Abstract: A loading assistance device includes an infeed unit to which a plurality of articles are transported, a work area, a transporter that transports the plurality of articles from the infeed unit to the work area, a reader that reads identification information on the plurality of articles, a writer that writes operation assistance information on a surface of each of the plurality of articles, and a control system. The work area includes a plurality of work sections in which supports are placed. The operation assistance information includes section specification information specifying a work section of the plurality of work sections for each of the plurality of articles to undergo loading. The control system generates the section specification information to be written on each of the plurality of articles based on the identification information to allow articles in a same category to be preferentially loaded onto a same support of the supports.

Abstract: A piezoelectric thin film resonator includes: a substrate; a piezoelectric film located on the substrate and including a penetration hole penetrating therethrough; a lower electrode and an upper electrode facing each other across at least a part of the piezoelectric film; and a protective film covering an upper surface of the piezoelectric film, a side surface of the piezoelectric film, and an inner surface of the penetration hole.

Abstract: An inductor includes: a substrate; a first wiring line located on the substrate; a second wiring line located above the first wiring line and spaced from the first wiring line through an air gap, at least a part of the second wiring line overlapping with at least a part of the first wiring line in plan view; a first supporting post connecting ends of the first and second wiring lines such that a direct current conducts between the first and second wiring lines through the first supporting post; and a second supporting post provided such that the second supporting post overlaps with the second wiring line in plan view, and overlaps with the first wiring line in plan view or is surrounded by the first wiring line in plan view, the second supporting post being insulated from the first wiring line, the second supporting post supporting the second wiring line.

Abstract: An acoustic wave device includes: a first substrate having a first surface and a side surface; an acoustic wave resonator located on the first surface of the first substrate; and a first insulator film that covers the acoustic wave resonator and is in contact with at least a part, which is located closer to the first surface, of the side surface of the first substrate.

Abstract: An acoustic wave device includes: a piezoelectric substrate; a comb-shaped electrode located on the piezoelectric substrate; a wiring layer located on the piezoelectric substrate and electrically connected with the comb-shaped electrode; a first insulating film located on the piezoelectric substrate, the first insulating film covering the comb-shaped electrode, having an aperture on the wiring layer, and being thicker than the comb-shaped electrode; a second insulating film covering an upper surface of the first insulating film and at least a part of a side surface of the first insulating film in the aperture and having a higher moisture resistance than the first insulating film; and a pad being in contact with the wiring layer exposed by the aperture.

Abstract: An inductor includes: a substrate; a first wiring line located on the substrate; a second wiring line located above the first wiring line and spaced from the first wiring line through an air gap, at least a part of the second wiring line overlapping with at least a part of the first wiring line in plan view; a first supporting post connecting ends of the first and second wiring lines such that a direct current conducts between the first and second wiring lines through the first supporting post; and a second supporting post provided such that the second supporting post overlaps with the second wiring line in plan view, and overlaps with the first wiring line in plan view or is surrounded by the first wiring line in plan view, the second supporting post being insulated from the first wiring line, the second supporting post supporting the second wiring line.

Abstract: A belt device includes a belt that is rotatable and a driving rotator to drive and rotate the belt and to be accidentally adhered with a foreign substance. The driving rotator includes a coating layer as a surface layer. The coating layer includes a plurality of fine particles.

Abstract: An acoustic wave device includes: a first substrate having a first surface and a side surface; an acoustic wave resonator located on the first surface of the first substrate; and a first insulator film that covers the acoustic wave resonator and is in contact with at least a part, which is located closer to the first surface, of the side surface of the first substrate.

Abstract: A piezoelectric thin film resonator includes: a substrate; a piezoelectric film that is located on the substrate; a lower electrode that is located on the substrate through an air gap, makes contact with the piezoelectric film, and includes a thin film part and a thick film part in which a distance from the air gap to a surface making contact with the piezoelectric film is greater than that of the thin film part in a region overlapping with the air gap in plan view; and an upper electrode that is located on an opposite surface of the piezoelectric film from a surface making contact with the lower electrode.

Abstract: A piezoelectric thin film resonator includes: a substrate; a lower electrode and an upper electrode located on the substrate; a piezoelectric film, at least a part of the piezoelectric film being sandwiched between the upper electrode and the lower electrode, the piezoelectric film including a discontinuous portion in which the piezoelectric film discontinues in at least a part of a region surrounding a center region that includes a center of a resonance region where the upper electrode and the lower electrode face each other across the at least a part of the piezoelectric film.

Abstract: A piezoelectric thin film resonator includes: a substrate; a piezoelectric film located on the substrate and including a penetration hole penetrating therethrough; a lower electrode and an upper electrode facing each other across at least a part of the piezoelectric film; and a protective film covering an upper surface of the piezoelectric film, a side surface of the piezoelectric film, and an inner surface of the penetration hole.

