Patents by Inventor Takeshi Kobayashi

Takeshi Kobayashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250149291
    Abstract: A plasma processing apparatus includes a processing container, a substrate holder that is inserted into the processing container and holds a plurality of substrates in a plurality of tiers, a rotating shaft capable of rotating the substrate holder inside the processing container, a gas supply pipe that supplies a processing gas into the processing container, an exhaust unit that evacuates an inside of the processing container, a pair of electrodes arranged outside the processing container and positioned to face each other with respect to a center of the processing container, and a radio-frequency power supply that applies a radio-frequency power to the pair of the electrodes, thereby generating a capacitively-coupled plasma in the processing container. The substrate holder includes a ring member that holds a substrate, and surrounds a radial outer side of the substrate in a plan view.
    Type: Application
    Filed: November 3, 2024
    Publication date: May 8, 2025
    Inventors: Hiroyuki MATSUURA, Takeshi KOBAYASHI, Takahiro SHINDO
  • Publication number: 20250105349
    Abstract: An ion conductive solid comprising an oxide represented by a general formula: Li6+a?c?2dX1?a?b?c?dM1aM2bM3cM4dB3O9, where, in formula, X is at least one metal element selected from a group consisting of Lu, Ho, Er, and Tm, M1 is at least one metal element selected from a group consisting of Mg, Mn, Zn, Ni, Ca, Sr, and Ba, M2 is at least one metal element selected from a group consisting of La, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Lu, In, Fe, and Sc, M3 is at least one metal element selected from a group consisting of Zr, Ce, Hf, Sn, and Ti, M4 is at least one metal element selected from a group consisting of Nb and Ta, and a, b, c, and d are specific real numbers, provided that a case in which X and M2 are the same metal elements is excluded.
    Type: Application
    Filed: December 10, 2024
    Publication date: March 27, 2025
    Inventors: Saori FUJIKURA, Noriko SAKAMOTO, Takeshi KOBAYASHI, Yoshitaka SHIBA
  • Publication number: 20250079139
    Abstract: An ignition control method includes: providing a substrate processing apparatus including a pair of electrodes in a processing container, a matching box including a variable reactor and an electronic circuit, an RF power supply connected to the electrodes, and a temperature sensor that detects a temperature of the variable reactor; setting the temperature of the variable reactor to a first temperature, and measuring first information indicating a voltage between the electrodes for each adjustment position of the variable reactor when a radio-frequency voltage is applied to the electrodes; determining a preset value of the variable reactor based on the first information; acquiring the detected temperature of the variable reactor as a second temperature; and when the first and second temperatures are different, correcting the current by controlling the electronic circuit such that an adjustment position of the variable reactor becomes the determined preset value.
    Type: Application
    Filed: August 22, 2024
    Publication date: March 6, 2025
    Inventor: Takeshi KOBAYASHI
  • Publication number: 20240405267
    Abstract: The present invention provides an ion conductive solid which contains an oxide that is represented by general formula Li6+a-c-2dY1-a-b-c-dM1aM2bM3cM4dB3O9, where, in the formula, M1 represents at least one metal element that is selected from the group consisting of Mg, Mn, Zn, Ni, Ca, Sr and Ba; M2 represents at least one metal element that is selected from the group consisting of La, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, In and Fe, M3 represents at least one metal element that is selected from the group consisting of Hf, Sn and Ti, M4 represents at least one metal element that is selected from the group consisting of Nb and Ta; and a, b, c and d represent real numbers that are respectively within specific ranges, while satisfying 0.010?a+b+c+d<1.000.
