Abstract: Provided is a spectroscopic measurement device capable of improving detection sensitivity to a change in a physical property value such as expansion of a sample to which energy is applied by an infrared ray or the like. The spectroscopic measurement device includes: a stage on which a sample is to be placed; an energy source configured to generate an energy beam to be emitted to a predetermined region of the sample; an electromagnetic wave source configured to generate an electromagnetic wave to be emitted to the sample; an objective lens configured to focus the electromagnetic wave in the predetermined region; two confocal detectors configured to detect the electromagnetic wave reflected by the sample; and a calculation unit configured to calculate, based on each of outputs of the confocal detectors, a change in a physical property value of the sample when the energy beam is emitted to the predetermined region.

Abstract: Provided is a spectrometry apparatus that suppresses a reduction in usage efficiency of an irradiation energy of a light. A spectrometry apparatus of the disclosure includes a stage on which a sample is placed, an electromagnetic source that emits an electromagnetic wave, one or a plurality of optical elements that transform a spatial energy distribution of the electromagnetic wave and emit the electromagnetic wave, and a reflective objective lens that collects the electromagnetic wave after a transformation of the spatial energy distribution and irradiates the sample with the collected electromagnetic wave.

Abstract: To enhance the measurement sensitivity of a scanning probe microscope. In a cross sectional view, a cantilever includes a vertex portion that is a portion close to a sample and is covered by a metallic film, a ridge that is connected to the vertex portion and is covered by the metallic film, and an upper corner portion that is connected to the ridge. Here, the upper corner portion and a part of the ridge are portions to be irradiated with excitation light emitted from a light source of the scanning probe microscope.

Abstract: To enhance the measurement sensitivity of a scanning probe microscope. In a cross sectional view, a cantilever includes a vertex portion that is a portion close to a sample and is covered by a metallic film, a ridge that is connected to the vertex portion and is covered by the metallic film, and an upper corner portion that is connected to the ridge. Here, the upper corner portion and a part of the ridge are portions to be irradiated with excitation light emitted from a light source of the scanning probe microscope.

Abstract: A pattern height measurement device capable of high-precision measurement of the dimensions of a fine pattern, and a charged particle beam device are provided. The pattern height measurement device includes a calculation device that determines dimensions of a sample, in the height direction, based on first reflected light information obtained by dispersing light reflected from a sample. The calculation device determines second reflected light information based on a formula for the relationship between the value for the dimension in the sample surface direction of a pattern formed upon the sample, obtained by irradiation of a charged particle beam on the sample, the value for the dimension in the height direction of the sample, and reflected light information; compares a second reflected light intensity and the first reflected light information; and outputs the value for the dimension in the height direction of the sample in the second reflected light information.

Abstract: A purpose of the present invention is to provide: a pattern height measurement device capable of high-precision measurement of the dimensions of a fine pattern, in the height direction; and a charged particle beam device. In order to achieve the purpose, this pattern height measurement device comprises a calculation device that finds the dimensions of a sample, in the height direction, on the basis of first reflected light information obtained by dispersing light that is reflected when the sample is irradiated with light.

Abstract: To detect near-field light, which is generated by a thermal assist type magnetic head element, and leaking light with high sensitivity and to more accurately obtain the spatial intensity distribution of a near-field light generation area, an inspection apparatus for a thermal assist type magnetic head element is adapted so that a distance between a cantilever and the surface of a specimen and the excitation amplitude of the cantilever are set to be small to detect near-field light with high sensitivity by the suppression of an influence of other light components, a distance between the cantilever and the surface of the specimen and the excitation amplitude of the cantilever are set to be large to detect other light components present in the vicinity of near-field light with high sensitivity by the suppression of an influence of the amount of detected near-field light when other light components are measured.

Abstract: To detect near-field light, which is generated by a thermal assist type magnetic head element, and leaking light with high sensitivity and to more accurately obtain the spatial intensity distribution of a near-field light generation area, an inspection apparatus for a thermal assist type magnetic head element is adapted so that a distance between a cantilever and the surface of a specimen and the excitation amplitude of the cantilever are set to be small to detect near-field light with high sensitivity by the suppression of an influence of other light components, a distance between the cantilever and the surface of the specimen and the excitation amplitude of the cantilever are set to be large to detect other light components present in the vicinity of near-field light with high sensitivity by the suppression of an influence of the amount of detected near-field light when other light components are measured.

Abstract: In a method and an apparatus for inspecting a thermally assisted magnetic recording head element, a specimen is mounted on a table movable in a plane of a scanning probe microscope device, evanescent light is generated from a portion of light emission of evanescent light of the specimen, scattered light of the evanescent light is detected by moving the table in the plane while a cantilever of the scanning probe microscope having a probe is vertically vibrated in the vicinity of a surface of the specimen, and an intensity distribution of the evanescent light emitted from the portion of light emission of evanescent light or a surface profile of the portion of light emission of evanescent light of the specimen is inspected using position information of generation of the evanescent light based on the detected scattered light.

Abstract: To detect both of near-field light and magnetic field generated by a thermal assist type magnetic head and to perform inspection of the head, a cantilever of a scanning probe microscope has a lever in which a probe is formed, a thin magnetic film formed on a surface of the probe, and fine particles or thin film of noble metal or an alloy including noble metal formed on a surface of the magnetic film. An inspection apparatus has the cantilever, a displacement detection unit to detect vibration of the cantilever, a near-field light detection unit to detect scattered light caused by near-field light generated from a near-field light emitter and enhanced on the surface of the probe of the cantilever, and a processing unit to process signals obtained by detection with the displacement detection unit and the near-field light detection unit.