Abstract: An acoustic wave device includes: a piezoelectric substrate; a comb-shaped electrode located on the piezoelectric substrate; a wiring layer located on the piezoelectric substrate and electrically connected with the comb-shaped electrode; a first insulating film located on the piezoelectric substrate, the first insulating film covering the comb-shaped electrode, having an aperture on the wiring layer, and being thicker than the comb-shaped electrode; a second insulating film covering an upper surface of the first insulating film and at least a part of a side surface of the first insulating film in the aperture and having a higher moisture resistance than the first insulating film; and a pad being in contact with the wiring layer exposed by the aperture.

Abstract: A belt device includes a belt that is rotatable and a driving rotator to drive and rotate the belt and to be accidentally adhered with a foreign substance. The driving rotator includes a coating layer as a surface layer. The coating layer includes a plurality of fine particles.

Abstract: An image forming apparatus includes a plurality of image bearers, a plurality of developing devices, a plurality of first transfer devices disposed opposite the plurality of image bearers, a second transfer device, a cleaning device to remove toner remaining on the intermediate transferor after a secondary transfer process, and a processor to control the plurality of developing devices to perform a refresh process to discharge toner from the plurality of developing devices to the plurality of image bearers. Among toner of the colors, toner having a first circularity first reaches the cleaning device and toner having a second circularity higher than the first circularity subsequently reaches the cleaning device in the refresh process.

Abstract: A piezoelectric thin film resonator includes: a substrate; a piezoelectric film that is located on the substrate; a lower electrode that is located on the substrate through an air gap, makes contact with the piezoelectric film, and includes a thin film part and a thick film part in which a distance from the air gap to a surface making contact with the piezoelectric film is greater than that of the thin film part in a region overlapping with the air gap in plan view; and an upper electrode that is located on an opposite surface of the piezoelectric film from a surface making contact with the lower electrode.

Abstract: An image forming apparatus includes an intermediate transfer body, a plurality of image bearers, a plurality of developing devices, a plurality of primary transfer devices, a secondary transfer device, and a cleaner. The plurality of image bearers are disposed side by side along the intermediate transfer body. In a refreshing mode, the plurality of developing devices form toner images on the plurality of image bearers during a non-image-formation period and the cleaner cleans a surface of the intermediate transfer body. In the refreshing mode, a toner image formed on one image bearer of the plurality of image bearers, which differs from a most downstream image bearer of the plurality of image bearers in a direction of conveyance of the intermediate transfer body, reaches the cleaner first of the toner images formed on the plurality of image bearers.

Abstract: A piezoelectric thin film resonator includes: a substrate; a piezoelectric film provided on the substrate; a lower electrode and an upper electrode that sandwich at least a part of the piezoelectric film and face with each other; and an inserted film that is inserted in the piezoelectric film, is provided on an outer circumference region in a resonance region in which the lower electrode and the upper electrode sandwich the piezoelectric film and face with each other, is not provided in a center region of the resonance region, and has a cutout in the resonance region.

Abstract: A process unit includes a rotatable image bearer, an optical writing head to expose the image bearer within an maximum exposure range in an axial direction of the image bearer, a developer bearer, spacers disposed in axial end portions of the image bearer to determine a position of the optical writing head relative to the image bearer and slidingly contact the image bearer, a cleaner disposed downstream from the developer bearer in an image bearer rotation direction, and a remover to slidingly contact the axial end portion of the image bearer to remove a substance adhering thereto. In the axial direction, inner ends of the spacers are positioned inside a toner layer range of the developer bearer extending beyond a largest sheet width. The remover is disposed downstream from the cleaner and crossing a line extending from the inner end of the spacer perpendicularly to the axial direction.

Abstract: A piezoelectric thin film resonator includes: a substrate; a piezoelectric film provided on the substrate; a lower electrode and an upper electrode that sandwich at least a part of the piezoelectric film and face with each other; and an inserted film that is inserted in the piezoelectric film, is provided on an outer circumference region in a resonance region in which the lower electrode and the upper electrode sandwich the piezoelectric film and face with each other, is not provided in a center region of the resonance region, and has a cutout in the resonance region.

Abstract: A piezoelectric thin film resonator includes: a substrate; a piezoelectric film located on the substrate; a lower electrode and an upper electrode facing each other across at least a part of the piezoelectric film; and an insertion film inserted in the piezoelectric film, located in at least a part of an outer peripheral region within a resonance region where the lower electrode and the upper electrode face each other across the piezoelectric film, and not located in a center region of the resonance region, wherein a difference between a total film thickness of the piezoelectric film and the insertion film in a first region, in which the insertion film is inserted, within the resonance region and a film thickness of the piezoelectric film in a second region, in which the insertion film is not inserted, is less than a film thickness of the insertion film.