Abstract: An exposure apparatus that exposes a shot region on a substrate to radiant energy based on an obtained position of a surface of the shot region. A projecting optical system obliquely projects detection light to a surface of a shot region on a substrate. A receiving optical system receives the detection light reflected at the shot region. A detector includes a photodetector that accumulates charges generated by the detection light incident thereon and detects a position of the detection light incident on the photodetector from the receiving optical system. A controller obtains a position of the surface based on the detection by the detector.

Abstract: The present invention provides a measurement apparatus which includes a scale and a sensor one of which is attached on a target object, and measures a position of the target object by reading the scale by the sensor, the apparatus including a detection unit configured to detect a shift amount of the scale from a reference position, and a calculation unit configured to correct, the position of the target object measured by reading the scale by the sensor, based on the shift amount of the scale from the reference position, which is detected by the detection unit.

Abstract: A measuring apparatus for measuring a position of a surface of an object while the object is scanned in a scanning direction in an X-Y plane.

Abstract: An exposure apparatus, and exposure method and a device manufacturing method, wherein the exposure apparatus includes a projection optical system, an original stage configured to hold an original thereon and to move the original, a position measuring system configured to measure a position of a pattern surface of the original held by the original stage, with respect to a direction parallel to an optical axis of the projection optical system, an exposure system configured to expose a substrate through the original and the projection optical system, on the basis of the measurement by the position measuring system, a memory configured to store therein compensation information that interrelates a temperature of the position measuring system and a compensation quantity for compensating for an output of the position measuring system, and a controller configured to compensate for an output of the position measuring system on the basis of the compensation information stored in the memory, to obtain a position measure

Abstract: A measuring apparatus for measuring a position of a surface of an object while the object is scanned in a scanning direction in an X-Y plane.

Abstract: A method of measuring a position of a surface of an object while the object is scanned relative to a detection unit in a scanning direction in an X-Y plane. The detection unit is configured to detect the position of the surface in a Z direction perpendicular to the X-Y plane.

Abstract: An exposure apparatus according to this invention comprises a detector configured to obliquely project detection light to a surface of a substrate and to detect a position of the surface based on the detection by the detector, and exposes the substrate to radiant energy based on the calculated position of the light. The controller is configured to correct, to obtain the calculated position of the surface, a position of the surface calculated based on the detection by the detector, in accordance with a period before the detection, during the period the detector being in a dark state in which the detection light is not incident on the detector.

Abstract: Disclosed is an exposure apparatus, and exposure method and a device manufacturing method, wherein, in one preferred from of the invention, the exposure apparatus includes a projection optical system, an original stage configured to hold an original thereon and to move the original, a position measuring system configured to measure a position of a pattern surface of the original held by the original stage, with respect to a direction parallel to an optical axis of the projection optical system, an exposure system configured to expose a substrate through the original and the projection optical system, on the basis of the measurement by the position measuring system, a memory configured to store therein compensation information that interrelates a temperature of the position measuring system and a compensation quantity for compensating for an output of the position measuring system, and a controller configured to compensate for an output of the position measuring system on the basis of the compensation informat

Abstract: Disclosed is a method of measuring a position of a surface of an object while relatively scanning the object and a detecting unit, wherein the method includes (i) a first measuring step for relatively scanning the detecting unit and a first object in a plurality of directions and for measuring, with respect to each of the plurality of directions, a surface position of the first object, (ii) a calculating step for calculating a corrective amount for correcting a surface position to be provided by the detecting unit, on the basis of the surface positions obtained with respect to the plurality of directions at the first measuring step, (iii) a second measuring step for measuring a surface position of a second object while relatively scanning the detecting unit and the second object in any one of the plurality of directions, and (iv) a correcting step for correcting the surface position of the second object obtained by said second measuring step, on the basis of the corrective amount obtained by the calculating s