Patents by Inventor Takeshi Tobimatsu

Takeshi Tobimatsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Liquid processing apparatus and liquid processing method
    Patent number: 11161136
    Abstract: A liquid processing apparatus includes a processing liquid supply including a nozzle configured to discharge a processing liquid; a nozzle mover configured to move the nozzle between a coating position and a standby position; a suction unit including a suction opening toward a leading end surface of the nozzle located at the standby position; a cleaning unit configured to clean the leading end surface of the nozzle located at the standby position with a cleaning liquid; and a control device. The control device controls the processing liquid supply to discharge the processing liquid in a state that the nozzle is located at the standby position. The control device controls the suction unit to suck the processing liquid. The control device controls the cleaning unit to supply the cleaning liquid toward the standby position to clean the nozzle. The control device controls the suction unit to suck the cleaning liquid.
    Type: Grant
    Filed: April 24, 2020
    Date of Patent: November 2, 2021
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Tomoki Okazawa, Yuta Nishiyama, Takeshi Tobimatsu
  • LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD
    Publication number: 20200338582
    Abstract: A liquid processing apparatus includes a processing liquid supply including a nozzle configured to discharge a processing liquid; a nozzle mover configured to move the nozzle between a coating position and a standby position; a suction unit including a suction opening toward a leading end surface of the nozzle located at the standby position; a cleaning unit configured to clean the leading end surface of the nozzle located at the standby position with a cleaning liquid; and a control device. The control device controls the processing liquid supply to discharge the processing liquid in a state that the nozzle is located at the standby position. The control device controls the suction unit to suck the processing liquid. The control device controls the cleaning unit to supply the cleaning liquid toward the standby position to clean the nozzle. The control device controls the suction unit to suck the cleaning liquid.
    Type: Application
    Filed: April 24, 2020
    Publication date: October 29, 2020
    Inventors: Tomoki Okazawa, Yuta Nishiyama, Takeshi Tobimatsu