Patents by Inventor Takeshi Ogashiwa
Takeshi Ogashiwa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10453648Abstract: There is provided a charged particle beam apparatus capable of obtaining a high SN ratio with a small electron irradiation amount. The charged particle beam apparatus includes a charged particle detection device. The charged particle detection device detects an analog pulse waveform signal (110) in a detection of emitted electrons (1 event) when one primary electron enters a sample, converts the analog pulse waveform signal (110) into a digital signal (111), perform a wave height discrimination (112) with the use of a unit peak corresponding electron, and outputs the digital signal (111) as a multilevel count value.Type: GrantFiled: October 22, 2015Date of Patent: October 22, 2019Assignee: Hitachi High-Technologies CorporationInventors: Yoshinobu Kimura, Natsuki Tsuno, Toshihide Agemura, Takeshi Ogashiwa, Junichiro Tomizawa
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Publication number: 20170345614Abstract: There is provided a charged particle beam apparatus capable of obtaining a high SN ratio with a small electron irradiation amount. The charged particle beam apparatus includes a charged particle detection device. The charged particle detection device detects an analog pulse waveform signal (110) in a detection of emitted electrons (1 event) when one primary electron enters a sample, converts the analog pulse waveform signal (110) into a digital signal (111), perform a wave height discrimination (112) with the use of a unit peak corresponding electron, and outputs the digital signal (111) as a multilevel count value.Type: ApplicationFiled: October 22, 2015Publication date: November 30, 2017Inventors: Yoshinobu KIMURA, Natsuki TSUNO, Toshihide AGEMURA, Takeshi OGASHIWA, Junichiro TOMIZAWA
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Patent number: 9040911Abstract: Conventionally, in a general-purpose scanning electron microscope, the maximum accelerating voltage which can be set is low, and hence thin crystal samples which can be observed under normal high-resolution observation conditions are limited to samples with large lattice spacing. For this reason, there has no means for accurately performing magnification calibration. As means for solving this problem, the present invention includes an electron source which generates an electron beam, a deflector which deflects the electron beam so as to scan a sample with the electron beam, an objective lens which focuses the electron beam on the sample, a detector which detects an elastically scattered electron and an inelastically scattered electron which are transmitted through the sample, and an aperture disposed between the sample and the detector to control detection angles of the elastically scattered electron and the inelastically scattered electron.Type: GrantFiled: March 25, 2013Date of Patent: May 26, 2015Assignee: Hitachi High-Technologies CorporationInventors: Takeshi Ogashiwa, Mitsugu Sato, Mitsuru Konno
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Publication number: 20150108351Abstract: Conventionally, in a general-purpose scanning electron microscope, the maximum accelerating voltage which can be set is low, and hence thin crystal samples which can be observed under normal high-resolution observation conditions are limited to samples with large lattice spacing. For this reason, there has no means for accurately performing magnification calibration. As means for solving this problem, the present invention includes an electron source which generates an electron beam, a deflector which deflects the electron beam so as to scan a sample with the electron beam, an objective lens which focuses the electron beam on the sample, a detector which detects an elastically scattered electron and an inelastically scattered electron which are transmitted through the sample, and an aperture disposed between the sample and the detector to control detection angles of the elastically scattered electron and the inelastically scattered electron.Type: ApplicationFiled: March 25, 2013Publication date: April 23, 2015Inventors: Takeshi Ogashiwa, Mitsugu Sato, Mitsuru Konno
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Patent number: 8853647Abstract: Provided is an electron microscope on which a specimen holder to have high voltage applied is mountable. The specimen holder has safety (electric shock prevention) features, and attention is paid to the specimen holder in terms of operability. The microscope includes a specimen holder having a function of applying a voltage to a specimen mount disposed to load a specimen, a voltage source that supplies the voltage to be applied to the specimen mount, a voltage cable connected at one end thereof to the specimen holder, and a relay unit to which the other end of the voltage cable is connected, the relay unit being placed on a supporting base that supports a lens barrel of the electron microscope.Type: GrantFiled: May 16, 2012Date of Patent: October 7, 2014Assignee: Hitachi High-Technologies CorporationInventors: Takeshi Ogashiwa, Masahiro Akatsu
