Abstract: A process of accelerating electrons with a voltage applied thereto in a vacuum, guiding the accelerated electrons into a normal-pressure atmosphere, and irradiating the electron beam (EB) onto an object. The electron beam irradiation process uses a vacuum tube-type electron beam irradiation apparatus, and with the acceleration voltage for generating an electron beam set at a value smaller than 100 kV, the electron beam is irradiated onto the object.

Abstract: A process of accelerating electrons with a voltage applied thereto in a vacuum, guiding the accelerated electrons into a normal-pressure atmosphere, and irradiating the electron beam (EB) onto an object. The electron beam irradiation process uses a vacuum tube-type electron beam irradiation apparatus, and with the acceleration voltage for generating an electron beam set at a value smaller than 100 kV, the electron beam is irradiated onto the object.

Abstract: A containment device for retaining semiconductor wafers (54) is disclosed. The containment device comprises a first housing member (10) having a frame (12), an inner wall (14) and an outer wall (16). The inner wall (14) and outer wall (16) each extend generally perpendicularly from the frame (12). The inner wall (14) and outer wall (16) have a spaced apart relationship forming a gap (18) therebetween. The inner wall (14) closely receives the semiconductor wafers (54). The containment device also comprises a second housing member (36) that is securably attachable to the first housing member (10). The second housing member (36) has a frame (38) that forms the top of the containment device when the first and second housing members (10, 36) are securably attached together.

Abstract: A containment device for retaining semiconductor wafers (54) which includes a first housing member (10) having a frame (12), an inner wall (14) and an outer wall (16), the inner wall (14) and outer wall (16) having a spaced apart relationship forming a gap (18) therebetween. The inner wall (14) closely receives the semiconductor wafers (54). The containment device also includes a second housing member (36) that is securably attachable to the first housing member (10) and which has a frame (38) that forms the top of the containment device when the first and second housing members (10, 36) are securably attached together. The first and second housing members are secured by a plurality of latches (20), each with a hook (22) secured to the first housing member which passes through a hole (40) in the second housing member and is releasably secured within the hole by the hook.

Abstract: A method for connecting two glass fibers, which comprises abutting the end surfaces to be connected of the two glass fibers so that their axes are in a line, and raising the temperature at the abutted end surfaces so that the end surfaces are fusion-spliced to connect the two glass fibers, wherein one of the two glass fibers is a high-melting glass fiber having a higher glass transition point and the other is a low-melting glass fiber having a lower glass transition point, and the heating is carried out in such a manner that the temperature is highest at a portion on the high-melting glass fiber distant by at least 1 &mgr;m from the end surface to raise the temperature at the end surfaces.

Abstract: In an interference fit type cutting tool according to the present invention, a projection and a fitting projection are formed at the rear end of an edge section and at the leading end of a shank section, respectively. A connecting member is provided with first and second holes that have a predetermined interference with respect to the outer diameters of the projection and the fitting projection. The edge section and the shank section are fixed by interference fitting between the first hole and the projection, and between the second hole and the fitting projection. Chatter vibration is reduced by making the edge section and the shank section of a high-rigidity material having a lower coefficient of thermal expansion than that of the connecting member.

Abstract: In an epitaxial-wafer fabricating process for epitaxially growing a silicon layer on the surface of a silicon wafer having the crystal orientation <100> or <111> and an inclination angle of 0°±1° in a reactive gas at a atmosphereicpressure, a growth temperature T is lower than a normal growth temperature by 50° C. to 100° C. during the process of epitaxial growth.

Abstract: A containment device for retaining semiconductor wafers (54) is disclosed. The containment device comprises a first housing member (10) having a frame (12), an inner wall (14) and an outer wall (16). The inner wall (14) and outer wall (16) each extend generally perpendicularly from the frame (12). The inner wall (14) and outer wall (16) have a spaced apart relationship forming a gap (18) therebetween. The inner wall (14) closely receives the semiconductor wafers (54). The containment device also comprises a second housing member (36) that is securably attachable to the first housing member (10). The second housing member (36) has a frame (38) that forms the top of the containment device when the first and second housing members (10, 36) are securably attached together.

Abstract: A process of accelerating electrons with a voltage applied thereto in a vacuum, guiding the accelerated electrons into a normal-pressure atmosphere, and irradiating the electron beam (EB) onto an object. The electron beam irradiation process uses a vacuum tube-type electron beam irradiation apparatus, and with the acceleration voltage for generating an electron beam set at a value smaller than 100 kV, the electron beam is irradiated onto the object.

Abstract: A silver halide color reversal light-sensitive material comprising on a transparent support having a red-sensitive silver halide emulsion layer containing a cyan coupler, a green-sensitive silver halide emulsion layer containing a magenta coupler, and a blue-sensitive silver halide emulsion layer containing a yellow coupler is disclosed, wherein the light-sensitive material has a magnetic recording layer containing from 4.times.10.sup.-3 to 3 g/m.sup.2 of a ferromagnetic powder, and the minimum density area of the light-sensitive material after development processing has a chromaticity having an a* value of from -5 to 5, a b* value of from -5 to 5, and an L* value of not less than 80 as calculated from tristimulus values in CIE 1964 X.sub.10 Y.sub.10 Z.sub.10 Colorimetric System under an illuminant C as specified in JIS Z8720 according to the method of JIS Z8729. The photographic material exhibits improved color reproducibility.

Abstract: A process for forming a color image wherein a color photographic material is developed with a processing solution containing a solvent for the silver halide in the presence of an aromatic primary amino color devloping agent. The color photographic material comprises, on a support, at least one layer containing (1) a coupler capable of forming a dye by reaction with an oxidized aromatic primary amino color developing agent and having a dye covering power of at least 0.75 and (2) a silver chlorobromide emulsion or silver chlorobromide emulsion containing at least 90 molar % of silver chloride.

