Patents by Inventor Takeo Oishi

Takeo Oishi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11667730
    Abstract: An oxime ester compound represented by general formula (I): wherein R1, R2, and R3 each independently represent R11, OR11, COR11, SR11, CONR12R13, or CN; R11, R12, and R13 each independently represent a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms, or a heterocyclic group having 2 to 20 carbon atoms, R4 and R5 each independently represent R11, OR11, SR11, COR11, CONR12R13, NR12COR11, OCOR11, COOR11, SCOR11, OCSR11, COSR11, CSOR11, CN, a halogen atom, or a hydroxyl group; and a and b each independently represent 0 to 3.
    Type: Grant
    Filed: June 22, 2017
    Date of Patent: June 6, 2023
    Assignee: ADEKA CORPORATION
    Inventors: Daisuke Sawamoto, Koichi Kimijima, Kiyoshi Murata, Yasunori Kozaki, Takeo Oishi
  • Patent number: 10189847
    Abstract: An oxime ester compound represented by general formula (I), wherein R1to R8 are as defined in the description, and n is 0 or 1; a photopolymerization initiator containing the compound; a photosensitive composition, alkali-developable photosensitive resin composition, and colored alkali-developable photosensitive resin composition containing the photopolymerization initiator; and a cured product of these compositions are provided. The compound is useful as a high-sensitivity photopolymerization initiator that has good stability and low sublimability and that efficiently absorbs, and is activated by, near-ultraviolet light, e.g., at 365 nm.
    Type: Grant
    Filed: March 30, 2015
    Date of Patent: January 29, 2019
    Assignee: ADEKA CORPORATION
    Inventors: Yoko Komiyama, Takeo Oishi, Tomoyuki Ariyoshi, Tomoya Tamachi, Takayuki Ikaga, Naomi Sato
  • Publication number: 20170283520
    Abstract: An oxime ester compound represented by general formula (I): wherein R1, R2, and R3 each independently represent R11, OR11, COR11, SR11, CONR12R13, or CN; R11, R12, and R13 each independently represent a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms, or a heterocyclic group having 2 to 20 carbon atoms, R4 and R5 each independently represent R11, OR11, SR11, COR11, CONR12R13, NR12COR11, OCOR11, COOR11, SCOR11, OCSR11, COSR11, CSOR11, CN, a halogen atom, or a hydroxyl group; and a and b each independently represent 0 to 3.
    Type: Application
    Filed: June 22, 2017
    Publication date: October 5, 2017
    Inventors: Daisuke SAWAMOTO, Koichi KIMIJIMA, Kiyoshi MURATA, Yasunori KOZAKI, Takeo OISHI
  • Publication number: 20170166575
    Abstract: The present invention provides oxime ester compounds represented by general formula (I), a photopolymerization initiator using said compound, and a photosensitive composition, alkali-developable photosensitive resin composition, and colored alkali-developable photosensitive resin composition containing same, and cured products thereof. The compounds of the present invention have excellent stability and low sublimability, and are useful as highly sensitive photopolymerization initiators that are activated by efficiently absorbing near ultraviolet light of 365 nm, etc. (I) (See the Specification for the definitions of R1-R8 in the formula. n represents 0 or 1.
    Type: Application
    Filed: March 30, 2015
    Publication date: June 15, 2017
    Inventors: Yoko KOMIYAMA, Takeo OISHI, Tomoyuki ARIYOSHI, Tomoya TAMACHI, Takayuki IKAGA, Naomi SATO
  • Patent number: 9594302
    Abstract: A novel compound having satisfactory sensitivity (base generating performance), a photosensitive resin composition containing the compound as a photo-initiator, and a cured product of the composition are provided. Specifically, a compound represented by general formula (1) (compound (1)), a photosensitive resin composition containing (A) a photo-initiator including at least one compound (1) and (B) a photosensitive resin are provided. Preferred are the compound (1) in which R1 is an unsubstituted or substituted C6-C20 aromatic hydrocarbon group, the compound (1) in which at least one of R5, R6, R7, R8, R9, R10, and R11 is nitro, and the compound (1) in which n is 0. The symbols in general formula (1) are as defined in the description.
