Patents by Inventor Takeshi Honma

Takeshi Honma has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240118406
    Abstract: A sensor includes a complex-transfer-function calculator that calculates a complex transfer function from received signals, a reflection-coefficient calculator that calculates a reflection coefficient using a complex transfer function when an object to be detected is arranged at one of L positions and an ideal complex transfer function which is a theoretical value for the position at which the object to be detected is arranged, various normalizers that calculate a normalized reflection coefficient by normalizing the reflection coefficient, a reflection-coefficient interpolator that calculates an interpolated reflection coefficient by interpolation calculation of the reflection coefficient using the normalized reflection coefficient for each coordinates used in position estimation of the object to be detected, and a position estimator that corrects the position estimation, using a steering vector and the interpolated reflection coefficient that are determined based on the position of each of the transmitting a
    Type: Application
    Filed: December 14, 2021
    Publication date: April 11, 2024
    Applicant: Panasonic Intellectual Property Management Co., Ltd.
    Inventors: Takeshi NAKAYAMA, Shoichi IIZUKA, Naoki HONMA, Tomonori ITO, Teppei HAYASHI, Nobuyuki SHIRAKI, Kentaro MURATA
  • Publication number: 20240118407
    Abstract: A sensor receives M reception signals including reflection signals reflected by a living body; extracts a living-body component transfer function matrix from first complex transfer functions and second complex transfer functions, the first complex transfer functions being obtained by recording an M×N complex transfer function matrix including complex transfer functions in time series, from M reception signals, the complex transfer functions each indicating characteristics of propagation between a corresponding one of transmission antenna elements and a corresponding one of reception antenna elements, the second complex transfer functions being obtained by estimating and recording M×N complex transfer functions in a second period, and outputting a position at which a spectrum function indicating a likelihood that a living body is present indicates a local maximum value, using a correlation matrix based on the living-body component complex transfer function matrix and a steering vector corresponding to each of
    Type: Application
    Filed: December 22, 2021
    Publication date: April 11, 2024
    Applicant: Panasonic Intellectual Property Management Co., Ltd.
    Inventors: Shoichi IIZUKA, Takeshi NAKAYAMA, Naoki HONMA, Nobuyuki SHIRAKI, Kentaro MURATA
  • Patent number: 11597137
    Abstract: Provided is a method of producing a cured product pattern, including: a first step (arranging step) of arranging a layer formed of a curable composition (?1?) that is the components of the curable composition (?1) except the component (D) serving as a solvent on a substrate; and a second step (applying step) of applying droplets of a curable composition (?2) discretely onto the layer formed of the curable composition (?1), the curable composition (?1) having a number concentration of particles each having a particle diameter of 0.07 ?m or more of less than 2,021 particles/mL, and the curable composition (?1?) having a surface tension larger than that of the curable composition (?2).
    Type: Grant
    Filed: October 3, 2018
    Date of Patent: March 7, 2023
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Jun Kato, Takeshi Honma, Toshiki Ito, Hidetoshi Tsuzuki
  • Publication number: 20210223690
    Abstract: A photocurable composition for imprint at least has a polymerizable compound (A) and a photopolymerization initiator (B), in which the polymerizable compound (A) contains 20% by weight or more of a multifunctional (meth)acrylic monomer and the glass transition temperature of a photocured substance of the photocurable composition is 90° C. or more.
    Type: Application
    Filed: April 1, 2021
    Publication date: July 22, 2021
    Inventors: Shiori Yonezawa, Toshiki Ito, Tomonori Otani, Kazumi Iwashita, Takeshi Honma
  • Patent number: 11003073
    Abstract: A photocurable composition for imprint at least has a polymerizable compound (A) and a photopolymerization initiator (B), in which the polymerizable compound (A) contains 20% by weight or more of a multifunctional (meth)acrylic monomer and the glass transition temperature of a photocured substance of the photocurable composition is 90° C. or more.
