Patents by Inventor Takeshi HIEDA

Takeshi HIEDA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11121270
    Abstract: There is provided a photoelectric conversion element which can prevent the contact resistance between a non-crystalline semiconductor layer containing impurities and an electrode formed on the non-crystalline semiconductor layer from increasing, and can improve the element characteristics. A photoelectric conversion element (10) includes a semiconductor substrate (12), a first semiconductor layer (20n), a second semiconductor layer (20p), a first electrode (22n), and a second electrode (22p). The first semiconductor layer (20n) has a first conductive type. The second semiconductor layer (20p) has a second conductive type opposite to the first conductive type. The first electrode (22n) is formed on the first semiconductor layer (20n). The second electrode (22p) is formed on the second semiconductor layer (20p). At least one electrode of the first electrode (22n) and the second electrode (22p) includes a plurality of metal crystal grains.
    Type: Grant
    Filed: October 24, 2014
    Date of Patent: September 14, 2021
    Assignee: SHARP KABUSHIKI KAISHA
    Inventors: Kenji Kimoto, Naoki Koide, Takeshi Hieda, Junichi Nakamura
  • Patent number: 10580911
    Abstract: A photovoltaic element includes: a semiconductor substrate; a first i-type semiconductor film provided on a part of one of surfaces of the semiconductor substrate; a first semiconductor region including a first-conductivity-type semiconductor film provided on the first i-type semiconductor film; a first electrode layer provided on the first semiconductor region; a first conductive film interposed at least at a site between the first semiconductor region and the first electrode layer.
    Type: Grant
    Filed: August 21, 2015
    Date of Patent: March 3, 2020
    Assignee: SHARP KABUSHIKI KAISHA
    Inventors: Takeshi Hieda, Masamichi Kobayashi, Chikao Okamoto, Yuta Matsumoto, Kenji Kimoto
  • Patent number: 10411148
    Abstract: Provided are a photoelectric conversion element capable of enhancing characteristics and reliability more than ever before and a method for manufacturing the photoelectric conversion element. The photoelectric conversion element includes a base including a semiconductor substrate, a first i-type semiconductor film placed on a portion of a surface of the semiconductor substrate, a first conductivity-type semiconductor film placed on the first i-type semiconductor film, a second i-type semiconductor film placed on another portion of the surface thereof, and a second conductivity-type semiconductor film placed on the second i-type semiconductor film; an electrode section including a first electrode layer placed on the first conductivity-type semiconductor film and a second electrode layer placed on the second conductivity-type semiconductor film; and a reflective section placed in a gap region A interposed between the first electrode layer and the second electrode layer.
    Type: Grant
    Filed: February 12, 2015
    Date of Patent: September 10, 2019
    Assignee: SHARP kABUSHIKI KAISHA
    Inventors: Naoki Asano, Takeshi Hieda, Chikao Okamoto, Yuta Matsumoto, Kenichi Higashi, Hiroaki Shigeta
  • Publication number: 20180248056
    Abstract: A photovoltaic element includes: a semiconductor substrate; a first i-type semiconductor film provided on a part of one of surfaces of the semiconductor substrate; a first semiconductor region including a first-conductivity-type semiconductor film provided on the first i-type semiconductor film; a first electrode layer provided on the first semiconductor region; a first conductive film interposed at least at a site between the first semiconductor region and the first electrode layer.
    Type: Application
    Filed: August 21, 2015
    Publication date: August 30, 2018
    Inventors: TAKESHI HIEDA, MASAMICHI KOBAYASHI, CHIKAO OKAMOTO, YUTA MATSUMOTO, KENJI KIMOTO
  • Publication number: 20170125622
    Abstract: Provided are a photoelectric conversion element capable of enhancing characteristics and reliability more than ever before and a method for manufacturing the photoelectric conversion element. The photoelectric conversion element includes a base including a semiconductor substrate, a first i-type semiconductor film placed on a portion of a surface of the semiconductor substrate, a first conductivity-type semiconductor film 3 placed on the first i-type semiconductor film, a second i-type semiconductor film placed on another portion of the surface thereof, and a second conductivity-type semiconductor film placed on the second i-type semiconductor film; an electrode section including a first electrode layer placed on the first conductivity-type semiconductor film and a second electrode layer placed on the second conductivity-type semiconductor film; and a reflective section placed in a gap region A interposed between the first electrode layer and the second electrode layer.
    Type: Application
    Filed: February 12, 2015
    Publication date: May 4, 2017
    Inventors: Naoki ASANO, Takeshi HIEDA, Chikao OKAMOTO, Yuta MATSUMOTO, Kenichi HIGASHI, Hiroaki SHIGETA
  • Publication number: 20160247949
    Abstract: There is provided a photoelectric conversion element which can prevent the contact resistance between a non-crystalline semiconductor layer containing impurities and an electrode formed on the non-crystalline semiconductor layer from increasing, and can improve the element characteristics. A photoelectric conversion element (10) includes a semiconductor substrate (12), a first semiconductor layer (20n), a second semiconductor layer (20p), a first electrode (22n), and a second electrode (22p). The first semiconductor layer (20n) has a first conductive type. The second semiconductor layer (20p) has a second conductive type opposite to the first conductive type. The first electrode (22n) is formed on the first semiconductor layer (20n). The second electrode (22p) is formed on the second semiconductor layer (20p). At least one electrode of the first electrode (22n) and the second electrode (22p) includes a plurality of metal crystal grains.
    Type: Application
    Filed: October 24, 2014
    Publication date: August 25, 2016
    Applicant: SHARP KABUSHIKI KAISHA
    Inventors: Kenji KIMOTO, Naoki KOIDE, Takeshi HIEDA, Junichi NAKAMURA