Abstract: A template of one embodiment includes an alignment mark. The alignment mark includes a first main pattern and a first auxiliary pattern. In the first main pattern, a first part and a second part are disposed according to a predetermined repeating pattern. The first auxiliary pattern is configured as a pattern opposite to the repeating pattern in a region outside an end of the first main pattern.

Abstract: According to one embodiment, an imprint method is provided. In the imprint method, a template including a mechanoluminescent material is brought into contact with a resist on a substrate. The posture of the template is adjusted on the basis of the intensity of mechanoluminescence from the template. Light is emitted to the resist to harden the resist. The template is separated from the resist.

Abstract: According to one embodiment, an imprint method is provided. In the imprint method, a template including a mechanoluminescent material is brought into contact with a resist on a substrate. The posture of the template is adjusted on the basis of the intensity of mechanoluminescence from the template. Light is emitted to the resist to harden the resist. The template is separated from the resist.

Abstract: According to an embodiment, a first alignment mark includes a first template-side mark in which a plurality of first portions are arranged with a first period, and a second template-side mark in which a plurality of second portions are arranged with a second period. A second alignment mark includes a first wafer-side mark in which a plurality of third portions are arranged with a third period, and a second wafer-side mark in which a plurality of fourth portions are arranged with a fourth period. The first wafer-side mark and the first template-side mark are configured to be overlaid with each other to constitute a first moire mark. The second wafer-side mark and the second template-side mark are configured to be overlaid with each other to constitute a second moire mark. An average period of the first moire mark and an average period of the second moire mark are different from each other.

Abstract: According to an embodiment, a first alignment mark includes a first template-side mark in which a plurality of first portions are arranged with a first period, and a second template-side mark in which a plurality of second portions are arranged with a second period. A second alignment mark includes a first wafer-side mark in which a plurality of third portions are arranged with a third period, and a second wafer-side mark in which a plurality of fourth portions are arranged with a fourth period. The first wafer-side mark and the first template-side mark are configured to be overlaid with each other to constitute a first moire mark. The second wafer-side mark and the second template-side mark are configured to be overlaid with each other to constitute a second moire mark. An average period of the first moire mark and an average period of the second moire mark are different from each other.

Abstract: According to one embodiment, an imprint method is provided. In the imprint method, a template including a mechanoluminescent material is brought into contact with a resist on a substrate. The posture of the template is adjusted on the basis of the intensity of mechanoluminescence from the template. Light is emitted to the resist to harden the resist. The template is separated from the resist.

Abstract: According to one embodiment, According to one embodiment, a pattern formation method includes disposing a mask and a substrate separately from each other, the mask having a plurality of light transmitting portions arranged periodically. The method includes irradiating the mask with illumination light emitted from an optical part to irradiate the substrate with at least a part of the illumination light transmitted through the light transmitting portions. a distance d between the mask and the substrate, a wavelength ? of the illumination light, a pitch p of an arrangement of the light transmitting parts, a numerical aperture NAi of the optical part, and at least one natural number n satisfy the following. p?2?, (np2/?)???d?(np2/?)+?, ?=p2(2?) and ?/(8np)?NAi<?/(2np).

Abstract: According to one embodiment, According to one embodiment, a pattern formation method includes disposing a mask and a substrate separately from each other, the mask having a plurality of light transmitting portions arranged periodically. The method includes irradiating the mask with illumination light emitted from an optical part to irradiate the substrate with at least a part of the illumination light transmitted through the light transmitting portions. a distance d between the mask and the substrate, a wavelength of the illumination light, a pitch p of an arrangement of the light transmitting parts, a numerical aperture NAi of the optical part, and at least one natural number n satisfy the following, p?2?, (np2/?)???d?(np2/?)+?, ?=p2(2?) and ?/(8np)?NAi<?/(2np).

Abstract: A removable pressure-sensitive adhesive which, even when applied to metal sheets or to metallic members which have undergone a coating treatment, is inhibited from increasing in adhesive force with the lapse of time and can be easily removed therefrom and which has satisfactory weatherability and satisfactory pot life contains 100 parts by weight on a solid basis of an aqueous dispersion type acrylic copolymer obtained by polymerizing a monomer mixture in an aqueous medium in the presence of a nonionic surfactant and/or an anionic surfactant each having an ethylenic double bond and 0.1 to 3 parts by weight of a hindered-amine light stabilizer having a piperidine ring in which the nitrogen atom has a tertiary amine structure; and an adhesive sheet is produced with the adhesive.

