Patents by Inventor Takeru Jo

Takeru Jo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Polymer, Resist Composition, Method for Manufacturing Substrate Having Pattern Formed Therein, and (Meth)Acrylic Ester and Production Method Therefor
    Publication number: 20240092956
    Abstract: Provided is a polymer including a constituent unit (1) based on a monomer represented by Formula (1), in which a content of a constituent unit based on a monomer having a polycyclic structure is 35 mol % or less. In Formula (1), R1 represents a hydrogen atom or a methyl group, A1 represents a linking group including an ester bond, or a single bond, where A1 has no tertiary carbon atom, and Z1 represents an atomic group forming a sulfur-containing cyclic hydrocarbon group having 3 to 6 carbon atoms, which includes a carbon atom bonded to A1, and —SO2—.
    Type: Application
    Filed: November 6, 2023
    Publication date: March 21, 2024
    Applicant: Mitsubishi Chemical Corporation
    Inventors: Kazuaki Mukai, Takeru Jo, Yoshihiro Kamon, Satoshi Sakuma, Ryuichi Ansai
  • Polymer, resist composition, method for manufacturing substrate having pattern formed therein, and (meth) acrylic ester and production method therefor
    Patent number: 11845822
    Abstract: Provided is a polymer including a constituent unit (1) based on a monomer represented by Formula (1), in which a content of a constituent unit based on a monomer having a polycyclic structure is 35 mol % or less. In Formula (1), R1 represents a hydrogen atom or a methyl group, A1 represents a linking group including an ester bond, or a single bond, where A1 has no tertiary carbon atom, and Z1 represents an atomic group forming a sulfur-containing cyclic hydrocarbon group having 3 to 6 carbon atoms, which includes a carbon atom bonded to A1, and —SO2—.
    Type: Grant
    Filed: March 25, 2020
    Date of Patent: December 19, 2023
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Kazuaki Mukai, Takeru Jo, Yoshihiro Kamon, Satoshi Sakuma, Ryuichi Ansai
  • Polymer, Resist Composition, Method for Manufacturing Substrate Having Pattern Formed Therein, and (Meth)Acrylic Ester and Production Method Therefor
    Publication number: 20220213243
    Abstract: Provided is a polymer including a constituent unit (1) based on a monomer represented by Formula (1), in which a content of a constituent unit based on a monomer having a polycyclic structure is 35 mol % or less. In Formula (1), R1 represents a hydrogen atom or a methyl group, A1 represents a linking group including an ester bond, or a single bond, where A1 has no tertiary carbon atom, and Z1 represents an atomic group forming a sulfur-containing cyclic hydrocarbon group having 3 to 6 carbon atoms, which includes a carbon atom bonded to A1, and —SO2—.
    Type: Application
    Filed: March 25, 2020
    Publication date: July 7, 2022
    Applicant: Mitsubishi Chemical Corporation
    Inventors: Kazuaki Mukai, Takeru Jo, Yoshihiro Kamon, Satoshi Sakuma, Ryuichi Ansai