Abstract: A substrate for an information recording medium, wherein the period of microwaviness is 2 &mgr;m to 4 mm, and if we let wa be the maximum height of this microwaviness and Rmax be the maximum height measured by atomic force microscope, the main surface of the substrate has a wa of no more than 5 nm and an Rmax of no more than 12 nm, provided that wa is the difference between the highest and lowest points on a measurement curve of all measured points in a measurement area.

Abstract: In a method of manufacturing a glass substrate for a magnetic recording medium for forming a predetermined roughness, a principal surface of the glass substrate is precisely polished by the use of polishing material containing free abrasive grain. Remaining stress distribution for a portion of a polishing trace due to the free abrasive grain is generated on the surface of the glass substrate. A surface process is performed for at least the principal surface of the glass substrate by the use of hydrosilicofluoric acid. A portion having relatively high remaining distortion in the generated remaining stress distribution is decided as an island portion. The glass substrate is heated after precisely polishing before performing the surface process by the use of the hydrosilicofluoric acid.

Abstract: In a method of manufacturing a glass substrate for a magnetic recording medium for forming a predetermined roughness, a principal surface of the glass substrate is precisely polished by the use of polishing material containing free abrasive grain. Remaining stress distribution for a portion of a polishing trace due to the free abrasive grain is generated on the surface of the glass substrate. A surface process is performed for at least the principal surface of the glass substrate by the use of hydrosilicofluoric acid. A portion having relatively high remaining distortion in the generated remaining stress distribution is decided as an island portion. The glass substrate is heated after precisely polishing before performing the surface process by the use of the hydrosilicofluoric acid.

Abstract: There are disclosed a polishing method and a polishing device in which cleaning of a glass substrate surface can be achieved to a high level. A glass substrate (MD substrate 1) in the shape of a circular disc having a circular hole in a center portion is immersed in an abrasive liquid 50 containing free abrasive grains, and an inner peripheral end surface of the glass substrate is polished using the abrasive liquid containing the free abrasive grains by rotating a rotary brush 4 or a polishing pad in contact with the inner peripheral end surface.

Abstract: There are disclosed a polishing method and a polishing device in which cleaning of a glass substrate surface can be achieved to a high level. A glass substrate (MD substrate 1) in the shape of a circular disc having a circular hole in a center portion is immersed in an abrasive liquid 50 containing free abrasive grains, and an inner peripheral end surface of the glass substrate is polished using the abrasive liquid containing the free abrasive grains by rotating a rotary brush 4 or a polishing pad in contact with the inner peripheral end surface.

Abstract: In a glass substrate for use in a magnetic recording medium, the glass substrate has a pair of principal surfaces opposite to each other and a peripheral side area contiguous to the principal surfaces. The peripheral side area has a side end wall and intermediate regions between the side end wall and the principal surfaces. In this case, at least one of the intermediate regions and the side end wall is formed by a mirror finished surface which has a surface roughness Ra not greater than 1 &mgr;m or a surface roughness Rmax not greater than 4 &mgr;m. With this structure, no particles are generated from the peripheral side area because the side end surface of the glass substrate is mirror finished. Consequently, reproduction is performed without reproduction errors because of no generation of a thermal asperity and a head crash can be sufficiently avoided because of no projections which might result from the particles.

Abstract: In a glass substrate for use in a magnetic recording medium, the glass substrate has a pair of principal surfaces opposite to each other and a peripheral side area contiguous to the principal surfaces. The peripheral side area has a side end wall and intermediate regions between the side end wall and the principal surfaces. In this case, at least one of the intermediate regions and the side end wall is formed by a mirror finished surface which has a surface roughness Ra not greater than 1 .mu.m or a surface roughness Rmax not greater than 4 .mu.m. With this structure, no particles are generated from the peripheral side area because the side end surface of the glass substrate is mirror finished. Consequently, reproduction is performed without reproduction errors because of no generation of a thermal asperity and a head crash can be sufficiently avoided because of no projections which might result from the particles.