Patents by Inventor Takeru Mizue

Takeru Mizue has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Conductive film, electron emitting device and image display apparatus
    Patent number: 8080931
    Abstract: A conductive film of thickness of from 3 nm to 50 nm made from a metal or ally formed on a substrate, wherein the ratio of density thereof to bulk density of the metal or alloy is from 0.2 to 0.5, and the ratio of resistivity thereof to bulk resistivity of the metal or alloy is from 100 to 100000.
    Type: Grant
    Filed: July 31, 2008
    Date of Patent: December 20, 2011
    Assignee: Canon Kabushiki Kaisha
    Inventors: Masahiro Terada, Makoto Kojima, Takashi Iwaki, Takeru Mizue, Tsuyoshi Ibe
  • Film pattern producing method, and producing method for electronic device, electron-emitting device and electron source substrate utilizing the same
    Patent number: 7547620
    Abstract: A method for producing a film pattern comprises a step of forming a resin film on a substrate surface; a step of incorporating into the resin film a constituent of a conductive film or a semiconductor film; a step of irradiating the resin film with an ultraviolet light; and a step of heating the resin film at a temperature not lower than a decomposition temperature of the resin to form a conductive film or a semiconductor film on the substrate, whereby the resin does not easily generate decomposition residues to improve precision and quality of the produced film pattern.
    Type: Grant
    Filed: August 31, 2005
    Date of Patent: June 16, 2009
    Assignee: Canon Kabushiki Kaisha
    Inventors: Shosei Mori, Tsuyoshi Furuse, Masahiro Terada, Takeru Mizue, Kazuhiro Kagami
  • CONDUCTIVE FILM, ELECTRON EMITTING DEVICE AND IMAGE DISPLAY APPARATUS
    Publication number: 20090033223
    Abstract: A conductive film of thickness of from 3 nm to 50 nm made from a metal or ally formed on a substrate, wherein the ratio of density thereof to bulk density of the metal or alloy is from 0.2 to 0.5, and the ratio of resistivity thereof to bulk resistivity of the metal or alloy is from 100 to 100000.
    Type: Application
    Filed: July 31, 2008
    Publication date: February 5, 2009
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Masahiro Terada, Makoto Kojima, Takashi Iwaki, Takeru Mizue, Tsuyoshi Ibe
  • Film pattern producing method, and producing method for electronic device, electron-emitting device and electron source substrate utilizing the same
    Publication number: 20060046208
    Abstract: A method for producing a film pattern comprises a step of forming a resin film on a substrate surface; a step of incorporating into the resin film a constituent of a conductive film or a semiconductor film; a step of irradiating the resin film with an ultraviolet light; and a step of heating the resin film at a temperature not lower than a decomposition temperature of the resin to form a conductive film or a semiconductor film on the substrate, whereby the resin does not easily generate decomposition residues to improve precision and quality of the produced film pattern.
    Type: Application
    Filed: August 31, 2005
    Publication date: March 2, 2006
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Shosei Mori, Tsuyoshi Furuse, Masahiro Terada, Takeru Mizue, Kazuhiro Kagami