Patents by Inventor Takeshi Takenaka
Takeshi Takenaka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 11512019Abstract: A fluidized-bed-type apparatus and method for treating gypsum, which activates or improves fluidity of gypsum powder to promote an effect of treatment of gypsum, such as modification or homogenization of the gypsum powder. The apparatus for treating gypsum includes a reactor vessel, a conditioned air supply port, a horizontal partition wall and a plurality of stationary vanes. The wall allows a conditioned air flow to flow upward into a reaction region. The vanes are arranged at an angular interval in a circumferential direction. A fluidized bed of calcined gypsum is provided in the vessel. The vane deflects the conditioned air flow flowing upward into the reaction region, toward a radially outward and circumferential direction of the reaction region. The calcined gypsum makes a saltational fluid motion or saltational movement in the vessel with the air flow.Type: GrantFiled: July 14, 2017Date of Patent: November 29, 2022Assignee: YOSHINO GYPSUM CO., LTD.Inventors: Kouji Nitoh, Takeshi Takenaka, Masaru Yoshida
-
Patent number: 11300357Abstract: A multitubular rotary heat exchanger has a stationary shielding unit. The shielding unit is positioned in close proximity to a tube plate outside a heating or cooling region. A stationary surface of the shielding unit is positioned in opposition to and in close proximity to an end opening of a heat transfer tube moving in an upper zone of the heating or cooling region, thereby transiently reducing or restricting the flow rate of the thermal medium fluid flowing through the heat transfer tube moving in the upper zone.Type: GrantFiled: March 15, 2019Date of Patent: April 12, 2022Assignee: YOSHINO GYPSUM CO., LTD.Inventors: Tomonori Yoshida, Takeshi Takenaka
-
Publication number: 20210292229Abstract: A fluidized-bed-type apparatus and method for treating gypsum, which activates or improves fluidity of gypsum powder to promote an effect of treatment of gypsum, such as modification or homogenization of the gypsum powder. The apparatus for treating gypsum includes a reactor vessel, a conditioned air supply port, a horizontal partition wall and a plurality of stationary vanes. The wall allows a conditioned air flow to flow upward into a reaction region. The vanes are arranged at an angular interval in a circumferential direction. A fluidized bed of calcined gypsum is provided in the vessel. The vane deflects the conditioned air flow flowing upward into the reaction region, toward a radially outward and circumferential direction of the reaction region. The calcined gypsum makes a saltational fluid motion or saltational movement in the vessel with the air flow.Type: ApplicationFiled: July 14, 2017Publication date: September 23, 2021Applicant: YOSHINO GYPUM CO., Ltd.Inventors: Kouji NITOH, Takeshi TAKENAKA, Masaru YOSHIDA
-
Publication number: 20210048254Abstract: A multitubular rotary heat exchanger has a stationary shielding unit. The shielding unit is positioned in close proximity to a tube plate outside a heating or cooling region. A stationary surface of the shielding unit is positioned in opposition to and in close proximity to an end opening of a heat transfer tube moving in an upper zone of the heating or cooling region, thereby transiently reducing or restricting the flow rate of the thermal medium fluid flowing through the heat transfer tube moving in the upper zone.Type: ApplicationFiled: March 15, 2019Publication date: February 18, 2021Applicant: YOSHINO GYPSUM CO., LTD.Inventors: Tomonori YOSHIDA, Takeshi TAKENAKA
-
Patent number: 10350564Abstract: An apparatus for calcination of gypsum includes a gypsum calciner having an interior wall surface with a circular or annular configuration as seen in its plan view, and a tubular combustor positioned at a center part of a body of the calciner. Raw gypsum is calcined or dehydrated by a high temperature gas spouting flow (Hg) ejected from a lower portion of the combustor. The calciner has a stationary-vane-type or movable-vane-type auxiliary device, which circumferentially energizes the raw gypsum in the vicinity of the interior wall surface toward a circumferential direction of the calciner. The auxiliary device has a plurality of stationary vanes circumferentially arranged in an outer peripheral zone of a lower portion of the combustor and spaced apart from each other at an angular interval, or an agitator extending through a conical or inner circumferential surface defined by the interior wall surface.Type: GrantFiled: February 12, 2016Date of Patent: July 16, 2019Assignee: YOSHINO GYPSUM CO., LTD.Inventors: Katsumi Niimi, Kazumi Endo, Takeshi Takenaka, Kouji Nitoh
-
Publication number: 20180036697Abstract: An apparatus for calcination of gypsum includes a gypsum calciner having an interior wall surface with a circular or annular configuration as seen in its plan view, and a tubular combustor positioned at a center part of a body of the calciner. Raw gypsum is calcined or dehydrated by a high temperature gas spouting flow (Hg) ejected from a lower portion of the combustor. The calciner has a stationary-vane-type or movable-vane-type auxiliary device, which circumferentially energizes the raw gypsum in the vicinity of the interior wall surface toward a circumferential direction of the calciner. The auxiliary device has a plurality of stationary vanes circumferentially arranged in an outer peripheral zone of a lower portion of the combustor and spaced apart from each other at an angular interval, or an agitator extending through a conical or inner circumferential surface defined by the interior wall surface.Type: ApplicationFiled: February 12, 2016Publication date: February 8, 2018Applicant: YOSHINO GYPSUM CO., LTD.Inventors: Katsumi NIIMI, Kazumi ENDO, Takeshi TAKENAKA, Kouji NITOH
-
Patent number: 5407502Abstract: A method is provided wherein semiconductor device includes a package, a semiconductor chip provided on the package, an intermediate layer formed on the package, an adhesive layer formed on the intermediate layer, and a lid formed on the adhesive layer and sealing the semiconductor chip. The intermediate layer contains a major component which is the same as a major component of the package. The method includes screen printing the intermediate layer on a predetermined area of the package and the formation of a roughened surface by sintering the intermediate layer. The major component comprises, among other materials, alumina or alumina and glass.Type: GrantFiled: September 16, 1993Date of Patent: April 18, 1995Assignee: Fujitsu LimitedInventors: Takeshi Takenaka, Toshio Hamano, Takekiyo Saito
-
Patent number: 5278429Abstract: A semiconductor device includes a package, a semiconductor chip provided on the package, an intermediate layer formed on the package, an adhesive layer formed on the intermediate layer, and a lid formed on the adhesive layer and sealing the semiconductor chip. The intermediate layer contains a major component which is the same as a major component of the package.Type: GrantFiled: April 20, 1993Date of Patent: January 11, 1994Assignee: Fujitsu LimitedInventors: Takeshi Takenaka, Toshio Hamano, Takekiyo Saito