Patents by Inventor Takeshi Shirai
Takeshi Shirai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240226135Abstract: Provided is an immunostimulator that contains ?-glucan derived from yeast cell walls and has a high immunostimulating effect. The immunostimulator contains ?-glucan derived from yeast cell walls and the ?-glucan content is from 25% by mass to 45% by mass.Type: ApplicationFiled: April 20, 2022Publication date: July 11, 2024Applicant: Asahi Group Holdings, Ltd.Inventors: Yu SHIMADA, Jumpei YOSHIDA, Taichi MINAMI, Tetsuya ISHIDA, Takeshi SHIRAI, Yu IMAI
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Patent number: 11739360Abstract: [Problem] To provide a novel technology that can promote the production of interleukin-6, and to provide a novel technology that can promote the production of interleukin-10. [Solution] Provided are an interleukin-6 production promoter that comprises a crude yeast cell wall hydrolysate, and an interleukin-10 production promoter that comprises a crude yeast cell wall hydrolysate.Type: GrantFiled: June 3, 2019Date of Patent: August 29, 2023Assignee: ASAHI GROUP HOLDINGS, LTD.Inventors: Taichi Minami, Yu Imai, Tetsuya Ishida, Junpei Yoshida, Takeshi Shirai
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Publication number: 20220211786Abstract: Provided is an immunostimulator containing glucan and having an immunostimulatory effect. This immunostimulator contains glucan and lipid derived from yeast cell wall and is water-insoluble. A total content percentage of glucan and lipid is 80 mass % or more, and a content ratio of lipid to glucan is 0.1 or more and 0.4 or less.Type: ApplicationFiled: September 5, 2019Publication date: July 7, 2022Applicant: Asahi Group Holdings, Ltd.Inventors: Takeshi SHIRAI, Jumpei YOSHIDA
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Publication number: 20210254118Abstract: [Problem] To provide a novel technology that can promote the production of interleukin-6, and to provide a novel technology that can promote the production of interleukin-10. [Solution] Provided are an interleukin-6 production promoter that comprises a crude yeast cell wall hydrolysate, and an interleukin-10 production promoter that comprises a crude yeast cell wall hydrolysate.Type: ApplicationFiled: June 3, 2019Publication date: August 19, 2021Applicant: ASAHI GROUP HOLDINGS, LTD.Inventors: Taichi MINAMI, Yu IMAI, Tetsuya ISHIDA, Junpei YOSHIDA, Takeshi SHIRAI
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Publication number: 20200329662Abstract: [Problem] To provide a novel livestock bedding and a novel compost. [Solution] A livestock bedding to be used for rearing livestock, said livestock bedding comprising a shredded product of a plant belonging to a genus Erianthus.Type: ApplicationFiled: March 14, 2019Publication date: October 22, 2020Applicant: ASAHI GROUP HOLDINGS, LTD.Inventors: Tetsuya ISHIDA, Takeshi SHIRAI, Kazuya IWASAKI
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Patent number: 10610981Abstract: The present invention provides a solder paste free of reducing agents and activators, and a method for producing a soldered product in which the solder paste is used to achieve solder bonding. The solder paste for reducing gas of the present invention is a solder paste for reducing gas used together a reducing gas. The solder paste contains a solder powder; a thixotropic agent that is solid at normal temperature; and a solvent, and is free of reducing agents for removal of oxide films and free of activators for improvement of reducibility.Type: GrantFiled: September 29, 2016Date of Patent: April 7, 2020Assignees: ORIGIN COMPANY, LIMITED, KOKI COMPANY LIMITEDInventors: Yukiko Hayashi, Arisa Shiraishi, Naoto Ozawa, Takayuki Suzuki, Takeshi Shirai, Noriyoshi Uchida, Mitsuyasu Furusawa
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Publication number: 20190009375Abstract: The present invention provides a solder paste free of reducing agents and activators, and a method for producing a soldered product in which the solder paste is used to achieve solder bonding. The solder paste for reducing gas of the present invention is a solder paste for reducing gas used together a reducing gas. The solder paste contains a solder powder; a thixotropic agent that is solid at normal temperature; and a solvent, and is free of reducing agents for removal of oxide films and free of activators for improvement of reducibility.Type: ApplicationFiled: September 29, 2016Publication date: January 10, 2019Inventors: Yukiko HAYASHI, Arisa SHIRAISHI, Naoto OZAWA, Takayuki SUZUKI, Takeshi SHIRAI, Noriyoshi UCHIDA, Mitsuyasu FURUSAWA
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Patent number: 10175584Abstract: An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system.Type: GrantFiled: October 17, 2013Date of Patent: January 8, 2019Assignee: NIKON CORPORATIONInventors: Takeshi Shirai, Takao Kokubun, Hitoshi Ishizawa, Atsunobu Murakami
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Patent number: 9046796Abstract: An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system.Type: GrantFiled: February 28, 2012Date of Patent: June 2, 2015Assignee: NIKON CORPORATIONInventors: Takeshi Shirai, Takao Kokubun, Hitoshi Ishizawa, Atsunobu Murakami
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Patent number: 8957286Abstract: Provided are a plant capable of bearing seedless fruits stably over several generations, a seedless fruit generated from this plant, a method of producing a variety capable of readily and reliably bearing seedless fruits, a variety produced by this production method, and a seedless fruit generated from the thus produced variety.Type: GrantFiled: January 28, 2009Date of Patent: February 17, 2015Assignee: Syngenta Participations AGInventor: Takeshi Shirai
