Abstract: An exposure system includes a pulse light source emitting light in response to a trigger signal and giving a predetermined exposure light quantity by a plurality of times of light emission. A reticle has an alignment mark and a light exposure pattern. A projection lens contractedly projects the pattern of the reticle. A wafer has an alignment mark to be located. The wafer is exposed to a projection of the pattern. A wafer stage is movable and carries the wafer. A laser interferometer measures a position of the wafer stage. An alignment device serves to detect a condition of an alignment of the wafer with respect to the reticle in an exposure position.

Abstract: A method and apparatus for applying a uniform coating of an adhesive compound to a resin-coated mandrel. A scraper formed from a circular knitted web of long length nylon fibers is located at the leading tip end of a tapered tube to scrape off any excess adhesive and obtain the uniform, smooth coating on the mandrel.

Abstract: A reticle/wafer alignment system provided with a laser beam source for emitting laser beams, a first optical system portion for a reticle/wafer alignment which consists of a first optical sub-system for receiving laser beams from the laser beam source and projecting the received laser beams onto alignment marks formed on a substrate and made up of diffraction gratings and a second optical sub-system for gathering laser beams diffracted by the alignment marks to form an image thereof, a photoelectric detection portion for performing a photoelectric conversion of the gathered laser beams, a position detecting portion for measuring the position of the substrate based on a signal outputted from the photoelectric detection portion, a second optical system portion for an image processing which consists of a third optical sub-system for illuminating the alignment marks and a fourth optical sub-system having a television camera for observing the image of the alignment marks, and an image processing portion for perfor

Abstract: A sealed-type aquarium device capable of permitting a viewer to feel unexpected and marvelous interest in addition to enjoyment through observation of fish. The aquarium device includes a sealed aquarium body which is constructed so as to prevent air from being introduced into the aquarium body. Water cleaned through a filtering unit is fed under pressure through a feed pipe to the aquarium body by a feed pump, so that a water pressure in the aquarium body is increased to cause water polluted in the aquarium body to be forcibly discharged through a drain pipe to the filtering unit. The aquarium body may be formed into any desired shape.

Abstract: An alignment detection apparatus for detecting the alignment of a superfine exposure system including an interrupted emission light source. The apparatus is equipped with an output variation monitoring sensor to detect an output variation of the light source and further a photoelectric conversion device to perform the photoelectric conversion of the alignment light to generate discrete photoelectric conversion signals. Also included in the apparatus is an integration and hold circuit to integrate and peak-hold each of the photoelectric conversion signals. This peak-hold values are corrected on the basis of the detected light-source output variation due to the monitoring sensor to output stepwise continuous signals from which a harmonic component is removed by a filter so as to obtain a smooth analog waveform. This analog waveform is processed by a phase detector. The output of the phase detector allows an accurate alignment irrespective of using the interrupted emission light source.

Abstract: A first reticle is located at an object position of a lens to be evaluated. The first reticle is formed with a first diffraction grating. A stage supports the first reticle. A coherent light source illuminates a whole region of the first diffraction grating. A spatial filter blocks a 0-order component of diffraction light from the first diffraction grating. A second reticle is located at an image position of the lens and is formed with a second diffraction grating. A stage moves the second reticle within a projection range of the lens. Interference fringes are formed on the second reticle by re-diffraction by the lens. Moire fringes are caused by the second diffraction grating and the interference fringes. The moire fringes are observed.

Abstract: A position signal producing apparatus, for an apparatus for project-printing a pattern on reticle onto a wafer through a project lens with ultraviolet light, for producing a position signal indicative of position of the wafer, comprises: a laser emitting two different frequency components polarized orthogonally with each other which are splitted by a polarizing beam splitter. The first and second components are reflected by first and second mirrors respectively to produce interference fringes at a given place being on an annular region within a circle defined by field angle of the project lens on the reticle through wave plates for circularly-polarizing. Another interference fringes is formed on a diffraction grating of the wafer in correspondence with the interference fringes through the project lens and a lens for achromatizing the project lens at wavelengths of the components. Another interference fringes reflected by the diffraction grating is detected by a photodetector for producing the position signal.

Abstract: A light source emits light having two components which ave slightly-different frequencies and which have different planes of polarization. The emitted light is separated into first, second, and third parts travelling along different paths respectively. First, second, and third reference gratings diffract the first, second, and third light parts respectively. First, second, and third illumination optical systems selectively transmit the diffracted first, second, and third light parts respectively. First, second, and third mark gratings having predetermined orientations are formed on a mask and are illuminated with the first, second, and third light parts coming from the first, second, and third illumination systems respectively. Similarly, first, second, and third mark gratings are formed on a wafer and are illuminated with the first, second, and third light parts coming from the first, second, and third illumination systems respectively.

Abstract: An optical wavelength converting apparatus for converting the divergent lights by a compact apparatus into a parallel lights comprises a light source, a means for collecting the lights from the light source to introduce them into the optical waveguide of the wavelength converting element, a rotation symmetrical lens disposed on the end portion opposite to the end portion on the side irradiated with the collected lights, thereby to make it possible to convert the divergent lights like Cherenkov radiation lights into parallel lights by a compact apparatus.

