the display of a stereoscopic image so as to improve the convenience of a user in viewing a stereoscopic image. A head mount display displays a stereoscopic image using image data including a plurality of images having different viewpoints. The image data is processed based on metadata attached to the image data. In a case where information indicating that the image data is associated with a file format which cannot cause the head mount display to perform display is included in the metadata, the image data is converted into a file format which can cause the head mount display to perform display.
    Type: Application
    Filed: September 6, 2021
    Publication date: March 10, 2022
    Inventors: Takehiro Yoshida, Takumi Uehara, Hiroki Ito, Kunihiro Shirai, Takuma Mikawa, Hiroshi Atobe