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Publication number: 20140313495Abstract: An optical element for use in an exposure apparatus configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided directly on a surface of a transmissive optical element on the substrate's side of the projection optical system, and a second anti-dissolution member formed on the first anti-dissolution member on the substrate's side of the first anti-dissolution member.Type: ApplicationFiled: June 30, 2014Publication date: October 23, 2014Applicant: Nikon CorporationInventor: Takeshi SHIRAI
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Patent number: 8767173Abstract: A lithographic projection apparatus projects a pattern from a patterning device onto a substrate using a projection system and includes a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid. An element of the projection system through which the pattern is projected has, on a surface configured to be in contact with the liquid, a protective coating which is substantially insoluble in the liquid.Type: GrantFiled: December 15, 2010Date of Patent: July 1, 2014Assignee: Nikon CorporationInventor: Takeshi Shirai
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Publication number: 20140043592Abstract: An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system.Type: ApplicationFiled: October 17, 2013Publication date: February 13, 2014Applicant: NIKON CORPORATIONInventors: Takeshi SHIRAI, Takao KOKUBUN, Hitoshi ISHIZAWA, Atsunobu MURAKAMI
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Publication number: 20120291922Abstract: A solder paste according to an aspect of the invention includes, within a flux, an activator that has a dibasic acid with a molecular weight of 250 or less, a monobasic acid with a molecular weight of 150 or greater and 300 or less, and a dibasic acid with a molecular weight of 300 or greater and 600 or less; and at least one resin additive selected from the group consisting of high-density polyethylenes and polypropylenes. The solder paste has the resin additive in an amount of 4% by weight or greater and 12% by weight or less when the total amount of the flux is taken as 100% by weight, and has a viscosity of 400 Pa·s or greater at 80° C.Type: ApplicationFiled: December 6, 2010Publication date: November 22, 2012Applicants: ARAKAWA CHEMICAL INDUSTRIES, LTD., TOYOTA JIDOSHA KABUSHIKI KAISHA, HARIMA CHEMICALS, INC., FUJITSU TEN LIMITED, KOKI COMPANY LIMITED, DENSO CORPORATIONInventors: Eiji Iwamura, Kazushi Gotoh, Fumio Ishiga, Takayasu Yoshioka, Masayoshi Utsuno, Atsuo Nakamura, Teruo Okochi, Masaki Sanji, Takuji Sukekawa, Kenshi Ikedo, Yoshiyuki Andoh, Takeshi Shirai, Kimiaki Mori, Rie Wada, Kensuke Nakanishi, Masami Aihara, Seishi Kumamoto
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Publication number: 20120291921Abstract: A flux for a solder paste according to an aspect of the invention includes an acrylic resin obtained by radically copolymerizing a (meth)acrylate having a C6-C15 alkyl group and a (meth)acrylate other than the above-mentioned (meth)acrylate; and rosins. The weight ratio of the acrylic resin is 0.5 or greater and 1.2 or less when the weight of the rosins is taken as 1, and the flux for a solder paste is fluidized by application of a shear force of 10 Pa or greater and 150 Pa or less.Type: ApplicationFiled: December 6, 2010Publication date: November 22, 2012Applicants: ARAKAWA CHEMICAL INDUSTRIES, LTD., TOYOTA JIDOSHA KABUSHIKI KAISHA, HARIMA CHEMICALS, INC., FUJITSU TEN LIMITED, KOKI COMPANY LIMITED, DENSO CORPORATIONInventors: Eiji Iwamura, Kazushi Gotoh, Shinsuke Nagasaka, Takayasu Yoshioka, Masayoshi Utsuno, Atsuo Nakamura, Teruo Okochi, Masaki Sanji, Takuji Sukekawa, Kenshi Ikedo, Yoshiyuki Andoh, Takeshi Shirai, Kimiaki Mori, Rie Wada, Kensuke Nakanishi, Masami Aihara, Seishi Kumamoto
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Publication number: 20120212716Abstract: An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system.Type: ApplicationFiled: February 28, 2012Publication date: August 23, 2012Applicant: NIKON CORPORATIONInventors: Takeshi SHIRAI, Takao KOKUBUN, Hitoshi ISHIZAWA, Atsunobu MURAKAMI
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Publication number: 20120206705Abstract: An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system.Type: ApplicationFiled: April 18, 2012Publication date: August 16, 2012Applicant: NIKON CORPORATIONInventors: Takeshi SHIRAI, Takao KOKUBUN, Hitoshi ISHIZAWA, Atsunobu MURAKAMI
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Patent number: 8189170Abstract: An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system.Type: GrantFiled: February 25, 2010Date of Patent: May 29, 2012Assignee: Nikon CorporationInventors: Takeshi Shirai, Takao Kokubun, Hitoshi Ishizawa, Atsunobu Murakami
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Patent number: 8149381Abstract: An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system.Type: GrantFiled: May 2, 2006Date of Patent: April 3, 2012Assignee: Nikon CorporationInventors: Takeshi Shirai, Takao Kokubun, Hitoshi Ishizawa, Atsunobu Murakami
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Patent number: 7993008Abstract: An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system.Type: GrantFiled: November 14, 2008Date of Patent: August 9, 2011Assignee: Nikon CorporationInventors: Takeshi Shirai, Takao Kokubun, Hitoshi Ishizawa, Atsunobu Murakami