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Publication number: 20140151555Abstract: Provided is an electron microscope on which a specimen holder with high voltage applied is mountable. The specimen holder has safety (electric shock prevention means), and attention is paid to the specimen holder in terms of operability. The present invention includes a specimen holder having a function of applying a voltage to a specimen mount, disposed to load a specimen, a voltage source that supplies the voltage to be applied to the specimen mount, a voltage cable connected at one end thereof to the specimen holder, and a relay unit to which the other end of the voltage cable is connected, the relay unit being placed on a supporting base that supports a lens barrel of the electron microscope.Type: ApplicationFiled: May 16, 2012Publication date: June 5, 2014Inventors: Takeshi Ogashiwa, Masahiro Akatsu
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Patent number: 8455823Abstract: The present invention provides a charged particle beam device in which signal electrons (14) are generated from a sample when the sample (11) is irradiated with a primary charged particle beam (3), and then enter different positions of a position-sensitive signal detector (16) in accordance with energy of the signal electrons (14), whereby an energy distribution image of the signal electrons generated from the sample is acquired. Accordingly, it becomes possible to discriminate and select signal electrons having arbitrary energy to thereby obtain an image to which information specific to the arbitrary energy is reflected, and to acquire various characteristic information of the sample.Type: GrantFiled: November 11, 2009Date of Patent: June 4, 2013Assignee: Hitachi High-Technologies CorporationInventors: Takashi Ichimura, Takeshi Ogashiwa, Yasuko Aoki
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Patent number: 8124940Abstract: Disclosed herein is a scanning electron microscope having a function for positioning an object point of an objective lens at a defined position even under an electronic optical condition in which it is difficult to accurately control the position of the object point of the objective lens. A deflector is provided to deflect an electron beam in order to detect the object point and located at a desired position of the object point of the objective lens. The deflector is not used to scan a sample with the electron beam. The scanning electron microscope has a function for automatically adjusting the position of the object point to ensure that the object point of the objective lens is located at the position of the object point detection deflector by using a characteristic in which a displacement of an image by the deflector is minimal when the object point is located at the position of the deflector.Type: GrantFiled: January 9, 2009Date of Patent: February 28, 2012Assignee: Hitachi High-Technologies CorporationInventors: Kunji Shigeto, Takeshi Ogashiwa
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Publication number: 20110233399Abstract: The present invention provides a charged particle beam device in which signal electrons (14) are generated from a sample when the sample (11) is irradiated with a primary charged particle beam (3), and then enter different positions of a position-sensitive signal detector (16) in accordance with energy of the signal electrons (14), whereby an energy distribution image of the signal electrons generated from the sample is acquired. Accordingly, it becomes possible to discriminate and select signal electrons having arbitrary energy to thereby obtain an image to which information specific to the arbitrary energy is reflected, and to acquire various characteristic information of the sample.Type: ApplicationFiled: November 11, 2009Publication date: September 29, 2011Inventors: Takashi Ichimura, Takeshi Ogashiwa, Yasuko Aoki
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Patent number: 8026491Abstract: A charged particle beam apparatus facilitating adjusting a beam center axis of a charged particle beam in a case where optical conditions are modified or in a case where the beam center axis of the charged particle beam is moved due to state variation of the apparatus. When the beam center axis of a primary charged particle beam is adjusted with a deflector (aligner), a first processing step for measuring the sensitivity of the aligner and a second processing step for detecting the deviation between the center of the primary charged particle beam and the center of the objective aperture are provided. The charged particle beam apparatus determines the aligner set values, using the aligner sensitivity measured in the first processing step and the amount of deviation detected in the second processing step, such that the primary charged particle beam passes through the center of the objective aperture and controls the aligner using the aligner set values.Type: GrantFiled: March 8, 2007Date of Patent: September 27, 2011Assignee: Hitachi High-Technologies CorporationInventors: Takeshi Ogashiwa, Mitsugu Sato, Atsushi Takane, Toshihide Agemura, Yuusuke Narita, Takeharu Shichiji, Shinichi Tomita, Sukehiro Ito, Junichi Katane