    Type: Application
    Filed: August 9, 2024
    Publication date: December 5, 2024
    Inventors: Saori FUJIKURA, Noriko SAKAMOTO, Takeshi KOBAYASHI, Yoshitaka SHIBA
  • Publication number: 20240405266
    Abstract: An ion conductive solid that can be produced by heat treatment at low temperature and has a high ion conductivity; and the ion conductive solid comprises an oxide represented by a general formula: Li6+a-c-2dYb1-a-b-c-dM1aM2bM3cM4dB3O9 (In the formula, M1 is at least one metal element selected from the group consisting of Mg, Mn, Zn, Ni, Ca, Sr, and Ba, M2 is at least one metal element selected from the group consisting of La, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Lu, In, and Fe, M3 is at least one metal element selected from the group consisting of Zr, Ce, Hf, Sn, and Ti, M4 is at least one metal element selected from the group consisting of Nb and Ta, and a, b, c, and d are real numbers of which each is in a specific range).
    Type: Application
    Filed: August 9, 2024
    Publication date: December 5, 2024
    Inventors: Saori FUJIKURA, Noriko SAKAMOTO, Takeshi KOBAYASHI, Yoshitaka SHIBA
  • Publication number: 20240405902
    Abstract: A test system includes an actual propagation path characteristic calculation unit that calculates estimation characteristics, at analysis target timings, of propagation path characteristics of channels constituting an actual propagation path, a channel model parameter calculation unit that calculates channel model parameters characterizing statistical properties of the estimation characteristics, a simulation propagation path characteristic generation unit that generates simulation propagation path characteristics according to the channel model parameters, a simulation channel capacity calculation unit that calculates a channel capacity of the simulation propagation path characteristics, an actual propagation path channel capacity calculation unit that calculates a channel capacity of the estimation characteristics at some analysis target timings among the analysis target timings, and a channel capacity evaluation unit that calculates an evaluation indicator for evaluating a degree of similarity between the c
    Type: Application
    Filed: May 1, 2024
    Publication date: December 5, 2024
    Inventors: Takeshi KOBAYASHI, Keisuke TAKIZAWA, Hirofumi SUGANUMA, Ikuya OTANI
  • Publication number: 20240393380
    Abstract: A test system includes an actual propagation path estimation characteristic calculation unit that calculates estimation characteristics, at a plurality of analysis target timings, of propagation path characteristics of an analysis target channel among one or more channels constituting an actual propagation path, and a parameter calculation unit that calculates a maximum Doppler frequency of the analysis target channel, as one of parameters characterizing statistical properties of the estimation characteristics of the propagation path characteristics, in which the parameter calculation unit includes a maximum Doppler frequency estimation unit that estimates a maximum value among the frequencies of frequency components of a quasi-Doppler spectrum of the analysis target channel that have power equal to or higher than specified power, as the maximum Doppler frequency.
    Type: Application
    Filed: May 1, 2024
    Publication date: November 28, 2024
    Inventors: Takeshi KOBAYASHI, Keisuke TAKIZAWA
  • Publication number: 20240387144
    Abstract: A plasma processing apparatus includes a radio-frequency (RF) power supply; a pair of plasma electrodes, and a matcher disposed between the pair of plasma electrodes and the RF power supply. The matcher includes an RF feed line supplied with RF power from the RF power supply; a ground line; a first load line connected to one of the plasma electrodes; a second load line connected to the other of the plasma electrodes; an impedance matching circuit connected to the RF feed line, the first load line, the second load line, and the ground line, and including variable reactance elements; an RF sensor that is provided in the RF feed line and detects the RF power; a voltage sensor that detects a first peak value; and a matcher controller that controls the variable reactance elements by inputting detected values from the RF sensor and the voltage sensor.
    Type: Application
    Filed: May 13, 2024
    Publication date: November 21, 2024
    Inventor: Takeshi KOBAYASHI
  • Patent number: 12131889
    Abstract: A plasma generating apparatus includes: an electrode pair including a first plasma electrode and a second plasma electrode that are arranged to face each other; an RF power supply that supplies an RF power to the electrode pair; and a matching unit provided between the RF power supply and the electrode pair. The matching unit includes: a first variable capacitor and a second variable capacitor that are connected in parallel with respect to a load between the electrode pair; a coil connected in series with the first plasma electrode; and a capacitor connected in series with the second plasma electrode.
