Patents by Inventor Takeshi Uno

Takeshi Uno has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11004682
    Abstract: Provided are a laser annealing apparatus, a laser annealing method, and a mask with which scan nonuniformity can be decreased. According to the present invention, all or some openings of a plurality of openings are configured so that a partial subregion of a prescribed region is irradiated with laser light. The plurality of openings are configured so that, between prescribed regions irradiated with laser light via a group of openings in one row arranged in a row direction and prescribed regions irradiated with laser light via a group of openings in another row arranged in the row direction, the number of times of laser light radiations in subregions having the same occupying region is the same, and at least two openings of a group of openings arranged in a column direction have different positions or shapes.
    Type: Grant
    Filed: December 15, 2016
    Date of Patent: May 11, 2021
    Assignee: SAKAI DISPLAY PRODUCTS CORPORATION
    Inventors: Yoshiaki Matsushima, Takeshi Uno, Yuta Sugawara, Kota Imanishi, Nobutake Nodera, Takao Matsumoto
  • Publication number: 20200098557
    Abstract: Provided are a laser annealing apparatus, a laser annealing method, and a mask with which scan nonuniformity can be decreased. According to the present invention, all or some openings of a plurality of openings are configured so that a partial subregion of a prescribed region is irradiated with laser light. The plurality of openings are configured so that, between prescribed regions irradiated with laser light via a group of openings in one row arranged in a row direction and prescribed regions irradiated with laser light via a group of openings in another row arranged in the row direction, the number of times of laser light radiations in subregions having the same occupying region is the same, and at least two openings of a group of openings arranged in a column direction have different positions or shapes.
    Type: Application
    Filed: December 15, 2016
    Publication date: March 26, 2020
    Inventors: YOSHIAKI MATSUSHIMA, TAKESHI UNO, YUTA SUGAWARA, KOTA IMANISHI, NOBUTAKE NODERA, TAKAO MATSUMOTO
  • Patent number: 10559600
    Abstract: A thin film transistor according to an embodiment of the present invention includes: a gate electrode supported by a substrate; a gate insulating layer covering the gate electrode; a silicon semiconductor layer being provided on the gate insulating layer and having a crystalline silicon region, the crystalline silicon region including a first region, a second region, and a channel region located between the first region and the second region, such that the channel region, the first region, and the second region overlap the gate electrode via the gate insulating layer; an insulating protection layer disposed on the silicon semiconductor layer so as to cover the channel region and allow the first region and the second region to be exposed; a source electrode electrically connected to the first region; and a drain electrode electrically connected to the second region. The channel region is higher in crystallinity than the first region and the second region.
    Type: Grant
    Filed: April 1, 2019
    Date of Patent: February 11, 2020
    Assignee: SAKAI DISPLAY PRODUCTS CORPORATION
    Inventors: Yuta Sugawara, Takeshi Uno, Nobutake Nodera, Takao Matsumoto
  • Publication number: 20200006395
    Abstract: A thin film transistor according to an embodiment of the present invention includes: a gate electrode supported by a substrate; a gate insulating layer covering the gate electrode; a silicon semiconductor layer being provided on the gate insulating layer and having a crystalline silicon region, the crystalline silicon region including a first region, a second region, and a channel region located between the first region and the second region, such that the channel region, the first region, and the second region overlap the gate electrode via the gate insulating layer; an insulating protection layer disposed on the silicon semiconductor layer so as to cover the channel region and allow the first region and the second region to be exposed; a source electrode electrically connected to the first region; and a drain electrode electrically connected to the second region. The channel region is higher in crystallinity than the first region and the second region.
    Type: Application
    Filed: April 1, 2019
    Publication date: January 2, 2020
    Inventors: YUTA SUGAWARA, TAKESHI UNO, NOBUTAKE NODERA, TAKAO MATSUMOTO
  • Patent number: 8475668
    Abstract: Provided are a substrate liquid processing apparatus, a substrate liquid processing method, and a computer readable storage medium having a substrate liquid processing program stored therein that can prevent the occurrence of the electrostatic breakdown caused by the discharge of electric charges in a substrate. The substrate liquid processing apparatus processes a circuit-forming surface of the substrate with a chemical liquid. Furthermore, prior to processing the substrate with the chemical liquid, the substrate liquid processing apparatus performs an anti-static process for an surface opposite to the circuit-forming surface of the substrate by an anti-static liquid, thereby emitting the electric charges on the substrate.
