Patents by Inventor Takeshi Fijino

Takeshi Fijino has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for forming a patterned resist
    Patent number: 5322764
    Abstract: After a resist layer is formed on a substrate, a predetermined region of resist layer is exposed. A silylated layer is formed in the exposed region of resist layer. After the silylation, a part but not all of the unexposed portion of the resist layer is etched to expose a nonsilylated side portion of the exposed region. The non-silylated side portion of the exposed region uncovered by etching is then silylated. The remainder of the unexposed region is removed, so that a resist pattern is finally obtained. According to the method, a fine resist pattern can be formed without side etch.
    Type: Grant
    Filed: May 13, 1992
    Date of Patent: June 21, 1994
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Kinya Kamiyama, Takeshi Fijino