Patents by Inventor Takeshi Hiraide

Takeshi Hiraide has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus and method for supplying chemicals
    Publication number: 20070141845
    Abstract: A chemical supplying apparatus includes first and second mixing tanks for mixing and supplying chemical slurries used in a semiconductor fabrication process. The slurries are alternately provided from the first and second mixing tanks such that the slurry is continuously available to a precessing apparatus for maximum efficiency. While one of the tanks is supplying the slurry, the other tank is cleaned and then used to prepare a new batch of the slurry.
    Type: Application
    Filed: February 9, 2007
    Publication date: June 21, 2007
    Applicant: FUJITSU LIMITED
    Inventors: Naoki Hiraoka, Takeshi Hiraide
  • Apparatus and method for supplying chemicals
    Publication number: 20050142883
    Abstract: A chemical supplying apparatus includes first and second mixing tanks for mixing and supplying chemical slurries used in a semiconductor fabrication process. The slurries are alternately provided from the first and second mixing tanks such that the slurry is continuously available to a precessing apparatus for maximum efficiency. While one of the tanks is supplying the slurry, the other tank is cleaned and then used to prepare a new batch of the slurry.
    Type: Application
    Filed: February 23, 2005
    Publication date: June 30, 2005
    Applicant: FUJITSU LIMITED
    Inventors: Naoki Hiraoka, Takeshi Hiraide
  • Apparatus and method for supplying chemicals
    Publication number: 20020186613
    Abstract: A chemical supplying apparatus includes first and second mixing tanks for mixing and supplying chemical slurries used in a semiconductor fabrication process. The slurries are alternately provided from the first and second mixing tanks such that the slurry is continuously available to a processing apparatus for maximum efficiency. While one of the tanks is supplying the slurry, the other tank is cleaned and then used to prepare a new batch of the slurry.
    Type: Application
    Filed: August 12, 2002
    Publication date: December 12, 2002
    Applicant: FUJITSU LIMITED
    Inventors: Naoki Hiraoka, Takeshi Hiraide
  • Apparatus and method for supplying chemicals
    Patent number: 6457852
    Abstract: A chemical supplying apparatus includes first and second mixing tanks for mixing and supplying chemical slurries used in a semiconductor fabrication process. The slurries are alternately provided from the first and second mixing tanks such that the slurry is continuously available to a processing apparatus for maximum efficiency. While one of the tanks is supplying the slurry, the other tank is cleaned and then used to prepare a new batch of the slurry.
    Type: Grant
    Filed: March 31, 1998
    Date of Patent: October 1, 2002
    Assignee: Fujitsu Limited
    Inventors: Naoki Hiraoka, Takeshi Hiraide