Patents by Inventor Takeshi Akimoto
Takeshi Akimoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20240334575Abstract: A light source including a light-emitting device including a substrate, and a first light-emitting element and a second light-emitting element that are located on the substrate. The light source further includes a drive circuit to supply a current to drive the light-emitting device, a switch configured to switch between a first state of supplying a current to only the first light-emitting element and a second state of supplying a current to only the second light-emitting element, and a timing controller configured to control a timing of an operation of the switch. A light emission peak wavelength of the first light-emitting element is 430 nm or greater and less than 490 nm. A light emission peak wavelength of the second light-emitting element is 490 nm or greater and less than 570 nm. A forward voltage of the second light-emitting element is less than a forward voltage of the first light-emitting element.Type: ApplicationFiled: March 27, 2024Publication date: October 3, 2024Applicant: NICHIA CORPORATIONInventors: Hajime AKIMOTO, Naoto FUJIWARA, Takeshi MORIKAWA, Akira HORI
-
Publication number: 20230253224Abstract: A substrate processing system, includes: a measurement device configured to measure errors of substrates after the substrates are subjected to processing of a first process by a first processing apparatus; a transfer device configured to transfer the substrates between apparatuses including the first processing apparatus, a second processing apparatus that performs processing of a second process after the first process, and the measurement device; a map creating device configured to create an error map indicating a distribution of the errors on the substrates; and an evaluation device configured to calculate an evaluation value indicating a degree of importance of the errors based on the error map, wherein the evaluation device instructs the transfer device on a transfer destination of the substrates subjected to the first process according to a determination result as to whether or not the evaluation value is equal to or larger than a predetermined first threshold value.Type: ApplicationFiled: June 16, 2021Publication date: August 10, 2023Inventor: Takeshi AKIMOTO
-
Publication number: 20230118026Abstract: A data processing apparatus comprises processing circuitry configured to generate normalized data by normalizing time series data of multiple wavelengths, measured from a substrate, by using predetermined reference data; divide the normalized data into a plurality of regions for each predetermined time range and predetermined wavelength range; for each respective region of the plurality of regions, extract an outlier value in the respective region as a representative value; and convert the representative values from the plurality of regions into color data to generate image data from the color data.Type: ApplicationFiled: December 21, 2022Publication date: April 20, 2023Applicant: Tokyo Electron LimitedInventors: Hitoshi YONEMICHI, Hisanori SAKAI, Takeshi AKIMOTO
-
Patent number: 11587763Abstract: A substrate processing system includes a substrate processing apparatus and a switching timing creation support device, wherein the switching timing creation support device includes: an acquisition part configured to acquire, for each of a plurality of properties of particles contained in a gas in the substrate processing apparatus during a processing for a substrate, a measured value of an amount of the particles from a measuring device; a selection part configured to select properties of a predetermined number of the particles in descending order of temporal variations in the amount of the particles; a determination part configured to determine an operation expression and a switching condition for determining a switching timing based on a temporal change in the amount of the particles for each of the selected properties of the particles; and an output part configured to output the operation expression and the switching condition to the substrate processing apparatus.Type: GrantFiled: February 25, 2021Date of Patent: February 21, 2023Assignee: TOKYO ELECTRON LIMITEDInventor: Takeshi Akimoto
-
Publication number: 20220406634Abstract: There is provided a method of inspecting a substrate in an etching system including an imaging device, the method comprising: (A) imaging a substrate after plasma etching with the imaging device to acquire image data; and (B) calculating, based on the image data of the substrate after plasma etching, at least one selected from a group consisting of a dimension of a pattern on the substrate after plasma etching, information on a defect on the substrate after plasma etching, a thickness of a film on the substrate after plasma etching, and information on an appearance of the substrate after plasma etching.Type: ApplicationFiled: June 22, 2022Publication date: December 22, 2022Applicant: Tokyo Electron LimitedInventor: Takeshi AKIMOTO
-
Publication number: 20210272772Abstract: A substrate processing system includes a substrate processing apparatus and a switching timing creation support device, wherein the switching timing creation support device includes: an acquisition part configured to acquire, for each of a plurality of properties of particles contained in a gas in the substrate processing apparatus during a processing for a substrate, a measured value of an amount of the particles from a measuring device; a selection part configured to select properties of a predetermined number of the particles in descending order of temporal variations in the amount of the particles; a determination part configured to determine an operation expression and a switching condition for determining a switching timing based on a temporal change in the amount of the particles for each of the selected properties of the particles; and an output part configured to output the operation expression and the switching condition to the substrate processing apparatusType: ApplicationFiled: February 25, 2021Publication date: September 2, 2021Inventor: Takeshi AKIMOTO
