Abstract: A metal image-forming material comprising a base, a photosensitive resin layer formed thereon, and a layer of an aluminum/iron alloy formed between the base and the resin layer. The aluminum/iron alloy layer has superior etchability, and the image-forming material affords images having high contrast and resolving power. The image-forming material is especially suitable for linework and dot etching.

Abstract: A planographic printing plate material comprising a support and a light sensitive layer provided on the support, the light-sensitive layer being composed of (A) an inorganic material; (B) at least one metal and/or metal compound [(A)/(B) are capable of reacting with each other upon application of electromagnetic radiation] and (C) an organic compound capable of affecting the reaction between the inorganic material (A) and the metal and/or metal compound (B), wherein the inorganic material (A), the metal or metal compound (B), and the organic compound (C) are in contact with each other. When the light-sensitive layer is exposed to electromagnetic radiation, a difference in the hydrophilic or oleophilic nature of the exposed areas and the unexposed areas results, whereby a planographic printing plate is obtained which can be mounted on a printing machine and printed without any other treatments.

Abstract: A processing-free lithographic printing plate, which comprises a support having deposited thereon a composition containing germanium and sulfur and at least one of a metal or metal compound in a physically mixed state.

Abstract: A metallic image forming article comprising a support, an intermediate layer comprising Al and a metal having an ionizing tendency lower than that of Al, and a photosensitive resin layer on the intermediate layer.

Abstract: A method for forming an image, which comprises subjecting an image-recording material comprising a metal layer and an inorganic material layer to imagewise exposure by application of electromagnetic radiation, and then heating the exposed material to cause a thermal doping of the unexposed area of the metal layer. This method permits the formation of negative-positive type images. The product finds a wide range of valuable industrial applications, for example, as an ordinary image-recording material, laser recording material, electron beam recording material or microrecording material, and also for producing a print-wiring plate, relief metal plate for relief and lithographic printing, or a master for electrostatic printing.

Abstract: A photo-sensitive etchant comprising (1) a first composition comprising a substance capable of producing water upon exposure to light, a binder and a solvent and (2) a second composition comprising a compound capable of producing, upon exposure to light, a metal-etching substance or a substance which reacts with another other substance to form a metal-etching product, a binder and a solvent; and a method for forming metal image by using the photosensitive etchant.

Abstract: A light-sensitive etching agent comprising (a) a photodecomposable compound forming upon decomposition a material capable of etching a silicon compound containing film or capable of etching the film after reaction with another material, (b) a material capable of forming water upon exposure to light, (c) a binder and (d) a solvent, and a method of making a semiconductor device utilizing the light-sensitive etching agent.

Abstract: A method of forming patterns on a semiconductor element is disclosed comprising the steps of (a) depositing a coating of silicon nitride, borosilicate glass, or phosphosilicate glass on the surface of a semiconductor substrate, (b) applying a photosensitive etching solution layer to the coating and drying it, (c) irradiating the substrate with ultraviolet radiation through a photomask having a required pattern to decompose the photosensitive solution and etch the coating, and (d) removing the photosensitive solution, the decomposed material, and the reaction product of the decomposed material and the coating with an organic solvent. The photosensitive etching solution consists of a compound which may be decomposed by light to a material which etches the coating, or a compound obtained from the reaction between the photodecomposed material and other material in the solution which etches said coating.