Abstract: An apparatus for inspecting a thermal assist type magnetic head is constituted by a scanning probe microscope means including a cantilever having a probe with a magnetic film formed on the surface of a tip portion thereof; a probe unit which provides an alternating current to a terminal formed on the thermal assist type magnetic head element and causes a pulse drive current or pulse drive voltage; a scattered light detection means which scans the near-field light emitting part with the probe to detect the scattered light generated from the probe in the generation region of the near-field light; an imaging means which image the thermal assist type magnetic head element; and a signal process means inspects the thermal assist type magnetic head element and an output signal outputted from the scanning probe microscope means by scanning with the probe while providing an alternating current to the terminal.

Abstract: To reliably detect scattered light generated in the near field light generation area in the inspection of a thermal assist type magnetic head (herein after refer to magnetic head), the present invention provides a magnetic head inspection apparatus including: a scanning probe microscope including a cantilever having a probe with a magnetic film formed on the surface of the tip; a probe unit for supplying alternating current to a terminal formed in a magnetic head element, so that the laser beam is incident on the near field light emitting part; an imaging unit for taking an image of the probe unit and the magnetic head element; a scattered light detection unit for detecting the scattered light generated from the probe present in the generation area of the near field light of the magnetic head element, through a pinhole; and a signal processing unit for inspecting the magnetic head element.

Abstract: In the inspection of a defect in a fine concave-convex pattern, a spectral waveform of a detection area of an inspection object is detected, area determination as to which area section determined by a pattern type of the inspection object the detection area belongs to is performed, a feature calculation equation and a determination index value which correspond to a determined area section and vary according to defect type is selected, feature calculation on the spectral waveform data in accordance with the selected feature calculation equation is performed, and a calculated feature value and the selected determination index value are compared to perform determination processing according to defect type.

Abstract: In a method of manufacturing this cantilever for the magnetic force microscope, a magnetic film is formed on a probe at a tip of the cantilever for the magnetic force microscope. When a non-magnetic rigid protective film is formed around the probe, the film is formed from the front of the probe of the cantilever for the magnetic force microscope at an angle (15° to 45°) and from the back of the probe of the cantilever for the magnetic force microscope in two directions each at an angle in a range of (15° to 30°).

Abstract: In a method and an apparatus for inspecting a thermally assisted magnetic recording head element, a specimen is mounted on a table movable in a plane of a scanning probe microscope device, evanescent light is generated from a portion of light emission of evanescent light of the specimen, scattered light of the evanescent light is detected by moving the table in the plane while a cantilever of the scanning probe microscope having a probe is vertically vibrated in the vicinity of a surface of the specimen, and an intensity distribution of the evanescent light emitted from the portion of light emission of evanescent light or a surface profile of the portion of light emission of evanescent light of the specimen is inspected using position information of generation of the evanescent light based on the detected scattered light.

Abstract: In a method and an apparatus for inspecting a thermally assisted magnetic recording head element, a specimen is mounted on a table movable in a plane of a scanning probe microscope device, evanescent light is generated from a portion of light emission of evanescent light of the specimen, scattered light of the evanescent light is detected by moving the table in the plane while a cantilever of the scanning probe microscope having a probe is vertically vibrated in the vicinity of a surface of the specimen, and an intensity distribution of the evanescent light emitted from the portion of light emission of evanescent light or a surface profile of the portion of light emission of evanescent light of the specimen is inspected using position information of generation of the evanescent light based on the detected scattered light.

Abstract: An inspection region is specified using the design information to perform region division for measurement through a scatterometry method. The obtained detection data is classified by pattern into a periodic region and a non-periodic region. A spectroscopic characteristic is detected by an optical sensor to extract features. The extracted features are compared with features stored in a feature map database for each region to evaluate a state of a patterned medium.

Abstract: In a method and an apparatus for inspecting a thermally assisted magnetic recording head element, a specimen is mounted on a table movable in a plane of a scanning probe microscope device, evanescent light is generated from a portion of light emission of evanescent light of the specimen, scattered light of the evanescent light is detected by moving the table in the plane while a cantilever of the scanning probe microscope having a probe is vertically vibrated in the vicinity of a surface of the specimen, and an intensity distribution of the evanescent light emitted from the portion of light emission of evanescent light or a surface profile of the portion of light emission of evanescent light of the specimen is inspected using position information of generation of the evanescent light based on the detected scattered light.

Abstract: In a method of manufacturing this cantilever for the magnetic force microscope, a magnetic film is formed on a probe at a tip of the cantilever for the magnetic force microscope. When a non-magnetic rigid protective film is formed around the probe, the film is formed from the front of the probe of the cantilever for the magnetic force microscope at an angle (15° to 45°) and from the back of the probe of the cantilever for the magnetic force microscope in two directions each at an angle in a range of (15° to 30°).

Abstract: In an optical inspection for patterned media for hard disks, a pattern inspection device is provided for inspecting patterns without being susceptible to variations in film thickness and film quality of an underlying film, the device includes optical characteristics detection means for detecting optical characteristics of multilayers by processing, upon the reflected light being dispersed and detected by the spectroscopic detection means, the reflected light from a non-patterned region on the substrate, and processing a detection signal corresponding to, and detecting optical characteristics of, the reflected light from the patterns including the multilayers; and pattern inspection means for inspecting the patterns formed on the multilayers, by viewing, upon the detection of the optical characteristics by the optical characteristics detection means, information on the optical characteristics of the reflected light from the multilayers, and processing information on the optical characteristics of the reflected