    Type: Grant
    Filed: October 15, 2021
    Date of Patent: October 29, 2024
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Takeshi Kobayashi, Takeshi Ando, Kiwamu Ito, Yuki Tanaka
  • Patent number: 12109262
    Abstract: Provided is a method for producing an artificial recombinant virus of the family Reoviridae, the method comprising the steps of: (1) introducing a FAST protein expression vector and/or a capping enzyme expression vector into host cells; (2) introducing a vector containing expression cassettes for individual RNA genome segments of a virus or introducing a set of single-stranded RNA transcripts from the expression cassettes into host cells; and (3) culturing the host cells. The method of the present invention allows more efficient production of an artificial recombinant virus of the family Reoviridae as compared with conventional methods and allows artificial recombinant rotavirus production without using a helper virus.
    Type: Grant
    Filed: June 3, 2022
    Date of Patent: October 8, 2024
    Assignee: Osaka University
    Inventors: Takeshi Kobayashi, Yuta Kanai
  • Publication number: 20240331918
    Abstract: An inductor includes a coil, a main body, and outer terminals. The coil includes a winding portion formed by winding a flat conducting wire and also includes a pair of extension portions of the conducting wire extended from the winding portion. The main body contains magnetic powder and resin and accommodates the coil. The outer terminals are formed on at least one surface of the main body and connected to respective extension portions. In the inductor, the main body includes a principal surface shaped like a rectangle having sides extending in a first direction and in a second direction, and the principal surface intersects a winding axis of the coil. The main body also includes a pair of first surfaces adjoining the principal surface and extending in the first direction and a pair of second surfaces adjoining the principal surface and extending in the second direction.
    Type: Application
    Filed: February 21, 2024
    Publication date: October 3, 2024
    Applicant: Murata Manufacturing Co., Ltd.
    Inventors: Takeshi KOBAYASHI, Daisuke ISHIDA
  • Publication number: 20240326497
    Abstract: According to an embodiment, a printer includes: a pair of support shafts that are supported by the casing, inserted into an inner periphery of an ink ribbon wound into a cylinder, and support the ink ribbon hung around a printing device. The printer further includes a driven shaft that is connected to one end of each of the support shafts so as to be movable along a longitudinal direction of the corresponding support shaft. The printer further includes a transmitter that is driven to rotate to transmits rotation to the driven shaft pressed by biasing of the biasing member.
    Type: Application
    Filed: November 27, 2023
    Publication date: October 3, 2024
    Inventor: Takeshi KOBAYASHI
  • Publication number: 20240312763
    Abstract: An ignition control method includes: preparing a substrate processing apparatus including a processing container that accommodates a substrate, a plasma box formed in the processing container, an electrode disposed on the plasma box, a radio-frequency (RF) power supply connected to the electrode via a matching unit, and a switch disposed between the matcher and the electrode; setting the switch during a process performed by the substrate processing apparatus based on a recipe; and after setting the switch, selecting a region for igniting a plasma generated from a gas by applying a radio-frequency voltage from the RF power supply.
    Type: Application
    Filed: March 12, 2024
    Publication date: September 19, 2024
    Inventor: Takeshi KOBAYASHI
  • Patent number: 12083254
    Abstract: A shielding structure of an object sterilized by radiation. The object is a housing that accommodates an accommodated object therein and is formed of a shielding material that shields the radiation and secondary radiation that has a higher transparency than the radiation and is secondarily generated by the radiation, an exterior of the housing is sterilized by the radiation, and the radiation and the secondary radiation do not penetrate through the accommodated object.
    Type: Grant
    Filed: September 24, 2021
    Date of Patent: September 10, 2024
    Assignee: JGC JAPAN CORPORATION
    Inventors: Takeshi Kobayashi, Takeshi Kojima
  • Patent number: 12080517
    Abstract: An ignition method in a plasma processing apparatus includes: applying a first radio frequency from a radio-frequency power supply to an electrode of a plasma generator, thereby igniting plasma from a gas, the radio-frequency power supply being capable of applying a radio frequency of a variably controlled frequency to the electrode of the plasma generator; and applying a second radio frequency different from the first radio frequency to the electrode of the plasma generator after a predetermined time is elapsed after applying the first radio frequency to the electrode of the plasma generator.