Abstract: A process for processing a silver halide color photographic material is described comprising subjecting a silver halide color photographic material comprising a support having provided thereon at least one photographic emulsion layer containing at least one kind of pyrazoloazole series magenta coupler represented by general formula (I) to photographic processing using a bath containing at least 1.times.10.sup.-4 mol/liter of a soluble iron salt as the final bath: ##STR1## wherein Za and Zb each represents .dbd.CH--, (wherein R.sub.2 represents a hydrogen atom or a substituent) or =N-; R.sub.1 represents a hydrogen atom or a substituent; X represents a hydrogen atom or a group releasably upon coupling with the oxidation product of an aromatic primary amine developing agent; when Za=Zb is a carbon-carbon double bond, the double bond may be a part of an aromatic ring; the magenta coupler may form a dimer or polymer at R.sub.1, R.sub.2 or X; when at least one of said Za and Zb is ##STR2## at least one of the R.

Abstract: A silver halide color photographic light-sensitive material comprising a support and at least one silver halide photographic emulsion layer on the support, said emulsion layer containing a 5-pyrazolone coupler having a coupling eliminable group of the following general formula (I) at the coupling site thereof: ##STR1## wherein L.sub.1 represents a substituted or an unsubstituted methylene or ethylene group; l represents 0 or 1; m represents 0 or an integer from 1 to 3; R.sub.1 represents a hydrogen atom, or a substituted or an unsubstituted alkyl, aryl or heterocyclic group; Y represents ##STR2## Q represents a single bond or nonmetal atoms necessary to complete a 5- to 8-membered ring together with ##STR3## said 5- to 8-membered ring may further have a saturated or an unsaturated ring condensed thereto; R.sub.

Abstract: A silver halide color photographic material comprising a support having thereon a blue-sensitive silver halide emulsion layer, a green-sensitive silver halide emulsion layer and a red-sensitive silver halide emulsion layer, wherein the silver halide color photographic material contains at least one kind of pyrazoloazole type magenta coupler represented by the general formula (I) described below and the total coating amount of silver in the photographic material is 0.75 g/m.sup.2 or less. ##STR1## wherein R.sup.1 represents a hydrogen atom or a substituent; X represents a hydrogen atom or a group capable of being released upon a coupling reaction with an oxidation product of an aromatic primary amine developing agent; Za, Zb and Zc each represents a methine group, a substituted methine group, .dbd.

Abstract: A multilayer silver halide color photographic material comprising a reflective support and a blue-, green- and red-sensitive emulsion layer containing at least one yellow coupler (represented by the general formula (I)), magenta coupler (represented by the general formula (II)), and cyan coupler (represented by the general formula (III)), respectively, and the blue-sensitive emulsion layer also contains at least one compound represented by the general formulae (A) or (B), all compounds are as disclosed in the specification.

Abstract: A silver halide color photographic light-sensitive material comprising a support having provided thereon at least one silver halide emulsion layer, wherein at least one magenta coupler represented by the formula ##STR1## where the groups in the formula are defined in the specification; is dispersed in the silver halide emulsion layer in the presence of at least one high-boiling organic solvent represented by one of the formulae (II), (III), (IV) and (V): ##STR2## where the groups in the formulae are described in the specification. The a high boiling point organic solvent has a dielectric constant of not less than 4.00 at 25.degree. C. and 10 KHz.

Abstract: A silver halide color photographic material comprising a support having thereon at least one silver halide emulsion layer, said silver halide emulsion layer containing a pyrazoloazole series magenta coupler represented by general formula [I] ##STR1## wherein, R.sup.1 and R.sup.2 each represents a hydrogen atom or a substituent; and X represents a hydrogen atom or a releasing group which is released at the reaction with the oxidation product of an aromatic primary amine developing agent; at least one of said R.sup.1 and R.sup.2 is an alkyl group having a secondary or tertiary carbon atom directly bonded to the skeleton, at least one of said R.sub.1 and R.sub.2 is a sulfonamidoalkyl group or a sulfamoylalkyl group; and the magenta coupler may form a dimer or more polymer at the position of said R.sup.1, R.sup.2 or X.By the combined use of high boiling point organic solvent and ultraviolet absorbent, light fastness and coloring property are markedly improved.

Abstract: A silver halide color photographic material is disclosed, comprising a support having provided thereon a red-sensitive layer, a green-sensitive layer, and a blue-sensitive layer, in which at least one of couplers represented by the formulae (I) and/or (II), at least one of couplers represented by the following formula (III), and at least one of couplers represented by the following formula (IV) are respectively incorporated in the light-sensitive layers different from each other in color sensitivity: ##STR1## wherein: R.sub.1, R.sub.2, R.sub.4 each represents a substituted or unsubstituted aliphatic, aromatic or heterocyclic group;R.sub.3, R.sub.5, and R.sub.6 each represents a hydrogen atom, a halogen atom, an aliphatic group, an aromatic group, or an acylimino group or, when taken together, R.sub.3 and R.sub.2 represent non-metallic atoms necessary for forming a nitrogen-containing 5- or 6-membered ring;R.sub.7 represents an alkoxy group, an aryloxy group, or a heterocyclic oxy group;R.sub.

Abstract: A method for forming a color image is disclosed, which comprises imagewise exposing a multi-layer silver halide color photographic material comprising a reflective support having provided thereon at least three silver halide emulsion layers different in color sensitivity, each of which separately contains at least one coupler selected from a specific combination of cyan, magenta, and yellow couplers, and processing the exposed material with a color developing solution containing substantially no benzyl alcohol for a period of not more than 2 minutes and a half. A color image excellent in color reproducibility and preservability can be obtained rapidly without using benzyl alcohol.