Abstract: A removable pressure-sensitive adhesive which, even when applied to metal sheets or to metallic members which have undergone a coating treatment, is inhibited from increasing in adhesive force with the lapse of time and can be easily removed therefrom and which has satisfactory weatherability and satisfactory pot life contains 100 parts by weight on a solid basis of an aqueous dispersion type acrylic copolymer obtained by polymerizing a monomer mixture in an aqueous medium in the presence of a nonionic surfactant and/or an anionic surfactant each having an ethylenic double bond and 0.1 to 3 parts by weight of a hindered-amine light stabilizer having a piperidine ring in which the nitrogen atom has a tertiary amine structure; and an adhesive sheet is produced with the adhesive.

Abstract: An electrode having an excellent corrosion resistance and long service life even in a severe corrosive environment such as in NaCl solutions for anode electrolysis in which chlorine gas or the like is produced at a high potential from the alloy surface. The electrode of the invention is provided using a precious metal-based amorphous alloy which has a good plasticity processibility and is applicable to a large-sized component. The object is implemented by provision of an electrode material for anode electrolysis which utilizes a precious metal-based amorphous alloy which satisfies the general formula NM.sub.100-a-b-c Ni.sub.a Cu.sub.b P.sub.c wherein NM comprises one or two precious metal elements selected from Pd and Pt; a, b and c being atomic percent, satisfy that 30.ltoreq.a+b.ltoreq.45,3.ltoreq.b/a.ltoreq.7, and 18.ltoreq.c.ltoreq.25, respectively; Pt is contained from 10 to 30 atom percent (at. %); and wherein a temperature width .DELTA.Tx in the supercooled liquid region (.DELTA.

Abstract: A projection exposure apparatus is provided with an illuminating optical system for illuminating a reticle having a predetermined fine pattern, a projection optical system for projecting the pattern of the reticle onto a wafer, and diaphragm means so constructed as to vary the aperture of a diaphragm of the projection optical system, wherein means for receiving information on the pattern present on the reticle, and means for determining a diaphgram aperture capable of eliminating the high-order diffracted light generated by the pattern of the reticle according to information as stated above and controlling the aperture of variable diaphragm means of the projection optical system, are provided.

Abstract: A surface displacement sensor is so designed that a stop or aperture for controlling an angle of opening is disposed at the position of a pupil of a detection optical system in which a slit image is focused on the surface to be detected and the light rays reflected from the surface to be detected are collected to re-focus the slit image on the light receiving surface of the sensor. When the height position of the surface to be detected is detected by such stop for controlling the angle of opening, the deviation of the distribution of intensity of light which tends to occur in the widthwise direction of the slit through which passes the light beam which in turn focuses a slit image, can be positively decreased by limiting the angle of opening N.A. in the widthwise direction of the slit for passing the light beam to focus a slit image to be narrow and consequently the degree of detection accuracy can be improved.

Abstract: An apparatus for measuring dimensions of a micropattern has a photoelectric sensor for scanning an enlarged image of a pattern and detects the positions of the leading and trailing edges by use of a predetermined slice level from a photoelectric signal which is derived by this sensor, thereby detecting the interval between those edges. The slice level is corrected in accordance with the interval between the edges to be measured. An amount of correction is stored as a predetermined table. A determination is made by an interval discriminating section to see if the correction needs to be performed or not.

Abstract: An optical apparatus for precisely measuring the dimensions of an object comprises an objective lens for forming an enlarged image of the object, a screen member onto which the enlarged image by the objective lens is projected and which is movable in a direction parallel to one direction on the image plane of the enlarged image, the screen member including a slit formed perpendicularly to the one direction, and a reflecting surface which is provided in an area including the surroundings of the slit and onto which the enlarged image is projected, observation optical means for observing therethrough the enlarged image on the reflecting surface, the observation optical means having a relay lens, and a field lens provided in opposed relationship with the reflecting surface of the screen member, the imaging light beam of the object from the objective lens passing through the field lens onto the reflecting surface of the screen member, the imaging light beam of the object reflected by the reflecting surface of the