Abstract: A time chart generation apparatus includes a user interface, a motor drive shaft chart display, and a motor drive shaft chart generator. The user interface is configured to receive an input from a user. The motor drive shaft chart display is configured to display on an image display device a motor drive shaft chart representing a change in a speed of at least one motor drive shaft along a time axis. The motor drive shaft chart generator is configured to add a movement waveform of the motor drive shaft to the motor drive shaft chart based on a predetermined amount when a first time point on the time axis is designated through the input on the user interface.

Abstract: A device control system includes a controller to control a device including a motor drive shaft. An operation terminal is communicably coupled to the controller. An external instruction synchronized drive command device notifies the controller of a drive command for external instruction synchronized drive of the motor drive shaft. A periodic communication device communicates with the controller at a predetermined period at least during the external instruction synchronized drive. An external instruction synchronized drive execution device executes the external instruction synchronized drive based on the drive command. The external instruction synchronized operation execution stopping device monitors communication from the periodic communication device at least during the external instruction synchronized drive, and stops the external instruction synchronized drive when the communication is interrupted.

Abstract: A controller includes a user interface, a selection section, and a state display section. The user interface includes an image display device and is coupled to an external device including a motor drive shaft as a control target. The selection section is configured to display at least one option image and configured to transmit a control command to the external device based on a selection result corresponding to the option image. The state display section is configured to display at least one state image corresponding to the at least one option image, and configured to reflect a state of the external device into the state image.

Abstract: A controller that controls a device on the basis of a time chart, which controls a servo axis on the basis of a velocity chart that plots a velocity of the servo axis and/or a position chart that plots a position of the servo axis, with respect to a time axis; executes return operation for returning the servo axis to an initial position set in the time chart in advance after operation described in the time chart has been executed; and executes regress operation for regressing to a start point of the time chart, and repetitively executing the time chart after the return operation has been completed.

Abstract: The invention provides an acetal compound containing an adamantane ring having an alcoholic hydroxyl group which is protected with an acetal group having a carbonyl moiety of branched structure. A photoresist film comprising a polymer comprising recurring units derived from the acetal compound and an acid generator is characterized by a high dissolution contrast when it is subjected to exposure and organic solvent development to form an image via positive/negative reversal.

Abstract: A positive resist composition based on a polymer comprising recurring units of (meth)acrylate having a cyclic acid labile group and a dihydroxynaphthalene novolak resin, and containing a photoacid generator is improved in resolution, step coverage and adhesion on a highly reflective stepped substrate, has high resolution, and forms a pattern of good profile and minimal edge roughness through exposure and development.

Abstract: Provided is a glass article, including: a crystallized glass plate; and an antifouling film formed on the surface of the crystallized glass plate and containing a multiple oxide of silicon and zirconium or a mixture of a silicon oxide and a zirconium oxide, in which the antifouling film has a ?-OH content of 1 to 300/mm.

Abstract: Disclosed is an antidepressant, neuroprotectant, amyloid ? deposition inhibitor, or age retardant composition containing a heterocyclic compound having the general formula (I):

Abstract: An instrument panel of an automobile includes a base and a covering bonded to a surface of the base. A cleavage groove is formed on the back of the base. When the base is cleaved by inflation pressure of an airbag, the cleavage groove serves as a starting point of the cleavage. The covering is formed by a ground fabric layer made of knitted fabric and a covering layer bonded the surface of the ground fabric layer. The ground fabric layer is formed of an original fabric in which the tensile strength in directions along its surface is anisotropic. The cleavage groove includes a first groove section, which is cleaved first. The covering is oriented with respect to the base such that the direction of the smallest tensile strength of the ground fabric layer matches with a direction perpendicular to the direction in which the first groove section extends.

Abstract: A negative pattern is formed by applying a resist composition onto a substrate, baking, exposing to high-energy radiation, baking (PEB), and developing the exposed resist film in an organic solvent developer to selectively dissolve the unexposed region of resist film. The resist composition comprising a hydrogenated ROMP polymer and a (meth)acrylate resin displays a high dissolution contrast in organic solvent development, and exhibits high dry etch resistance even when the acid labile group is deprotected through exposure and PEB.