    Type: Grant
    Filed: December 15, 2015
    Date of Patent: May 11, 2021
    Assignee: Canon Kabushiki Kaisha
    Inventors: Shiori Yonezawa, Toshiki Ito, Tomonori Otani, Kazumi Iwashita, Takeshi Honma
  • Patent number: 10850531
    Abstract: A photocurable ink contains a polymerizable compound and a photopolymerization initiator, and this ink contains a low boiling point solvent having a boiling point of 40° C. to 120° C. at one atmospheric pressure and at least one particle having a surface on which an unsaturated hydrocarbon group is provided.
    Type: Grant
    Filed: September 28, 2018
    Date of Patent: December 1, 2020
    Assignee: Canon Kabushiki Kaisha
    Inventors: Yoshinori Kotani, Motokazu Kobayashi, Takeshi Honma, Kaori Kawa, Shiori Yonezawa
  • Patent number: 10647863
    Abstract: A film forming method includes forming a film on a substrate, in which the film includes first regions, second regions, and third regions, the first regions, the second regions, and the third regions being defined by a refractive index and a region size and being present in a mixed manner in a cross section parallel to a thickness direction, the first regions and the second regions have a refractive index at least 0.4 higher than the third regions, the second regions are formed of high-refractive-index particles having an average particle size of 10 nm or more and 100 nm or less, the first regions are formed of the high-refractive-index particles that have been aggregated, the first regions having an equivalent circular diameter of 250 nm or more, and the third regions have an equivalent circular diameter of more than 100 nm.
    Type: Grant
    Filed: July 20, 2017
    Date of Patent: May 12, 2020
    Assignee: Canon Kabushiki Kaisha
    Inventors: Yoshinori Kotani, Kenichi Iida, Satoshi Yamabi, Motokazu Kobayashi, Shinichirou Yoshikawa, Toshihiko Sugimoto, Takeshi Honma
  • Patent number: 10593547
    Abstract: A photocurable composition contains a polymerizable compound (A) satisfying OA=NA/(NC,A?NO,A), wherein NA, NC,A and NO,A represent the total number of atoms, the number of carbon atoms, and the number of oxygen atoms, respectively, in (A); and a non-polymerizable component (E) containing at least one compound (X) including a photopolymerization initiator (B), in a proportion of 10% to 50% relative to the total weight of (A) and (E). The component (E) has a weight average molecular weight of 250 or less. The compound (X) satisfies OX=NX/(NC,X?NO,X). NX, NC,X and NO,X represent the total number of atoms, the number of carbon atoms, and the number of oxygen atoms, respectively, in the corresponding compound (X). The composition satisfies: OA?OE>1.00; and OAE<3.40. OE and OAE represent the molar fraction weighted averages of OX's and of OA and OE, respectively.
    Type: Grant
    Filed: August 18, 2015
    Date of Patent: March 17, 2020
    Assignee: Canon Kabushiki Kaisha
    Inventors: Toshiki Ito, Takeshi Honma, Shiori Yonezawa
  • Patent number: 10570298
    Abstract: A photocurable ink containing a first liquid containing a polymerizable compound and a photopolymerization initiator, and a second liquid that is incompatible with the first liquid, in which droplets formed by the second liquid are dispersed in the first liquid, wherein the photocurable ink contains first particles and second particles having higher hydrophilicity than that of the first particles, wherein the first particles are adsorbed on an interface between the first liquid and the second liquid, and the second particles are present in the second liquid.
    Type: Grant
    Filed: October 31, 2017
    Date of Patent: February 25, 2020
    Assignee: Canon Kabushiki Kaisha
    Inventors: Takeshi Honma, Motokazu Kobayashi, Yoshinori Kotani, Shiori Yonezawa, Kaori Kawa
  • Patent number: 10533065
    Abstract: A photocurable composition contains a polymerizable compound; and a photopolymerization initiator, in which the photocurable composition contains a compound represented by General Formula (1) shown below as the polymerizable compound, and in which, in General Formula (1), Ar represents a monovalent aromatic group which may have a substituent, R1 represents an alkyl group which may have a substituent or a hydrogen atom, R2 represents an alkyl group having (m+n) valences which may have a substituent, m is an integer of 2 or more, and n is an integer of 1 or more.