    Type: Grant
    Filed: October 12, 2010
    Date of Patent: July 2, 2013
    Assignee: Tokyo Electron Limited
    Inventors: Hiroshi Tanaka, Teruomi Minami, Yosuke Kawabuchi, Norihiro Ito, Fumihiro Kamimura, Takashi Yabuta, Kazuki Kosai, Takeshi Uno, Kenji Sekiguchi, Yasushi Fujii
  • Publication number: 20110089137
    Abstract: Provided are a substrate liquid processing apparatus, a substrate liquid processing method, and a computer readable storage medium having a substrate liquid processing program stored therein that can prevent the occurrence of the electrostatic breakdown caused by the discharge of electric charges in a substrate. The substrate liquid processing apparatus processes a circuit-forming surface of the substrate with a chemical liquid. Furthermore, prior to processing the substrate with the chemical liquid, the substrate liquid processing apparatus performs an anti-static process for an surface opposite to the circuit-forming surface of the substrate by an anti-static liquid, thereby emitting the electric charges on the substrate.
    Type: Application
    Filed: October 12, 2010
    Publication date: April 21, 2011
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Hiroshi TANAKA, Teruomi MINAMI, Yosuke KAWABUCHI, Norihiro ITO, Fumihiro KAMIMURA, Takashi YABUTA, Kazuki KOSAI, Takeshi UNO, Kenji SEKIGUCHI, Yasushi FUJII
  • Patent number: 4494139
    Abstract: An automatic assembly system wherein parts supplied from a feeder are held by a holder and are automatically mounted onto predetermined positions of a circuit board; comprising a first image pickup device which images at least a portion of said circuit board, a second image pickup device which images at least a portion of the part held by the holder means, a signal processor which processes an output of said first image pickup device to detect a deviation of said circuit board from a reference position and which also processes an output of said second image pickup device to detect a magnitude of deviation between said part and the predetermined position of said circuit board, and a positioning device which operates under control of said signal processor so as to adjust said predetermined position of said circuit board to a position opposing to said part and also to move said part toward said circuit board.
    Type: Grant
    Filed: March 30, 1982
    Date of Patent: January 15, 1985
    Assignee: Hitachi, Ltd.
    Inventors: Yoshihiro Shima, Seiji Kashioka, Takeshi Uno, Kunio Suzuki
  • Patent number: 4286146
    Abstract: A coded label comprising a code pattern in which first and second segments respectively being substantially square and having reflection factors different from each other are arranged in at least four rows and two columns, and in which at least two of either of the first and second segments are arranged in each column and at least one is arranged in each of the uppermost and lowermost rows.
    Type: Grant
    Filed: January 12, 1979
    Date of Patent: August 25, 1981
    Assignee: Hitachi, Ltd.
    Inventors: Takeshi Uno, Hirotada Ueda, Sadahiro Ikeda, Masakazu Ejiri, Shinji Matsuoka
  • Patent number: 4281342
    Abstract: In a mark detecting system using an image pickup device such as a TV camera in which a mark in the form of a regressive reflector is provided on an object, the field of view of the image pickup device is illuminated with light of a specified wavelength from an illuminating device placed in the vicinity of the image pickup device. The reflected light is introduced on the image pickup device through a filter capable of cutting off light having wavelengths other than the specified wavelength. Since the mark forms a bright pattern on an image produced within the field of view of the image pickup device, the position of the mark can be easily detected by means of a data processor which processes image signals.
    Type: Grant
    Filed: March 28, 1979
    Date of Patent: July 28, 1981
    Assignee: Hitachi, Ltd.
    Inventors: Hirotada Ueda, Toshikazu Yasue, Takeshi Uno
  • Patent number: 4194157
    Abstract: An audio apparatus in the form of a radio receiver is composed of a first part including electrical components constituting a tuner housed within a first cabinet for providing audio signals, a second part including at least a loud speaker housed within a second cabinet for converting the audio signals to sound, and cooperative mechanical and electrical coupling members at mating surfaces of the first and second cabinets for detachably assembling together the first and second parts of the apparatus with such mating surfaces of the respective cabinets in abutting relationship. When the first and second parts of the audio apparatus are detached from each other, the first part thereof may be used alone as a pocket radio with the audio signals produced thereby being audibly reproduced by means of an earphone engaged with a respective jack of such first part.
    Type: Grant
    Filed: September 15, 1977
    Date of Patent: March 18, 1980
    Assignee: Sony Corporation
    Inventor: Takeshi Uno
  • Patent number: 4136957
    Abstract: A recognition device for recognizing the shape and the position of an object includes means for applying a bundle of parallel light beams having a specific cross-section to a space containing the object, means for transducing the light informations from the space into image signals, means for extracting from said image signals a specific pattern corresponding to the portion to which the bundle of light beams is applied and means for determining the position of the pattern on the image surface, whereby the existence, shape and the position of the object are recognized from the information on the image surface.