Abstract: A leak current absorption circuit for absorbing a leak current from an output transistor includes a switch connected to a grounding node on one end, a constant voltage circuit connected between the other end of the switch and an output node, a switch-operating circuit connected between the output node and the grounding node to operate the switch based on a voltage of the output node. When the voltage of the output node becomes equal to a predetermined threshold voltage or more, the switch-operating circuit turns on the switch to clamp the voltage of the output node by allowing at least a portion of the leak current from the output transistor flow to the grounding node.

Abstract: A chemically amplified resist composition is provided comprising (A) a specific tertiary amine compound, (B) a specific acid generator, (C) a base resin having an acidic functional group protected with an acid labile group, which is substantially insoluble in alkaline developer and turns soluble in alkaline developer upon deprotection of the acid labile group, and (D) an organic solvent. The resist composition has a high resolution, improved defect control in the immersion lithography, and good shelf stability.

Abstract: Provided is a machine control program generation device for generating a machine control program to be executed on a controller for controlling a machine component, including: a connected device selector for selecting a connected device to be connected to the controller; and a connector identifier assignor for assigning, when the connected device selector selects the connected device, a new connector identifier for identifying a connector for connecting the controller and the selected connected device to each other to the selected connected device.

Abstract: [Problem] To provide a prophylactic/therapeutic agent against, for example, nerve diseases and the like such as ischemic brain disease and neurodegenerative disease, or a prophylactic/therapeutic agent against diseases against which antioxidant action is effective, as a cell protecting agent, in particular as an inhibitor of brain cell damage or brain cell death.

Abstract: There is provided a reference current generation circuit, including a reference voltage generation unit configured to generate a reference voltage by using a depression type transistor, and a voltage/current conversion unit configured to generate a reference current from the reference voltage.

Abstract: A pattern is formed by coating a resist composition comprising a polymer comprising recurring units having an optionally acid labile group-substituted naphthol group, an acid generator, and an organic solvent onto a substrate, baking to form a resist film, exposing the resist film to high-energy radiation, baking, and developing the exposed film with an organic solvent developer to form a negative pattern wherein the unexposed region of film is dissolved and the exposed region of film is not dissolved. In the process of image formation via positive/negative reversal by organic solvent development, the resist film has a high dissolution contrast and controlled acid diffusion. By subjecting the resist film to exposure through a mask having a lattice-like pattern and organic solvent development, a fine hole pattern can be formed at a high precision of dimensional control.

Abstract: A pattern is formed by applying a resist composition comprising a polymer comprising recurring units having an acid labile group-substituted hydroxyl group, an acid generator, and an organic solvent onto a substrate, prebaking the composition to form a resist film, exposing the resist film to high-energy radiation to define exposed and unexposed regions, baking, and developing the exposed film with an organic solvent developer to form a negative pattern wherein the unexposed region of film is dissolved and the exposed region of film is not dissolved.

Abstract: A negative pattern is formed by applying a resist composition onto a substrate, baking, exposing to high-energy radiation, baking (PEB), and developing the exposed resist film in an organic solvent developer to selectively dissolve the unexposed region of resist film. The resist composition comprising a hydrogenated ROMP polymer and a (meth)acrylate resin displays a high dissolution contrast in organic solvent development, and exhibits high dry etch resistance even when the acid labile group is deprotected through exposure and PEB.

Abstract: There is provided a reference current generation circuit, including a reference voltage generation unit configured to generate a reference voltage by using a depression type transistor, and a voltage/current conversion unit configured to generate a reference current from the reference voltage.

Abstract: A chemically amplified resist composition is provided comprising (A) a specific tertiary amine compound, (B) a specific acid generator, (C) a base resin having an acidic functional group protected with an acid labile group, which is substantially insoluble in alkaline developer and turns soluble in alkaline developer upon deprotection of the acid labile group, and (D) an organic solvent. The resist composition has a high resolution, improved defect control in the immersion lithography, and good shelf stability.