Patents by Inventor Takeshi Hirao
Takeshi Hirao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240219839Abstract: A technique capable of reducing, when processing a substrate by using a processing liquid, a burden in the processing and a burden in works involved in the processing is provided. A container includes a storage space forming unit 20 in which a storage space 59 storing therein a processing liquid configured to process a substrate is formed; a discharge port 25 of the processing liquid, provided in the storage space forming unit; and a fragile member 47 provided in the storage space forming unit and configured to be broken by being pressurized with a penetrating member in order to form an access path, the penetrating member being configured to pressurize the storage space such that the processing liquid is discharged from the discharge port, and the penetrating member being advanced into the storage space forming unit through the access path.Type: ApplicationFiled: March 31, 2022Publication date: July 4, 2024Inventors: Katsuhiro Tsuchiya, Takeshi Hirao, Hiroichi Inada, Yoshimichi Kutsuna, Takashi Yamamoto
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Patent number: 11349494Abstract: A compression engine calculates replacement CRC codes, in predetermined data lengths, for DIF-in cleartext data including cleartext data and multiple CRC codes based on the cleartext data. The compression engine generates headered compressed-text data in which a header including the replacement CRC codes is added to compressed-text data in which the cleartext data is compressed, and generates code-in compressed-text data by calculating multiple CRC codes based on the headered compressed-text data to add the calculated CRC codes to the headered compressed-text data.Type: GrantFiled: March 4, 2021Date of Patent: May 31, 2022Assignee: HITACHI, LTD.Inventors: Takeshi Hirao, Yuusaku Kiyota, Shoji Kato
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Publication number: 20220131555Abstract: A compression engine calculates replacement CRC codes, in predetermined data lengths, for DIF-in cleartext data including cleartext data and multiple CRC codes based on the cleartext data. The compression engine generates headered compressed-text data in which a header including the replacement CRC codes is added to compressed-text data in which the cleartext data is compressed, and generates code-in compressed-text data by calculating multiple CRC codes based on the headered compressed-text data to add the calculated CRC codes to the headered compressed-text data.Type: ApplicationFiled: March 4, 2021Publication date: April 28, 2022Inventors: Takeshi HIRAO, Yuusaku KIYOTA, Shoji KATO
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Patent number: 8562753Abstract: Disclosed are a nozzle cleaning apparatus and a nozzle cleaning method, which are capable of effectively cleaning a nozzle for discharging a process liquid to a substrate. A nozzle 30 is accommodated in a cleaning container 2 having a funnel-shaped portion 2b. A solvent T as a cleaning liquid is supplied along an inner surface of the funnel-shaped portion 2b. The solvent T forms a vortex flow whirling around the nozzle 30. By exposing the nozzle 30 to the vortex flow, the nozzle 30 can be effectively, thoroughly cleaned.Type: GrantFiled: December 21, 2010Date of Patent: October 22, 2013Assignee: Tokyo Electron LimitedInventors: Takeshi Hirao, Akihiro Fujimoto, Yasutaka Souma
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Patent number: 8512478Abstract: A cleaning and drying-preventing method including: positioning a nozzle in a container such that a funnel-like inner circumferential surface of the container is located around a periphery of a distal end of the nozzle; sucking a liquid in the nozzle to retract a level of the liquid to a side of a supply passage; supplying a solvent into the container to form a swirl flow of the solvent turning around the distal end of the nozzle, and cleaning the nozzle by the swirl flow; supplying a solvent into the container to form a liquid pool of the solvent; and further retracting the level of the liquid in the nozzle to the side of the supply passage. A liquid layer, an air layer, and a solvent layer are formed in the nozzle in this order from the side of the supply passage, to prevent drying of the liquid in the nozzle.Type: GrantFiled: June 20, 2012Date of Patent: August 20, 2013Assignee: Tokyo Electron LimitedInventors: Yasuyuki Kometani, Takeshi Hirao, Kentaro Yamamura, Kenichi Miyamoto