    Type: Grant
    Filed: January 24, 1977
    Date of Patent: January 30, 1979
    Assignee: Hitachi, Ltd.
    Inventors: Takeshi Uno, Sadahiro Ikeda, Toshikazu Yasue, Masakazu Ejiri
  • Patent number: 4115761
    Abstract: This method for recognizing a specific pattern is characterized in a process of extracting feature parts wherein one or more certain feature parts of specific shape are extracted from an input pattern; the next feature part is then extracted from an extracting area which is determined from the position on the input pattern where a previous feature part was extracted; and in case that the next feature part fails to be extracted from the extracting area so determined, the initial condition is restored thereby extracting the feature part by successively limiting extracting areas.
    Type: Grant
    Filed: February 7, 1977
    Date of Patent: September 19, 1978
    Assignee: Hitachi, Ltd.
    Inventors: Hirotada Ueda, Takeshi Uno, Masakazu Ejiri, Sadahiro Ikeda, Shinji Matsuoka
  • Patent number: 4021778
    Abstract: A pattern recognition system comprises a partial pattern cutting out system which has a plurality of cutting out windows previously provided in correspondence with a plurality of regions in a specific pattern which respectively correspond to a characteristic part of the specific pattern to be recognized and which constitute patterns symmetric to each other. A binary input signal is cut out by the use of the partial pattern cutting out apparatus. The "EXCLUSIVE OR" function between the corresponding bits of the partial patterns obtained from the plurality of cutting out windows are evaluated by "EXCLUSIVE OR" circuits. The number of outputs of predetermined logic level among the outputs of the "EXCLUSIVE OR" circuits and a preset number are compared, and the coincidence between both the numbers is sought. When both numbers coincide, the inputted signal is recognized as being the specific pattern.
    Type: Grant
    Filed: August 2, 1976
    Date of Patent: May 3, 1977
    Assignee: Hitachi, Ltd.
    Inventors: Hirotada Ueda, Takeshi Uno, Sadahiro Ikeda
  • Patent number: 4014000
    Abstract: A pattern recognition system comprises a picture tube for picking up an object to be recognized, a partial image pattern cutting out apparatus which, in turn, outputs a plurality of partial image patterns cut out from an image pattern obtained from the picture tube, the partial image patterns being output in synchronization with the scanning of the picture tube and a memory storing a plurality of partial standard patterns. Each of the partial image patterns is compared with the respective partial standard patterns and the respective partial image patterns similar to each partial standard pattern are grouped every partial standard pattern. A group of the partial image patterns, each of which is closely spaced from each other in a position of two-dimensional coordinate is selected from each group of the grouped partial image patterns and the respective representative positions of the respective elected groups of the partial image patterns are calculated.
    Type: Grant
    Filed: March 29, 1976
    Date of Patent: March 22, 1977
    Assignee: Hitachi, Ltd.
    Inventors: Takeshi Uno, Sadahiro Ikeda, Hirotada Ueda
  • Patent number: 3967242
    Abstract: An automatic working machine adapted to carry out works such as cutting, filling, tightening and loosening, which comprises a visual unit for detecting, by means of the image information, a plurality of works and obstacles existing on an object, a working unit which works against a particular work and moves in relation to the object, and a tactile sensor provided in the vicinity of the working unit, the working unit being precisely positioned by the aid of the tactile sensor when the visual unit detects the particular work, the relative position being maintained during the operation, and the working unit along with the tactile sensor being retracted when the visual unit detects an obstacle, to avoid collision thereof with the obstacle.
    Type: Grant
    Filed: June 13, 1974
    Date of Patent: June 29, 1976
    Assignee: Hitachi, Ltd.
    Inventors: Osamu Isoo, Shinji Matsuoka, Shigeru Matsuoka, Takeshi Uno, Sadahiro Ikeda, Ikuro Masuda, Koji Kurokawa
  • Patent number: 3959771
    Abstract: A pattern recognition apparatus for discriminating a body having a specified shape from a number of bodies, in which an image area, at which the image signal has a value within a specified range, within a specified region of the image of a body is measured and whether or not the image area is within the range predetermined by the body to be recognized is decided.
    Type: Grant
    Filed: October 11, 1973
    Date of Patent: May 25, 1976
    Assignee: Hitachi, Ltd.
    Inventors: Takeshi Uno, Sadahiro Ikeda, Masakazu Ejiri, Jun Motoike