Patents by Inventor Takeshi Shirai

Takeshi Shirai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11739360
    Abstract: [Problem] To provide a novel technology that can promote the production of interleukin-6, and to provide a novel technology that can promote the production of interleukin-10. [Solution] Provided are an interleukin-6 production promoter that comprises a crude yeast cell wall hydrolysate, and an interleukin-10 production promoter that comprises a crude yeast cell wall hydrolysate.
    Type: Grant
    Filed: June 3, 2019
    Date of Patent: August 29, 2023
    Assignee: ASAHI GROUP HOLDINGS, LTD.
    Inventors: Taichi Minami, Yu Imai, Tetsuya Ishida, Junpei Yoshida, Takeshi Shirai
  • Publication number: 20220211786
    Abstract: Provided is an immunostimulator containing glucan and having an immunostimulatory effect. This immunostimulator contains glucan and lipid derived from yeast cell wall and is water-insoluble. A total content percentage of glucan and lipid is 80 mass % or more, and a content ratio of lipid to glucan is 0.1 or more and 0.4 or less.
    Type: Application
    Filed: September 5, 2019
    Publication date: July 7, 2022
    Applicant: Asahi Group Holdings, Ltd.
    Inventors: Takeshi SHIRAI, Jumpei YOSHIDA
  • Publication number: 20210254118
    Abstract: [Problem] To provide a novel technology that can promote the production of interleukin-6, and to provide a novel technology that can promote the production of interleukin-10. [Solution] Provided are an interleukin-6 production promoter that comprises a crude yeast cell wall hydrolysate, and an interleukin-10 production promoter that comprises a crude yeast cell wall hydrolysate.
    Type: Application
    Filed: June 3, 2019
    Publication date: August 19, 2021
    Applicant: ASAHI GROUP HOLDINGS, LTD.
    Inventors: Taichi MINAMI, Yu IMAI, Tetsuya ISHIDA, Junpei YOSHIDA, Takeshi SHIRAI
  • Publication number: 20200329662
    Abstract: [Problem] To provide a novel livestock bedding and a novel compost. [Solution] A livestock bedding to be used for rearing livestock, said livestock bedding comprising a shredded product of a plant belonging to a genus Erianthus.
    Type: Application
    Filed: March 14, 2019
    Publication date: October 22, 2020
    Applicant: ASAHI GROUP HOLDINGS, LTD.
    Inventors: Tetsuya ISHIDA, Takeshi SHIRAI, Kazuya IWASAKI
  • Patent number: 10610981
    Abstract: The present invention provides a solder paste free of reducing agents and activators, and a method for producing a soldered product in which the solder paste is used to achieve solder bonding. The solder paste for reducing gas of the present invention is a solder paste for reducing gas used together a reducing gas. The solder paste contains a solder powder; a thixotropic agent that is solid at normal temperature; and a solvent, and is free of reducing agents for removal of oxide films and free of activators for improvement of reducibility.
    Type: Grant
    Filed: September 29, 2016
    Date of Patent: April 7, 2020
    Assignees: ORIGIN COMPANY, LIMITED, KOKI COMPANY LIMITED
    Inventors: Yukiko Hayashi, Arisa Shiraishi, Naoto Ozawa, Takayuki Suzuki, Takeshi Shirai, Noriyoshi Uchida, Mitsuyasu Furusawa
  • Publication number: 20190009375
    Abstract: The present invention provides a solder paste free of reducing agents and activators, and a method for producing a soldered product in which the solder paste is used to achieve solder bonding. The solder paste for reducing gas of the present invention is a solder paste for reducing gas used together a reducing gas. The solder paste contains a solder powder; a thixotropic agent that is solid at normal temperature; and a solvent, and is free of reducing agents for removal of oxide films and free of activators for improvement of reducibility.
    Type: Application
    Filed: September 29, 2016
    Publication date: January 10, 2019
    Inventors: Yukiko HAYASHI, Arisa SHIRAISHI, Naoto OZAWA, Takayuki SUZUKI, Takeshi SHIRAI, Noriyoshi UCHIDA, Mitsuyasu FURUSAWA
  • Patent number: 10175584
    Abstract: An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system.
    Type: Grant
    Filed: October 17, 2013
    Date of Patent: January 8, 2019
    Assignee: NIKON CORPORATION
    Inventors: Takeshi Shirai, Takao Kokubun, Hitoshi Ishizawa, Atsunobu Murakami
  • Patent number: 9046796
    Abstract: An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system.
    Type: Grant
    Filed: February 28, 2012
    Date of Patent: June 2, 2015
    Assignee: NIKON CORPORATION
    Inventors: Takeshi Shirai, Takao Kokubun, Hitoshi Ishizawa, Atsunobu Murakami
  • Patent number: 8957286
    Abstract: Provided are a plant capable of bearing seedless fruits stably over several generations, a seedless fruit generated from this plant, a method of producing a variety capable of readily and reliably bearing seedless fruits, a variety produced by this production method, and a seedless fruit generated from the thus produced variety.
    Type: Grant
    Filed: January 28, 2009
    Date of Patent: February 17, 2015
    Assignee: Syngenta Participations AG
    Inventor: Takeshi Shirai
  • Publication number: 20140313495
    Abstract: An optical element for use in an exposure apparatus configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided directly on a surface of a transmissive optical element on the substrate's side of the projection optical system, and a second anti-dissolution member formed on the first anti-dissolution member on the substrate's side of the first anti-dissolution member.