    Type: Grant
    Filed: March 4, 2022
    Date of Patent: September 3, 2024
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Takeshi Kobayashi, Takeshi Ando, Kazumasa Igarashi
  • Publication number: 20240238771
    Abstract: The present application is directed to a supported rare earth-catalyst. This catalyst comprises a metal oxide support having Brønsted acid sites and a rare earth element-catalyst. The rare earth element-catalyst is bound to the Brønsted acid sites on the metal oxide support. The present application is also directed to methods of making supported rare earth-catalyst and methods for borylation of hydrocarbons using the supported rare earth-catalyst.
    Type: Application
    Filed: January 5, 2024
    Publication date: July 18, 2024
    Inventors: Aaron David Sadow, Long Qi, Yuting Li, Uddhav Kanbur, Scott Southern, Frederic A. Perras, Takeshi Kobayashi
  • Publication number: 20240182653
    Abstract: A fiber-reinforced resin sheet includes a fiber assembly including a reinforcing fiber; and a thermoplastic polyurethane resin impregnated in at least one surface of the fiber assembly. The thermoplastic polyurethane resin contains a reaction product of a polyol component and a polyisocyanate component including a monocyclic alicyclic polyisocyanate.
    Type: Application
    Filed: March 31, 2022
    Publication date: June 6, 2024
    Inventors: Ryo TAKANO, Satoshi KUROIWA, Takeshi KOBAYASHI
  • Patent number: 11972921
    Abstract: A temperature measurement system includes: a thickness calculating unit that calculates an optical thickness of a substrate; a rotation position detecting unit that detects rotation position information of the rotary table; a substrate specifying unit that specifies a substrate based on the rotation position information; a storage unit that stores first relationship information indicating a relationship between a temperature and a thickness associated with each substrate, and second relationship information indicating a relationship between an amount of change in temperature and an amount of change in optical thickness associated with each substrate; and a temperature calculating unit that calculates a temperature of the substrate based on the optical thickness calculated by the thickness calculating unit, the substrate specified by the substrate specifying unit, the first relationship information, and the second relationship information.
    Type: Grant
    Filed: November 5, 2020
    Date of Patent: April 30, 2024
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Takeshi Kobayashi, Tatsuo Matsudo
  • Publication number: 20240120139
    Abstract: An inductor including an element body containing metal magnetic powder and resin and having a coil conductor that has a winding portion, an extended portion extended from the winding portion, and an outer electrode connection portion leading to the extended portion and connected to an outer electrode and is embedded in the element body; and an element body coat covering a surface of the element body. The outer electrode is formed on a surface of the element body and connected to the outer electrode connection portion, in which the outer electrode connection portion has a region covered with the element body coat and a region connected to the outer electrode on the surface of the element body.
    Type: Application
    Filed: August 21, 2023
    Publication date: April 11, 2024
    Applicant: Murata Manufacturing Co., Ltd.
    Inventors: Yasuo SHIMOMURA, Takeshi KOBAYASHI, Kenichi HARADA, Daisuke ISHIDA
  • Publication number: 20240079208
    Abstract: A plasma processing apparatus includes: a processing container; a substrate holding unit that disposes a plurality of substrates in multiple tiers and is inserted into the processing container; a rotary shaft that rotates the substrate holding unit; a gas supply unit that supplies a processing gas into the processing container; an exhaust unit that exhausts the inside of the processing container; a plurality of electrodes disposed on the outer side of the processing container and arranged in the circumferential direction of the processing container; and a radio-frequency power supply that applies a radio-frequency power to the plurality of electrodes, thereby generating capacitively coupled plasma in the processing container.
    Type: Application
    Filed: August 30, 2023
    Publication date: March 7, 2024
    Inventors: Takeshi KOBAYASHI, Michitaka AITA