Abstract: A method for manufacturing a device including a substrate and a second film disposed above the substrate includes: forming a first film above the substrate using a composition containing a polymerizable monomer and an oxidation inhibitor; and forming the second film by curing the first film in a state where at least one part of a mold having a convexo-concave pattern is in contact with the first film, or after at least one part of the mold is brought into contact with the first film. The oxidation inhibitor is at least one of a hindered amine compound and a hindered phenol compound having a molecular weight of 700 or more. The composition satisfies a relationship of (t0(T)?tx(T))/t0(T)×100?13.0. (t0(T) is a height of a convex part of cured film obtained by the specific method, and tx(T) is the corresponding height after heating at 260° C.

Abstract: A method of producing a molded product, the method including: pressing a mold having a surface including at least one of a concave part or a convex part against a photocurable positive electron beam resist; obtaining a molded product of the positive electron beam resist having a surface including a concave part and a convex part by irradiating the photocurable positive electron beam resist pressed against the resist with light to cure the resist; and partially decomposing the molded product of the positive electron beam resist in a region subjected to irradiation with an electron beam by irradiating the surface of the molded product of the positive electron beam resist with the electron beam.

Abstract: A method for manufacturing a device including a substrate and a second film disposed above the substrate includes: forming a first film above the substrate using a composition containing a polymerizable monomer and an oxidation inhibitor; and forming the second film by curing the first film in a state where at least one part of a mold having a convexo-concave pattern is in contact with the first film, or after at least one part of the mold is brought into contact with the first film. The oxidation inhibitor is at least one of a hindered amine compound and a hindered phenol compound having a molecular weight of 700 or more. The composition satisfies a relationship of (t0(T)?tx(T))/t0(T)×100?13.0. (t0(T) is a height of a convex part of cured film obtained by the specific method, and tx(T) is the corresponding height after heating at 260° C.

Abstract: Methods for producing an optical element having a cured layer with a concavo-convex structure are described. Such a method includes: forming a composition layer on a base material by using a composition containing a polymerizable compound and a photo initiator; forming a pattern formative layer by pressure-contacting a mold; and forming the cured layer having the concavo-convex structure by photo-curing the pattern formative layer, wherein the polymerizable compound contains (a) a urethane (meth)acrylate monomer, the composition contains 0.005 to 0.5 part by mass of the photo initiator with respect to 100 parts by mass of the polymerizable compound, and the cured layer has a film thickness of the concavo-convex structure within a range of 0.5 mm to 1 cm.

Abstract: Described is a composition comprising: a compound (A) having a substituent (a) being at least either one of an acryloyl group and a methacryloyl group, and a perfluoroalkylene group; and a compound (B) having a substituent (b) being either one of an acryloyl group and a methacryloyl group, and a substituent (c) being either one of an acryloyl group and a methacryloyl group.

Abstract: A suitable combination of a composition for formation of a resin mold with a pattern and a composition for formation of resin to which the pattern is transferred from the resin mold is found.

Abstract: A curable resin composition comprising: a fluorinated urethane(meth)acrylate represented by formula (1), wherein, R1, R2, R3 and R4 each independently represents a hydrogen atom or a methyl group, x and y each independently represents 1 or 2, and n represents an integer within the range of 1 to 10; R3 and R4 each independently represents the hydrogen atom when x and y are both 1; R3 represents the hydrogen atom and R4 represents the methyl group when x is 1 and y is 2; R3 represents the methyl group and R4 represents the hydrogen atom when x is 2 and y is 1; and R3 and R4 each independently represents the methyl group when x and y are both 2.

Abstract: Compositions are for formation of etch-resistant resins. Such resins are useful for manufacturing components or devices.

Abstract: A method for manufacturing a device including a substrate and a second film disposed above the substrate includes: forming a first film above the substrate using a composition containing a polymerizable monomer and an oxidation inhibitor; and forming the second film by curing the first film in a state where at least one part of a mold having a convexo-concave pattern is in contact with the first film, or after at least one part of the mold is brought into contact with the first film. The oxidation inhibitor is at least one of a hindered amine compound and a hindered phenol compound having a molecular weight of 700 or more. The composition satisfies a relationship of (t0(T)-tx(T))/t0(T)×100?13.0. (t0(T) is a height of a convex part of cured film obtained by the specific method, and tx(T) is the corresponding height after heating at 260° C.

Abstract: Described is a resinous structure derived from fluorine-containing polymers useful as a mold having excellent dimensional stability.

Abstract: A composition suitable for manufacturing components and devices (e.g., optical or electronic components, films, and devices) is disclosed. Such compositions may comprise a first compound having a first polymerizable group, a second polymerizable group, and a third polymerizable group. The first compound preferably has no aromatic group, and the second compound is preferably able to generate a radical by cleavage of a bond of the second compound. The first polymerizable group, the second polymerizable group and the third polymerizable group may be identical substituents. Further, the first polymerizable group may be connected to a first chain connected to a first atom; the second polymerizable group may be connected to a second chain connected to the first atom; and the third polymerizable group may be connected to a third chain connected to the first atom.

Abstract: A suitable combination of a composition for formation of a resin mold with a pattern and a composition for formation of resin to which the pattern is transferred from the resin mold is found.

Abstract: Compositions are for formation of etch-resistant resins. Such resins are useful for manufacturing components or devices.

Abstract: Compositions that are especially suitable for optical components are disclosed.

Abstract: Described is a resinous article of manufacture that is wrinkle-resistant and is warpage-resistant when subjected to very high temperatures. Such an article is useful as an optical lens.

Abstract: Described is a composition comprising: a compound (A) having a substituent (a) being at least either one of an acryloyl group and a methacryloyl group, and a perfluoroalkylene group; and a compound (B) having a substituent (b) being either one of an acryloyl group and a methacryloyl group, and a substituent (c) being either one of an acryloyl group and a methacryloyl group.

Abstract: A suitable composition for manufacturing components and devices is disclosed.

Abstract: A curable resin composition comprising: a fluorinated urethane(meth)acrylate represented by formula (1), wherein, R1, R2, R3 and R4 each independently represents a hydrogen atom or a methyl group, x and y each independently represents 1 or 2, and n represents an integer within the range of 1 to 10; R3 and R4 each independently represents the hydrogen atom when x and y are both 1; R3 represents the hydrogen atom and R4 represents the methyl group when x is 1 and y is 2; R3 represents the methyl group and R4 represents the hydrogen atom when x is 2 and y is 1; and R3 and R4 each independently represents the methyl group when x and y are both 2.

Abstract: A composition suitable for manufacturing components and devices (e.g., optical or electronic components, films, and devices) is disclosed. Such compositions may comprise a first compound having a first polymerizable group, a second polymerizable group, and a third polymerizable group. The first compound preferably has no aromatic group, and the second compound is preferably able to generate a radical by cleavage of a bond of the second compound. The first polymerizable group, the second polymerizable group and the third polymerizable group may be identical substituents. Further, the first polymerizable group may be connected to a first chain connected to a first atom; the second polymerizable group may be connected to a second chain connected to the first atom; and the third polymerizable group may be connected to a third chain connected to the first atom.

Abstract: A suitable composition for manufacturing components and devices is disclosed.