    Type: Grant
    Filed: March 5, 2013
    Date of Patent: March 14, 2017
    Assignee: ADEKA CORPORATION
    Inventors: Takeo Oishi, Koichi Kimijima, Nobuhide Tominaga, Hirokatsu Shinano, Daisuke Sawamoto, Kiyoshi Murata
  • Publication number: 20150064623
    Abstract: A novel compound having satisfactory sensitivity (base generating performance), a photosensitive resin composition containing the compound as a photo-initiator, and a cured product of the composition are provided. Specifically, a compound represented by general formula (1) (compound (1)), a photosensitive resin composition containing (A) a photo-initiator including at least one compound (1) and (B) a photosensitive resin are provided. Preferred are the compound (1) in which R1 is an unsubstituted or substituted C6-C20 aromatic hydrocarbon group, the compound (1) in which at least one of R5, R6, R7, R8, R9, R10, and R11 is nitro, and the compound (1) in which n is 0. The symbols in general formula (1) are as defined in the description.
    Type: Application
    Filed: March 5, 2013
    Publication date: March 5, 2015
    Inventors: Takeo Oishi, Koichi Kimijima, Nobuhide Tominaga, Hirokatsu Shinano, Daisuke Sawamoto
  • Patent number: 8148045
    Abstract: A novel compound is a highly-sensitive photopolymerization initiator with excellent stability, low sublimability, excellent developability, and high transmittance in the visible region. It efficiently absorbs, and is activated by, near-ultraviolet rays such as at 365 nm. Also provided are a photopolymerization initiator and a photosensitive composition using such compound. An oxime ester compound is represented by the following general formula (I), a photopolymerization initiator containing the same, and a photosensitive composition containing the photopolymerization initiator and a polymerizable compound having an ethylenically unsaturated bond: R1 and R2 each represent R11, COR11, CONR12R13, CN, etc.; R11, R12, and R13 each represent a C1-20 alkyl group, etc.; R3 and R4 each represent R11, OR11, COR11, CONR12R13, OCOR11, CN, a halogen atom, etc.; a and b each represent an integer 0-4; X represents an oxygen atom, a sulfur atom, etc.
    Type: Grant
    Filed: November 19, 2010
    Date of Patent: April 3, 2012
    Assignee: Adeka Corporation
    Inventors: Kiyoshi Murata, Takeo Oishi, Koichi Kimijima
  • Publication number: 20110129778
    Abstract: The invention provides a novel compound useful as a highly-sensitive photopolymerization initiator that has excellent stability, low sublimability, excellent developability, and high transmittance in the visible region and that efficiently absorbs, and is activated by, near-ultraviolet rays such as at 365 nm. Also provided are a photopolymerization initiator and a photosensitive composition using the above-described compound. Specifically, the invention provides an oxime ester compound represented by the following general formula (I), a photopolymerization initiator containing the same, and a photosensitive composition containing the photopolymerization initiator and a polymerizable compound having an ethylenically unsaturated bond: wherein, R1 and R2 each represent R11, COR11, CONR12R13, CN, etc.; R11, R12, and R13 each represent a C1-20 alkyl group, etc.; R3 and R4 each represent R11, OR11, COR11, CONR12R13, OCOR11, CN, a halogen atom, etc.
    Type: Application
    Filed: November 19, 2010
    Publication date: June 2, 2011
    Applicant: ADEKA CORPORATION
    Inventors: Kiyoshi MURATA, Takeo OISHI, Koichi KIMIJIMA
  • Publication number: 20090292039
    Abstract: Disclosed is an oxime ester compound represented by the following general formula (I). (In the formula, R1, R2 and R3 independently represent R11, OR11, COR11, SR11, CONR12R13 or CN; R11, R12 and R13 Independently represent a hydrogen atom, an alkyl group having 1-20 carbon atoms, an aryl group having 6-30 carbon atoms, an arylalkyl group having 7-30 carbon atoms or a heterocyclic group having 2-20 carbon atoms; R4 and R5 independently represent R11, OR11, SR11, COR11, CONR12R13, NR12COR11, OCOR11, COOR11, SCOR11, OCSR11, COSR11, CSOR11, CN, a halogen atom or a hydroxy group; and a and b independently represent a number of 0-3.
    Type: Application
    Filed: December 21, 2007
    Publication date: November 26, 2009
    Applicant: ADEKA CORPORATION
    Inventors: Daisuke Sawamoto, Koichi Kimijima, Kiyoshi Murata, Yasunori Kozaki, Takeo Oishi