Abstract: Based on the pattern writing data input to an input unit 20, a control computer 19 divides a predetermined region on which writing is effected by an electron beam 54 into smaller regions each consisting of one or the same number of frames and determines the areal density of a pattern to be written on each smaller region. A drift compensation time interval determining unit 32 then determines the amount of change in pattern areal density between each two adjacent smaller regions, and groups the smaller regions in the predetermined region into region groups depending on whether or not the amount of change is greater than a predetermined value. A time profile for compensating for the drift of the electron beam 54 is then determined for each region group.

Abstract: Based on the pattern writing data input to an input unit 20, a control computer 19 divides a predetermined region on which writing is effected by an electron beam 54 into smaller regions each consisting of one or the same number of frames and determines the areal density of a pattern to be written on each smaller region. A drift compensation time interval determining unit 32 then determines the amount of change in pattern areal density between each two adjacent smaller regions, and groups the smaller regions in the predetermined region into region groups depending on whether or not the amount of change is greater than a predetermined value. A time profile for compensating for the drift of the electron beam 54 is then determined for each region group.

Abstract: A charged-particle beam lithography apparatus includes a charged-particle beam irradiation unit, a deflector which deflects the charged particle beam, a stage which disposes thereon a workpiece for pattern writing and a plurality of marks being regularly laid out in an entire area substantially equal to a pattern writing region of the workpiece, a measurement unit for measuring positions of the marks on the stage through scanning of the charged-particle beam by the deflector, a coefficient calculation unit which uses an approximation equation for correction of a position deviation occurring due to a hardware configuration of the apparatus to perform the fitting of a position deviation amount of each mark by a coordinate system of the apparatus to thereby calculate more than one coefficient of the fitting-applied approximation equation, and a storage unit which performs overwrite-storing whenever the coefficient calculation unit calculates the coefficient.

Abstract: A charged particle beam pattern writing apparatus includes an input part for inputting a predetermined command, a check part for checking a state of a predetermined function used for pattern writing using a charged particle beam, based on the predetermined command, and an output part for outputting the state of the predetermined function which has been checked.

Abstract: A charged-particle beam lithography apparatus includes a charged-particle beam irradiation unit, a deflector which deflects the charged particle beam, a stage which disposes thereon a workpiece for pattern writing and a plurality of marks being regularly laid out in an entire area substantially equal to a pattern writing region of the workpiece, a measurement unit for measuring positions of the marks on the stage through scanning of the charged-particle beam by the deflector, a coefficient calculation unit which uses an approximation equation for correction of a position deviation occurring due to a hardware configuration of the apparatus to perform the fitting of a position deviation amount of each mark by a coordinate system of the apparatus to thereby calculate more than one coefficient of the fitting-applied approximation equation, and a storage unit which performs overwrite-storing whenever the coefficient calculation unit calculates the coefficient.

Abstract: A charged particle beam pattern writing apparatus includes an input part for inputting a predetermined command, a check part for checking a state of a predetermined function used for pattern writing using a charged particle beam, based on the predetermined command, and an output part for outputting the state of the predetermined function which has been checked.