    Type: Application
    Filed: June 30, 2014
    Publication date: October 23, 2014
    Applicant: Nikon Corporation
    Inventor: Takeshi SHIRAI
  • Patent number: 8767173
    Abstract: A lithographic projection apparatus projects a pattern from a patterning device onto a substrate using a projection system and includes a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid. An element of the projection system through which the pattern is projected has, on a surface configured to be in contact with the liquid, a protective coating which is substantially insoluble in the liquid.
    Type: Grant
    Filed: December 15, 2010
    Date of Patent: July 1, 2014
    Assignee: Nikon Corporation
    Inventor: Takeshi Shirai
  • Publication number: 20140043592
    Abstract: An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system.
    Type: Application
    Filed: October 17, 2013
    Publication date: February 13, 2014
    Applicant: NIKON CORPORATION
    Inventors: Takeshi SHIRAI, Takao KOKUBUN, Hitoshi ISHIZAWA, Atsunobu MURAKAMI
  • Publication number: 20120291921
    Abstract: A flux for a solder paste according to an aspect of the invention includes an acrylic resin obtained by radically copolymerizing a (meth)acrylate having a C6-C15 alkyl group and a (meth)acrylate other than the above-mentioned (meth)acrylate; and rosins. The weight ratio of the acrylic resin is 0.5 or greater and 1.2 or less when the weight of the rosins is taken as 1, and the flux for a solder paste is fluidized by application of a shear force of 10 Pa or greater and 150 Pa or less.
    Type: Application
    Filed: December 6, 2010
    Publication date: November 22, 2012
    Applicants: ARAKAWA CHEMICAL INDUSTRIES, LTD., TOYOTA JIDOSHA KABUSHIKI KAISHA, HARIMA CHEMICALS, INC., FUJITSU TEN LIMITED, KOKI COMPANY LIMITED, DENSO CORPORATION
    Inventors: Eiji Iwamura, Kazushi Gotoh, Shinsuke Nagasaka, Takayasu Yoshioka, Masayoshi Utsuno, Atsuo Nakamura, Teruo Okochi, Masaki Sanji, Takuji Sukekawa, Kenshi Ikedo, Yoshiyuki Andoh, Takeshi Shirai, Kimiaki Mori, Rie Wada, Kensuke Nakanishi, Masami Aihara, Seishi Kumamoto
  • Publication number: 20120291922
    Abstract: A solder paste according to an aspect of the invention includes, within a flux, an activator that has a dibasic acid with a molecular weight of 250 or less, a monobasic acid with a molecular weight of 150 or greater and 300 or less, and a dibasic acid with a molecular weight of 300 or greater and 600 or less; and at least one resin additive selected from the group consisting of high-density polyethylenes and polypropylenes. The solder paste has the resin additive in an amount of 4% by weight or greater and 12% by weight or less when the total amount of the flux is taken as 100% by weight, and has a viscosity of 400 Pa·s or greater at 80° C.
    Type: Application
    Filed: December 6, 2010
    Publication date: November 22, 2012
    Applicants: ARAKAWA CHEMICAL INDUSTRIES, LTD., TOYOTA JIDOSHA KABUSHIKI KAISHA, HARIMA CHEMICALS, INC., FUJITSU TEN LIMITED, KOKI COMPANY LIMITED, DENSO CORPORATION
    Inventors: Eiji Iwamura, Kazushi Gotoh, Fumio Ishiga, Takayasu Yoshioka, Masayoshi Utsuno, Atsuo Nakamura, Teruo Okochi, Masaki Sanji, Takuji Sukekawa, Kenshi Ikedo, Yoshiyuki Andoh, Takeshi Shirai, Kimiaki Mori, Rie Wada, Kensuke Nakanishi, Masami Aihara, Seishi Kumamoto
  • Publication number: 20120212716
    Abstract: An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system.
    Type: Application
    Filed: February 28, 2012
    Publication date: August 23, 2012
    Applicant: NIKON CORPORATION
    Inventors: Takeshi SHIRAI, Takao KOKUBUN, Hitoshi ISHIZAWA, Atsunobu MURAKAMI
  • Publication number: 20120206705
    Abstract: An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system.
    Type: Application
    Filed: April 18, 2012
    Publication date: August 16, 2012
    Applicant: NIKON CORPORATION
    Inventors: Takeshi SHIRAI, Takao KOKUBUN, Hitoshi ISHIZAWA, Atsunobu MURAKAMI
  • Patent number: 8189170
    Abstract: An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system.
    Type: Grant
    Filed: February 25, 2010
    Date of Patent: May 29, 2012
    Assignee: Nikon Corporation
    Inventors: Takeshi Shirai, Takao Kokubun, Hitoshi Ishizawa, Atsunobu Murakami
  • Patent number: 8149381
    Abstract: An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system.
    Type: Grant
    Filed: May 2, 2006
    Date of Patent: April 3, 2012
    Assignee: Nikon Corporation
    Inventors: Takeshi Shirai, Takao Kokubun, Hitoshi Ishizawa, Atsunobu Murakami
  • Patent number: 7993008
    Abstract: An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system.
    Type: Grant
    Filed: November 14, 2008
    Date of Patent: August 9, 2011
    Assignee: Nikon Corporation
    Inventors: Takeshi Shirai, Takao Kokubun, Hitoshi Ishizawa, Atsunobu Murakami
  • Publication number: 20110128514
    Abstract: A lithographic projection apparatus projects a pattern from a patterning device onto a substrate using a projection system and includes a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid. An element of the projection system through which the pattern is projected has, on a surface configured to be in contact with the liquid, a protective coating which is substantially insoluble in the liquid.
    Type: Application
    Filed: December 15, 2010
    Publication date: June 2, 2011
    Applicant: NIKON CORPORATION
    Inventor: Takeshi Shirai