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Publication number: 20120255581Abstract: A cleaning and drying-preventing method including: positioning a nozzle in a container such that a funnel-like inner circumferential surface of the container is located around a periphery of a distal end of the nozzle; sucking a liquid in the nozzle to retract a level of the liquid to a side of a supply passage; supplying a solvent into the container to form a swirl flow of the solvent turning around the distal end of the nozzle, and cleaning the nozzle by the swirl flow; supplying a solvent into the container to form a liquid pool of the solvent; and further retracting the level of the liquid in the nozzle to the side of the supply passage. A liquid layer, an air layer, and a solvent layer are formed in the nozzle in this order from the side of the supply passage, to prevent drying of the liquid in the nozzle.Type: ApplicationFiled: June 20, 2012Publication date: October 11, 2012Applicant: Tokyo Electron LimitedInventors: Yasuyuki KOMETANI, Takeshi Hirao, Kentaro Yamamura, Kenichi Miyamoto
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Patent number: 8216390Abstract: A cleaning and drying-preventing method including: positioning a nozzle in a container such that a funnel-like inner circumferential surface of the container is located around a periphery of a distal end of the nozzle; sucking a liquid in the nozzle to retract a level of the liquid to a side of a supply passage; supplying a solvent into the container to form a swirl flow of the solvent turning around the distal end of the nozzle, and cleaning the nozzle by the swirl flow; supplying a solvent into the container to form a liquid pool of the solvent; and further retracting the level of the liquid in the nozzle to the side of the supply passage. A liquid layer, an air layer, and a solvent layer are formed in the nozzle in this order from the side of the supply passage, to prevent drying of the liquid in the nozzle.Type: GrantFiled: August 28, 2009Date of Patent: July 10, 2012Assignee: Tokyo Electron LimitedInventors: Yasuyuki Kometani, Takeshi Hirao, Kentaro Yamamura, Kenichi Miyamoto
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Publication number: 20110083702Abstract: Disclosed are a nozzle cleaning apparatus and a nozzle cleaning method, which are capable of effectively cleaning a nozzle for discharging a process liquid to a substrate, with a simple structure and a low cost. A nozzle 30 is accommodated in a cleaning container 2 having a funnel-shaped portion 2b. A solvent T as a cleaning liquid is supplied along an inner surface of the funnel-shaped portion 2b. The solvent T forms a vortex flow whirling around the nozzle 30. By exposing the nozzle 30 to the vortex flow, the nozzle 30 can be effectively, thoroughly cleaned.Type: ApplicationFiled: December 21, 2010Publication date: April 14, 2011Applicant: TOKYO ELECTRON LIMITEDInventors: Takeshi Hirao, Akihiro Fujimoto, Yasutaka Souma
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Publication number: 20110083703Abstract: Disclosed are a nozzle cleaning apparatus and a nozzle cleaning method, which are capable of effectively cleaning a nozzle for discharging a process liquid to a substrate, with a simple structure and a low cost. A nozzle 30 is accommodated in a cleaning container 2 having a funnel-shaped portion 2b. A solvent T as a cleaning liquid is supplied along an inner surface of the funnel-shaped portion 2b. The solvent T forms a vortex flow whirling around the nozzle 30. By exposing the nozzle 30 to the vortex flow, the nozzle 30 can be effectively, thoroughly cleaned.Type: ApplicationFiled: December 21, 2010Publication date: April 14, 2011Applicant: TOKYO ELECTRON LIMITEDInventors: Takeshi HIRAO, Akihiro FUJIMOTO, Yasutaka SOUMA
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Patent number: 7891365Abstract: Disclosed are a nozzle cleaning apparatus and a nozzle cleaning method, which are capable of effectively cleaning a nozzle for discharging a process liquid to a substrate, with a simple structure and a low cost. A nozzle 30 is accommodated in a cleaning container 2 having a funnel-shaped portion 2b. A solvent T as a cleaning liquid is supplied along an inner surface of the funnel-shaped portion 2b. The solvent T forms a vortex flow whirling around the nozzle 30. By exposing the nozzle 30 to the vortex flow, the nozzle 30 can be effectively, thoroughly cleaned.Type: GrantFiled: May 22, 2007Date of Patent: February 22, 2011Assignee: Tokyo Electron LimitedInventors: Takeshi Hirao, Akihiro Fujimoto, Yasutaka Souma