-
Patent number: 7824153Abstract: A stator vane for a turbo molecular pump has stator vane halves each having inner and outer rim portions and radially arranged stator blades connected integrally between the inner and outer rim portions. The inner rim portion of each stator vane half has a pair of inner rim ends and the outer rim portion of each stator vane half has a pair of outer rim ends. The stator vane halves are disposed in abutment with one another along an abutment line to form an annular body with the inner rim ends of one of the stator vane halves being disposed in confronting relation with the respective inner rim ends of the other of the stator vane halves and with the outer rim ends of the one of the stator vane halves being disposed in confronting relation with the respective outer rim ends of the other of the stator vane halves.Type: GrantFiled: August 26, 2005Date of Patent: November 2, 2010Assignee: BOC Edwards Japan LimitedInventors: Takeshi Akimoto, Shinji Kawanishi
-
Patent number: 7390164Abstract: Provided are a fixing structure for fixing a rotor to a rotor shaft, in which the contact state of the contact surfaces of the rotor shaft and the rotor is stabilized to thereby maintain the rotation balance of the rotor shaft and the rotor, making it possible to prevent oscillation, and a turbo molecular pump having such a fixing structure. On the outer peripheral portion of the upper surface of a fastening portion (253), there is concentrically formed a rotor shaft (213) side contact surface (257) to be brought into contact with a rotor (103). Further, in the inner periphery of the contact surface (257), there is formed a spot facing portion (259) whose upper surface is recessed from the contact surface (257).Type: GrantFiled: August 27, 2004Date of Patent: June 24, 2008Assignee: Edwards Japan LimitedInventors: Yasushi Maejima, Yutaka Inayoshi, Shinji Kawanishi, Kou Sakurai, Hiroyuki Suda, Takeshi Akimoto
-
Publication number: 20080118351Abstract: A stator vane of a turbo molecular pump suitable for reducing damage of the stator vane is provided. The stator vane (B) of a turbo molecular pump formed annular is formed by abutting a pair of stator vane halves (30,30). In this state, a gap (S) is formed in an inner rim portion (32).Type: ApplicationFiled: August 26, 2005Publication date: May 22, 2008Inventors: Takeshi Akimoto, Shinji Kawanishi
-
Patent number: 6846538Abstract: A composite sheet including a paper layer made of a wood pulp having a Canadian standard freeness value of 350 to 500 ml, a transparency improving layer provided over one side of the paper layer, and a release liner provided over the transparency improving layer. The composite sheet has a transmittance of at least 10 to 20% for a light with a wavelength of 940 to 960 nm and a bulk density of 0.90 to 1.15 g/cm3. A thermosensitive recording adhesive label sheet has the above composite sheet and a thermosensitive recording sheet provided on the composite sheet through an adhesive layer.Type: GrantFiled: December 19, 2002Date of Patent: January 25, 2005Assignee: Ricoh Company, Ltd.Inventors: Masahiro Sato, Masanaka Nagamoto, Takeshi Akimoto
-
Patent number: 6670010Abstract: A composite sheet including a paper layer made of a wood pulp having a Canadian standard freeness value of 350 to 500 ml and a transmittance of at least 7% for a light with a wavelength of 940 to 960 nm, a transparency improving layer provided over one side of the paper layer so that said paper layer overlaid with said transparency improving layer exhibits a transmittance of at least 11% for a light with a wavelength of 940 to 960 nm, and a release liner provided over an opposite surface of the transparency improving layer from the paper layer. A thermosensitive recording adhesive label sheet has the above composite sheet and a thermosensitive recording sheet provided on the composite sheet through an adhesive layer.Type: GrantFiled: July 23, 2002Date of Patent: December 30, 2003Assignee: Ricoh Company, Ltd.Inventors: Masanaka Nagamoto, Masahiro Sato, Takeshi Akimoto
-
Publication number: 20030170414Abstract: A composite sheet including a paper layer made of a wood pulp having a Canadian standard freeness value of 350 to 500 ml, a transparency improving layer provided over one side of the paper layer, and a release liner provided over the transparency improving layer. The composite sheet has a transmittance of at least 10 to 20% for a light with a wavelength of 940 to 960 nm and a bulk density of 0.90 to 1.15 g/cm3. A thermosensitive recording adhesive label sheet has the above composite sheet and a thermosensitive recording sheet provided on the composite sheet through an adhesive layer.Type: ApplicationFiled: December 19, 2002Publication date: September 11, 2003Applicant: Ricoh Company, Ltd.Inventors: Masahiro Sato, Masanaka Nagamoto, Takeshi Akimoto
-
Publication number: 20030031820Abstract: A composite sheet including a paper layer made of a wood pulp having a Canadian standard freeness value of 350 to 500 ml and a transmittance of at least 7% for a light with a wavelength of 940 to 960 nm, a transparency improving layer provided over one side of the paper layer so that said paper layer overlaid with said transparency improving layer exhibits a transmittance of at least 11% for a light with a wavelength of 940 to 960 nm, and a release liner provided over an opposite surface of the transparency improving layer from the paper layer. A thermosensitive recording adhesive label sheet has the above composite sheet and a thermosensitive recording sheet provided on the composite sheet through an adhesive layer.Type: ApplicationFiled: July 23, 2002Publication date: February 13, 2003Inventors: Masanaka Nagamoto, Masahiro Sato, Takeshi Akimoto