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Publication number: 20090184256Abstract: Disclosed herein is a scanning electron microscope having a function for positioning an object point of an objective lens at a defined position even under an electronic optical condition in which it is difficult to accurately control the position of the object point of the objective lens. A deflector is provided to deflect an electron beam in order to detect the object point and located at a desired position of the object point of the objective lens. The deflector is not used to scan a sample with the electron beam. The scanning electron microscope has a function for automatically adjusting the position of the object point to ensure that the object point of the objective lens is located at the position of the object point detection deflector by using a characteristic in which a displacement of an image by the deflector is minimal when the object point is located at the position of the deflector.Type: ApplicationFiled: January 9, 2009Publication date: July 23, 2009Inventors: Kunji Shigeto, Takeshi Ogashiwa
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Patent number: 7550724Abstract: An electron beam device includes an electron gun section having an internal space kept at an ultrahigh vacuum level for generating a primary electron beam, a mirror section having an internal space kept at a vacuum level lower than that of the electron gun section for scanning a specimen with an electron probe of the primary electron beam generated in the electron gun section and focused on the specimen, a differential exhaust diaphragm for providing communication in internal space between the electron gun section and the mirror section and passing the primary electron beam, and a control section for controlling respective constituent elements in the electron beam device. A diaphragm mechanism having a plurality of different diaphragm aperture diameters is provided between a second anode and a first condenser lens.Type: GrantFiled: September 14, 2006Date of Patent: June 23, 2009Assignee: Hitachi High-Technologies CorporationInventors: Takashi Ichimura, Takeshi Ogashiwa, Toshihide Agemura, Kenji Aoki
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Publication number: 20070284542Abstract: A charged particle beam apparatus facilitating adjusting the beam center axis of a charged particle beam in a case where optical conditions are modified or in a case where the beam center axis of the charged particle beam is moved due to state variation of the apparatus. When the beam center axis of a primary charged particle beam is adjusted with a deflector (aligner), a processing step (1) for measuring the sensitivity of the aligner and a processing step (2) for detecting the deviation between the center of the primary charged particle beam and the center of the objective aperture are provided. The charged particle beam apparatus has means for determining the aligner set values, using the aligner sensitivity measured in the processing step (1) and the amount of deviation detected in the processing step (2), such that the primary charged particle beam passes through the center of the objective aperture and controlling the aligner using the aligner set values.Type: ApplicationFiled: March 8, 2007Publication date: December 13, 2007Inventors: Takeshi Ogashiwa, Mitsugu Sato, Atsushi Takane, Toshihide Agemura, Yuusuke Narita, Takeharu Shichiji, Shinichi Tomita, Sukehiro Ito, Junichi Katane
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Publication number: 20070057185Abstract: An electron beam device includes an electron gun section having an internal space kept at an ultrahigh vacuum level for generating a primary electron beam, a mirror section having an internal space kept at a vacuum level lower than that of the electron gun section for scanning a specimen with an electron probe of the primary electron beam generated in the electron gun section and focused on the specimen, a differential exhaust diaphragm for providing communication in internal space between the electron gun section and the mirror section and passing the primary electron beam, and a control section for controlling respective constituent elements in the electron beam device. A diaphragm mechanism having a plurality of different diaphragm aperture diameters is provided between a second anode and a first condenser lens.Type: ApplicationFiled: September 14, 2006Publication date: March 15, 2007Inventors: Takashi Ichimura, Takeshi Ogashiwa, Toshihide Agemura, Kenji Aoki
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Publication number: 20060219907Abstract: A sample image display method and an image shift sensitivity measuring method to be executed in a charged particle beam apparatus are provided for accurately correcting an image drift in any observing and analyzing condition such as an accelerating voltage, a working distance or a raster rotation. When obtaining a reference image used for detecting a drift, the process is executed to obtain an image having the different image shift amount from that of the reference image at a time and to occasionally measure an image shift sensitivity. Then, the process is executed to automatically register this reference image and the image shift sensitivity and to detect a drift amount and control an image shift (correct a drift) according to the registered conditions when correcting the drift.Type: ApplicationFiled: December 20, 2005Publication date: October 5, 2006Inventors: Takeshi Ogashiwa, Mitsugu Sato, Atsushi Takane