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Publication number: 20100051059Abstract: A cleaning and drying-preventing method including: positioning a nozzle in a container such that a funnel-like inner circumferential surface of the container is located around a periphery of a distal end of the nozzle; sucking a liquid in the nozzle to retract a level of the liquid to a side of a supply passage; supplying a solvent into the container to form a swirl flow of the solvent turning around the distal end of the nozzle, and cleaning the nozzle by the swirl flow; supplying a solvent into the container to form a liquid pool of the solvent; and further retracting the level of the liquid in the nozzle to the side of the supply passage. A liquid layer, an air layer, and a solvent layer are formed in the nozzle in this order from the side of the supply passage, to prevent drying of the liquid in the nozzle.Type: ApplicationFiled: August 28, 2009Publication date: March 4, 2010Applicant: Tokyo Electron LimitedInventors: Yasuyuki Kometani, Takeshi Hirao, Kentaro Yamamura, Kenichi Miyamoto
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Patent number: 7326299Abstract: A process liquid supply nozzle comprises a substantially tubular main nozzle provided with a discharge port for discharging a coating liquid, a substantially bowl-shaped nozzle holder provided with a through-hole into which the main nozzle can be inserted, and a free space formed between the inner circumferential surface of the nozzle holder and the outer circumferential surface of the main nozzle, at least a prescribed cleaning liquid being supplied into the free space. The nozzle holder or the nozzle is relatively movable in the vertical direction such that the coating liquid is discharged from the discharge port under the state that the discharge port of the main nozzle projects downward from the through-hole, and the nozzle is cleaned with the cleaning liquid under the state that the nozzle is housed in the nozzle holder.Type: GrantFiled: February 24, 2004Date of Patent: February 5, 2008Assignee: Tokyo Electron LimitedInventors: Makoto Muramatsu, Hitoshi Hashima, Norihiko Sasagawa, Takeshi Hirao
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Publication number: 20080023034Abstract: Disclosed are a nozzle cleaning apparatus and a nozzle cleaning method, which are capable of effectively cleaning a nozzle for discharging a process liquid to a substrate, with a simple structure and a low cost. A nozzle 30 is accommodated in a cleaning container 2 having a funnel-shaped portion 2b. A solvent T as a cleaning liquid is supplied along an inner surface of the funnel-shaped portion 2b. The solvent T forms a vortex flow whirling around the nozzle 30. By exposing the nozzle 30 to the vortex flow, the nozzle 30 can be effectively, thoroughly cleaned.Type: ApplicationFiled: May 22, 2007Publication date: January 31, 2008Inventors: Takeshi Hirao, Akihiro Fujimoto, Yasutaka Souma
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Publication number: 20040173153Abstract: A process liquid supply nozzle comprises a substantially tubular main nozzle provided with a discharge port for discharging a coating liquid, a substantially bowl-shaped nozzle holder provided with a through-hole into which the main nozzle can be inserted, and a free space formed between the inner circumferential surface of the nozzle holder and the outer circumferential surface of the main nozzle, at least a prescribed cleaning liquid being supplied into the free space. The nozzle holder or the nozzle is relatively movable in the vertical direction such that the coating liquid is discharged from the discharge port under the state that the discharge port of the main nozzle projects downward from the through-hole, and the nozzle is cleaned with the cleaning liquid under the state that the nozzle is housed in the nozzle holder.Type: ApplicationFiled: February 24, 2004Publication date: September 9, 2004Applicant: TOKYO ELECTRON LIMITEDInventors: Makoto Muramatsu, Hitoshi Hashima, Norihiko Sasagawa, Takeshi Hirao