Abstract: The hot water is stored in the hot-water tank and kept at the predetermined temperature. The clamp base is provided in the hot water of the hot-water tank for receiving the substrate portion of the wafer and the lifter is arranged for moving the wafer from the upper part of the hot-water tank into the hot water. The clamper is placed at the upper of the clamp base and the substrate portion of the wafer is pushed to the clamp base fixedly and the pusher is arranged at the upper side of the clamp base in the vicinity of the clamper so as to push the slice base of the wafer, whereby the slice base is peeled. The peeling is performed in the hot water, therefore, the temperature of the wafer does not lower while peeling, so that the adhesive can be peeled easily.

Abstract: The hot water is stored in the hot-water tank and kept at the predetermined temperature. The clamp base is provided in the hot water of the hot-water tank for receiving the substrate portion of the wafer and the lifter is arranged for moving the wafer from the upper part of the hot-water tank into the hot water. The clamper is placed at the upper of the clamp base and the substrate portion of the wafer is pushed to the clamp base fixedly and the pusher is arranged at the upper side of the clamp base in the vicinity of the clamper so as to push the slice base of the wafer, whereby the slice base is peeled. The peeling is performed in the hot water, therefore, the temperature of the wafer does not lower while peeling, so that the adhesive can be peeled easily.

Abstract: The hot water is stored in the hot-water tank and kept at the predetermined temperature. The clamp base is provided in the hot water of the hot-water tank for receiving the substrate portion of the wafer and the lifter is arranged for moving the wafer from the upper part of the hot-water tank into the hot water. The clamper is placed at the upper of the clamp base and the substrate portion of the wafer is pushed to the clamp base fixedly and the pusher is arranged at the upper side of the clamp base in the vicinity of the clamper so as to push the slice base of the wafer, whereby the slice base is peeled. The peeling is performed in the hot water, therefore, the temperature of the wafer does not lower while peeling, so that the adhesive can be peeled easily.

Abstract: A slide table is slidably supported on the slide stage which is moved by a guide screw. The slide table is connected with the slide stage by means of pressurization means. A rotatable wafer table is provided on the slide table. A grinding wheel for chamfering is used. The pressurization means is locked, so that the slide table is kept locked to the slide stage. A wafer set on the slide table is moved toward the grinding wheel, and an edge of the wafer is chamfered. A grinding wheel for polishing is used. The pressurization means is not locked, so that the slide table can be slide on the slide stage. A wafer set on the slide table is moved toward the grinding wheel, and an edge of the wafer is polished.

Abstract: There is provided a wafer chamfering machine, wherein chamfering of a notch of a wafer can be accurately performed the space of the wafer chamfering machine is compact size, the costs are reduced and the time required for chamfering is shorten.

Abstract: It is an object of the present invention to provide an apparatus and a method for manufacturing a wafer, which are the most suitable for meeting the requirement for the mirror grinding surface of the wafer's chamfering portion. As a result, when the ingot is sliced, a wafer being sliced is chamfered at the same time. And, it is also possible that before the ingot starts to be sliced by the blade, the grindstone is pressed against the outer periphery of the slicing position to form a V-shaped groove along the outer periphery of the slicing position, so that the chamfering can be performed.

Abstract: The present invention relates to a wafer diameter/sectional shape measuring machine in which the diameter and the sectional shape of the wafer can be measured together. The diameter/sectional shape measuring machine is arranged in the wafer chamfering machine so that the chamfering conditions of the wafer can be adjusted in a short time without taking the wafer out from the wafer chamfering machine. The wafer diameter/ sectional shape measuring machine comprises a position control mechanism. The position control mechanism positions a center and an orientation flat of a wafer on a wafer table. The wafer table, which can rotate and move vertically, adsorbs and holds the wafer. A shape detector detects a sectional shape of the wafer. A measuring mechanism drives the shape detector in the direction of the wafer table and detects a moving value. The moving value is based on the distance that the measuring mechanism moves the shape detector.

Abstract: An ingot is conveyed to a slicing machine by an ingot loader. Then, the ingot is cut into a wafer by the slicing machine. And, the cut wafer is conveyed to a peel-off portion and soaked in a warm water tank for a predetermined time so that the adhesive of the slice base can be heat softened, and then the slice base is hammered by a hammer rod so as to be peeled off from the wafer. Further, the wafer, from which the slice base has been peeled off, is conveyed to a wash-dry device, and washed and dried. The washed and dried wafer is conveyed to a surface inspecting device by a conveying device and judged a pass or fail to the wafer standard in the surface inspecting device. And, the passed wafer is conveyed to a chamfering device and the edge of the wafer is chamfered by the chamfering device. Then, the chamfered wafer is washed and dried by a wash-dry device, thereafter, conveyed to the storing part by the conveying device and stored.