-
Patent number: 6189481Abstract: A microwave plasma processing apparatus for producing plasma from processing gas by a microwave and processing a wafer or similar semiconductor by the plasma. The apparatus includes a mechanism which allows the areas of radiation ports formed in an upper electrode to be changed independently of each other. This allows a plasma distribution in a plasma processing chamber to be controlled in any desired manner.Type: GrantFiled: December 13, 1994Date of Patent: February 20, 2001Assignee: NEC CorporationInventor: Takeshi Akimoto
-
Patent number: 6060427Abstract: A thermosensitive recording material including a substrate, a thermosensitive coloring layer which is formed overlying the substrate and which induces color formation upon application of heat, and a protective layer which is formed overlying the thermosensitive coloring layer and which includes a resin, wherein the protective layer is formed by coating with a liquid including a core-shell type emulsion of the resin, and wherein the core-shell type emulsion of the resin is prepared by polymerizing monomers including (d) acrylamide and/or methacrylamide and (e) a vinyl monomer having a hydroxy group in the presence of a seed emulsion which is prepared by polymerizing monomers including (a) acrylamide and/or methacrylamide, (b) acrylonitrile and (c) a vinyl monomer having a hydroxy group.Type: GrantFiled: August 14, 1998Date of Patent: May 9, 2000Assignee: Ricoh Company, Ltd.Inventors: Yasutomo Mori, Mitsuru Naruse, Takeshi Akimoto
-
Patent number: 5911852Abstract: A plasma processing apparatus includes a conductive thin film provided on a surface of a microwave introducing member which is exposed to a processing chamber, in which an object to be processed is placed. The conductive thin film is provided at the entire portion excluding a transmission portion, through which microwaves pass into the processing chamber. The conductive thin film is grounded to act as an electrode.Type: GrantFiled: June 14, 1996Date of Patent: June 15, 1999Assignee: Sumitomo Metal Industries LimitedInventors: Katsuo Katayama, Kyouichi Komachi, Kouichi Iio, Takeshi Akimoto
-
Patent number: 5804923Abstract: A plasma processing apparatus includes a microwave introducing member, which is provided with a microwave transmission opening through which microwaves pass into a processing chamber. The microwave introducing member is also provided at a transmission opening with a dielectric member. Preferably, the dielectric member is formed to have a relative dielectric constant of 4 to 10 and an insulation resistance of 10.sup.8 to 10.sup.12 .OMEGA..Type: GrantFiled: June 14, 1996Date of Patent: September 8, 1998Assignee: Sumitomo Metal Industries LimitedInventors: Kouichi Iio, Kyouichi Komachi, Katsuo Katayama, Takeshi Akimoto
-
Patent number: 5798544Abstract: Disclosed herein is a semiconductor memory device including a plurality of memory cells each includes an active region which is defined in a column direction by a pair of trench isolation regions formed in a semiconductor substrate and in a row direction by an isolation gate conductor lines formed on a first gate insulating film covering the substrate, a source and a drain region selectively formed in the active region to define a channel region of a cell transistor, a second gate insulating film formed on the channel region, a word line formed on the second gate insulating film, a first insulating film covering the active region and the word line, a bit line formed on the first insulating film to overlap with the isolation gate conductor, a bit line connection conductor formed in the first insulating film to connect the drain region to the bit line with being in contact with the sidewall surface of the bit line, a second insulating film covering the bit line and the first insulating film, and a storage capacType: GrantFiled: May 13, 1994Date of Patent: August 25, 1998Assignee: NEC CorporationInventors: Shuichi Ohya, Masato Sakao, Yoshihiro Takaishi, Kiyonori Kajiyana, Takeshi Akimoto, Shizuo Oguro, Seiichi Shishiguchi
-
Patent number: 5721190Abstract: A thermosensitive recording medium including a support, and at least one layer provided on the support, wherein one of the at least one layer is a thermosensitive layer capable of forming a color image when heated imagewise, and one of the at least one layer contains a zinc dithiocarbamate of the formula: ##STR1## wherein R.sup.1 and R.sup.2 stand independently from each other for an alkyl group having 1-4 carbon atoms or a phenyl group. The zinc dithiocarbamate is contained in the thermosensitive layer or an intermediate layer interposed between the thermosensitive layer and the support.Type: GrantFiled: July 2, 1996Date of Patent: February 24, 1998Assignee: Ricoh Company, Ltd.Inventors: Shuji Miyamoto, Yasutomo Mori, Takeshi Akimoto
-
Patent number: 5677824Abstract: An electrostatic chuck applicable to, e.g., an epitaxial apparatus or an etching apparatus for electrostatically chucking a semiconductor substrate or wafer is disclosed. The chuck includes a stage for electrostatically retaining the wafer thereon. A plurality of lift pins are elevatable to thrust up the wafer. A plurality of release pins are arranged on the stage for thrusting up the peripheral portion of the wafer. A plurality of drive mechanisms respectively thrust up the release pins stepwise within the allowable elastic deformation range of the wafer. A control device selectively actuates the release pins via the associated drive mechanisms.Type: GrantFiled: November 22, 1996Date of Patent: October 14, 1997Assignee: Nec CorporationInventors: Keiichi Harashima, Takeshi Akimoto