Abstract: A first lens, a second lens, means and a third lens means are arranged successively in a direction of travel of a ray. The first lens means each comprising a single lens element power. The second lens means has a predetermined negative refracting power. The third lens means has a predetermined positive refracting power. A fourth lens means consisting of a plurality of lens elements follows the third lens means in the direction of travel of the ray and has a predetermined positive refracting power. At least one surface of the first, second, third, and fourth lens elements is aspherical. The follwoing conditions (1), (2), and (3) are satisfied:4f<f3<20f (1)0.65<(f4/d34)<1.

Abstract: A system for controlling the relation in position between a photomask and a wafer for use in manufacturing apparatus of a highly integrated circuit such as large scale integration (LSI). The position control system includes a coherent light source for generating two light beams which are different in frequency and polarizing direction from each other. The light beams from the coherent light source is introduced into a first diffraction grating and the diffracted light from the first diffraction grating selectively pass through a telecentric lens system and are led to second and third diffraction gratings respectively disposed on the photomask and the wafer. Light beat signals are obtained in correspondance with the diffracted light from the second and third difraction gratings and the position relation between the photomask and wafer is controlled on the basis of the phase difference between the obtained light beat signals which corresponds to the position difference between the photomask and the wafer.

Abstract: A projection optical system for use in a precise copy which uses a pair of catadioptric optical systems consisting of convex mirrors, concave mirrors, and phase correction members is shown. Two catadioptric optical systems commonly use an entrance pupil on a coaxis and are coupled so as to respectively face the phase correction members. Each of the concave mirrors has an opening at the center. Each of the convex mirrors has no opening in one embodiment but has an opening portion at the center in another embodiment.

Abstract: A scanning type projection exposure system includes a source emitting light. The light is applied to a portion of a mask having a preset pattern. At least one optical erect projection sub-system images a portion of the pattern on a substrate. The portion of the pattern corresponds to the portion of the mask exposed to the light. The projection sub-system is subjected to scanning movement. The mask and the substrate are subjected to scanning movement. Relative positions of the mask and the substrate are held fixed during the scanning movement of the mask and the substrate.

Abstract: An electrical discharge machining apparatus for forming minute holes in a workpiece has a machining electrode supported in V-shaped grooves for forming a minute hole through an electrical discharge between the machining electrode and the workpiece. The machining electrode is movable toward and away from the workpiece. The workpiece is movable between a position below the machining electrode and a position below a microscope disposed in conjugate relation to the machining electrode. After a position to be machined has been set by the positioning means, the workpiece is moved to the position below the machining electrode for electrical discharge machining. The machining electrode is subjected to little displacement while it is being rotated, and the position to be machined can be determined with high accuracy. The electrical discharge machining apparatus can quickly form a neat minute hole of small out-of-roundness and reduced surface roughness in the workpiece at a correct position thereon.

Abstract: A projection optical system for photolithography includes a refraction sub-system and a cata-dioptric sub-system optically connected to each other. The refraction sub-system extends at an object side. The cata-dioptric sub-system extends at an image side. The refraction sub-system is generally composed of refracting members. The cata-dioptric sub-system is generally composed of a phase compensating member, a concave mirror, and a convex mirror. The phase compensating member adjoins the refraction sub-system. At least the concave mirror has a central opening through which light passes. The light forms an image at a rear of the concave mirror.

Abstract: An electrode consisting of a core wire, a support tube having a bore in which the electrode core wire is slidably supported, an outer peripheral surface held in highly concentric relation to the bore, and a rotatable support body for transmitting rotative power to the support tube. The support tube and the rotatable support body having a central axis and a center of rotation are aligned with each other for preventing the electrode from having wobbling movement or displacement during rotation of the electrode. This allows minute holes of small out-of-roundness and good accuracy of shape to be formed. In addition for fine feeding of an electrode an apparatus is used which includes a gear rotated by a motor to vertically move a feed screw that causes a pivot lever to move the electrode for a small vertical interval.

Abstract: A cathode-ray tube for a projector, wherein a mesh-like or striped heat conduction member is disposed on an outer surface of a faceplate corresponding to an effective area of a phosphor screen, and the heat conduction member is conductively in contact with a heat radiator which is secured on the outer side of the faceplate.

Abstract: A green-emitting phosphor for a cathode-ray tube contains calcium sulfide activated by cerium and lithium. Decreases in the brightness when the tube is excited with an electron beam of high current densities or is subjected to high temperatures are eliminated.

Abstract: A compatible AM-FM frequency discriminator for deriving an FM demodulated output and AFC outputs for FM and AM waves from an FM demodulator employing a quadrature detecting circuit which has connected thereto a phase shifter group composed of a series circuit of resonant circuits for AM and FM input frequencies, respectively, and a parallel circuit of AM and FM 90.degree. phase shift circuits exhibiting substantially equal impedance values in predetermined frequency ranges, respectively.

Abstract: An exposure device is adapted to intermittently feed a metal strip with each surface coated with a photosensitive film and expose it from both sides when the metal strip stops its movement. The device includes a feed setting mechanism comprising a detection roller rotated in accordance with the movement of the metal strip, a detection bar longitudinally movable by the movement of the detection roller, and a switch actuated, when the detection bar is moved a predetermined amount, to stop the movement of the metal strip.