    Type: Grant
    Filed: July 22, 2015
    Date of Patent: January 14, 2020
    Assignee: Canon Kabushiki Kaisha
    Inventors: Toshiki Ito, Takeshi Honma, Shiori Yonezawa, Tomonori Otani, Kazumi Iwashita
  • Patent number: 10450389
    Abstract: A curable composition for photoimprint at least includes a polymerizable compound component (A) and a photopolymerization initiator component (B) and satisfies expression (1) and (2): 0.800?Er10/Er200??(1) 2.55?Er10??(2) wherein, Er10 represents the reduced modulus (GPa) of a photocured film prepared by exposing a film of the curable composition for photoimprint to light of 10 mJ/cm2; and Er200 represents the reduced modulus (GPa) of a photocured film prepared by exposing a film of the curable composition for photoimprint to light of 200 mJ/cm2.
    Type: Grant
    Filed: August 22, 2014
    Date of Patent: October 22, 2019
    Assignee: Canon Kabushiki Kaisha
    Inventors: Takeshi Honma, Toshiki Ito, Jun Kato, Shiori Yonezawa, Youji Kawasaki
  • Patent number: 10395943
    Abstract: To provide a patterning method for forming a desired pattern in a reverse process. A patterning method includes a reverse process. A photocurable composition contains at least a polymerizable compound (A) component and a photopolymerization initiator (B) component. The (A) component has a mole fraction weighted average molecular weight of 200 or more and 1000 or less. The (A) component has an Ohnishi parameter (OP) of 3.80 or more. The Ohnishi parameter (OP) of the (A) component is a mole fraction weighted average of N/(NC?NO), wherein N denotes a total number of atoms in a molecule, NC denotes a number of carbon atoms in the molecule, and NO denotes a number of oxygen atoms in the molecule.
    Type: Grant
    Filed: February 15, 2016
    Date of Patent: August 27, 2019
    Assignee: Canon Kabushiki Kaisha
    Inventors: Toshiki Ito, Takeshi Honma, Shiori Yonezawa, Tomonori Otani, Kazumi Iwashita
  • Patent number: 10387413
    Abstract: Provided is a search result evaluation system connected with a search device and that evaluates search results of the search device, the search result evaluation system including: a search unit that transmits a search query to the search device; and an evaluation unit that, if the evaluation unit receives search results from the search device, determines whether specifications of the search device have been modified, by evaluating the received search results, wherein, if the evaluation unit determines that the specifications of the search device have been modified, the evaluation unit outputs an anomaly signal to notify a manager of the search result evaluation system that the specifications of the search device have been modified.
    Type: Grant
    Filed: November 11, 2014
    Date of Patent: August 20, 2019
    Assignee: Clarion Co., Ltd.
    Inventors: Takeshi Honma, Kazuaki Shima
  • Patent number: 10351719
    Abstract: A photo-curable ink contains an oil-based liquid containing a polymerizable compound and a photopolymerization initiator, and an aqueous liquid containing water. When the photo-curable ink is stirred at a rotational speed of 15000 rpm or more for 3 minutes and then allowed to stand at 25° C. for one hour or more, droplets formed with the aqueous liquid are dispersed in the oil-based liquid without layer separation between the oil-based liquid and the aqueous liquid.
    Type: Grant
    Filed: July 29, 2016
    Date of Patent: July 16, 2019
    Assignee: Canon Kabushiki Kaisha
    Inventors: Takeshi Honma, Motokazu Kobayashi, Yoshinori Kotani, Kenichi Iida, Shiori Yonezawa, Kazumi Iwashita, Kaori Kawa
  • Patent number: 10338467
    Abstract: A method of producing a film includes: a disposing step of disposing a photocurable composition on a substrate; a mold contact step of bringing the photocurable composition and a mold into contact with each other; a photoirradiation step of irradiating the photocurable composition with light to form a cured product; and a mold release step of releasing the cured product and the mold from each other, in which the method further includes an alignment step of aligning the mold and the substrate with each other before the photoirradiation step, in which the photocurable composition contains at least a polymerizable compound serving as a component (A) and a photopolymerization initiator serving as a component (B), and in which the polymerizable compound has a polymerization conversion ratio of 50% or more when exposed to light under conditions of an illuminance of 0.12 mW/cm2 and an exposure time of 11.0 seconds.
