Patents by Inventor Takeshi Watari

Takeshi Watari has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230330779
    Abstract: Disclosed is a laser processing method for imparting compressive residual stress to an object along an objective area on a surface of the object by irradiating the objective area with laser light. The laser processing method includes a processing step of scanning the objective area with an irradiation spot of the laser light while increasing a moving average in intensity of the laser light per unit area.
    Type: Application
    Filed: July 5, 2021
    Publication date: October 19, 2023
    Applicant: HAMAMATSU PHOTONICS K.K.
    Inventors: Yuki KABEYA, Takashi KURITA, Ryo YOSHIMURA, Takeshi WATARI
  • Publication number: 20230330774
    Abstract: Disclosed is a laser processing method for imparting compressive residual stress to an object along an objective area on a surface of the object by irradiating the objective area with laser light. The laser processing method includes: a first step of expanding an area irradiated with the laser light toward a first side in the objective area; and a second step of expanding the area irradiated with the laser light toward a second side different from the first side in the objective area.
    Type: Application
    Filed: July 5, 2021
    Publication date: October 19, 2023
    Applicant: HAMAMATSU PHOTONICS K.K.
    Inventors: Yuki KABEYA, Takashi KURITA, Ryo YOSHIMURA, Takeshi WATARI
  • Publication number: 20230226639
    Abstract: A processed product manufacturing method includes preparing a workpiece containing metal and forming a plurality of first regions and a second region along a surface of the workpiece by the irradiation of a laser beam. The first regions are applied with a tensile residual stress. In the second region applied with a compressive residual stress, a plurality of irradiation points separated from each other in the surface of the workpiece are irradiated with the laser beam. The first regions are formed to be separated from each other and each of the first regions is surrounded by the second region when viewed from a direction orthogonal to the surface.
    Type: Application
    Filed: June 4, 2021
    Publication date: July 20, 2023
    Applicant: HAMAMATSU PHOTONICS K.K.
    Inventors: Takashi KURITA, Takeshi WATARI, Yuki KABEYA, Ryo YOSHIMURA
  • Patent number: 11662483
    Abstract: A signal readout circuit is a circuit for reading out a signal from a photodetection element having a plurality of photodetection pixels each generating a detection signal according to light incidence, and includes N light incidence detection units (N is an integer of 2 or more) each for inputting the detection signal from each of N photodetection pixels and outputting a signal indicating the light incidence, and a total value detection unit for detecting a total value of the output signals from the N light incidence detection units. Each light incidence detection unit outputs the signal weighted differently corresponding to each photodetection pixel. A weight thereof is set such that the total values are different for respective photodetection pixels and all combination patterns of the photodetection pixels.
    Type: Grant
    Filed: July 6, 2020
    Date of Patent: May 30, 2023
    Assignee: HAMAMATSU PHOTONICS K.K.
    Inventor: Takeshi Watari
  • Patent number: 11504803
    Abstract: A laser processing apparatus includes a light source which outputs a laser light, and a waveform control unit which controls a pulse waveform of the laser light irradiating the workpiece, in which the pulse waveform of the laser light controlled by the waveform control unit includes a main pulse and a foot pulse temporally preceding the main pulse, and a peak intensity of the foot pulse is smaller than a peak intensity of the main pulse, and a peak position of the main pulse is positioned in a retention time period of plasma generated due to an incidence of the foot pulse on the workpiece.
    Type: Grant
    Filed: January 24, 2019
    Date of Patent: November 22, 2022
    Assignee: HAMAMATSU PHOTONICS K.K
    Inventors: Yoshio Mizuta, Takashi Kurita, Takeshi Watari, Yuki Kabeya, Norio Kurita, Toshiyuki Kawashima
  • Publication number: 20220268948
    Abstract: A signal readout circuit is a circuit for reading out a signal from a photodetection element having a plurality of photodetection pixels each generating a detection signal according to light incidence, and includes N light incidence detection units (N is an integer of 2 or more) each for inputting the detection signal from each of N photodetection pixels and outputting a signal indicating the light incidence, and a total value detection unit for detecting a total value of the output signals from the N light incidence detection units. Each light incidence detection unit outputs the signal weighted differently corresponding to each photodetection pixel. A weight thereof is set such that the total values are different for respective photodetection pixels and all combination patterns of the photodetection pixels.
    Type: Application
    Filed: July 6, 2020
    Publication date: August 25, 2022
    Applicant: HAMAMATSU PHOTONICS K.K.
    Inventor: Takeshi WATARI
  • Publication number: 20190232423
    Abstract: A laser processing apparatus includes a light source which outputs a laser light, and a waveform control unit which controls a pulse waveform of the laser light irradiating the workpiece, in which the pulse waveform of the laser light controlled by the waveform control unit includes a main pulse and a foot pulse temporally preceding the main pulse, and a peak intensity of the foot pulse is smaller than a peak intensity of the main pulse, and a peak position of the main pulse is positioned in a retention time period of plasma generated due to an incidence of the foot pulse on the workpiece.
    Type: Application
    Filed: January 24, 2019
    Publication date: August 1, 2019
    Applicant: HAMAMATSU PHOTONICS K.K.
    Inventors: Yoshio MIZUTA, Takashi KURITA, Takeshi WATARI, Yuki KABEYA, Norio KURITA, Toshiyuki KAWASHIMA
  • Patent number: 9953729
    Abstract: A radiation generating apparatus comprises a fuel storage unit 20 for storing a mixed liquid 61, a pressure application unit 10 for applying a pressure to the mixed liquid 61, a jet formation unit 30 for forming a jet 61a of the mixed liquid 61, a reaction unit 44 for forming the jet 61a of the mixed liquid 61 therein, a pressure adjustment unit 41 for setting a pressure in the reaction unit 44 lower than an internal pressure of the jet formation unit 30, and a light source unit 45 for irradiating a particle group 63a with laser light L1.
    Type: Grant
    Filed: August 8, 2012
    Date of Patent: April 24, 2018
    Assignee: HAMAMATSU PHOTONICS K.K.
    Inventors: Takeshi Watari, Katsunobu Nishihara, Masaru Takagi, Nakahiro Satoh, Toshiyuki Kawashima, Hirofumi Kan
  • Publication number: 20140226772
    Abstract: A radiation generating apparatus comprises a fuel storage unit 20 for storing a mixed liquid 61, a pressure application unit 10 for applying a pressure to the mixed liquid 61, a jet formation unit 30 for forming a jet 61a of the mixed liquid 61, a reaction unit 44 for forming the jet 61a of the mixed liquid 61 therein, a pressure adjustment unit 41 for setting a pressure in the reaction unit 44 lower than an internal pressure of the jet formation unit 30, and a light source unit 45 for irradiating a particle group 63a with laser light L1.
    Type: Application
    Filed: August 8, 2012
    Publication date: August 14, 2014
    Applicant: HAMAMATSU PHOTONICS K.K.
    Inventors: Takeshi Watari, Katsunobu Nishihara, Masaru Takagi, Nakahiro Satoh, Toshiyuki Kawashima, Hirofumi Kan