    Type: Grant
    Filed: September 5, 2014
    Date of Patent: July 2, 2019
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Toshiki Ito, Takeshi Honma, Shiori Yonezawa, Youji Kawasaki
  • Patent number: 10293543
    Abstract: In an imprint method in a condensable gas atmosphere, the force (mold releasing force) required to separate a mold from a resist cured film (mold release) has been large. A photocurable composition for performing imprint in an atmosphere containing a condensable gas includes a component (A) which is a (meth)acrylate monomer; a component (B) which is a photopolymerization initiator; and a component (C) which is a mold releasing agent. The saturated solubility of the component (C) in the condensable gas at 5 degrees (Celsius) and 1 atm is 50% by weight or more, the condensable gas being in a liquid state at 5 degrees (Celsius) and 1 atm.
    Type: Grant
    Filed: June 19, 2014
    Date of Patent: May 21, 2019
    Assignee: Canon Kabushiki Kaisha
    Inventors: Takeshi Honma, Toshiki Ito, Shiori Yonezawa, Keiko Chiba, Keiji Yamashita
  • Publication number: 20190030785
    Abstract: Provided is a method of producing a cured product pattern, including: a first step (arranging step) of arranging a layer formed of a curable composition (?1?) that is the components of the curable composition (?1) except the component (D) serving as a solvent on a substrate; and a second step (applying step) of applying droplets of a curable composition (?2) discretely onto the layer formed of the curable composition (?1), the curable composition (?1) having a number concentration of particles each having a particle diameter of 0.07 ?m or more of less than 2,021 particles/mL, and the curable composition (?1?) having a surface tension larger than that of the curable composition (?2).
    Type: Application
    Filed: October 3, 2018
    Publication date: January 31, 2019
    Inventors: Jun Kato, Takeshi Honma, Toshiki Ito, Hidetoshi Tsuzuki
  • Publication number: 20190031902
    Abstract: A photocurable ink contains a polymerizable compound and a photopolymerization initiator, and this ink contains a low boiling point solvent having a boiling point of 40° C. to 120° C. at one atmospheric pressure and at least one particle having a surface on which an unsaturated hydrocarbon group is provided.
    Type: Application
    Filed: September 28, 2018
    Publication date: January 31, 2019
    Inventors: Yoshinori Kotani, Motokazu Kobayashi, Takeshi Honma, Kaori Kawa, Shiori Yonezawa
  • Patent number: 10182500
    Abstract: In an imprint process in a gaseous atmosphere containing a condensable gas, the curable composition for photoimprint is difficult to cure, the pattern is not fully formed to cause defects. The present invention relates to a curable composition for photoimprint in a gaseous atmosphere containing a condensable gas. The curable composition for photoimprint at least comprises the following component (A) and component (B): (A) polymerizable compound, and (B) photopolymerization initiator. Component (B) has a saturated solubility of less than 1% by weight in the condensable gas in a liquid state at 5° C. and 1 atm or has a Hansen distance (Ra) of larger than 7.6 to the condensable gas.
    Type: Grant
    Filed: February 10, 2015
    Date of Patent: January 15, 2019
    Assignee: Canon Kabushiki Kaisha
    Inventors: Takeshi Honma, Toshiki Ito, Shiori Yonezawa, Youji Kawasaki, Akiko Iimura
  • Patent number: 10073341
    Abstract: In nanoimprinting processes, photo-cured products often separate from the substrate and stick to the mold due to insufficient adhesion between the photo-cured product and the substrate. This causes a defect of pattern separation. An adhesion layer composition used for forming an adhesion layer between a substrate and a photocurable composition includes a compound (A) having at least two functional groups, and a solvent (B). The functional groups include at least one functional group capable of being bound to the substrate, selected from the group consisting of hydroxy, carboxy, thiol, amino, epoxy, and (blocked) isocyanate, and at least one hydrogen donating group as a functional group capable of being bound to the photocurable composition.
    Type: Grant
    Filed: June 26, 2015
    Date of Patent: September 11, 2018
    Assignee: Canon Kabushiki Kaisha
    Inventors: Takeshi Honma, Toshiki Ito, Tomonori Otani, Kazumi Iwashita